KR102874085B1 - 피드백 및 피드포워드 제어를 이용한 나노임프린트 리소그래피에서의 정렬 제어 - Google Patents

피드백 및 피드포워드 제어를 이용한 나노임프린트 리소그래피에서의 정렬 제어

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Publication number
KR102874085B1
KR102874085B1 KR1020227018415A KR20227018415A KR102874085B1 KR 102874085 B1 KR102874085 B1 KR 102874085B1 KR 1020227018415 A KR1020227018415 A KR 1020227018415A KR 20227018415 A KR20227018415 A KR 20227018415A KR 102874085 B1 KR102874085 B1 KR 102874085B1
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South Korea
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information
feedforward
stage
substrate
alignment
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KR1020227018415A
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English (en)
Korean (ko)
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KR20220093169A (ko
Inventor
밍지 러우
병진 최
제프리 디. 클라인
다카히로 요시다
스티븐 티. 젠킨스
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캐논 가부시끼가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • H01L21/67092—
    • H01L21/681—
    • H01L23/544—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/53—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H01L2223/54426—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification
    • H10W46/301—Marks applied to devices, e.g. for alignment or identification for alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020227018415A 2019-12-12 2020-10-27 피드백 및 피드포워드 제어를 이용한 나노임프린트 리소그래피에서의 정렬 제어 Active KR102874085B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/712,739 2019-12-12
US16/712,739 US11422460B2 (en) 2019-12-12 2019-12-12 Alignment control in nanoimprint lithography using feedback and feedforward control
PCT/US2020/057520 WO2021118698A1 (en) 2019-12-12 2020-10-27 Alignment control in nanoimprint lithography using feedback and feedforward control

Publications (2)

Publication Number Publication Date
KR20220093169A KR20220093169A (ko) 2022-07-05
KR102874085B1 true KR102874085B1 (ko) 2025-10-22

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KR1020227018415A Active KR102874085B1 (ko) 2019-12-12 2020-10-27 피드백 및 피드포워드 제어를 이용한 나노임프린트 리소그래피에서의 정렬 제어

Country Status (6)

Country Link
US (1) US11422460B2 (https=)
JP (1) JP7589231B2 (https=)
KR (1) KR102874085B1 (https=)
CN (1) CN114667485B (https=)
TW (1) TWI794664B (https=)
WO (1) WO2021118698A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12195382B2 (en) * 2021-12-01 2025-01-14 Canon Kabushiki Kaisha Superstrate and a method of using the same
CN118610132B (zh) * 2024-08-09 2024-10-29 青岛天仁微纳科技有限责任公司 一种基于晶圆检测数据的生成设备参数调节方法及系统
CN120969152A (zh) * 2025-09-23 2025-11-18 宁波市汉鸣科技股份有限公司 压缩机抽真空同步移动控制方法及装置

