KR20060004505A - 기판 제조장비의 샤워헤드 - Google Patents
기판 제조장비의 샤워헤드 Download PDFInfo
- Publication number
- KR20060004505A KR20060004505A KR1020040053641A KR20040053641A KR20060004505A KR 20060004505 A KR20060004505 A KR 20060004505A KR 1020040053641 A KR1020040053641 A KR 1020040053641A KR 20040053641 A KR20040053641 A KR 20040053641A KR 20060004505 A KR20060004505 A KR 20060004505A
- Authority
- KR
- South Korea
- Prior art keywords
- fixed end
- shower head
- showerhead
- horizontal
- center
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (6)
- 상하를 관통하는 다수의 분사홀을 가지는 판 형상의 몸체와상기 몸체 측벽의 무게중심선 이하에서 측방으로 연장되며, 상기 몸체보다 얇은 두께를 가지는 고정단을 포함하는 샤웨헤드
- 제1항에 있어서,상기 고정단은 상기 몸체의 측방으로 돌출되는 제1 수평부와, 상기 제1 수평부의 상부에 위치하는 제2 수평부와, 상기 제1 수평부와 제2 수평부를 연결하는 수직부로 이루어지는 샤워헤드
- 제2항에 있어서,상기 제1 수평부는 두께가 더 얇은 제 3 수평부를 포함하는 샤워헤드
- 제2항에 있어서,상기 제1 수평부와 상기 수직부 사이의 각도 및 상기 수직부와 상기 제2 수 평부 사이의 각도는 일정한 샤워헤드
- 제1항에 있어서,상기 고정단과 몸체는 일체로 형성되는 것을 특징으로 하는 샤워헤드
- 제1항에 있어서,상기 고정단과 몸체는 알루미늄 재질로 이루어지는 샤워헤드
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040053641A KR101063737B1 (ko) | 2004-07-09 | 2004-07-09 | 기판 제조장비의 샤워헤드 |
US11/177,883 US8236134B2 (en) | 2004-07-09 | 2005-07-08 | Gas distributor and apparatus using the same |
TW094123081A TWI379019B (en) | 2004-07-09 | 2005-07-08 | Gas distributor and apparatus using the same |
CN2005100828605A CN1719965B (zh) | 2004-07-09 | 2005-07-11 | 气体分配器和包括气体分配器的设备 |
CN201010221356XA CN101888736B (zh) | 2004-07-09 | 2005-07-11 | 气体分配器和包括气体分配器的设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040053641A KR101063737B1 (ko) | 2004-07-09 | 2004-07-09 | 기판 제조장비의 샤워헤드 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060004505A true KR20060004505A (ko) | 2006-01-12 |
KR101063737B1 KR101063737B1 (ko) | 2011-09-08 |
Family
ID=35540094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040053641A KR101063737B1 (ko) | 2004-07-09 | 2004-07-09 | 기판 제조장비의 샤워헤드 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8236134B2 (ko) |
KR (1) | KR101063737B1 (ko) |
CN (2) | CN101888736B (ko) |
TW (1) | TWI379019B (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008048543A1 (en) * | 2006-10-16 | 2008-04-24 | Lam Research Corporation | Upper electrode backing member with particle reducing features |
US9200368B2 (en) | 2004-05-12 | 2015-12-01 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
KR20160107687A (ko) * | 2015-03-05 | 2016-09-19 | 주성엔지니어링(주) | 기판 처리장치에 구비되는 샤워헤드 |
WO2020159064A1 (ko) * | 2019-01-29 | 2020-08-06 | 주성엔지니어링(주) | 샤워헤드 및 이를 포함하는 기판처리장치 |
WO2021167325A1 (ko) * | 2020-02-18 | 2021-08-26 | (주)포인트엔지니어링 | 가스 공급장치 및 이를 구비한 증착장치 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8328939B2 (en) * | 2004-05-12 | 2012-12-11 | Applied Materials, Inc. | Diffuser plate with slit valve compensation |
US8074599B2 (en) * | 2004-05-12 | 2011-12-13 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser curvature |
KR20060014495A (ko) * | 2004-08-11 | 2006-02-16 | 주식회사 유진테크 | 화학기상증착장치의 샤워헤드 |
