KR20060059835A - 위치결정 장치 - Google Patents
위치결정 장치 Download PDFInfo
- Publication number
- KR20060059835A KR20060059835A KR1020050114650A KR20050114650A KR20060059835A KR 20060059835 A KR20060059835 A KR 20060059835A KR 1020050114650 A KR1020050114650 A KR 1020050114650A KR 20050114650 A KR20050114650 A KR 20050114650A KR 20060059835 A KR20060059835 A KR 20060059835A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- floating
- positioning
- support member
- receiving
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004343412A JP2006156612A (ja) | 2004-11-29 | 2004-11-29 | 位置決め装置 |
JPJP-P-2004-00343412 | 2004-11-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20060059835A true KR20060059835A (ko) | 2006-06-02 |
Family
ID=36634521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050114650A KR20060059835A (ko) | 2004-11-29 | 2005-11-29 | 위치결정 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006156612A (zh) |
KR (1) | KR20060059835A (zh) |
CN (1) | CN100505204C (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018139280A (ja) * | 2017-02-24 | 2018-09-06 | リンテック株式会社 | 位置決め装置および位置決め方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4989498B2 (ja) * | 2008-01-18 | 2012-08-01 | 株式会社ディスコ | ウェーハ搬送装置および加工装置 |
WO2011158903A1 (ja) * | 2010-06-17 | 2011-12-22 | 日産自動車株式会社 | ワーク位置決め装置及び電池製造方法 |
JP5861365B2 (ja) * | 2011-10-05 | 2016-02-16 | 大日本印刷株式会社 | 基板のアラインメント方法及び装置 |
JP5977042B2 (ja) * | 2012-02-27 | 2016-08-24 | 株式会社Screenホールディングス | 塗布装置、基板保持装置および基板保持方法 |
CN103367215B (zh) * | 2013-06-08 | 2016-08-24 | 天通吉成机器技术有限公司 | 一种等离子刻蚀设备的基片定位升降装置 |
JP6934435B2 (ja) * | 2018-02-26 | 2021-09-15 | 株式会社Screenホールディングス | センタリング装置、センタリング方法、基板処理装置、および基板処理方法 |
JP7259476B2 (ja) * | 2019-03-27 | 2023-04-18 | 東京エレクトロン株式会社 | アライメント装置、基板処理装置、アライメント方法及び基板処理方法 |
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2004
- 2004-11-29 JP JP2004343412A patent/JP2006156612A/ja active Pending
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2005
- 2005-11-29 KR KR1020050114650A patent/KR20060059835A/ko active Search and Examination
- 2005-11-29 CN CNB2005101373310A patent/CN100505204C/zh active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018139280A (ja) * | 2017-02-24 | 2018-09-06 | リンテック株式会社 | 位置決め装置および位置決め方法 |
Also Published As
Publication number | Publication date |
---|---|
CN100505204C (zh) | 2009-06-24 |
JP2006156612A (ja) | 2006-06-15 |
CN1812073A (zh) | 2006-08-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
AMND | Amendment | ||
J201 | Request for trial against refusal decision | ||
B601 | Maintenance of original decision after re-examination before a trial | ||
J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20130412 Effective date: 20130924 |