KR20050055031A - 부품류의 세정장치 및 세정방법 - Google Patents
부품류의 세정장치 및 세정방법 Download PDFInfo
- Publication number
- KR20050055031A KR20050055031A KR1020057006911A KR20057006911A KR20050055031A KR 20050055031 A KR20050055031 A KR 20050055031A KR 1020057006911 A KR1020057006911 A KR 1020057006911A KR 20057006911 A KR20057006911 A KR 20057006911A KR 20050055031 A KR20050055031 A KR 20050055031A
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning
- washing
- hole
- cleaned
- liquid
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
조건 | US세정1ST-880 | DP세정1ST-880 | US세정2ST-880 | US세정2ST-880 | 완성된 린스 순수 | 건조 | 결과(%)합격률(완전률) |
비교예 | - | 70℃×10분DP | - | - | 50℃×10분DP | 상온×3분100℃×7분 | 50%(30%)이하 |
실시예1 | - | 70℃×10분고압 DP | - | - | 50℃×10분고압 DP | 상온×3분100℃×7분 | 83%(40%) |
실시예2 | 70℃×5분 | 50℃×5분고압 DP | - | - | 50℃×10분고압 DP | 상온×3분100℃×7분 | 89%(76%) |
실시예3 | 70℃×5분 | 50℃×5분고압 DP | 70℃×5분 | 50℃×5분고압 DP | 50℃×10분고압 DP | 상온×3분100℃×7분 | 93%(88%) |
Claims (6)
- 세정액의 순환라인 안에 위치되는 세정용기내의 피세정물을 상기 세정용기내에서 강제 유통하는 세정액에 의해 세정하는 장치에 있어서,미세한 관통공을 갖는 피세정물을 상기 관통공의 관통방향이 상기 세정액의 액체흐름 방향과 동일한 방향 또는 근접한 방향이 되도록 유지하는 유지수단을 구비하고,피세정물의 관통공내를 고압의 세정액이 통과하도록 구성하는부품류의 세정장치.
- 제1항에 있어서,상기 유지수단에 의해 상기 세정용기내를 상부챔버과 하부챔버로 분리하고, 상기 상부챔버에 유입하는 상기 세정액은 주로 피세정물의 관통공을 통해 상기 하부챔버에 도달하도록 구성하는부품류의 세정장치.
- 제1항에 있어서,상기 유지수단은 피세정물이 이동중 끼워지는 다수의 유지용 요홈부와, 상기 유지용 요홈부의 저부에 설치되는 상기 유지용 요홈부보다도 작은 지름의 연통공을 구비하고, 상기 유지용 요홈부에 끼워진 상기 피세정물의 관통공과 상기 유체흐름공이 연통하되록 구성하는부품류의 세정장치.
- 제1항에 있어서,피세정물을 초음파에 의해 세정하는 초음파 세정수단을 구비하는부품류의 세정장치.
- 제4항에 기재된 세정장치에 따른 초음파 세정과 피세정물의 관통공내를 고압의 세정액을 통과시키는 고압세정을 번갈아 반복하는부품류의 세정방법.
- 제4항에 기재된 세정장치에 따른 초음파 세정과 피세정물의 관통공내를 고압의 세정액을 통과시키는 고압세정을 동시에 행하는부품류의 세정방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002310179A JP3846584B2 (ja) | 2002-10-24 | 2002-10-24 | 部品類の洗浄装置及び洗浄方法 |
JPJP-P-2002-00310179 | 2002-10-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050055031A true KR20050055031A (ko) | 2005-06-10 |
KR100988294B1 KR100988294B1 (ko) | 2010-10-18 |
Family
ID=32171042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057006911A KR100988294B1 (ko) | 2002-10-24 | 2003-10-09 | 부품류의 세정장치 및 세정방법 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP3846584B2 (ko) |
KR (1) | KR100988294B1 (ko) |
CN (1) | CN100336611C (ko) |
HK (1) | HK1082930A1 (ko) |
TW (1) | TWI247632B (ko) |
WO (1) | WO2004037452A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI393595B (zh) * | 2006-03-17 | 2013-04-21 | Michale Goodson J | 具有頻率掃描的厚度模式轉換器之超高頻音波處理設備 |
JP2009071201A (ja) * | 2007-09-18 | 2009-04-02 | Nec Electronics Corp | 洗浄装置 |
JP2009160483A (ja) * | 2007-12-28 | 2009-07-23 | Nec Electronics Corp | 循環型洗浄装置 |
CN101912853B (zh) * | 2010-09-03 | 2011-11-02 | 任保林 | 超声波脉冲水射流管壁除锈清洗装置 |
CN102274838A (zh) * | 2011-05-06 | 2011-12-14 | 湘潭大众整流器制造有限公司 | 超声波清洗机 |
CN102522322A (zh) * | 2011-12-15 | 2012-06-27 | 华东光电集成器件研究所 | 一种半导体芯粒的清洗装置 |
WO2015162699A1 (ja) | 2014-04-22 | 2015-10-29 | 富士機械製造株式会社 | ノズル洗浄装置および、ノズル乾燥方法 |
CN106541329B (zh) | 2015-09-16 | 2019-01-01 | 泰科电子(上海)有限公司 | 集成设备 |
CN106540917B (zh) * | 2015-09-16 | 2020-03-31 | 泰科电子(上海)有限公司 | 超声波清洗系统 |
JP6861427B2 (ja) * | 2015-10-16 | 2021-04-21 | 株式会社Fuji | ノズル洗浄装置およびノズル乾燥方法 |
