KR20040084925A - 유기 물질로 코팅된 재료 표면의 플라즈마 세정 방법 및이를 수행하기 위한 장치 - Google Patents
유기 물질로 코팅된 재료 표면의 플라즈마 세정 방법 및이를 수행하기 위한 장치 Download PDFInfo
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- KR20040084925A KR20040084925A KR10-2004-7012864A KR20047012864A KR20040084925A KR 20040084925 A KR20040084925 A KR 20040084925A KR 20047012864 A KR20047012864 A KR 20047012864A KR 20040084925 A KR20040084925 A KR 20040084925A
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- discharge
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning In General (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
방전 전력(W) | 전압(V) | 탈지 백분율(%) | 주파수(㎑) |
11055 | 34001720 | 83%87% | 1020 |
Claims (13)
- - 적어도 90 체적%의 산소를 함유하는 가스 스트림이 공급되는 10mbar 내지 1bar 사이의 압력을 가진 처리 챔버로 상기 재료를 도입하는 단계,- 생성된 유리기(O°)의 작용을 통하여 상기 유기 물질을 분해하도록, 상기 재료의 표면과 유전체 피복 전극들 사이에 전기 방전을 통과시켜 플라즈마를 발생시키는 단계로 이루어진 것을 특징으로 하는 유기 물질로 코팅된 재료의 표면을 세정하는 방법.
- 제 1 항에 있어서,상기 플라즈마에서 생성된 유리기(O°)의 재조합에 의해 형성되는 산소 및/또는 오존 분자들은 재해리되는 것을 특징으로 하는 방법.
- 제 1 항 또는 제 2 항에 있어서,상기 재해리는 적절한 파장의 자외선 방사에 의하여 실시되는 것을 특징으로 하는 방법.
- 제 1 항 내지 제 3 항 중 어느 한 항에 있어서,방전 개시를 위한 전압은 사인곡선이고, 10 내지 100㎑ 사이의 주파수를 가지는 것을 특징으로 하는 방법.
- 제 1 항 내지 제 4 항 중 어느 한 항에 있어서,방전중 에너지 방사는 40W/㎠이하이고, 방전을 개시하기 위한 적용 전압은 4.4㎸ 이하인 것을 특징으로 하는 방법.
- 제 1 항 내지 제 5 항 중 어느 한 항에 있어서,상기 재료는 이동하는 띠 형태이며, 방법의 여러 단계들은 이동 띠의 경로를 따라 연속적으로 배치되는 설비들에 의해 연속적으로 수행되는 것을 특징으로 하는 방법.
- 제 6 항에 있어서,상기 띠는 그 면들중 하나가 처리되고, 잇따라 다른 면이 연속적으로 처리되는 것을 특징으로 하는 방법.
- 제 1 항 내지 제 7 항 중 어느 한 항에 있어서,상기 처리될 재료는 금속성 재료인 것을 특징으로 하는 방법.
- 제 8 항에 있어서,상기 금속성 재료는 탄소강인 것을 특징으로 하는 방법.
- 제 8 항 또는 제 9 항에 있어서,표면에 도포물을 침착하기 앞서 금속성 재료의 상기 표면을 탈지하기 위하여 실시되는 것을 특징으로 하는 방법.
- 처리 챔버(2)를 포함하는 적어도 하나의 모듈, 상기 챔버 내부 압력을 10mbar 내지 1bar 사이 값으로 설정하기 위한 수단, 상기 접지된 띠(4)가 상기 챔버를 통과하도록 하기 위한 수단(3), 상기 처리될 띠(4)의 표면과 마주하도록 배치되고 사인곡선의 고전압 발생기(6)에 연결되는 일련의 유전체 피복 전극(5a,5b,5c,5d,5e,5f,5g)들, 상기 챔버(2)에 가스를 공급하기 위한 수단 및 띠(4)에 코팅되는 유기 물질의 분해에 따른 가스를 상기 챔버로부터 추출하기 위한 수단을 포함하는 제 6 항 내지 제 10 항 중 어느 한 항에 따른 방법을 수행하기 위한 장치.
