DE102014203189A1 - Spiegel-Array - Google Patents
Spiegel-Array Download PDFInfo
- Publication number
- DE102014203189A1 DE102014203189A1 DE102014203189.3A DE102014203189A DE102014203189A1 DE 102014203189 A1 DE102014203189 A1 DE 102014203189A1 DE 102014203189 A DE102014203189 A DE 102014203189A DE 102014203189 A1 DE102014203189 A1 DE 102014203189A1
- Authority
- DE
- Germany
- Prior art keywords
- mirror
- individual mirrors
- illumination
- individual
- facet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 claims description 90
- 230000005855 radiation Effects 0.000 claims description 60
- 238000006073 displacement reaction Methods 0.000 claims description 46
- 238000003491 array Methods 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 29
- 238000012937 correction Methods 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 18
- 238000009826 distribution Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000001393 microlithography Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 76
- 210000001747 pupil Anatomy 0.000 description 43
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000011888 foil Substances 0.000 description 9
- 101150095130 URAD gene Proteins 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 230000005294 ferromagnetic effect Effects 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 238000009304 pastoral farming Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000011449 brick Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QLJCFNUYUJEXET-UHFFFAOYSA-K aluminum;trinitrite Chemical compound [Al+3].[O-]N=O.[O-]N=O.[O-]N=O QLJCFNUYUJEXET-UHFFFAOYSA-K 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Gyroscopes (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014203189.3A DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
| JP2016553587A JP6568865B2 (ja) | 2014-02-21 | 2015-02-17 | ミラーアレイ |
| KR1020167025881A KR102424717B1 (ko) | 2014-02-21 | 2015-02-17 | 미러 어레이 |
| PCT/EP2015/053287 WO2015124555A1 (de) | 2014-02-21 | 2015-02-17 | Spiegel-array |
| US15/226,358 US9874819B2 (en) | 2014-02-21 | 2016-08-02 | Mirror array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014203189.3A DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102014203189A1 true DE102014203189A1 (de) | 2015-08-27 |
Family
ID=52595296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102014203189.3A Ceased DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9874819B2 (https=) |
| JP (1) | JP6568865B2 (https=) |
| KR (1) | KR102424717B1 (https=) |
| DE (1) | DE102014203189A1 (https=) |
| WO (1) | WO2015124555A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019206865A1 (de) * | 2019-05-13 | 2020-11-19 | Carl Zeiss Smt Gmbh | Verfahren zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| DE102022209427A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen |
| DE102022209411A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen |
| DE102023126597A1 (de) * | 2023-09-29 | 2025-04-03 | Carl Zeiss Smt Gmbh | Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105308947B (zh) | 2013-06-13 | 2018-10-02 | 核心光电有限公司 | 双孔径变焦数字摄影机 |
| CN108535839B (zh) | 2013-07-04 | 2022-02-08 | 核心光电有限公司 | 小型长焦透镜套件 |
| CN105917641B (zh) | 2013-08-01 | 2018-10-19 | 核心光电有限公司 | 具有自动聚焦的纤薄多孔径成像系统及其使用方法 |
| US9392188B2 (en) | 2014-08-10 | 2016-07-12 | Corephotonics Ltd. | Zoom dual-aperture camera with folded lens |
| CN112327463B (zh) | 2015-01-03 | 2022-10-14 | 核心光电有限公司 | 微型长焦镜头模块和使用该镜头模块的相机 |
| KR102078978B1 (ko) | 2015-04-16 | 2020-02-19 | 코어포토닉스 리미티드 | 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화 |
| US10230898B2 (en) | 2015-08-13 | 2019-03-12 | Corephotonics Ltd. | Dual aperture zoom camera with video support and switching / non-switching dynamic control |
| WO2017208090A1 (en) | 2016-05-30 | 2017-12-07 | Corephotonics Ltd. | Rotational ball-guided voice coil motor |
