KR20050009241A - 레지스트막 부착 기판의 제조방법 - Google Patents

레지스트막 부착 기판의 제조방법 Download PDF

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Publication number
KR20050009241A
KR20050009241A KR1020040055669A KR20040055669A KR20050009241A KR 20050009241 A KR20050009241 A KR 20050009241A KR 1020040055669 A KR1020040055669 A KR 1020040055669A KR 20040055669 A KR20040055669 A KR 20040055669A KR 20050009241 A KR20050009241 A KR 20050009241A
Authority
KR
South Korea
Prior art keywords
coating
substrate
resist
nozzle
resist agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020040055669A
Other languages
English (en)
Korean (ko)
Inventor
슈호우 모토무라
Original Assignee
호야 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 호야 가부시키가이샤 filed Critical 호야 가부시키가이샤
Publication of KR20050009241A publication Critical patent/KR20050009241A/ko
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020040055669A 2003-07-17 2004-07-16 레지스트막 부착 기판의 제조방법 Ceased KR20050009241A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00276256 2003-07-17
JP2003276256 2003-07-17
JPJP-P-2004-00200516 2004-07-07
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020070007625A Division KR20070017228A (ko) 2003-07-17 2007-01-24 레지스트막 부착 기판의 제조방법

Publications (1)

Publication Number Publication Date
KR20050009241A true KR20050009241A (ko) 2005-01-24

Family

ID=34277588

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040055669A Ceased KR20050009241A (ko) 2003-07-17 2004-07-16 레지스트막 부착 기판의 제조방법

Country Status (4)

Country Link
JP (1) JP2005051220A (https=)
KR (1) KR20050009241A (https=)
CN (1) CN1577741A (https=)
TW (1) TWI276474B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006294820A (ja) * 2005-04-08 2006-10-26 Hoya Corp 塗布装置及びフォトマスクブランクの製造方法
JP4260135B2 (ja) * 2005-04-08 2009-04-30 Ｈｏｙａ株式会社 レジスト塗布方法及びレジスト塗布装置、並びにフォトマスクブランクの製造方法
JP5164088B2 (ja) * 2006-03-30 2013-03-13 Ｈｏｙａ株式会社 マスクブランク及びフォトマスク
JP5073375B2 (ja) * 2007-06-13 2012-11-14 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2009258152A (ja) * 2008-04-11 2009-11-05 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4397349D2 (de) * 1993-05-05 1996-11-14 Steag Micro Tech Gmbh Vorrichtung zur Belackung oder Beschichtung von Platten oder Scheiben
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2001293417A (ja) * 2000-04-14 2001-10-23 Sharp Corp 塗布装置
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
JP3658355B2 (ja) * 2001-10-03 2005-06-08 Ｈｏｙａ株式会社 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP4017372B2 (ja) * 2001-10-15 2007-12-05 住友化学株式会社 薄膜形成方法

Also Published As

Publication number Publication date
TW200507950A (en) 2005-03-01
TWI276474B (en) 2007-03-21
CN1577741A (zh) 2005-02-09
JP2005051220A (ja) 2005-02-24

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