KR20030057451A - 유기발광 다이오드 장치의 제조를 위한 자체 진공방법 - Google Patents
유기발광 다이오드 장치의 제조를 위한 자체 진공방법 Download PDFInfo
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- KR20030057451A KR20030057451A KR1020020085006A KR20020085006A KR20030057451A KR 20030057451 A KR20030057451 A KR 20030057451A KR 1020020085006 A KR1020020085006 A KR 1020020085006A KR 20020085006 A KR20020085006 A KR 20020085006A KR 20030057451 A KR20030057451 A KR 20030057451A
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- 229910052763 palladium Inorganic materials 0.000 description 1
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- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
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- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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Abstract
Description
실시예 번호 | 공기에 공여체 소자를 노출시키는 시간 | 20mA/c㎡에서의 초기 휘도(cd/㎡) | 20mA/c㎡ 에서의 전압(V) | 20mA/㎠에서의 작동 안정성(% 초기 휘도) | |||
10시간 | 100시간 | 250시간 | 500시간 | ||||
1 | 0 | 620 | 7.9 | 86% | 75% | 67% | 60% |
2 | 5 | 360 | 7.3 | 61% | 45% | 37% | 30% |
3 | 20 | 275 | 7.5 | 63% | 46% | 38% | 29% |
Claims (5)
- (a) 유기발광 다이오드(OLED) 장치의 일부분을 형성하게 되는 수용체 소자를 진공 피복기에 제공하는 단계;(b) 상기 진공 피복기에 공여체 지지 소자를 제공하고, 상기 공여체 지지 소자를 코팅하여 OLED 장치의 전체 또는 일부분을 제조하는데 필요한 하나 이상의 층을 갖는 공여체 소자를 생성하는 단계;(c) 상기 공여체 소자의 코팅된 면을 수용체 소자가 상기 진공 피복기 내부에서 코팅되는 물질 수송 관계로 위치시키는 단계; 및(d) 공여체 소자에 방사선을 조사시켜, 상기 공여체 소자로부터 하나 이상의 층을 수용체 소자로 선택적으로 수송하는 단계를 포함하는,수분 민감성 또는 산소 민감성의 OLED 장치를 적어도 일부분 제조하기 위한 자체 진공 방법.
- 제 1 항에 있어서,(e) 단계 (b) 내지 (d)를 반복적으로 수행하여 수분 민감성 또는 산소 민감성 장치를 전부 또는 일부분 형성하는 단계를 추가로 포함하는 방법.
- 제 1 항에 있어서,(e) 공여체 소자가 재코팅될 수 있도록 상기 공여체 소자를 세척하는 단계를 추가로 포함하는 방법.
- (a) 디스플레이의 일부분을 형성하게 되는 수용체 소자를 진공 피복기에 제공하는 단계;(b) 복수개의 공여체 지지 소자를 진공 피복기에 제공하고, 상기 공여체 지지 소자를 물질로 코팅하는 단계로서, 각각의 공여체 지지 소자는 동일한 OLED 장치와 상이한 출력 칼라를 제공하도록 하나 이상의 상이한 물질을 갖게 되는 단계;(c) 각각의 공여체 소자의 코팅된 면을, 수용체 소자가 코팅되는 물질 수송 관계로 순차적으로 위치시키는 단계; 및(d) 상기 위치된 공여체 소자에 방사선을 순차적으로 조사시켜 하나 이상의 층을 각각의 공여체 소자로부터 상기 수용체 소자에 형성된 동일한 OLED 장치로 진공중에서 선택적으로 이동시키는 단계를 포함하는,다수개의 OLED 장치로 형성되며 수분 민감성 또는 산소 민감성의 풀 칼라 디스플레이(full-colored display)의 제조를 위한, 동일반응계 진공 방법.
- (e) 진공 피복기를 사용하여 OLED 장치의 일부분을 형성하는 하나 이상의 층으로 상기 수용체 소자를 코팅하는 단계를 추가로 포함하는 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/033,459 US6555284B1 (en) | 2001-12-27 | 2001-12-27 | In situ vacuum method for making OLED devices |
US10/033,459 | 2001-12-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030057451A true KR20030057451A (ko) | 2003-07-04 |
KR100933405B1 KR100933405B1 (ko) | 2009-12-22 |
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EP (1) | EP1324404B1 (ko) |
JP (1) | JP2003234185A (ko) |
KR (1) | KR100933405B1 (ko) |
CN (1) | CN1319181C (ko) |
TW (1) | TWI295857B (ko) |
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CN1319181C (zh) | 2007-05-30 |
TW200301971A (en) | 2003-07-16 |
JP2003234185A (ja) | 2003-08-22 |
EP1324404A2 (en) | 2003-07-02 |
CN1428874A (zh) | 2003-07-09 |
EP1324404A3 (en) | 2009-06-10 |
EP1324404B1 (en) | 2013-08-28 |
US6555284B1 (en) | 2003-04-29 |
KR100933405B1 (ko) | 2009-12-22 |
TWI295857B (en) | 2008-04-11 |
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