CN107185870A (zh) * | 2017-07-25 | 2017-09-22 | 安徽瑞泰汽车零部件有限责任公司 | 一种铝合金零件清洗装置及清洗方法 |
CN108580424B (zh) * | 2018-03-22 | 2024-01-09 | 温州医科大学附属口腔医院 | 一种电动牙洁治器手柄清洗装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0478978U (ko) * | 1990-11-19 | 1992-07-09 | ||
JP3988320B2 (ja) * | 1999-06-18 | 2007-10-10 | 荒川化学工業株式会社 | 物品の洗浄方法および洗浄装置 |
JP2001162237A (ja) * | 1999-12-09 | 2001-06-19 | Totoku Electric Co Ltd | エナメル線用塗料塗布ダイスの洗浄装置 |
JP3494293B2 (ja) * | 2000-10-25 | 2004-02-09 | 株式会社カイジョー | 密閉型容器の洗浄方法及び洗浄装置 |
CN2514947Y (zh) * | 2001-11-23 | 2002-10-09 | 亚智科技股份有限公司 | 盲导孔及小孔清洗装置 |
-
2002
- 2002-10-24 JP JP2002310179A patent/JP3846584B2/ja not_active Expired - Lifetime
-
2003
- 2003-10-09 CN CNB2003801020750A patent/CN100336611C/zh not_active Expired - Fee Related
- 2003-10-09 KR KR1020057006911A patent/KR100988294B1/ko active IP Right Grant
- 2003-10-09 WO PCT/JP2003/012935 patent/WO2004037452A1/ja active Application Filing
- 2003-10-14 TW TW092128411A patent/TWI247632B/zh not_active IP Right Cessation
-
2006
- 2006-03-02 HK HK06102724A patent/HK1082930A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3846584B2 (ja) | 2006-11-15 |
TW200416075A (en) | 2004-09-01 |
JP2004141778A (ja) | 2004-05-20 |
CN100336611C (zh) | 2007-09-12 |
WO2004037452A1 (ja) | 2004-05-06 |
HK1082930A1 (en) | 2006-06-23 |
TWI247632B (en) | 2006-01-21 |
CN1708365A (zh) | 2005-12-14 |
KR100988294B1 (ko) | 2010-10-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100988294B1 (ko) | 부품류의 세정장치 및 세정방법 | |
KR20040005779A (ko) | 회전식 초음파세척기 | |
KR101017102B1 (ko) | 습식 기판 세정 장치 및 그 세정 방법 | |
KR100385906B1 (ko) | 웨트처리용 노즐 및 노즐장치와 웨트처리장치 | |
KR101113272B1 (ko) | 필터 클리너 | |
CN112157089A (zh) | 一种用于汽车零部件的智能化清洗装置 | |
KR20210080609A (ko) | 기판 처리 장치 | |
KR100305735B1 (ko) | 부품 자동세척기 | |
JPH05261053A (ja) | 食器洗浄機 | |
KR100424913B1 (ko) | 기판 세척 장치 | |
KR101744532B1 (ko) | 열처리 부품용 세척장치 | |
KR100328258B1 (ko) | 웨이퍼 세정장치 | |
CN213728129U (zh) | 一种铝合金型材表面纹理加工装置 | |
KR102619350B1 (ko) | Mct 가공용 유니버셜 지그 장치 | |
CN218743356U (zh) | 一种用于铜门加工的原料预处理的清理设备 | |
CN220970088U (zh) | 一种空气滤清器外壳表面处理装置 | |
CN221209189U (zh) | 一种清洗装置 | |
KR20000025455A (ko) | 초음파 세척시스템 | |
CN114226347B (zh) | 一种用于复杂构件内腔及型面的清洗系统 | |
CN217569932U (zh) | 一种通用型连续式超声波清洗机 | |
EP1775090B1 (en) | A process for the functional regeneration of the porosity of moulds used for moulding ceramic objects | |
JPH02251288A (ja) | 洗浄装置 | |
JPH11307495A (ja) | ブラシ洗浄装置及びワーク洗浄システム | |
JPH0684872A (ja) | クリーン洗浄装置 | |
KR19990055500A (ko) | 진공초음파 세척기 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
AMND | Amendment | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
AMND | Amendment | ||
B701 | Decision to grant | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130924 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20141001 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20150918 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20160921 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20170919 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20180918 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20190917 Year of fee payment: 10 |