CN1983023A - 波纹缺陷检查方法和系统及光掩模的制造方法 - Google Patents

波纹缺陷检查方法和系统及光掩模的制造方法 Download PDF

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Publication number
CN1983023A
CN1983023A CNA2005101346578A CN200510134657A CN1983023A CN 1983023 A CN1983023 A CN 1983023A CN A2005101346578 A CNA2005101346578 A CN A2005101346578A CN 200510134657 A CN200510134657 A CN 200510134657A CN 1983023 A CN1983023 A CN 1983023A
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CN
China
Prior art keywords
inspection
corrugation
photomask
repetitive pattern
flaw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005101346578A
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English (en)
Chinese (zh)
Inventor
吉田辉昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN1983023A publication Critical patent/CN1983023A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CNA2005101346578A 2004-12-13 2005-12-13 波纹缺陷检查方法和系统及光掩模的制造方法 Pending CN1983023A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004360196A JP4583155B2 (ja) 2004-12-13 2004-12-13 欠陥検査方法及びシステム、並びにフォトマスクの製造方法
JP2004360196 2005-12-13

Publications (1)

Publication Number Publication Date
CN1983023A true CN1983023A (zh) 2007-06-20

Family

ID=36671596

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005101346578A Pending CN1983023A (zh) 2004-12-13 2005-12-13 波纹缺陷检查方法和系统及光掩模的制造方法

Country Status (5)

Country Link
US (1) US20060158643A1 (enExample)
JP (1) JP4583155B2 (enExample)
KR (1) KR20060066658A (enExample)
CN (1) CN1983023A (enExample)
TW (1) TWI270660B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102679931A (zh) * 2012-05-10 2012-09-19 上海大学 原位测量疲劳裂纹扩展长度的新方法
CN101510047B (zh) * 2007-07-12 2013-05-22 以色列商·应用材料以色列公司 用于评估具有重复图案的物体的方法和系统
CN110723478A (zh) * 2019-09-27 2020-01-24 苏州精濑光电有限公司 一种显示面板检修装置
TWI699615B (zh) * 2017-03-21 2020-07-21 荷蘭商Ａｓｍｌ荷蘭公司 用於識別塑形特徵之方法及電腦程式產品

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080002874A1 (en) * 2006-06-29 2008-01-03 Peter Fiekowsky Distinguishing reference image errors in optical inspections
JP4946306B2 (ja) * 2006-09-22 2012-06-06 凸版印刷株式会社 欠陥検査装置における照明角度設定方法
KR101702887B1 (ko) 2007-04-18 2017-02-06 마이크로닉 마이데이타 에이비 무라 검출 및 계측을 위한 방법 및 장치
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
CN101655614B (zh) * 2008-08-19 2011-04-13 京东方科技集团股份有限公司 液晶显示面板云纹缺陷的检测方法和检测装置
DE102008060293B4 (de) * 2008-12-03 2015-07-30 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Messung des relativen lokalen Lagefehlers eines der Abschnitte eines abschnittsweise belichteten Objektes
JP5895350B2 (ja) * 2011-03-16 2016-03-30 凸版印刷株式会社 むら検査装置及びむら検査方法
EP2972589B1 (en) 2013-03-12 2017-05-03 Micronic Mydata AB Mechanically produced alignment fiducial method and alignment system
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
JP6442154B2 (ja) * 2014-04-23 2018-12-19 浜松ホトニクス株式会社 画像取得装置及び画像取得方法
CN104914133B (zh) * 2015-06-19 2017-12-22 合肥京东方光电科技有限公司 摩擦缺陷检测装置
US10755133B2 (en) * 2018-02-22 2020-08-25 Samsung Display Co., Ltd. System and method for line Mura detection with preprocessing

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345163A (ja) * 1991-05-23 1992-12-01 Nikon Corp フォトマスクの欠陥検査装置
US5764209A (en) * 1992-03-16 1998-06-09 Photon Dynamics, Inc. Flat panel display inspection system
JP3343444B2 (ja) * 1994-07-14 2002-11-11 株式会社アドバンテスト Ｌｃｄパネル画質検査装置及びｌｃｄ画像プリサンプリング方法
US6154561A (en) * 1997-04-07 2000-11-28 Photon Dynamics, Inc. Method and apparatus for detecting Mura defects
JPH10325805A (ja) * 1997-05-23 1998-12-08 Nikon Corp 半導体ウエハの自動検査装置
US6621571B1 (en) * 1999-10-29 2003-09-16 Hitachi, Ltd. Method and apparatus for inspecting defects in a patterned specimen
US6797975B2 (en) * 2000-09-21 2004-09-28 Hitachi, Ltd. Method and its apparatus for inspecting particles or defects of a semiconductor device
JP4126189B2 (ja) * 2002-04-10 2008-07-30 株式会社日立ハイテクノロジーズ 検査条件設定プログラム、検査装置および検査システム
JP3668215B2 (ja) * 2002-08-21 2005-07-06 株式会社東芝 パターン検査装置
JP2005291874A (ja) * 2004-03-31 2005-10-20 Hoya Corp パターンのムラ欠陥検査方法及び装置
JP4480002B2 (ja) * 2004-05-28 2010-06-16 Ｈｏｙａ株式会社 ムラ欠陥検査方法及び装置、並びにフォトマスクの製造方法
JP4480001B2 (ja) * 2004-05-28 2010-06-16 Ｈｏｙａ株式会社 ムラ欠陥検査マスク、ムラ欠陥検査装置及び方法、並びにフォトマスクの製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101510047B (zh) * 2007-07-12 2013-05-22 以色列商·应用材料以色列公司 用于评估具有重复图案的物体的方法和系统
CN102679931A (zh) * 2012-05-10 2012-09-19 上海大学 原位测量疲劳裂纹扩展长度的新方法
CN102679931B (zh) * 2012-05-10 2015-05-06 上海大学 原位测量疲劳裂纹扩展长度的新方法
TWI699615B (zh) * 2017-03-21 2020-07-21 荷蘭商Ａｓｍｌ荷蘭公司 用於識別塑形特徵之方法及電腦程式產品
US10890540B2 (en) 2017-03-21 2021-01-12 Asml Netherlands B.V. Object identification and comparison
CN110723478A (zh) * 2019-09-27 2020-01-24 苏州精濑光电有限公司 一种显示面板检修装置

Also Published As

Publication number Publication date
KR20060066658A (ko) 2006-06-16
US20060158643A1 (en) 2006-07-20
TW200628758A (en) 2006-08-16
TWI270660B (en) 2007-01-11
JP4583155B2 (ja) 2010-11-17
JP2006170664A (ja) 2006-06-29

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Open date: 20070620