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3427944B2 (ja) 1993-06-30 2003-07-22 株式会社安川電機 軌跡追従位置決め制御方法
US5459624A (en) 1993-10-26 1995-10-17 International Business Machines Corporation Activator control method and apparatus for positioning a transducer using a phase plane trajectory trough function for a direct access storage device with estimated velocity and position states
JP3501304B2 (ja) 1994-08-05 2004-03-02 株式会社安川電機 軌跡追従位置決め制御方法
US6236895B1 (en) 1998-09-02 2001-05-22 Cirrus Logic, Inc. Reference estimator in a discrete-time sliding mode controller
US6185467B1 (en) 1998-09-02 2001-02-06 Cirrus Logic, Inc. Adaptive discrete-time sliding mode controller
US6798611B1 (en) 1998-09-02 2004-09-28 Cirrus Logic, Inc. Disk storage system employing a discrete-time sliding mode controller for servo control
JP3821642B2 (ja) 1999-11-17 2006-09-13 富士通株式会社 ディスク装置のヘッド位置決め制御方法及び装置
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
JP4209373B2 (ja) * 2003-10-13 2009-01-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置またはリソグラフィ処理セルの作動方法、リソグラフィ装置およびリソグラフィ処理セル
US20060082922A1 (en) 2004-10-15 2006-04-20 Teng-Yuan Shih Trajectories-based seek
US7262831B2 (en) * 2004-12-01 2007-08-28 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
JP4290177B2 (ja) 2005-06-08 2009-07-01 キヤノン株式会社 モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法
JP4819577B2 (ja) 2006-05-31 2011-11-24 キヤノン株式会社 パターン転写方法およびパターン転写装置
JP2008089868A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 描画点データ取得方法および装置ならびに描画方法および装置
NL1036290A1 (nl) 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus.
US8279401B2 (en) * 2008-04-25 2012-10-02 Asml Netherlands B.V. Position control system, a lithographic apparatus and a method for controlling a position of a movable object
US8470188B2 (en) 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
NL2003453A (en) 2008-10-09 2010-04-12 Asml Netherlands Bv A positioning system, method, and lithographic apparatus.
US7719782B1 (en) 2009-01-07 2010-05-18 International Business Machines Corporation Fast forward magnetic tape cartridge at first mount
US9142235B1 (en) 2009-10-27 2015-09-22 Western Digital Technologies, Inc. Disk drive characterizing microactuator by injecting sinusoidal disturbance and evaluating feed-forward compensation values
NL2006981A (en) * 2010-07-26 2012-01-30 Asml Netherlands Bv Position control system, lithographic apparatus, and method to control a position of a movable object.
US8508881B1 (en) 2011-05-26 2013-08-13 Western Digital Technologies, Inc. Disk drive employing system inversion for tuning seek to settle servo loop
JP5545601B2 (ja) 2011-11-07 2014-07-09 信越化学工業株式会社 蛍光体高充填波長変換シート、それを用いた発光半導体装置の製造方法、及び該発光半導体装置
US8737013B2 (en) 2011-11-16 2014-05-27 Western Digital Technologies, Inc. Disk drive selecting disturbance signal for feed-forward compensation
US9142234B1 (en) 2012-06-08 2015-09-22 Western Digital Technologies, Inc. Disk drive employing model-based feed-forward compensation during seek settling
US8929022B1 (en) 2012-12-19 2015-01-06 Western Digital Technologies, Inc. Disk drive detecting microactuator degradation by evaluating frequency component of servo signal
US9053724B1 (en) 2013-08-19 2015-06-09 Western Digital Technologies, Inc. Disk drive actuating first head microactuator while sensing signal from second head microactuator
JP6438219B2 (ja) * 2014-06-17 2018-12-12 キヤノン株式会社 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法
US9418689B2 (en) 2014-10-09 2016-08-16 Western Digital Technologies, Inc. Data storage device generating an operating seek time profile as a function of a base seek time profile
US9208815B1 (en) 2014-10-09 2015-12-08 Western Digital Technologies, Inc. Data storage device dynamically reducing coast velocity during seek to reduce power consumption
US9111575B1 (en) 2014-10-23 2015-08-18 Western Digital Technologies, Inc. Data storage device employing adaptive feed-forward control in timing loop to compensate for vibration
JP6562795B2 (ja) 2015-02-12 2019-08-21 キヤノン株式会社 インプリント装置、および物品の製造方法
NL2016509A (en) * 2015-04-03 2016-10-10 Asml Netherlands Bv Inspection apparatus for measuring properties of a target structure, methods of operating an optical system, method of manufacturing devices.
JP2016207926A (ja) * 2015-04-27 2016-12-08 株式会社アドバンテスト 露光装置および露光方法
JP6436067B2 (ja) 2015-11-19 2018-12-12 オムロン株式会社 制御装置、制御方法、情報処理プログラム、および記録媒体
JP6694717B2 (ja) * 2016-01-25 2020-05-20 デクセリアルズ株式会社 露光装置および露光方法
US10866510B2 (en) * 2017-07-31 2020-12-15 Canon Kabushiki Kaisha Overlay improvement in nanoimprint lithography
US10409178B2 (en) 2017-12-18 2019-09-10 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography based on real-time system identification
JP7116552B2 (ja) 2018-02-13 2022-08-10 キヤノン株式会社 インプリント装置、および、物品製造方法

Also Published As

Publication number Publication date
TWI794664B (zh) 2023-03-01
CN114667485A (zh) 2022-06-24
US20210181622A1 (en) 2021-06-17
JP2023506342A (ja) 2023-02-16
US11422460B2 (en) 2022-08-23
WO2021118698A1 (en) 2021-06-17
CN114667485B (zh) 2025-08-19
KR20220093169A (ko) 2022-07-05
JP7589231B2 (ja) 2024-11-25
TW202122936A (zh) 2021-06-16

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