KR20020066327A - 반도체에 셀프 도핑 접점을 형성하는 방법 및 장치 - Google Patents

반도체에 셀프 도핑 접점을 형성하는 방법 및 장치 Download PDF

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Publication number
KR20020066327A
KR20020066327A KR1020027006600A KR20027006600A KR20020066327A KR 20020066327 A KR20020066327 A KR 20020066327A KR 1020027006600 A KR1020027006600 A KR 1020027006600A KR 20027006600 A KR20027006600 A KR 20027006600A KR 20020066327 A KR20020066327 A KR 20020066327A
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South Korea
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semiconductor
temperature
impurity
region
silicon
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KR1020027006600A
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English (en)
Korean (ko)
Inventor
마이어다니엘엘
데이비스허버트피
가르시아루쓰에이
제스업조이시에이
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에바라 솔라 인코포레이티드
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Publication of KR20020066327A publication Critical patent/KR20020066327A/ko
Withdrawn legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/228Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/122Active materials comprising only Group IV materials
    • H10F77/1223Active materials comprising only Group IV materials characterised by the dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Photovoltaic Devices (AREA)
KR1020027006600A 1999-11-23 2000-11-22 반도체에 셀프 도핑 접점을 형성하는 방법 및 장치 Withdrawn KR20020066327A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US16735899P 1999-11-23 1999-11-23
US60/167,358 1999-11-23
US09/538,034 2000-03-29
US09/538,034 US6632730B1 (en) 1999-11-23 2000-03-29 Method for self-doping contacts to a semiconductor
PCT/US2000/032257 WO2001041221A1 (en) 1999-11-23 2000-11-22 Method and apparatus for self-doping contacts to a semiconductor

Publications (1)

Publication Number Publication Date
KR20020066327A true KR20020066327A (ko) 2002-08-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027006600A Withdrawn KR20020066327A (ko) 1999-11-23 2000-11-22 반도체에 셀프 도핑 접점을 형성하는 방법 및 장치

Country Status (10)

Country Link
US (4) US6632730B1 (enExample)
EP (1) EP1234342A1 (enExample)
JP (1) JP2003529207A (enExample)
KR (1) KR20020066327A (enExample)
CN (1) CN1260830C (enExample)
AU (1) AU780960B2 (enExample)
BR (1) BR0015803A (enExample)
CA (1) CA2392342C (enExample)
MX (1) MXPA02005186A (enExample)
WO (1) WO2001041221A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101032740B1 (ko) * 2010-10-05 2011-05-06 에프알앤디건설(주) 교량의 교좌장치

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Publication number Publication date
US6703295B2 (en) 2004-03-09
AU780960B2 (en) 2005-04-28
JP2003529207A (ja) 2003-09-30
US20030003693A1 (en) 2003-01-02
CA2392342C (en) 2011-01-04
AU1798301A (en) 2001-06-12
US6737340B2 (en) 2004-05-18
US20030203603A1 (en) 2003-10-30
EP1234342A1 (en) 2002-08-28
US20030008485A1 (en) 2003-01-09
WO2001041221A1 (en) 2001-06-07
US6664631B2 (en) 2003-12-16
US6632730B1 (en) 2003-10-14
CN1415119A (zh) 2003-04-30
CN1260830C (zh) 2006-06-21
MXPA02005186A (es) 2004-05-05
BR0015803A (pt) 2002-08-13
CA2392342A1 (en) 2001-06-07

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