KR102424717B1 - 미러 어레이 - Google Patents

미러 어레이 Download PDF

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Publication number
KR102424717B1
KR102424717B1 KR1020167025881A KR20167025881A KR102424717B1 KR 102424717 B1 KR102424717 B1 KR 102424717B1 KR 1020167025881 A KR1020167025881 A KR 1020167025881A KR 20167025881 A KR20167025881 A KR 20167025881A KR 102424717 B1 KR102424717 B1 KR 102424717B1
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South Korea
Prior art keywords
mirror
individual mirrors
illumination
group
mirror array
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KR1020167025881A
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Korean (ko)
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KR20160124205A (ko
Inventor
스티그 비엘링
마르쿠스 하우프
라르스 비쉬마이어
파비안 하아커
마틴 엔드레스
요하네스 아이센멩거
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
KR1020167025881A 2014-02-21 2015-02-17 미러 어레이 Active KR102424717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (2)

Publication Number Publication Date
KR20160124205A KR20160124205A (ko) 2016-10-26
KR102424717B1 true KR102424717B1 (ko) 2022-07-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025881A Active KR102424717B1 (ko) 2014-02-21 2015-02-17 미러 어레이

Country Status (5)

Country Link
US (1) US9874819B2 (https=)
JP (1) JP6568865B2 (https=)
KR (1) KR102424717B1 (https=)
DE (1) DE102014203189A1 (https=)
WO (1) WO2015124555A1 (https=)

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CN108535839B (zh) 2013-07-04 2022-02-08 核心光电有限公司 小型长焦透镜套件
CN105917641B (zh) 2013-08-01 2018-10-19 核心光电有限公司 具有自动聚焦的纤薄多孔径成像系统及其使用方法
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
CN112327463B (zh) 2015-01-03 2022-10-14 核心光电有限公司 微型长焦镜头模块和使用该镜头模块的相机
KR102078978B1 (ko) 2015-04-16 2020-02-19 코어포토닉스 리미티드 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화
US10230898B2 (en) 2015-08-13 2019-03-12 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
WO2017208090A1 (en) 2016-05-30 2017-12-07 Corephotonics Ltd. Rotational ball-guided voice coil motor
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EP4224233B1 (en) 2016-07-07 2024-12-11 Corephotonics Ltd. Linear ball guided voice coil motor for folded optic
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WO2018122650A1 (en) 2016-12-28 2018-07-05 Corephotonics Ltd. Folded camera structure with an extended light-folding-element scanning range
CN113805406A (zh) 2017-01-12 2021-12-17 核心光电有限公司 紧凑型折叠式摄影机及其组装方法
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WO2018167581A1 (en) 2017-03-15 2018-09-20 Corephotonics Ltd. Camera with panoramic scanning range
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KR102242452B1 (ko) 2018-02-05 2021-04-20 코어포토닉스 리미티드 폴디드 카메라에 대한 감소된 높이 페널티
WO2019155289A1 (en) 2018-02-12 2019-08-15 Corephotonics Ltd. Folded camera with optical image stabilization
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EP3864451A4 (en) * 2018-10-10 2022-06-22 Vyas, Trilok ULTRA-EFFICIENT VERTICAL VILLANOVA WINDMILL SYSTEM AND PROCESS
WO2020144528A1 (en) 2019-01-07 2020-07-16 Corephotonics Ltd. Rotation mechanism with sliding joint
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EP3837662A4 (en) 2019-07-31 2021-12-15 Corephotonics Ltd. SYSTEM AND METHOD FOR GENERATING BACKGROUND BLUR DURING CAMERA PAN or MOVEMENT
CN114667469B (zh) 2019-12-03 2024-11-26 核心光电有限公司 提供扩展的二自由度旋转范围的致动器
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
KR102811003B1 (ko) 2020-02-22 2025-05-20 코어포토닉스 리미티드 매크로 촬영을 위한 분할 스크린 기능
KR102732454B1 (ko) 2020-04-26 2024-11-20 코어포토닉스 리미티드 홀 바 센서 보정을 위한 온도 제어
EP4058978B1 (en) 2020-05-17 2024-07-03 Corephotonics Ltd. Image stitching in the presence of a full field of view reference image
CN114080565B (zh) 2020-05-30 2024-01-19 核心光电有限公司 用于获得超微距图像的系统和方法
CN119583939A (zh) 2020-07-15 2025-03-07 核心光电有限公司 移动电子装置
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
KR102778426B1 (ko) 2020-07-31 2025-03-06 코어포토닉스 리미티드 큰 스트로크 선형 위치 감지를 위한 홀 센서-자석 구조
CN116679419A (zh) 2020-08-12 2023-09-01 核心光电有限公司 用于光学防抖的装置和方法
KR20250165686A (ko) 2021-03-11 2025-11-26 코어포토닉스 리미티드 팝-아웃 카메라 시스템
EP4726455A2 (en) 2021-06-08 2026-04-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
KR102666903B1 (ko) 2021-07-21 2024-05-16 코어포토닉스 리미티드 팝-아웃 모바일 카메라 및 액추에이터
CN121091576A (zh) 2022-03-24 2025-12-09 核心光电有限公司 薄型紧凑透镜光学图像稳定
DE102022203369A1 (de) * 2022-04-05 2023-10-05 Carl Zeiss Smt Gmbh Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
WO2024037916A1 (en) * 2022-08-16 2024-02-22 Carl Zeiss Smt Gmbh Micro-optical element
DE102022209427A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
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JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

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JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
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Also Published As

Publication number Publication date
JP2017509918A (ja) 2017-04-06
US20160342095A1 (en) 2016-11-24
JP6568865B2 (ja) 2019-08-28
KR20160124205A (ko) 2016-10-26
WO2015124555A1 (de) 2015-08-27
US9874819B2 (en) 2018-01-23
DE102014203189A1 (de) 2015-08-27

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