KR20030038427A - 투영 광학계, 노광 장치 및 디바이스의 제조 방법 - Google Patents

투영 광학계, 노광 장치 및 디바이스의 제조 방법 Download PDF

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Publication number
KR20030038427A
KR20030038427A KR1020020068092A KR20020068092A KR20030038427A KR 20030038427 A KR20030038427 A KR 20030038427A KR 1020020068092 A KR1020020068092 A KR 1020020068092A KR 20020068092 A KR20020068092 A KR 20020068092A KR 20030038427 A KR20030038427 A KR 20030038427A
Authority
KR
South Korea
Prior art keywords
optical system
projection optical
lens group
lens
conditional expression
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020020068092A
Other languages
English (en)
Korean (ko)
Inventor
시게마츠고지
구도신타로
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20030038427A publication Critical patent/KR20030038427A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020020068092A 2001-11-05 2002-11-05 투영 광학계, 노광 장치 및 디바이스의 제조 방법 Ceased KR20030038427A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001339424 2001-11-05
JPJP-P-2001-00339424 2001-11-05
JPJP-P-2002-00200695 2002-07-10
JP2002200695A JP4228130B2 (ja) 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20030038427A true KR20030038427A (ko) 2003-05-16

Family

ID=26624347

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020068092A Ceased KR20030038427A (ko) 2001-11-05 2002-11-05 투영 광학계, 노광 장치 및 디바이스의 제조 방법

Country Status (4)

Country Link
JP (1) JP4228130B2 (enExample)
KR (1) KR20030038427A (enExample)
CN (1) CN100483172C (enExample)
TW (1) TW588223B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130121116A (ko) * 2010-12-01 2013-11-05 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 투사 대물렌즈 시스템

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP4779394B2 (ja) * 2005-03-23 2011-09-28 株式会社ニコン 投影光学系、露光装置、および露光方法
JP2010091751A (ja) 2008-10-07 2010-04-22 Canon Inc 投影光学系及び露光装置
CN103105666B (zh) * 2011-11-10 2015-04-15 上海微电子装备有限公司 一种曝光投影物镜
CN103364928B (zh) * 2012-03-31 2015-09-30 上海微电子装备有限公司 一种投影物镜光学系统
CN107664809B (zh) * 2016-07-29 2019-11-26 上海微电子装备（集团）股份有限公司 一种投影物镜

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08254652A (ja) * 1995-03-15 1996-10-01 Nikon Corp 投影光学系
KR19980018207A (ko) * 1996-08-08 1998-06-05 고노 시게오 투영 노광 장치 및 그 투영 노광 장치에 사용되는 투영 광하계 및 디바이스 제조 방법
JP2000056219A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影光学系
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08254652A (ja) * 1995-03-15 1996-10-01 Nikon Corp 投影光学系
KR19980018207A (ko) * 1996-08-08 1998-06-05 고노 시게오 투영 노광 장치 및 그 투영 노광 장치에 사용되는 투영 광하계 및 디바이스 제조 방법
JP2000056219A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影光学系
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130121116A (ko) * 2010-12-01 2013-11-05 상하이 마이크로 일렉트로닉스 이큅먼트 컴퍼니 리미티드 투사 대물렌즈 시스템

Also Published As

Publication number Publication date
TW588223B (en) 2004-05-21
CN100483172C (zh) 2009-04-29
CN1417610A (zh) 2003-05-14
JP4228130B2 (ja) 2009-02-25
JP2003202494A (ja) 2003-07-18

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