- 제 11 항에 있어서,일련의 짝수의 상기 모듈들(10,11,12,13)을 포함하고, 상기 띠(14)가 이를 연속적으로 통과하며, 그 면들중 하나가 차례로 상기 모듈들(10,11,12,13)의 전극들에 노출되는 것을 특징으로 하는 장치.
- 제 11 항 또는 제 12 항에 있어서,상기 전극들(5a,5b,5c,5d,5e,5f,5g) 사이에 배치되는 자외선 방사 램프들(7a,7b,7c,7d,7e,7f)을 더 포함하는 것을 특징으로 하는 장치.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR02/02057 | 2002-02-19 | ||
FR0202057A FR2836158B1 (fr) | 2002-02-19 | 2002-02-19 | Procede de nettoyage par plasma de la surface d'un materiau enduit d'une substance organique, et installation de mise en oeuvre |
PCT/FR2003/000542 WO2003071004A2 (fr) | 2002-02-19 | 2003-02-19 | Procede de nettoyage par plasma de la surface d’un materiau enduit d’une substance organique, et installation de mise en oeuvre |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040084925A true KR20040084925A (ko) | 2004-10-06 |
KR100939381B1 KR100939381B1 (ko) | 2010-01-29 |
Family
ID=27636289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020047012864A KR100939381B1 (ko) | 2002-02-19 | 2003-02-19 | 유기 물질로 코팅된 재료 표면의 플라즈마 세정 방법 및이를 수행하기 위한 장치 |
Country Status (18)
Country | Link |
---|---|
US (3) | US7674339B2 (ko) |
EP (1) | EP1481112B1 (ko) |
JP (2) | JP4942913B2 (ko) |
KR (1) | KR100939381B1 (ko) |
CN (1) | CN1997773B (ko) |
AT (1) | ATE334235T1 (ko) |
AU (1) | AU2003224204B2 (ko) |
BR (1) | BR0307769B8 (ko) |
CA (1) | CA2476510C (ko) |
DE (1) | DE60307062T2 (ko) |
ES (1) | ES2268352T3 (ko) |
FR (1) | FR2836158B1 (ko) |
MX (1) | MXPA04007977A (ko) |
PL (1) | PL203153B1 (ko) |
PT (1) | PT1481112E (ko) |
RU (1) | RU2318916C2 (ko) |
WO (1) | WO2003071004A2 (ko) |
ZA (1) | ZA200406182B (ko) |
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FR2836158B1 (fr) * | 2002-02-19 | 2005-01-07 | Usinor | Procede de nettoyage par plasma de la surface d'un materiau enduit d'une substance organique, et installation de mise en oeuvre |
US7086407B2 (en) * | 2004-01-09 | 2006-08-08 | Ozone International Llc | Cleaning and sanitizing system |
FR2869820B1 (fr) | 2004-05-06 | 2007-06-22 | Pechiney Capsules Soc Par Acti | Procede de fabrication de capsules decorees a resistance mecanique amelioree |
US7275982B1 (en) | 2006-05-12 | 2007-10-02 | Ozone International, Llc | Ozone-based conveyor cleaning system |
SK287455B6 (sk) * | 2006-06-08 | 2010-10-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho | Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2 |
JP4963923B2 (ja) * | 2006-10-06 | 2012-06-27 | 日本碍子株式会社 | 表面改質装置 |
SK51082006A3 (sk) * | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov |
DE102007033701A1 (de) * | 2007-07-14 | 2009-01-22 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen |
DE102007037984A1 (de) * | 2007-08-10 | 2009-02-12 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Verfahren zur Textilreinigung und Desinfektion mittels Plasma und Plasmaschleuse |
EP2034296B1 (en) * | 2007-09-07 | 2012-09-26 | Imec | Quantification of hydrophobic and hydrophilic properties of materials |
US20090277342A1 (en) * | 2008-05-08 | 2009-11-12 | Jetton John P | Ozone treating system and method |
US9919939B2 (en) | 2011-12-06 | 2018-03-20 | Delta Faucet Company | Ozone distribution in a faucet |
