KR20060047768A - 노광장치 - Google Patents

노광장치 Download PDF

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Publication number
KR20060047768A
KR20060047768A KR1020050039299A KR20050039299A KR20060047768A KR 20060047768 A KR20060047768 A KR 20060047768A KR 1020050039299 A KR1020050039299 A KR 1020050039299A KR 20050039299 A KR20050039299 A KR 20050039299A KR 20060047768 A KR20060047768 A KR 20060047768A
Authority
KR
South Korea
Prior art keywords
strip
substrate
exposure
shaped
photomask
Prior art date
Application number
KR1020050039299A
Other languages
English (en)
Korean (ko)
Inventor
켄 미야케
켄 이마니시
Original Assignee
상에이 기켄 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 상에이 기켄 가부시키가이샤 filed Critical 상에이 기켄 가부시키가이샤
Publication of KR20060047768A publication Critical patent/KR20060047768A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020050039299A 2004-05-13 2005-05-11 노광장치 KR20060047768A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00143587 2004-05-13
JP2004143587A JP2005326550A (ja) 2004-05-13 2004-05-13 露光装置

Publications (1)

Publication Number Publication Date
KR20060047768A true KR20060047768A (ko) 2006-05-18

Family

ID=35472967

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050039299A KR20060047768A (ko) 2004-05-13 2005-05-11 노광장치

Country Status (4)

Country Link
JP (1) JP2005326550A (zh)
KR (1) KR20060047768A (zh)
CN (1) CN100482038C (zh)
TW (1) TWI382276B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100123611A (ko) * 2009-05-15 2010-11-24 상에이 기켄 가부시키가이샤 노광 장치
KR20150135380A (ko) * 2013-03-26 2015-12-02 상에이 기켄 가부시키가이샤 노광 장치, 노광 방법

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301170A (ja) * 2005-04-19 2006-11-02 Fujikura Ltd 露光装置およびその方法
JP4845746B2 (ja) * 2006-06-20 2011-12-28 株式会社オーク製作所 搬送装置
US7961299B2 (en) 2007-11-08 2011-06-14 Orc Manufacturing Co., Ltd. Transfer device
US8023105B2 (en) 2007-11-19 2011-09-20 Orc Manufacturing Co., Ltd. Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns
JP5180624B2 (ja) * 2008-03-10 2013-04-10 東レエンジニアリング株式会社 帯状ワークの露光方法および露光装置
EP2729427A1 (en) * 2011-07-06 2014-05-14 Renishaw PLC Method of manufacture and apparatus therefor
CN102402131A (zh) * 2011-11-11 2012-04-04 深南电路有限公司 一种曝光系统
CN103246177B (zh) * 2013-05-03 2015-06-03 中山新诺科技有限公司 一种柔性面板连续无掩膜光刻方法及用于该方法的装置
KR101510156B1 (ko) * 2014-11-10 2015-04-08 (주)프리테크 리드프레임 제조용 노광장치
CN107077080B (zh) * 2015-01-15 2019-04-26 株式会社村田制作所 曝光装置
CN105467779A (zh) * 2016-01-04 2016-04-06 京东方科技集团股份有限公司 一种曝光机及曝光方法
CN108073044A (zh) * 2016-11-07 2018-05-25 俞庆平 一种柔性材料的双面曝光方法及装置
CN106773552B (zh) * 2017-02-04 2019-01-22 深圳市优盛科技有限公司 无掩膜实时微纳打码系统
JP7234426B2 (ja) * 2017-11-30 2023-03-07 株式会社アドテックエンジニアリング マスク対及び両面露光装置
JP7323267B2 (ja) * 2017-11-30 2023-08-08 株式会社アドテックエンジニアリング 両面露光装置
CN109661113B (zh) * 2018-12-29 2020-06-26 苏州群策科技有限公司 一种超薄型埋入式电路板的制备方法及装置
CN115627443A (zh) * 2020-11-18 2023-01-20 匠博先进材料科技(广州)有限公司 蒸镀掩模、组件、装置、显示装置及其制造方法和装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288729A (en) * 1989-10-07 1994-02-22 Kabushiki Kaisha Toshiba Exposing method and apparatus
JP2001272791A (ja) * 2000-03-24 2001-10-05 Think Laboratory Co Ltd フレキシブルプリント基板の連続製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100123611A (ko) * 2009-05-15 2010-11-24 상에이 기켄 가부시키가이샤 노광 장치
KR20150135380A (ko) * 2013-03-26 2015-12-02 상에이 기켄 가부시키가이샤 노광 장치, 노광 방법

Also Published As

Publication number Publication date
TWI382276B (zh) 2013-01-11
CN100482038C (zh) 2009-04-22
JP2005326550A (ja) 2005-11-24
TW200540563A (en) 2005-12-16
CN1703137A (zh) 2005-11-30

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