KR102447933B1 - 투명 전도성 필름 및 이의 제조 방법 - Google Patents

투명 전도성 필름 및 이의 제조 방법 Download PDF

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Publication number
KR102447933B1
KR102447933B1 KR1020200183402A KR20200183402A KR102447933B1 KR 102447933 B1 KR102447933 B1 KR 102447933B1 KR 1020200183402 A KR1020200183402 A KR 1020200183402A KR 20200183402 A KR20200183402 A KR 20200183402A KR 102447933 B1 KR102447933 B1 KR 102447933B1
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KR
South Korea
Prior art keywords
layer
silver nanowire
conductive film
transparent conductive
protective layer
Prior art date
Application number
KR1020200183402A
Other languages
English (en)
Korean (ko)
Other versions
KR20220019603A (ko
Inventor
창 영-쳉
차이 웨이-팅
첸 민-유
샤오 청-친
Original Assignee
캄브리오스 필름 솔루션스 (샤먼) 코포레이션
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Application filed by 캄브리오스 필름 솔루션스 (샤먼) 코포레이션 filed Critical 캄브리오스 필름 솔루션스 (샤먼) 코포레이션
Publication of KR20220019603A publication Critical patent/KR20220019603A/ko
Application granted granted Critical
Publication of KR102447933B1 publication Critical patent/KR102447933B1/ko

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Materials For Photolithography (AREA)
KR1020200183402A 2020-08-10 2020-12-24 투명 전도성 필름 및 이의 제조 방법 KR102447933B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202010794201.9A CN114068070A (zh) 2020-08-10 2020-08-10 透明导电薄膜及其制备方法
CN202010794201.9 2020-08-10

Publications (2)

Publication Number Publication Date
KR20220019603A KR20220019603A (ko) 2022-02-17
KR102447933B1 true KR102447933B1 (ko) 2022-09-27

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200183402A KR102447933B1 (ko) 2020-08-10 2020-12-24 투명 전도성 필름 및 이의 제조 방법

Country Status (3)

Country Link
JP (1) JP2022032022A (ja)
KR (1) KR102447933B1 (ja)
CN (1) CN114068070A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022181016A1 (ja) * 2021-02-26 2022-09-01

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012178149A (ja) * 2011-02-04 2012-09-13 Shin Etsu Polymer Co Ltd 静電容量式センサーシートおよびその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102211863B1 (ko) * 2013-10-15 2021-02-04 삼성디스플레이 주식회사 터치 패널 및 터치 패널의 제조 방법
JP2015191276A (ja) * 2014-03-27 2015-11-02 デクセリアルズ株式会社 積層体、積層体の製造方法、静電容量型タッチパネル及び画像表示装置
JPWO2016167228A1 (ja) * 2015-04-15 2018-02-08 日立化成株式会社 感光性導電フィルム、導電パターンの形成方法、導電パターン付き基材、及びタッチパネルセンサ
CN110177817A (zh) * 2017-03-01 2019-08-27 株式会社艾迪科 聚合性组合物及黑色柱状间隔物用感光性组合物
JPWO2020137797A1 (ja) * 2018-12-27 2021-11-11 富士フイルム株式会社 導電性転写材料、パターンつき基板の製造方法、積層体、及びタッチパネル

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012178149A (ja) * 2011-02-04 2012-09-13 Shin Etsu Polymer Co Ltd 静電容量式センサーシートおよびその製造方法

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Publication number Publication date
CN114068070A (zh) 2022-02-18
KR20220019603A (ko) 2022-02-17
JP2022032022A (ja) 2022-02-24

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