US7429410B2 (en) * | 2004-09-20 | 2008-09-30 | Applied Materials, Inc. | Diffuser gravity support |
KR101173645B1 (ko) * | 2007-12-31 | 2012-08-20 | (주)에이디에스 | 가스 분사 유닛 및 이를 구비하는 박막 증착 장치 |
US9493875B2 (en) * | 2008-09-30 | 2016-11-15 | Eugene Technology Co., Ltd. | Shower head unit and chemical vapor deposition apparatus |
JP3178295U (ja) | 2009-09-10 | 2012-09-13 | ラム リサーチ コーポレーション | プラズマ処理装置の交換式上部チャンバ部品 |
US20120152900A1 (en) * | 2010-12-20 | 2012-06-21 | Applied Materials, Inc. | Methods and apparatus for gas delivery into plasma processing chambers |
TW201325326A (zh) * | 2011-10-05 | 2013-06-16 | Applied Materials Inc | 電漿處理設備及其基板支撐組件 |
US20130284092A1 (en) * | 2012-04-25 | 2013-10-31 | Applied Materials, Inc. | Faceplate having regions of differing emissivity |
DE102013101534A1 (de) * | 2013-02-15 | 2014-08-21 | Aixtron Se | Gasverteiler für einen CVD-Reaktor |
US9484190B2 (en) * | 2014-01-25 | 2016-11-01 | Yuri Glukhoy | Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area |
KR102416568B1 (ko) * | 2017-08-14 | 2022-07-04 | 삼성디스플레이 주식회사 | 금속 산화막 형성 방법 및 플라즈마 강화 화학기상증착 장치 |
US11572624B2 (en) * | 2018-12-13 | 2023-02-07 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Apparatus and method for semiconductor fabrication |
CN111385955B (zh) * | 2018-12-28 | 2022-08-23 | 中微半导体设备(上海)股份有限公司 | 一种等离子体处理器的安装结构及相应的等离子体处理器 |
US11332827B2 (en) * | 2019-03-27 | 2022-05-17 | Applied Materials, Inc. | Gas distribution plate with high aspect ratio holes and a high hole density |
KR102371435B1 (ko) * | 2021-05-03 | 2022-03-08 | 주식회사 기가레인 | 샤워 헤드 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09153481A (ja) | 1995-11-30 | 1997-06-10 | Sumitomo Metal Ind Ltd | プラズマ処理装置 |
US5882411A (en) | 1996-10-21 | 1999-03-16 | Applied Materials, Inc. | Faceplate thermal choke in a CVD plasma reactor |
US6537418B1 (en) * | 1997-09-19 | 2003-03-25 | Siemens Aktiengesellschaft | Spatially uniform gas supply and pump configuration for large wafer diameters |
KR100505402B1 (ko) | 1999-06-22 | 2005-08-04 | 주식회사 하이닉스반도체 | 몸체 접촉 에스오아이 소자의 제조방법 |
US6415736B1 (en) * | 1999-06-30 | 2002-07-09 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
US6364949B1 (en) | 1999-10-19 | 2002-04-02 | Applied Materials, Inc. | 300 mm CVD chamber design for metal-organic thin film deposition |
KR100371385B1 (ko) | 2000-07-12 | 2003-02-06 | 김종민 | 실내 스키 구조물 |
AU2003238853A1 (en) * | 2002-01-25 | 2003-09-02 | Applied Materials, Inc. | Apparatus for cyclical deposition of thin films |
KR20030066118A (ko) | 2002-02-04 | 2003-08-09 | 주성엔지니어링(주) | 열팽창에 의한 변형을 최소화할 수 있는 샤워헤드형가스공급장치 |
KR100485709B1 (ko) | 2002-08-14 | 2005-04-27 | 주성엔지니어링(주) | 액정표시장치용 기판제조를 위한 챔버 |
KR100965758B1 (ko) | 2003-05-22 | 2010-06-24 | 주성엔지니어링(주) | 액정표시장치용 플라즈마 강화 화학기상증착 장치의샤워헤드 어셈블리 |
-
2004
- 2004-07-09 KR KR1020040053641A patent/KR101063737B1/ko active IP Right Grant
-
2005
- 2005-07-08 TW TW094123081A patent/TWI379019B/zh not_active IP Right Cessation
- 2005-07-08 US US11/177,883 patent/US8236134B2/en active Active
