KR20000015801A - 탄소막을 형성하기 위한 방법 - Google Patents

탄소막을 형성하기 위한 방법 Download PDF

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Publication number
KR20000015801A
KR20000015801A KR1019980709350A KR19980709350A KR20000015801A KR 20000015801 A KR20000015801 A KR 20000015801A KR 1019980709350 A KR1019980709350 A KR 1019980709350A KR 19980709350 A KR19980709350 A KR 19980709350A KR 20000015801 A KR20000015801 A KR 20000015801A
Authority
KR
South Korea
Prior art keywords
arc
pulsing
signal
pulsed
range
Prior art date
Application number
KR1019980709350A
Other languages
English (en)
Korean (ko)
Inventor
스코트 브이. 존슨
Original Assignee
비센트 비.인그라시아
모토로라 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 비센트 비.인그라시아, 모토로라 인코포레이티드 filed Critical 비센트 비.인그라시아
Publication of KR20000015801A publication Critical patent/KR20000015801A/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H01J37/32064—Circuits specially adapted for controlling the arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019980709350A 1997-03-20 1998-01-26 탄소막을 형성하기 위한 방법 KR20000015801A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82137497A 1997-03-20 1997-03-20
US08/821,374 1997-03-20

Publications (1)

Publication Number Publication Date
KR20000015801A true KR20000015801A (ko) 2000-03-15

Family

ID=25233216

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980709350A KR20000015801A (ko) 1997-03-20 1998-01-26 탄소막을 형성하기 위한 방법

Country Status (5)

Country Link
EP (1) EP0918886A1 (de)
JP (1) JP2001506319A (de)
KR (1) KR20000015801A (de)
CN (1) CN1220707A (de)
WO (1) WO1998041666A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7175752B2 (en) * 2002-05-24 2007-02-13 Federal-Mogul Worldwide, Inc. Method and apparatus for electrochemical machining
KR101103470B1 (ko) * 2004-02-27 2012-01-09 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 탄소계 박막 및 그 제조 방법, 및 이 박막을 이용한 부재
KR101113145B1 (ko) 2007-04-05 2012-03-13 후지쯔 세미컨덕터 가부시키가이샤 표면 형상 센서와 그 제조 방법
DE102007021386A1 (de) * 2007-05-04 2008-11-06 Christof-Herbert Diener Kurztaktniederdruckplasmaanlage
JP2011207736A (ja) * 2010-03-12 2011-10-20 Sekisui Chem Co Ltd グラフェンの形成方法
EP3143177B1 (de) * 2014-05-13 2019-01-02 Argor Aljba SA Verfahren zum filtern von makropartikeln in einer physikalischen gasphasenabscheidung (pvd) durch kathodischen lichtbogen im vakuum
CN105603372B (zh) * 2015-12-22 2018-03-27 长春吉大科诺科技有限责任公司 电磁驱动式石墨电弧溅射镶嵌探头
US20210156033A1 (en) * 2017-09-25 2021-05-27 Sumitomo Electric Industries, Ltd. Method for manufacturing hard carbon-based coating, and member provided with coating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL71530A (en) * 1984-04-12 1987-09-16 Univ Ramot Method and apparatus for surface-treating workpieces
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
JPS63210099A (ja) * 1987-02-26 1988-08-31 Nissin Electric Co Ltd ダイヤモンド膜の作製方法
DE9109503U1 (de) * 1991-07-31 1991-10-17 Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier, De

Also Published As

Publication number Publication date
JP2001506319A (ja) 2001-05-15
WO1998041666A1 (en) 1998-09-24
EP0918886A1 (de) 1999-06-02
CN1220707A (zh) 1999-06-23

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Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application