KR19980024493A - 위치 결정 메카니즘 및 메모리 소자 - Google Patents
위치 결정 메카니즘 및 메모리 소자 Download PDFInfo
- Publication number
- KR19980024493A KR19980024493A KR1019970046520A KR19970046520A KR19980024493A KR 19980024493 A KR19980024493 A KR 19980024493A KR 1019970046520 A KR1019970046520 A KR 1019970046520A KR 19970046520 A KR19970046520 A KR 19970046520A KR 19980024493 A KR19980024493 A KR 19980024493A
- Authority
- KR
- South Korea
- Prior art keywords
- bending element
- stage
- movement
- positioning mechanism
- elongate
- Prior art date
Links
- 230000007246 mechanism Effects 0.000 title claims abstract description 97
- 238000005452 bending Methods 0.000 claims abstract description 229
- 230000033001 locomotion Effects 0.000 claims abstract description 67
- 230000004044 response Effects 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims description 77
- 239000000725 suspension Substances 0.000 claims description 74
- 239000000523 sample Substances 0.000 claims description 70
- 239000000463 material Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 21
- 230000000295 complement effect Effects 0.000 claims description 16
- 230000010287 polarization Effects 0.000 claims description 7
- 229910001285 shape-memory alloy Inorganic materials 0.000 claims description 4
- 239000003302 ferromagnetic material Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 239000000853 adhesive Substances 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 12
- 238000006073 displacement reaction Methods 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000005291 magnetic effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000004621 scanning probe microscopy Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B17/00—Guiding record carriers not specifically of filamentary or web form, or of supports therefor
- G11B17/02—Details
- G11B17/022—Positioning or locking of single discs
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
- G11B9/1418—Disposition or mounting of heads or record carriers
- G11B9/1427—Disposition or mounting of heads or record carriers with provision for moving the heads or record carriers relatively to each other or for access to indexed parts without effectively imparting a relative movement
- G11B9/1436—Disposition or mounting of heads or record carriers with provision for moving the heads or record carriers relatively to each other or for access to indexed parts without effectively imparting a relative movement with provision for moving the heads or record carriers relatively to each other
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B20/00—Signal processing not specific to the method of recording or reproducing; Circuits therefor
- G11B20/10—Digital recording or reproducing
- G11B20/10009—Improvement or modification of read or write signals
- G11B20/10018—Improvement or modification of read or write signals analog processing for digital recording or reproduction
- G11B20/10027—Improvement or modification of read or write signals analog processing for digital recording or reproduction adjusting the signal strength during recording or reproduction, e.g. variable gain amplifiers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B20/00—Signal processing not specific to the method of recording or reproducing; Circuits therefor
- G11B20/10—Digital recording or reproducing
- G11B20/10009—Improvement or modification of read or write signals
- G11B20/10037—A/D conversion, D/A conversion, sampling, slicing and digital quantisation or adjusting parameters thereof
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
- G11B9/1463—Record carriers for recording or reproduction involving the use of microscopic probe means