CN104334349B (zh) | 2012-05-25 | 2016-06-08 | 夏伊洛工业公司 | 具有焊接凹口的金属板材件及其形成方法 |
WO2014005041A1 (en) | 2012-06-29 | 2014-01-03 | Shiloh Industries, Inc. | Welded blank assembly and method |
KR20180034706A (ko) | 2012-11-30 | 2018-04-04 | 쉴로 인더스트리즈 인코포레이티드 | 금속 박편에 용접 노치를 형성하는 방법 |
US9956636B2 (en) | 2013-03-14 | 2018-05-01 | Shiloh Industries, Inc. | Welded blank assembly and method |
JP6413345B2 (ja) * | 2014-05-23 | 2018-10-31 | 株式会社リコー | プラズマ処理装置、およびそれを有する画像形成装置 |
US11458214B2 (en) | 2015-12-21 | 2022-10-04 | Delta Faucet Company | Fluid delivery system including a disinfectant device |
CN115997482A (zh) * | 2020-06-30 | 2023-04-21 | 佳能株式会社 | 活性氧供给装置、利用活性氧的处理装置和利用活性氧的处理方法 |
CN113426763A (zh) * | 2021-06-15 | 2021-09-24 | 扬州国兴技术有限公司 | 一种用于清洗印制电路板钻针胶渣残屑装置及方法 |
CN115971169B (zh) * | 2023-02-24 | 2023-07-07 | 深圳市方瑞科技有限公司 | 一种滚筒式真空等离子清洗机及其工作方法 |
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JP3906653B2 (ja) * | 2000-07-18 | 2007-04-18 | ソニー株式会社 | 画像表示装置及びその製造方法 |
DE10195130D2 (de) * | 2000-11-29 | 2003-12-04 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Oberflächenbehandlung von Objekten |
FR2836158B1 (fr) * | 2002-02-19 | 2005-01-07 | Usinor | Procede de nettoyage par plasma de la surface d'un materiau enduit d'une substance organique, et installation de mise en oeuvre |
-
2002
- 2002-02-19 FR FR0202057A patent/FR2836158B1/fr not_active Expired - Fee Related
-
2003
- 2003-02-19 JP JP2003569892A patent/JP4942913B2/ja not_active Expired - Lifetime
- 2003-02-19 PL PL370516A patent/PL203153B1/pl unknown
- 2003-02-19 AT AT03720624T patent/ATE334235T1/de active
- 2003-02-19 EP EP03720624A patent/EP1481112B1/fr not_active Expired - Lifetime
- 2003-02-19 WO PCT/FR2003/000542 patent/WO2003071004A2/fr active IP Right Grant
- 2003-02-19 KR KR1020047012864A patent/KR100939381B1/ko active IP Right Grant
- 2003-02-19 DE DE60307062T patent/DE60307062T2/de not_active Expired - Lifetime
- 2003-02-19 CN CN038041561A patent/CN1997773B/zh not_active Expired - Fee Related
- 2003-02-19 PT PT03720624T patent/PT1481112E/pt unknown
- 2003-02-19 US US10/504,596 patent/US7674339B2/en active Active
- 2003-02-19 AU AU2003224204A patent/AU2003224204B2/en not_active Ceased
- 2003-02-19 ES ES03720624T patent/ES2268352T3/es not_active Expired - Lifetime
- 2003-02-19 BR BRPI0307769-1A patent/BR0307769B8/pt not_active IP Right Cessation
- 2003-02-19 CA CA2476510A patent/CA2476510C/fr not_active Expired - Fee Related
- 2003-02-19 RU RU2004127923/02A patent/RU2318916C2/ru not_active IP Right Cessation
- 2003-02-19 MX MXPA04007977A patent/MXPA04007977A/es active IP Right Grant
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2004
- 2004-08-03 ZA ZA200406182A patent/ZA200406182B/en unknown
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2009
- 2009-12-04 US US12/631,193 patent/US8877003B2/en not_active Expired - Lifetime
- 2009-12-04 US US12/631,220 patent/US8591660B2/en not_active Expired - Lifetime
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2010
- 2010-05-26 JP JP2010121010A patent/JP2010248633A/ja not_active Withdrawn
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