KR20000069790A - 반도체용 압력센서 - Google Patents
반도체용 압력센서 Download PDFInfo
- Publication number
- KR20000069790A KR20000069790A KR1019997005932A KR19997005932A KR20000069790A KR 20000069790 A KR20000069790 A KR 20000069790A KR 1019997005932 A KR1019997005932 A KR 1019997005932A KR 19997005932 A KR19997005932 A KR 19997005932A KR 20000069790 A KR20000069790 A KR 20000069790A
- Authority
- KR
- South Korea
- Prior art keywords
- resistance
- pressure sensor
- substrate
- measurement
- membrane
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0055—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements bonded on a diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/02—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning
- G01L9/06—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices
- G01L9/065—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in ohmic resistance, e.g. of potentiometers, electric circuits therefor, e.g. bridges, amplifiers or signal conditioning of piezo-resistive devices with temperature compensating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
Description
Claims (8)
- 외부에서 반도체 기판에 걸린 압력을 측정하기 위해서, 동시에 하나의 멤브레인으로 구성되어 있는 기판의 영역은 외부에서 걸린 압력에 의해서 변형될 수 있고, 또한 기판에서 하나의 기계적인 내부 방해응력이 존재하며, 이러한 방해응력을 통해서 전체의 기판이 변형되고, 또한 적어도 멤브레인위에 배치되어 있는 측정저항(4)을 가지고 있으며, 이 멤브레인이 변형을 통해서 변화되는 전기 저항을 갖게 되는 반도체용 압력센서에 있어서,기판위에서, 멤브레인 외부에, 적어도 변형에 의해서 가변 상쇄저항(5)이 배치되어 있고, 또한 이 저항이 측정저항(4)으로 회로에서 접속되며, 전기 저항의 변화가 내부의 기계적인 방해응력을 이유로 측정저항과 상쇄저항에 대한 값이 거의 같고 서로 다른 부호로 되어 있는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항에 있어서, 멤브레인위에 4개의 측정저항이 있고, 또한 이 측정저항이 휘트스톤-브리지에 배치되어 있는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항 또는 제 2 항에 있어서, 각각의 측정저항은 적어도 하나의 상쇄저항에 대응되어 있는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항 내지 제 3 항중 어느 한항에 있어서, 브리지의 반마다 하나의 상쇄저항은 측정저항과 대응되어 있는 것을 특징으로 하는 반도체용 압력센서.
- 제 2 항에 있어서, 상쇄저항으로 되어 있는 제 2 휘트스톤-브리지가 장착되어 있으며, 이의 브리지 신호가 측정저항으로 된 휘트스톤-브리지의 브리지신호를 적절한 형태로 응력을 가하게 되는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항 내지 제 5 항중 어느 한항에 있어서, 측정저항은 기판의 부분 증여에 의해서 발생되는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항 내지 제 6 항중 어느 한항에 있어서, 기판은 실리콘으로 되어 있는 것을 특징으로 하는 반도체용 압력센서.
- 제 1 항 내지 제 7 항중 어느 한항에 있어서, 기판이 하나의 [100]-표면을 갖게 되고, 또한 측정저항이 {011}-방향을 지나게 되며 그리고 이에 속한 상쇄저항이 측정저항에 대해서 수직적으로 놓여 있는 것을 특징으로 하는 반도체용 압력센서.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19701055.5 | 1997-01-15 | ||
DE19701055.5A DE19701055B4 (de) | 1997-01-15 | 1997-01-15 | Halbleiter-Drucksensor |
PCT/DE1997/002541 WO1998031998A1 (de) | 1997-01-15 | 1997-11-03 | Halbleiter-drucksensor |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000069790A true KR20000069790A (ko) | 2000-11-25 |
KR100507942B1 KR100507942B1 (ko) | 2005-08-17 |
Family
ID=7817372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1999-7005932A KR100507942B1 (ko) | 1997-01-15 | 1997-11-03 | 반도체용 압력 센서 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6234027B1 (ko) |
JP (1) | JP2001509267A (ko) |
KR (1) | KR100507942B1 (ko) |
DE (1) | DE19701055B4 (ko) |
WO (1) | WO1998031998A1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100741520B1 (ko) * | 2003-03-07 | 2007-07-20 | 가부시키가이샤 덴소 | 다이어프램을 갖는 반도체 압력 센서 |
