KR19990072619A - 결정인상장치용초전도자석장치 - Google Patents
결정인상장치용초전도자석장치 Download PDFInfo
- Publication number
- KR19990072619A KR19990072619A KR1019990004950A KR19990004950A KR19990072619A KR 19990072619 A KR19990072619 A KR 19990072619A KR 1019990004950 A KR1019990004950 A KR 1019990004950A KR 19990004950 A KR19990004950 A KR 19990004950A KR 19990072619 A KR19990072619 A KR 19990072619A
- Authority
- KR
- South Korea
- Prior art keywords
- superconducting
- coil
- magnetic
- crystal
- crystal raising
- Prior art date
Links
- 239000013078 crystal Substances 0.000 claims abstract description 87
- 239000000696 magnetic material Substances 0.000 claims abstract description 46
- 230000005855 radiation Effects 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 11
- 238000010586 diagram Methods 0.000 description 16
- 229910052734 helium Inorganic materials 0.000 description 11
- 239000001307 helium Substances 0.000 description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 230000005284 excitation Effects 0.000 description 8
- 230000001603 reducing effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000003507 refrigerant Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F6/00—Superconducting magnets; Superconducting coils
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/917—Magnetic
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Abstract
Description
Claims (12)
- 결정인상장치를 사이에 두도록 축방향에 대하여 서로 대면하는 1쌍의 환상의 초전도코일과, 이 초전도코일을 포위하는 방사쉴드와, 이 방사쉴드를 포위하는 진공용기를 포함하는 결정인상장치용 초전도자석장치에 있어서,상기 진공용기부재가, 결정인상장치에 대면하는 측의 일부를 비자성재로 하고, 다른 측의 일부를 자성재로하여 된 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제1항에 있어서,상기 결정인상장치에 대면하는 측의 진공용기부재의 일부를 자성재로한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제1항에 있어서,상기 코일의 외경측 및 상기 초전도코일에 대하여 결정인상장치와의 반대측의 진공용기부재 중 적어도 한쪽의 자성재료를 다른쪽보다 더 두껍게 한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제3항에 있어서,상기 초전도코일에 가장 가까운 부분의 자성재료만을 다른 부분보다 두껍게 한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제1항 내지 제4항 중 어느 한 항에 있어서,상기 진공용기의 자성부재가 간격을 갖는 다층판의 집합체로 된 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 축방향에 대하여 서로 대면하는 환상의 초전도코일과, 이 초전도 코일을 각각 포위하는 환상의 방사쉴드와, 상기 코일의 내경부분에 공간을 갖고 이 공간에 결정인상장치를 설치하도록 상기 환상의 방사쉴드를 포위하는 2중 원통형의 진공용기를 포함하는 결정인상장치용 초전도자석장치에 있어서,상기 코일의 중앙부분에 위치한 진공용기 외경부재에, 자석 내경측 또는 외경측 중 적어도 한쪽으로 돌출한 자성부재를 설치한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제5항에 있어서,상기 진공용기의 자성부재가 간격을 갖는 다층판의 집합체로 된 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제5항에 있어서,상하 코일중 어느 한쪽의 양단을 전기적으로 단락한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 결정인상장치를 사이에 두도록 축방향에 대하여 쌍의 환상의 초전도코일과, 이 초전도코일을 포위하는 방사쉴드와, 이 방사쉴드를 포위하는 진공용기를 포함하는 결정인상장치용 초전도자석장치에 있어서,주 초전도코일의 대칭축과 주 초전도코일의 중심축의 교차점으로부터 주 초전도코일쪽으로 연장하는 각도내에, 주코일과 역방향의 자기장을 발생하는 보조코일을 설치한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제9항에 있어서,상기 진공용기를 자성재로 한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제9항에 있어서,상기 보조코일의 양단을 전기적으로 단락한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
- 제11항에 있어서,서로 대면하는 주코일중 어느 한쪽의 양단을 전기적으로 단락한 것을 특징으로 하는 결정인상장치용 초전도자석장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03491198A JP3824412B2 (ja) | 1998-02-17 | 1998-02-17 | 結晶引上装置用超電導磁石装置 |
JP98-34911 | 1998-02-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990072619A true KR19990072619A (ko) | 1999-09-27 |
KR100309969B1 KR100309969B1 (ko) | 2001-10-29 |
Family
ID=12427402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019990004950A KR100309969B1 (ko) | 1998-02-17 | 1999-02-12 | 결정인상장치용 초전도자석장치 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6060971A (ko) |
EP (1) | EP0936290B1 (ko) |
JP (1) | JP3824412B2 (ko) |
KR (1) | KR100309969B1 (ko) |
CN (2) | CN1320172C (ko) |
DE (1) | DE69900515T2 (ko) |
MY (1) | MY125722A (ko) |