- G11B9/149—Record carriers for recording or reproduction involving the use of microscopic probe means characterised by the memorising material or structure
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/028—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors along multiple or arbitrary translation directions, e.g. XYZ stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/872—Positioner
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Signal Processing (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP96-261292 | 1996-09-10 | ||
JP26129296A JPH10105243A (ja) | 1996-09-10 | 1996-09-10 | 位置決め機構、位置決め装置及び情報記録装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR19980024493A true KR19980024493A (ko) | 1998-07-06 |
Family
ID=17359781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970046520A KR19980024493A (ko) | 1996-09-10 | 1997-09-10 | 위치 결정 메카니즘 및 메모리 소자 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6501210B1 (ja) |
EP (1) | EP0838302B1 (ja) |
JP (1) | JPH10105243A (ja) |
KR (1) | KR19980024493A (ja) |
DE (1) | DE69713026T2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100612867B1 (ko) * | 2004-11-02 | 2006-08-14 | 삼성전자주식회사 | 탐침 어레이를 가지는 저항성 메모리 소자 및 그 제조 방법 |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7260051B1 (en) | 1998-12-18 | 2007-08-21 | Nanochip, Inc. | Molecular memory medium and molecular memory integrated circuit |
DE19961869B4 (de) * | 1999-12-22 | 2005-01-13 | Man Roland Druckmaschinen Ag | Justiervorrichtung, insbesondere für Traversen mit Bebilderungseinrichtungen für Druckformen von Druckmaschinen |
KR100396020B1 (ko) * | 2001-04-16 | 2003-08-27 | 박희재 | 초정밀 위치결정시스템 |
JP3748395B2 (ja) * | 2001-08-23 | 2006-02-22 | 株式会社日立製作所 | マイクロマニピュレータ |
DE10156491B4 (de) * | 2001-11-16 | 2005-10-20 | Fraunhofer Ges Forschung | Vorrichtung zum Abstützen eines Trägers |
US7233517B2 (en) | 2002-10-15 | 2007-06-19 | Nanochip, Inc. | Atomic probes and media for high density data storage |
US7687767B2 (en) * | 2002-12-20 | 2010-03-30 | Agilent Technologies, Inc. | Fast scanning stage for a scanning probe microscope |
JP2005004921A (ja) * | 2003-06-13 | 2005-01-06 | Alps Electric Co Ltd | 高精度位置決め装置 |
US7054153B2 (en) * | 2003-10-31 | 2006-05-30 | Hewlett-Packard Development Company, L.P. | Mount for computer drive |
US7180662B2 (en) * | 2004-04-12 | 2007-02-20 | Applied Scientific Instrumentation Inc. | Stage assembly and method for optical microscope including Z-axis stage and piezoelectric actuator for rectilinear translation of Z stage |
US7706642B2 (en) * | 2005-08-05 | 2010-04-27 | Beneficial Photonics, Inc. | Methods and devices for moving optical beams |
JP2007158276A (ja) * | 2005-12-08 | 2007-06-21 | Ngk Insulators Ltd | 圧電/電歪デバイス及び圧電/電歪デバイスの駆動方法 |
KR100876912B1 (ko) * | 2006-07-13 | 2009-01-08 | 부산대학교 산학협력단 | 변위증폭측정 메카니즘을 구비한 스테이지 |
DE102007005293A1 (de) | 2007-01-29 | 2008-08-07 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum mikromechanischen Positionieren und Manipulieren eines Objektes |
WO2008126247A1 (ja) * | 2007-03-30 | 2008-10-23 | Pioneer Corporation | 駆動装置 |
US7626846B2 (en) | 2007-07-16 | 2009-12-01 | Nanochip, Inc. | Method and media for improving ferroelectric domain stability in an information storage device |
US7876663B2 (en) * | 2007-12-13 | 2011-01-25 | International Business Machines Corporation | Scanning system for a probe storage device |
US7792010B2 (en) * | 2007-12-13 | 2010-09-07 | International Business Machines Corporation | Scanning system for a probe storage device |
US7864653B2 (en) * | 2007-12-13 | 2011-01-04 | International Business Machines Corporation | Probe storage device |