KR20160106754A (ko) * | 2014-01-14 | 2016-09-12 | 로베르트 보쉬 게엠베하 | 마이크로 기계 압력 센서 장치 및 그 제조 방법 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19957556A1 (de) * | 1999-11-30 | 2001-05-31 | Bosch Gmbh Robert | Halbleiter-Drucksensor und Meßanordnung |
DE10013904A1 (de) | 2000-03-21 | 2001-09-27 | Bosch Gmbh Robert | Mikromechanisches Bauelement und Abgleichverfahren |
DE10135806A1 (de) | 2001-07-23 | 2003-02-13 | Zeiss Carl | Spiegel zur Reflexion elektromagnetischer Strahlung und Beleuchtungs- bzw. Abbildungsverfahren unter Einsatz desselben |
DE10156951A1 (de) * | 2001-11-20 | 2003-05-28 | Wabco Gmbh & Co Ohg | Elektrische Schaltungsanordnung |
US20030188829A1 (en) * | 2001-12-27 | 2003-10-09 | Bharath Rangarajan | Integrated pressure sensor for measuring multiaxis pressure gradients |
DE10241450A1 (de) | 2002-09-06 | 2004-03-18 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Bauteils mit einem Sensorelement, insbesondere eines Verformungssensors |
DE50313527D1 (de) | 2003-07-03 | 2011-04-21 | Grundfos As | Differenzdrucksensor |
US7055392B2 (en) | 2003-07-04 | 2006-06-06 | Robert Bosch Gmbh | Micromechanical pressure sensor |
DE102004006199B4 (de) * | 2004-02-09 | 2015-09-03 | Robert Bosch Gmbh | Mikromechanischer Drucksensor für hohe Drücke |
ATE470844T1 (de) * | 2004-09-24 | 2010-06-15 | Grundfos As | Drucksensor |
DE102004051113B4 (de) * | 2004-10-21 | 2006-11-30 | X-Fab Semiconductor Foundries Ag | Verfahren und Messanordnung zur elektrischen Ermittlung der Dicke von Halbleitermembranen durch Energieeintrag |
JP5069682B2 (ja) | 2005-07-22 | 2012-11-07 | エスティーマイクロエレクトロニクス エス.アール.エル. | 二重測定スケールおよび高フルスケール値を有する集積化圧力センサ |
DE102006009076A1 (de) * | 2006-02-28 | 2007-08-30 | Robert Bosch Gmbh | Verfahren und Vorrichtung zur Erkennung des freien Falls |
DE102008054408A1 (de) * | 2008-12-09 | 2010-06-10 | Robert Bosch Gmbh | Messbrücke, Messeinheit und drehbar gelagerter Spiegel |
JP5658477B2 (ja) * | 2010-04-13 | 2015-01-28 | アズビル株式会社 | 圧力センサ |
DE102011018588B4 (de) | 2011-04-26 | 2018-09-20 | X-Fab Semiconductor Foundries Ag | Verfahren zur Herstellung eines integrierten, eine Membrane aufweisenden Drucksensors als Bestandteil eines hochintegrierten Schaltkreises |
WO2013057689A1 (en) | 2011-10-21 | 2013-04-25 | Ecole Polytechnique Federale De Lausanne (Epfl) | SiC HIGH TEMPERATURE PRESSURE TRANSDUCER |
US9021887B2 (en) | 2011-12-19 | 2015-05-05 | Infineon Technologies Ag | Micromechanical semiconductor sensing device |
JP5454628B2 (ja) | 2012-06-29 | 2014-03-26 | 株式会社デンソー | 圧力センサ |
GB2521163A (en) | 2013-12-11 | 2015-06-17 | Melexis Technologies Nv | Semiconductor pressure sensor |
US10317297B2 (en) | 2013-12-11 | 2019-06-11 | Melexis Technologies Nv | Semiconductor pressure sensor |
CN103921171B (zh) * | 2014-04-17 | 2016-04-06 | 西安交通大学 | 一种大量程压阻式高频响固定式四分量铣削力传感器 |
DE102015222756A1 (de) * | 2015-11-18 | 2017-05-18 | Robert Bosch Gmbh | Sensorelement für einen Drucksensor |
CN106895886B (zh) * | 2017-04-13 | 2023-06-16 | 南京信息工程大学 | 基于巨压阻传感器的高灵敏度气体流量测量装置及方法 |
