KR20060049695A - 산성 에칭액 재생방법 및 산성 에칭액 재생장치 - Google Patents

산성 에칭액 재생방법 및 산성 에칭액 재생장치 Download PDF

Info

Publication number
KR20060049695A
KR20060049695A KR1020050055145A KR20050055145A KR20060049695A KR 20060049695 A KR20060049695 A KR 20060049695A KR 1020050055145 A KR1020050055145 A KR 1020050055145A KR 20050055145 A KR20050055145 A KR 20050055145A KR 20060049695 A KR20060049695 A KR 20060049695A
Authority
KR
South Korea
Prior art keywords
acid
etching solution
permeate
etching
oxalic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020050055145A
Other languages
English (en)
Korean (ko)
Inventor
다카미치 우메에다
요시야 기타가와
Original Assignee
나가세 상교오 가부시키가이샤
나가세 씨엠에스 테크놀로지 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나가세 상교오 가부시키가이샤, 나가세 씨엠에스 테크놀로지 가부시키가이샤 filed Critical 나가세 상교오 가부시키가이샤
Publication of KR20060049695A publication Critical patent/KR20060049695A/ko
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
KR1020050055145A 2004-06-25 2005-06-24 산성 에칭액 재생방법 및 산성 에칭액 재생장치 Withdrawn KR20060049695A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004188579A JP2006013158A (ja) 2004-06-25 2004-06-25 酸性エッチング液再生方法及び酸性エッチング液再生装置
JPJP-P-2004-00188579 2004-06-25

Publications (1)

Publication Number Publication Date
KR20060049695A true KR20060049695A (ko) 2006-05-19

Family

ID=35718358

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050055145A Withdrawn KR20060049695A (ko) 2004-06-25 2005-06-24 산성 에칭액 재생방법 및 산성 에칭액 재생장치

Country Status (4)

Country Link
JP (1) JP2006013158A (enExample)
KR (1) KR20060049695A (enExample)
CN (1) CN1712567A (enExample)
TW (1) TW200613582A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790370B1 (ko) * 2006-11-09 2008-01-02 주식회사 에스씨티 폐에칭액의 재생장치 및 그 재생방법
KR101021784B1 (ko) * 2008-10-22 2011-03-17 주식회사 에스씨티 나노막필터를 이용한 에칭액의 재생 장치 및 그 재생방법
KR20160010258A (ko) * 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 에칭액 처리장치, 에칭액 관리방법 및 에칭액의 성분농도 측정방법

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008208396A (ja) * 2007-02-23 2008-09-11 Kobelco Eco-Solutions Co Ltd インジウムの回収方法とその装置
JP5340760B2 (ja) * 2009-02-12 2013-11-13 倉敷紡績株式会社 流体制御方法及び流体制御装置
JP2011166006A (ja) * 2010-02-12 2011-08-25 Sumitomo Precision Prod Co Ltd エッチング方法
JP2012178424A (ja) * 2011-02-25 2012-09-13 Dainippon Screen Mfg Co Ltd エッチング液濃度管理装置
JP5795983B2 (ja) 2012-03-27 2015-10-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN105278566A (zh) * 2014-07-17 2016-01-27 株式会社平间理化研究所 蚀刻液管理装置、溶解金属浓度测定装置及测定方法
KR20160010257A (ko) * 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 에칭액 관리장치, 용해금속 농도 측정장치 및 용해금속 농도 측정방법
KR20160010259A (ko) 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 고체입자 회수 제거장치, 액체 관리장치 및 에칭액 관리장치
CN105845604B (zh) * 2016-03-10 2019-05-07 深圳市华星光电技术有限公司 一种蚀刻过程中酸浓度的监控方法及系统
CN106399984B (zh) * 2016-08-30 2019-06-25 嘉善天晟精密铸件有限公司 一种金属铸件表面钝化装置和方法
CN106399998B (zh) * 2016-08-30 2019-03-12 嘉善天晟精密铸件有限公司 一种金属铸件表面钝化方法
CN106245010B (zh) * 2016-08-30 2019-02-19 嘉善天晟精密铸件有限公司 一种金属铸件表面钝化装置
CN106399999B (zh) * 2016-08-30 2019-07-16 嘉善天晟精密铸件有限公司 一种用于金属铸件表面处理的回收组件
CN110072342B (zh) * 2019-04-30 2024-03-01 昆山沪利微电有限公司 一种用于pcb板制作的加工装置
EP3771749A1 (de) 2019-07-29 2021-02-03 Ewald Dörken Ag Verfahren zur passivierung metallischer substrate
CN113046563A (zh) * 2021-03-11 2021-06-29 苏州晶洲装备科技有限公司 一种刻蚀液再生装置、刻蚀系统装置和刻蚀方法
CN116153812A (zh) * 2022-12-29 2023-05-23 华灿光电（浙江）有限公司 湿法刻蚀装置和湿法刻蚀的控制方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790370B1 (ko) * 2006-11-09 2008-01-02 주식회사 에스씨티 폐에칭액의 재생장치 및 그 재생방법
KR101021784B1 (ko) * 2008-10-22 2011-03-17 주식회사 에스씨티 나노막필터를 이용한 에칭액의 재생 장치 및 그 재생방법
KR20160010258A (ko) * 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 에칭액 처리장치, 에칭액 관리방법 및 에칭액의 성분농도 측정방법

Also Published As

Publication number Publication date
JP2006013158A (ja) 2006-01-12
TW200613582A (en) 2006-05-01
CN1712567A (zh) 2005-12-28

Similar Documents

Publication Publication Date Title
KR20060049695A (ko) 산성 에칭액 재생방법 및 산성 에칭액 재생장치
KR20120139701A (ko) 습식야금공정 및 금속의 추출방법
JP7020821B2 (ja) 硬度成分含有水の処理装置および処理方法
JP2012192374A (ja) 水処理装置
Chen et al. Evaluating electrocoagulation and chemical coagulation for removing dissolved silica from high efficiency reverse osmosis (HERO) concentrate solutions
TWI570273B (zh) Processing apparatus and treatment liquid
US20120108473A1 (en) Process for treatment of produced water obtained from an enhanced oil recovery process using polymers
NL8003553A (nl) Werkwijze voor het regenereren van een chemische koperbekledingsoplossing.
CN111304657B (zh) 一种碱性蚀刻废液电解回用的方法
CN102002729A (zh) 含铜蚀刻废液的处理方法与蚀刻溶液再生方法
JP2024152742A (ja) 二酸化炭素除去方法
KR100513182B1 (ko) 알칼리 용액의 정제 장치 및 그 방법
US7452463B2 (en) Apparatus for treating water
KR101021784B1 (ko) 나노막필터를 이용한 에칭액의 재생 장치 및 그 재생방법
KR20100113501A (ko) 전해 방법
KR20220168399A (ko) 농축 해수 자원화 담수처리장치
WO2024207633A1 (zh) 高盐膜浓水处理方法及高盐膜浓水处理设备
AU2007325025A1 (en) Method for washing filtration membranes
KR100999893B1 (ko) Ａｕ의 회수 방법
JP7084704B2 (ja) シリカ含有水の処理装置および処理方法
CN111108069A (zh) 超纯水制造系统的微粒管理方法
US6984300B2 (en) Method for recovering useful components from electrolytic phosphate chemical treatment bath
CN203128222U (zh) 一种电路板蚀刻废水的碱式氯化铜合成装置
JP2019042646A (ja) シリカ含有水の処理装置および処理方法
JP2689076B2 (ja) エッチング液の能力回復維持方法

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20050624

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid