KR20060007187A - 기판의 처리방법과 처리장치 - Google Patents

기판의 처리방법과 처리장치 Download PDF

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Publication number
KR20060007187A
KR20060007187A KR1020040055951A KR20040055951A KR20060007187A KR 20060007187 A KR20060007187 A KR 20060007187A KR 1020040055951 A KR1020040055951 A KR 1020040055951A KR 20040055951 A KR20040055951 A KR 20040055951A KR 20060007187 A KR20060007187 A KR 20060007187A
Authority
KR
South Korea
Prior art keywords
substrate
processing
transfer
liquid
unit
Prior art date
Application number
KR1020040055951A
Other languages
English (en)
Korean (ko)
Inventor
김기현
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR1020040055951A priority Critical patent/KR20060007187A/ko
Priority to CNB2005100833478A priority patent/CN100543537C/zh
Priority to CN2009101601368A priority patent/CN101615576B/zh
Priority to US11/184,357 priority patent/US20060163207A1/en
Priority to JP2005208369A priority patent/JP4489647B2/ja
Priority to TW094124359A priority patent/TWI279846B/zh
Publication of KR20060007187A publication Critical patent/KR20060007187A/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020040055951A 2004-07-19 2004-07-19 기판의 처리방법과 처리장치 KR20060007187A (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020040055951A KR20060007187A (ko) 2004-07-19 2004-07-19 기판의 처리방법과 처리장치
CNB2005100833478A CN100543537C (zh) 2004-07-19 2005-07-12 基板处理设备及使用其的基板处理方法
CN2009101601368A CN101615576B (zh) 2004-07-19 2005-07-12 基板处理设备及使用其的基板处理方法
US11/184,357 US20060163207A1 (en) 2004-07-19 2005-07-18 Substrate treating apparatus and substrate treating method using the same
JP2005208369A JP4489647B2 (ja) 2004-07-19 2005-07-19 基板処理装置とこれを利用した基板処理方法
TW094124359A TWI279846B (en) 2004-07-19 2005-07-19 Substrate treating apparatus and substrate treating method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040055951A KR20060007187A (ko) 2004-07-19 2004-07-19 기판의 처리방법과 처리장치

Publications (1)

Publication Number Publication Date
KR20060007187A true KR20060007187A (ko) 2006-01-24

Family

ID=35924612

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040055951A KR20060007187A (ko) 2004-07-19 2004-07-19 기판의 처리방법과 처리장치

Country Status (2)

Country Link
KR (1) KR20060007187A (zh)
CN (1) CN100543537C (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100783069B1 (ko) * 2007-02-16 2007-12-07 세메스 주식회사 기판 이송 장치 및 이를 포함하는 기판 처리 장치
KR100902615B1 (ko) * 2007-09-27 2009-06-11 세메스 주식회사 기판 지지유닛 및 이를 갖는 기판 처리 장치
KR20150015348A (ko) * 2013-07-31 2015-02-10 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR20150092389A (ko) * 2014-02-03 2015-08-13 삼성디스플레이 주식회사 현상 장치 및 이를 이용한 현상 방법
US20150234326A1 (en) * 2013-06-25 2015-08-20 Boe Technology Group Co., Ltd. Developing device and developing method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5265099B2 (ja) * 2006-09-11 2013-08-14 オリンパス株式会社 基板検査装置
CN102404939A (zh) * 2010-09-17 2012-04-04 富葵精密组件(深圳)有限公司 湿处理装置及湿处理方法
KR20120053319A (ko) 2010-11-17 2012-05-25 삼성모바일디스플레이주식회사 기판 세정 시스템 및 세정 방법
CN104785401B (zh) * 2015-05-13 2017-08-29 合肥京东方光电科技有限公司 一种喷涂装置和喷涂方法
JP6887616B2 (ja) * 2017-05-09 2021-06-16 日本電気硝子株式会社 ガラス板の搬送装置及びガラス板の製造方法
CN113292246B (zh) * 2021-06-02 2022-05-17 中建材玻璃新材料研究院集团有限公司 一种用于玻璃减薄的连续生产装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100783069B1 (ko) * 2007-02-16 2007-12-07 세메스 주식회사 기판 이송 장치 및 이를 포함하는 기판 처리 장치
KR100902615B1 (ko) * 2007-09-27 2009-06-11 세메스 주식회사 기판 지지유닛 및 이를 갖는 기판 처리 장치
US20150234326A1 (en) * 2013-06-25 2015-08-20 Boe Technology Group Co., Ltd. Developing device and developing method
US9581939B2 (en) * 2013-06-25 2017-02-28 Boe Technology Group Co., Ltd. Developing device and developing method
KR20150015348A (ko) * 2013-07-31 2015-02-10 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR20150092389A (ko) * 2014-02-03 2015-08-13 삼성디스플레이 주식회사 현상 장치 및 이를 이용한 현상 방법

Also Published As

Publication number Publication date
CN100543537C (zh) 2009-09-23
CN1725074A (zh) 2006-01-25

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E601 Decision to refuse application