DE102017214846A1 (de) * | 2017-08-24 | 2019-02-28 | Infineon Technologies Ag | Gehäustes MEMS Bauteil mit Störgrößenkompensation |
US11885704B2 (en) | 2020-07-27 | 2024-01-30 | Precision Biomems Corporation | Flexible two-dimensional sheet array of electronic sensor devices |
US11650110B2 (en) * | 2020-11-04 | 2023-05-16 | Honeywell International Inc. | Rosette piezo-resistive gauge circuit for thermally compensated measurement of full stress tensor |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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US3772628A (en) * | 1972-05-30 | 1973-11-13 | Gen Electric | Integral silicon diaphragms for low pressure measurements |
US4333349A (en) * | 1980-10-06 | 1982-06-08 | Kulite Semiconductor Products, Inc. | Binary balancing apparatus for semiconductor transducer structures |
US4530244A (en) * | 1982-01-04 | 1985-07-23 | Honeywell Inc. | Semiconductor pressure transducer |
CA1186163A (en) * | 1982-01-04 | 1985-04-30 | James B. Starr | Semiconductor pressure transducer |
DE3207833A1 (de) * | 1982-03-04 | 1983-09-15 | Siemens AG, 1000 Berlin und 8000 München | Halbleiter-drucksensor |
DE3319605A1 (de) * | 1983-05-30 | 1984-12-06 | Siemens AG, 1000 Berlin und 8000 München | Sensor mit polykristallinen silicium-widerstaenden |
JPS60128673A (ja) * | 1983-12-16 | 1985-07-09 | Hitachi Ltd | 半導体感圧装置 |
JPH0650270B2 (ja) * | 1984-05-21 | 1994-06-29 | 株式会社日本自動車部品総合研究所 | 高圧用圧力検出器 |
US4682503A (en) * | 1986-05-16 | 1987-07-28 | Honeywell Inc. | Microscopic size, thermal conductivity type, air or gas absolute pressure sensor |
JPH0257933A (ja) * | 1988-08-24 | 1990-02-27 | Aisan Ind Co Ltd | 圧力センサ |
DE4000326C2 (de) * | 1990-01-08 | 1995-12-14 | Mannesmann Ag | Drucksensor |
JPH03249532A (ja) * | 1990-02-28 | 1991-11-07 | Yokogawa Electric Corp | 半導体圧力計 |
JP2895262B2 (ja) * | 1991-04-30 | 1999-05-24 | 株式会社日立製作所 | 複合センサ |
JPH0579938A (ja) * | 1991-09-24 | 1993-03-30 | Toshiba Corp | 半導体圧力センサ |
JP3049532B2 (ja) * | 1993-06-08 | 2000-06-05 | 株式会社共和電業 | ひずみゲージ式変換器およびひずみゲージ式変換器の初期値変動量検出方法 |
JP3365028B2 (ja) * | 1994-03-14 | 2003-01-08 | 株式会社デンソー | 圧力検出装置 |
JPH0875581A (ja) * | 1994-09-09 | 1996-03-22 | Yamatake Honeywell Co Ltd | 半導体圧力変換器 |
-
1997
- 1997-01-15 DE DE19701055.5A patent/DE19701055B4/de not_active Expired - Lifetime
- 1997-11-03 KR KR10-1999-7005932A patent/KR100507942B1/ko not_active IP Right Cessation
- 1997-11-03 JP JP53349098A patent/JP2001509267A/ja active Pending
- 1997-11-03 US US09/341,742 patent/US6234027B1/en not_active Expired - Lifetime
- 1997-11-03 WO PCT/DE1997/002541 patent/WO1998031998A1/de active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100741520B1 (ko) * | 2003-03-07 | 2007-07-20 | 가부시키가이샤 덴소 | 다이어프램을 갖는 반도체 압력 센서 |
KR20160106754A (ko) * | 2014-01-14 | 2016-09-12 | 로베르트 보쉬 게엠베하 | 마이크로 기계 압력 센서 장치 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JP2001509267A (ja) | 2001-07-10 |
KR100507942B1 (ko) | 2005-08-17 |
WO1998031998A1 (de) | 1998-07-23 |
US6234027B1 (en) | 2001-05-22 |
DE19701055B4 (de) | 2016-04-28 |
DE19701055A1 (de) | 1998-07-16 |
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