- 2005-07-11 CN CN201010221356XA patent/CN101888736B/zh not_active Expired - Fee Related
- 2005-07-11 CN CN2005100828605A patent/CN1719965B/zh not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9200368B2 (en) | 2004-05-12 | 2015-12-01 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
WO2008048543A1 (en) * | 2006-10-16 | 2008-04-24 | Lam Research Corporation | Upper electrode backing member with particle reducing features |
US7854820B2 (en) | 2006-10-16 | 2010-12-21 | Lam Research Corporation | Upper electrode backing member with particle reducing features |
US8709202B2 (en) | 2006-10-16 | 2014-04-29 | Lam Research Corporation | Upper electrode backing member with particle reducing features |
KR101419081B1 (ko) * | 2006-10-16 | 2014-08-13 | 램 리써치 코포레이션 | 입자 감소 특징을 갖는 상부 전극 백킹 부재 |
KR20160107687A (ko) * | 2015-03-05 | 2016-09-19 | 주성엔지니어링(주) | 기판 처리장치에 구비되는 샤워헤드 |
WO2020159064A1 (ko) * | 2019-01-29 | 2020-08-06 | 주성엔지니어링(주) | 샤워헤드 및 이를 포함하는 기판처리장치 |
WO2021167325A1 (ko) * | 2020-02-18 | 2021-08-26 | (주)포인트엔지니어링 | 가스 공급장치 및 이를 구비한 증착장치 |
Also Published As
Publication number | Publication date |
---|---|
TWI379019B (en) | 2012-12-11 |
US8236134B2 (en) | 2012-08-07 |
CN1719965A (zh) | 2006-01-11 |
US20060005926A1 (en) | 2006-01-12 |
CN101888736A (zh) | 2010-11-17 |
KR101063737B1 (ko) | 2011-09-08 |
CN101888736B (zh) | 2012-06-13 |
TW200617208A (en) | 2006-06-01 |
CN1719965B (zh) | 2010-09-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101063737B1 (ko) | 기판 제조장비의 샤워헤드 | |
KR101249999B1 (ko) | 화학기상증착 장치 | |
US20060005771A1 (en) | Apparatus and method of shaping profiles of large-area PECVD electrodes | |
TWI338319B (en) | Active cooling substrate support | |
US20070175396A1 (en) | Film-forming apparatus | |
US20060156987A1 (en) | Lift pin mechanism and substrate carrying device of a process chamber | |
US20100043709A1 (en) | Chemical vapor deposition apparatus for equalizing heating temperature | |
KR101535103B1 (ko) | 기판처리장치 | |
KR101534517B1 (ko) | 기판처리장치 | |
KR101276565B1 (ko) | 진공처리장치 | |
KR100981039B1 (ko) | 가스 공급 어셈블리 | |
KR20130048304A (ko) | 기판처리장치 | |
KR20200108693A (ko) | 기판처리 장치 | |
KR101483824B1 (ko) | 평판표시소자 제조용 화학기상증착 장치 | |
KR102663828B1 (ko) | 기판처리장치 및 이를 이용한 기판처리방법 | |
KR20070093187A (ko) | 기판 척킹 라인과 콘택하는 원통형의 오링을 구비한 히터어셈블리 | |
KR20110021571A (ko) | 보트 | |
JP2004335825A (ja) | 基板処理装置 | |
KR101130037B1 (ko) | 보트 | |
KR20100050659A (ko) | 기판 처리 장치 | |
KR20070014276A (ko) | 히터블럭 | |
KR20080114284A (ko) | 개선된 가열 지지부재를 구비한 화학증착장치 | |
CN205710904U (zh) | 框架、组合式基板下罩框和处理腔室 | |
KR200298458Y1 (ko) | 반도체 제조 설비의 공정 챔버 | |
KR20060088151A (ko) | 에지프레임 및 이를 포함하는 기판처리장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20140805 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20150803 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20160712 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20170703 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20180702 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20190701 Year of fee payment: 9 |