KR102846367B1 - 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물 - Google Patents

수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물

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Publication number
KR102846367B1
KR102846367B1 KR1020227045784A KR20227045784A KR102846367B1 KR 102846367 B1 KR102846367 B1 KR 102846367B1 KR 1020227045784 A KR1020227045784 A KR 1020227045784A KR 20227045784 A KR20227045784 A KR 20227045784A KR 102846367 B1 KR102846367 B1 KR 102846367B1
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group
resin composition
japanese patent
formula
compounds
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KR20230016676A (ko
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마사오미 마키노
타카시 카와시마
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020227045784A 2020-07-22 2021-07-19 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물 Active KR102846367B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020257026471A KR20250123943A (ko) 2020-07-22 2021-07-19 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020124897 2020-07-22
JPJP-P-2020-124897 2020-07-22
PCT/JP2021/026920 WO2022019254A1 (ja) 2020-07-22 2021-07-19 樹脂組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、樹脂および化合物

Related Child Applications (1)

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KR1020257026471A Division KR20250123943A (ko) 2020-07-22 2021-07-19 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물

Publications (2)

Publication Number Publication Date
KR20230016676A KR20230016676A (ko) 2023-02-02
KR102846367B1 true KR102846367B1 (ko) 2025-08-14

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KR1020227045784A Active KR102846367B1 (ko) 2020-07-22 2021-07-19 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물
KR1020257026471A Pending KR20250123943A (ko) 2020-07-22 2021-07-19 수지 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시 장치, 수지 및 화합물

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Country Status (4)

Country Link
JP (2) JP7515592B2 (enrdf_load_stackoverflow)
KR (2) KR102846367B1 (enrdf_load_stackoverflow)
CN (2) CN119306932A (enrdf_load_stackoverflow)
WO (1) WO2022019254A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022176788A1 (enrdf_load_stackoverflow) * 2021-02-18 2022-08-25

Citations (3)

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WO2001004170A1 (fr) 1999-07-08 2001-01-18 Mitsui Chemicals, Inc. Polymere thermoplastique contenant un groupe polaire, son utilisation et ses composes non satures contenant un groupe polaire
JP2015151465A (ja) * 2014-02-14 2015-08-24 富士フイルム株式会社 着色樹脂組成物およびこれを用いた硬化膜、カラーフィルタおよびその製造方法、固体撮像素子ならびに画像表示装置
JP2019203084A (ja) 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

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KR100813242B1 (ko) 2006-02-14 2008-03-13 삼성에스디아이 주식회사 고분자 전해질막, 이의 제조 방법 및 이를 구비한 연료전지
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WO2018123853A1 (ja) * 2016-12-26 2018-07-05 東レ株式会社 有機ｅｌ表示装置
KR102299736B1 (ko) * 2017-02-23 2021-09-08 후지필름 가부시키가이샤 감광성 조성물, 경화막, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치
CN111164512A (zh) * 2017-09-29 2020-05-15 东丽株式会社 感光性树脂组合物、固化膜、具备固化膜的元件和有机el显示器及有机el显示器的制造方法
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CN111656277A (zh) * 2018-01-31 2020-09-11 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置以及其制造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001004170A1 (fr) 1999-07-08 2001-01-18 Mitsui Chemicals, Inc. Polymere thermoplastique contenant un groupe polaire, son utilisation et ses composes non satures contenant un groupe polaire
JP2015151465A (ja) * 2014-02-14 2015-08-24 富士フイルム株式会社 着色樹脂組成物およびこれを用いた硬化膜、カラーフィルタおよびその製造方法、固体撮像素子ならびに画像表示装置
JP2019203084A (ja) 2018-05-24 2019-11-28 東洋インキＳｃホールディングス株式会社 ブロックポリマー

Also Published As

Publication number Publication date
TW202208470A (zh) 2022-03-01
JP7515592B2 (ja) 2024-07-12
JPWO2022019254A1 (enrdf_load_stackoverflow) 2022-01-27
KR20230016676A (ko) 2023-02-02
JP2024124473A (ja) 2024-09-12
CN119306932A (zh) 2025-01-14
CN115916902A (zh) 2023-04-04
KR20250123943A (ko) 2025-08-18
WO2022019254A1 (ja) 2022-01-27
JP7717231B2 (ja) 2025-08-01
CN115916902B (zh) 2024-10-22

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