TW (1) | TW407294B (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4908299B2 (ja) * | 2007-04-19 | 2012-04-04 | 株式会社東芝 | 超電導マグネット装置 |
CN101819845B (zh) * | 2010-04-16 | 2012-07-04 | 中国科学院电工研究所 | 用于高功率微波源聚焦与回旋电子装置的超导磁体系统 |
CN101859623A (zh) * | 2010-06-02 | 2010-10-13 | 江苏旌凯中科超导高技术有限公司 | 磁选用超导磁体系统 |
CN103952752A (zh) * | 2014-04-03 | 2014-07-30 | 西安理工大学 | 单晶炉的磁屏蔽体结构 |
JP2017011236A (ja) * | 2015-06-26 | 2017-01-12 | 株式会社神戸製鋼所 | 多層磁気シールド |
KR102644300B1 (ko) * | 2017-02-10 | 2024-03-07 | 한국전자통신연구원 | 자기장 차폐 장치 |
CN110129883A (zh) * | 2018-03-30 | 2019-08-16 | 杭州慧翔电液技术开发有限公司 | 一种用于磁控直拉单晶的磁体结构及磁控直拉单晶的方法 |
CN113046833A (zh) * | 2019-12-27 | 2021-06-29 | 上海新昇半导体科技有限公司 | 一种半导体晶体生长装置 |
CN115542865A (zh) * | 2022-11-24 | 2022-12-30 | 杭州慧翔电液技术开发有限公司 | 一种超导磁体自动升降场系统及参数控制方法 |
CN116759188B (zh) * | 2023-08-15 | 2023-11-03 | 苏州八匹马超导科技有限公司 | 一种超导磁体 |
Family Cites Families (17)
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DE3245945A1 (de) * | 1982-12-11 | 1984-06-14 | Bruker Analytische Meßtechnik GmbH, 7512 Rheinstetten | Elektromagnet fuer die nmr-tomographie |
JPS59195595A (ja) * | 1983-04-15 | 1984-11-06 | Sony Corp | 結晶成長装置 |
US4565671A (en) * | 1983-08-05 | 1986-01-21 | Kabushiki Kaisha Toshiba | Single crystal manufacturing apparatus |
JPS6051692A (ja) * | 1983-08-31 | 1985-03-23 | Toshiba Corp | 単結晶半導体育成装置 |
JPS6051691A (ja) * | 1983-08-31 | 1985-03-23 | Toshiba Corp | 単結晶半導体育成装置 |
JPS61239605A (ja) * | 1985-04-16 | 1986-10-24 | Mitsubishi Seiko Jizai Kk | 円筒状形態を有する直径方位励磁用磁場装置 |
GB8701363D0 (en) * | 1987-01-22 | 1987-02-25 | Oxford Instr Ltd | Magnetic field generating assembly |
JPS63204603A (ja) * | 1987-02-19 | 1988-08-24 | Sumitomo Electric Ind Ltd | クライオスタツト |
JPS64715A (en) * | 1987-06-23 | 1989-01-05 | Mitsubishi Electric Corp | Superconducting electromagnet device |
JP2537369B2 (ja) * | 1987-07-28 | 1996-09-25 | 東芝セラミックス株式会社 | 単結晶引上げ装置 |
US5136273A (en) * | 1988-10-17 | 1992-08-04 | Kabushiki Kaisha Toshiba | Magnet apparatus for use in a magnetic resonance imaging system |
JPH0582338A (ja) * | 1991-09-19 | 1993-04-02 | Hitachi Ltd | 超電導磁石装置及び励磁方法 |
JPH0729724A (ja) * | 1993-07-07 | 1995-01-31 | Toshiba Corp | 超電導電磁石 |
US5448214A (en) * | 1994-06-15 | 1995-09-05 | General Electric Company | Open MRI magnet with superconductive shielding |
JP3476962B2 (ja) * | 1995-06-05 | 2003-12-10 | 三菱電機株式会社 | 単結晶引上装置 |
JP3654463B2 (ja) * | 1996-03-29 | 2005-06-02 | 株式会社日立メディコ | 磁気共鳴イメージング装置 |
JP3585141B2 (ja) * | 1996-04-05 | 2004-11-04 | 株式会社日立メディコ | 超電導磁石装置 |
-
1998
- 1998-02-17 JP JP03491198A patent/JP3824412B2/ja not_active Expired - Lifetime
-
1999
- 1999-02-08 TW TW088101914A patent/TW407294B/zh not_active IP Right Cessation
- 1999-02-12 KR KR1019990004950A patent/KR100309969B1/ko not_active IP Right Cessation
- 1999-02-13 CN CNB2003101248307A patent/CN1320172C/zh not_active Expired - Lifetime
- 1999-02-13 CN CNB991006828A patent/CN1156614C/zh not_active Expired - Lifetime
- 1999-02-13 MY MYPI99000535A patent/MY125722A/en unknown
- 1999-02-16 US US09/250,728 patent/US6060971A/en not_active Expired - Lifetime
- 1999-02-16 EP EP99103048A patent/EP0936290B1/en not_active Expired - Lifetime
- 1999-02-16 DE DE69900515T patent/DE69900515T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH11233332A (ja) | 1999-08-27 |
JP3824412B2 (ja) | 2006-09-20 |
CN1508298A (zh) | 2004-06-30 |
CN1156614C (zh) | 2004-07-07 |
EP0936290A1 (en) | 1999-08-18 |
KR100309969B1 (ko) | 2001-10-29 |
DE69900515T2 (de) | 2002-07-25 |
EP0936290B1 (en) | 2001-12-05 |
CN1227285A (zh) | 1999-09-01 |
US6060971A (en) | 2000-05-09 |
DE69900515D1 (de) | 2002-01-17 |
TW407294B (en) | 2000-10-01 |
MY125722A (en) | 2006-08-30 |
CN1320172C (zh) | 2007-06-06 |
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