GB1416964A - Contact between an electrode metal and a semiconductor - Google Patents
Contact between an electrode metal and a semiconductorInfo
- Publication number
- GB1416964A GB1416964A GB3260573A GB3260573A GB1416964A GB 1416964 A GB1416964 A GB 1416964A GB 3260573 A GB3260573 A GB 3260573A GB 3260573 A GB3260573 A GB 3260573A GB 1416964 A GB1416964 A GB 1416964A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- semi
- conductor
- dopant
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 title abstract 10
- 229910052751 metal Inorganic materials 0.000 title abstract 10
- 239000004065 semiconductor Substances 0.000 title abstract 7
- 239000002019 doping agent Substances 0.000 abstract 5
- 230000002939 deleterious effect Effects 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000155 melt Substances 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/228—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
1416964 Semi-conductor devices J S AKIMOV A A GALAEV S S GORELIK B I GOFMAN V D ERMOSHIN S K KOROVIN V V NAUMOV K A PREOBRAZHENTSEV S V FRONK V L SHVARTSMAN V V GARSHENIN O F ASTAKHOV I I KRUGLOV and M M SAMOKHVALOV 9 July 1973 32605/73 Heading H1K Deleterious surface oxides of semi-conductor material are reduced during manufacture of a contact between an electrode metal and a semi-conductor body by providing directly on the semi-conductor surface a thin (less than 1000 Š thick) layer of a metal capable of performing the reduction at the contact-processing temperature. A thicker layer of the electrode metal is deposited over the thin reducing metal layer, followed in sequence by at least one layer of a dopant and another layer of the electrode metal, and the multi-layer structure is then heated to form a melt of the electrode metal, the dopant and the semi-conductor, from which melt the dopant diffuses into the semi-conductor body. For contact to P- and N- type Si the reducing metal may be Ti, Nb or Zr, the electrode metal may be Ag, Au or Sn and the dopant may be Al or Sb. Transistors and diodes are mentioned, but the main embodiments are contacts for varicaps. In one example, separate layers of Al and Sb alternate with Ag layers in the preliminary structure and diffuse together into the P-type Si body on heating to form the required PN junction. The electrode and dopant layers may be vacuum deposited or, if a layer of Ni is provided immediately on the layer of reducing metal, may be chemically or electrochemically deposited. Reference has been directed by the Comptroller to Specification. 1,196,541.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3260573A GB1416964A (en) | 1973-07-09 | 1973-07-09 | Contact between an electrode metal and a semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3260573A GB1416964A (en) | 1973-07-09 | 1973-07-09 | Contact between an electrode metal and a semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1416964A true GB1416964A (en) | 1975-12-10 |
Family
ID=10341235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3260573A Expired GB1416964A (en) | 1973-07-09 | 1973-07-09 | Contact between an electrode metal and a semiconductor |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1416964A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998050944A2 (en) * | 1997-05-06 | 1998-11-12 | Ebara Solar, Inc. | Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices |
WO2001041221A1 (en) * | 1999-11-23 | 2001-06-07 | Ebara Solar, Inc. | Method and apparatus for self-doping contacts to a semiconductor |
-
1973
- 1973-07-09 GB GB3260573A patent/GB1416964A/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998050944A2 (en) * | 1997-05-06 | 1998-11-12 | Ebara Solar, Inc. | Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices |
WO1998050944A3 (en) * | 1997-05-06 | 1999-05-27 | Ebara Solar Inc | Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices |
US6180869B1 (en) | 1997-05-06 | 2001-01-30 | Ebara Solar, Inc. | Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices |
WO2001041221A1 (en) * | 1999-11-23 | 2001-06-07 | Ebara Solar, Inc. | Method and apparatus for self-doping contacts to a semiconductor |
US6632730B1 (en) | 1999-11-23 | 2003-10-14 | Ebara Solar, Inc. | Method for self-doping contacts to a semiconductor |
US6664631B2 (en) | 1999-11-23 | 2003-12-16 | Ebara Solar, Inc. | Apparatus for self-doping contacts to a semiconductor |
US6703295B2 (en) | 1999-11-23 | 2004-03-09 | Ebara Corporation | Method and apparatus for self-doping contacts to a semiconductor |
US6737340B2 (en) | 1999-11-23 | 2004-05-18 | Ebara Corporation | Method and apparatus for self-doping contacts to a semiconductor |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |