KR102546435B1 - 착색제 분산액, 그것을 포함하는 감광성 수지 조성물, 및 분산 조제 - Google Patents

착색제 분산액, 그것을 포함하는 감광성 수지 조성물, 및 분산 조제 Download PDF

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KR102546435B1
KR102546435B1 KR1020160012473A KR20160012473A KR102546435B1 KR 102546435 B1 KR102546435 B1 KR 102546435B1 KR 1020160012473 A KR1020160012473 A KR 1020160012473A KR 20160012473 A KR20160012473 A KR 20160012473A KR 102546435 B1 KR102546435 B1 KR 102546435B1
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South Korea
Prior art keywords
group
substituent
colorant
pigment
formula
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KR1020160012473A
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English (en)
Korean (ko)
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KR20160096029A (ko
Inventor
에이타 스가
나오토 야마구치
다이 시오타
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도쿄 오카 고교 가부시키가이샤
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Publication of KR20160096029A publication Critical patent/KR20160096029A/ko
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Publication of KR102546435B1 publication Critical patent/KR102546435B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/002—Pigment pastes, e.g. for mixing in paints in organic medium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084—Dispersions of dyes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C219/00—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C219/02—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C219/20—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being unsaturated
    • C07C219/22—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton having esterified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/003—Pigment pastes, e.g. for mixing in paints containing an organic pigment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
KR1020160012473A 2015-02-04 2016-02-01 착색제 분산액, 그것을 포함하는 감광성 수지 조성물, 및 분산 조제 KR102546435B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015020317A JP6195584B2 (ja) 2015-02-04 2015-02-04 着色剤分散液、それを含む感光性樹脂組成物、及び分散助剤
JPJP-P-2015-020317 2015-02-04

Publications (2)

Publication Number Publication Date
KR20160096029A KR20160096029A (ko) 2016-08-12
KR102546435B1 true KR102546435B1 (ko) 2023-06-23

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KR1020160012473A KR102546435B1 (ko) 2015-02-04 2016-02-01 착색제 분산액, 그것을 포함하는 감광성 수지 조성물, 및 분산 조제

Country Status (4)

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JP (1) JP6195584B2 (ja)
KR (1) KR102546435B1 (ja)
CN (1) CN105838149B (ja)
TW (1) TWI723005B (ja)

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JP6195645B2 (ja) * 2015-07-21 2017-09-13 東京応化工業株式会社 着色感光性組成物
JP6088105B1 (ja) * 2015-08-27 2017-03-01 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
KR101788399B1 (ko) * 2015-09-23 2017-10-19 (주)경인양행 내열안정성이 우수한 옥심 에스테르 화합물, 그것을 포함하는 광중합 개시제 및 감광성 수지 조성물
JP6641468B2 (ja) * 2015-10-08 2020-02-05 常州強力電子新材料股▲分▼有限公司ＣＨＡＮＧＺＨＯＵ ＴＲＯＮＬＹ ＮＥＷ ＥＬＥＣＴＲＯＮＩＣ ＭＡＴＥＲＩＡＬＳ Ｃｏ．， Ｌｔｄ． フルオレン含有オキシムエステル類光開始剤、その合成、それを含有する感光性樹脂組成物及びその使用
JP6788971B2 (ja) * 2016-01-14 2020-11-25 東京応化工業株式会社 感光性組成物
WO2018062105A1 (ja) * 2016-09-30 2018-04-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
KR101848567B1 (ko) * 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
JP6856367B2 (ja) * 2016-11-30 2021-04-07 東京応化工業株式会社 感光性組成物、硬化膜、発光表示素子用の発光層、発光表示素子、及び発光層の形成方法
KR102121424B1 (ko) * 2016-12-02 2020-06-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치
JP7209471B2 (ja) * 2018-03-28 2023-01-20 株式会社Ｄｎｐファインケミカル 感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
CN114127638A (zh) 2019-07-10 2022-03-01 东丽株式会社 负型感光性树脂组合物、固化膜、有机el显示器及固化膜的制造方法

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KR102281546B1 (ko) * 2013-08-05 2021-07-27 도쿄 오카 고교 가부시키가이샤 안료 분산액, 그것을 포함하는 감광성 수지 조성물 및 분산 조제
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JP2014137466A (ja) * 2013-01-16 2014-07-28 Jsr Corp 感放射線性着色組成物、着色硬化膜及び表示素子

Also Published As

Publication number Publication date
JP6195584B2 (ja) 2017-09-13
TWI723005B (zh) 2021-04-01
CN105838149B (zh) 2020-11-24
CN105838149A (zh) 2016-08-10
TW201634446A (zh) 2016-10-01
KR20160096029A (ko) 2016-08-12
JP2016141770A (ja) 2016-08-08

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