KR102424717B1 - 미러 어레이 - Google Patents

미러 어레이 Download PDF

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Publication number
KR102424717B1
KR102424717B1 KR1020167025881A KR20167025881A KR102424717B1 KR 102424717 B1 KR102424717 B1 KR 102424717B1 KR 1020167025881 A KR1020167025881 A KR 1020167025881A KR 20167025881 A KR20167025881 A KR 20167025881A KR 102424717 B1 KR102424717 B1 KR 102424717B1
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South Korea
Prior art keywords
mirror
individual mirrors
illumination
group
mirror array
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Korean (ko)
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KR20160124205A (ko
Inventor
스티그 비엘링
마르쿠스 하우프
라르스 비쉬마이어
파비안 하아커
마틴 엔드레스
요하네스 아이센멩거
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
KR1020167025881A 2014-02-21 2015-02-17 미러 어레이 Active KR102424717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (2)

Publication Number Publication Date
KR20160124205A KR20160124205A (ko) 2016-10-26
KR102424717B1 true KR102424717B1 (ko) 2022-07-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025881A Active KR102424717B1 (ko) 2014-02-21 2015-02-17 미러 어레이

Country Status (5)

Country Link
US (1) US9874819B2 (https=)
JP (1) JP6568865B2 (https=)
KR (1) KR102424717B1 (https=)
DE (1) DE102014203189A1 (https=)
WO (1) WO2015124555A1 (https=)

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US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
CN112327463B (zh) 2015-01-03 2022-10-14 核心光电有限公司 微型长焦镜头模块和使用该镜头模块的相机
KR102088603B1 (ko) 2015-04-16 2020-03-13 코어포토닉스 리미티드 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화
EP4425424A3 (en) 2015-08-13 2024-11-20 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
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KR102903119B1 (ko) 2016-07-07 2025-12-22 코어포토닉스 리미티드 폴디드 옵틱용 선형 볼 가이드 보이스 코일 모터
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DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
KR102365748B1 (ko) 2019-07-31 2022-02-23 코어포토닉스 리미티드 카메라 패닝 또는 모션에서 배경 블러링을 생성하는 시스템 및 방법
EP4045959B1 (en) 2019-12-03 2025-02-05 Corephotonics Ltd. Actuators for providing an extended two-degree of freedom rotation range
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
KR102811003B1 (ko) 2020-02-22 2025-05-20 코어포토닉스 리미티드 매크로 촬영을 위한 분할 스크린 기능
EP4097773A4 (en) 2020-04-26 2023-11-01 Corephotonics Ltd. TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION
CN117372248A (zh) 2020-05-17 2024-01-09 核心光电有限公司 全视场参考图像的图像拼接
KR20250156831A (ko) 2020-05-30 2025-11-03 코어포토닉스 리미티드 슈퍼 매크로 이미지를 얻기 위한 시스템 및 방법
CN119355935A (zh) 2020-07-15 2025-01-24 核心光电有限公司 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的方法
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
CN114270145B (zh) 2020-07-31 2024-05-17 核心光电有限公司 用于大行程线性位置感测的霍尔传感器-磁体几何结构
KR102598070B1 (ko) 2020-08-12 2023-11-02 코어포토닉스 리미티드 스캐닝 폴디드 카메라의 광학 이미지 안정화
TWI888016B (zh) 2021-03-11 2025-06-21 以色列商核心光電有限公司 彈出式照相機系統
EP4726455A2 (en) 2021-06-08 2026-04-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
KR102940165B1 (ko) 2021-07-21 2026-03-16 코어포토닉스 리미티드 팝-아웃 모바일 카메라 및 액추에이터
EP4500266A1 (en) 2022-03-24 2025-02-05 Corephotonics Ltd. Slim compact lens optical image stabilization
DE102022203369A1 (de) * 2022-04-05 2023-10-05 Carl Zeiss Smt Gmbh Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
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JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

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Also Published As

Publication number Publication date
WO2015124555A1 (de) 2015-08-27
US20160342095A1 (en) 2016-11-24
JP2017509918A (ja) 2017-04-06
JP6568865B2 (ja) 2019-08-28
KR20160124205A (ko) 2016-10-26
DE102014203189A1 (de) 2015-08-27
US9874819B2 (en) 2018-01-23

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