US7913376B2 (en) * | 2007-12-13 | 2011-03-29 | International Business Machines Corporation | Method of forming an actuating mechanism for a probe storage system |
US20100085863A1 (en) * | 2008-10-07 | 2010-04-08 | Nanochip, Inc. | Retuning of ferroelectric media built-in-bias |
US8427441B2 (en) | 2008-12-23 | 2013-04-23 | Research In Motion Limited | Portable electronic device and method of control |
EP2202619A1 (en) * | 2008-12-23 | 2010-06-30 | Research In Motion Limited | Portable electronic device including tactile touch-sensitive input device and method of controlling same |
US8384680B2 (en) | 2008-12-23 | 2013-02-26 | Research In Motion Limited | Portable electronic device and method of control |
JP5295814B2 (ja) * | 2009-02-17 | 2013-09-18 | オリンパス株式会社 | 走査機構および走査型プローブ顕微鏡 |
JP6253312B2 (ja) | 2012-09-10 | 2017-12-27 | キヤノン株式会社 | 制御装置、制御装置を備えるアクチュエータ、画像振れ補正装置、交換用レンズ、撮像装置、及び自動ステージ |
KR102019098B1 (ko) * | 2013-04-19 | 2019-11-04 | 엘지이노텍 주식회사 | 멤스 소자 |
JP6318960B2 (ja) * | 2014-08-05 | 2018-05-09 | 日本精工株式会社 | テーブル装置、測定装置、半導体製造装置、フラットパネルディスプレイ製造装置、及び工作機械 |
US10263173B2 (en) * | 2015-01-16 | 2019-04-16 | The Regents Of The University Of Michigan | Multi-axis piezoelectric transducer |
GB2539869A (en) * | 2015-05-07 | 2017-01-04 | Elektron Tech Uk Ltd | Nanopositioner |
KR102092864B1 (ko) | 2015-08-31 | 2020-03-24 | 삼성전자주식회사 | 센서 모듈 및 이를 포함하는 운동 보조 장치 |
CN105425548A (zh) * | 2016-01-14 | 2016-03-23 | 哈尔滨工业大学 | 基于人字形线圈排布的动线圈磁浮无线微动台矢量圆弧换台方法及装置 |
US20190107772A1 (en) * | 2017-10-11 | 2019-04-11 | Young Optics Inc. | Light combining module |
CN114512579B (zh) * | 2022-02-18 | 2022-10-11 | 广东工业大学 | 一种Mini/micro芯片柔性飞行刺晶装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3304773A (en) * | 1964-03-26 | 1967-02-21 | Vernon L Rogallo | Force transducer |
US3526726A (en) * | 1967-09-27 | 1970-09-01 | Ampex | Piezoelectric transducer assembly for positioning a magnetic record/reproduce head |
US4601539A (en) * | 1983-05-07 | 1986-07-22 | Canon Kabushiki Kaisha | Lens moving device using piezoelectric material |
JPS6018958A (ja) | 1983-07-12 | 1985-01-31 | Toshiba Corp | 固体撮像装置 |
US4520570A (en) | 1983-12-30 | 1985-06-04 | International Business Machines Corporation | Piezoelectric x-y-positioner |
EP0253375B1 (en) | 1986-07-15 | 1993-02-03 | Matsushita Electric Industrial Co., Ltd. | Two-dimensional piezoelectric actuator |
JP2839543B2 (ja) * | 1989-04-12 | 1998-12-16 | 株式会社東芝 | 変位発生装置 |
US5170089A (en) * | 1989-12-20 | 1992-12-08 | General Electric Company | Two-axis motion apparatus utilizing piezoelectric material |
JP2802828B2 (ja) | 1990-10-19 | 1998-09-24 | キヤノン株式会社 | 情報記録担体及びこれを使用する情報処理装置 |
CA2060674C (en) | 1991-02-08 | 1996-10-01 | Masahiro Tagawa | Driving apparatus and a recording and/or reproducing apparatus using the same |
JPH07111143A (ja) * | 1993-08-18 | 1995-04-25 | Jeol Ltd | スリット装置 |
US5705878A (en) * | 1995-11-29 | 1998-01-06 | Lewis; Aaron | Flat scanning stage for scanned probe microscopy |
-
1996
- 1996-09-10 JP JP26129296A patent/JPH10105243A/ja active Pending
-
1997
- 1997-08-29 US US08/924,857 patent/US6501210B1/en not_active Expired - Fee Related
- 1997-09-04 EP EP97306864A patent/EP0838302B1/en not_active Expired - Lifetime
- 1997-09-04 DE DE69713026T patent/DE69713026T2/de not_active Expired - Fee Related
- 1997-09-10 KR KR1019970046520A patent/KR19980024493A/ko not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100612867B1 (ko) * | 2004-11-02 | 2006-08-14 | 삼성전자주식회사 | 탐침 어레이를 가지는 저항성 메모리 소자 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
EP0838302A1 (en) | 1998-04-29 |
EP0838302B1 (en) | 2002-06-05 |
US6501210B1 (en) | 2002-12-31 |
DE69713026T2 (de) | 2002-09-19 |
DE69713026D1 (de) | 2002-07-11 |
JPH10105243A (ja) | 1998-04-24 |
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