| KR20240036133A (ko) | 2016-06-19 | 2024-03-19 | 코어포토닉스 리미티드 | 듀얼 애퍼처 카메라 시스템에서의 프레임 동기화 |
| EP4224233B1 (en) | 2016-07-07 | 2024-12-11 | Corephotonics Ltd. | Linear ball guided voice coil motor for folded optic |
| DE102016217735A1 (de) * | 2016-09-16 | 2018-03-22 | Carl Zeiss Smt Gmbh | Komponente für eine Spiegelanordnung für die EUV-Lithographie |
| WO2018122650A1 (en) | 2016-12-28 | 2018-07-05 | Corephotonics Ltd. | Folded camera structure with an extended light-folding-element scanning range |
| CN113805406A (zh) | 2017-01-12 | 2021-12-17 | 核心光电有限公司 | 紧凑型折叠式摄影机及其组装方法 |
| US11111133B1 (en) * | 2017-01-30 | 2021-09-07 | Mirrorcle Technologies, Inc. | MEMS actuators with improved performance and cooling |
| WO2018167581A1 (en) | 2017-03-15 | 2018-09-20 | Corephotonics Ltd. | Camera with panoramic scanning range |
| CN113075837B (zh) | 2017-11-23 | 2022-04-12 | 核心光电有限公司 | 摄影机及制法、移动电子设备及减小凸起占用空间的方法 |
| KR102242452B1 (ko) | 2018-02-05 | 2021-04-20 | 코어포토닉스 리미티드 | 폴디드 카메라에 대한 감소된 높이 페널티 |
| WO2019155289A1 (en) | 2018-02-12 | 2019-08-15 | Corephotonics Ltd. | Folded camera with optical image stabilization |
| US11268829B2 (en) | 2018-04-23 | 2022-03-08 | Corephotonics Ltd | Optical-path folding-element with an extended two degree of freedom rotation range |
| CN112272829B (zh) * | 2018-07-04 | 2025-04-08 | 核心光电有限公司 | 用于汽车或监控应用具有扫描光路折叠元件的相机 |
| WO2020039302A1 (en) | 2018-08-22 | 2020-02-27 | Corephotonics Ltd. | Two-state zoom folded camera |
| EP3864451A4 (en) * | 2018-10-10 | 2022-06-22 | Vyas, Trilok | ULTRA-EFFICIENT VERTICAL VILLANOVA WINDMILL SYSTEM AND PROCESS |
| WO2020144528A1 (en) | 2019-01-07 | 2020-07-16 | Corephotonics Ltd. | Rotation mechanism with sliding joint |
| EP3837662A4 (en) | 2019-07-31 | 2021-12-15 | Corephotonics Ltd. | SYSTEM AND METHOD FOR GENERATING BACKGROUND BLUR DURING CAMERA PAN or MOVEMENT |
| CN114667469B (zh) | 2019-12-03 | 2024-11-26 | 核心光电有限公司 | 提供扩展的二自由度旋转范围的致动器 |
| US11949976B2 (en) | 2019-12-09 | 2024-04-02 | Corephotonics Ltd. | Systems and methods for obtaining a smart panoramic image |
| KR102811003B1 (ko) | 2020-02-22 | 2025-05-20 | 코어포토닉스 리미티드 | 매크로 촬영을 위한 분할 스크린 기능 |
| KR102732454B1 (ko) | 2020-04-26 | 2024-11-20 | 코어포토닉스 리미티드 | 홀 바 센서 보정을 위한 온도 제어 |
| EP4058978B1 (en) | 2020-05-17 | 2024-07-03 | Corephotonics Ltd. | Image stitching in the presence of a full field of view reference image |
| CN114080565B (zh) | 2020-05-30 | 2024-01-19 | 核心光电有限公司 | 用于获得超微距图像的系统和方法 |
| CN119583939A (zh) | 2020-07-15 | 2025-03-07 | 核心光电有限公司 | 移动电子装置 |
| US11637977B2 (en) | 2020-07-15 | 2023-04-25 | Corephotonics Ltd. | Image sensors and sensing methods to obtain time-of-flight and phase detection information |
| KR102778426B1 (ko) | 2020-07-31 | 2025-03-06 | 코어포토닉스 리미티드 | 큰 스트로크 선형 위치 감지를 위한 홀 센서-자석 구조 |
| CN116679419A (zh) | 2020-08-12 | 2023-09-01 | 核心光电有限公司 | 用于光学防抖的装置和方法 |
| KR20250165686A (ko) | 2021-03-11 | 2025-11-26 | 코어포토닉스 리미티드 | 팝-아웃 카메라 시스템 |
| EP4726455A2 (en) | 2021-06-08 | 2026-04-15 | Corephotonics Ltd. | Systems and cameras for tilting a focal plane of a super-macro image |
| KR102666903B1 (ko) | 2021-07-21 | 2024-05-16 | 코어포토닉스 리미티드 | 팝-아웃 모바일 카메라 및 액추에이터 |
| CN121091576A (zh) | 2022-03-24 | 2025-12-09 | 核心光电有限公司 | 薄型紧凑透镜光学图像稳定 |
| DE102022203369A1 (de) * | 2022-04-05 | 2023-10-05 | Carl Zeiss Smt Gmbh | Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln |
| WO2024037916A1 (en) * | 2022-08-16 | 2024-02-22 | Carl Zeiss Smt Gmbh | Micro-optical element |
| DE102022212168A1 (de) | 2022-11-16 | 2024-05-16 | Carl Zeiss Smt Gmbh | EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage |
| DE102022212167A1 (de) | 2022-11-16 | 2023-09-14 | Carl Zeiss Smt Gmbh | EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US7145269B2 (en) | 2004-03-10 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, Lorentz actuator, and device manufacturing method |
| WO2007134574A1 (de) | 2006-05-18 | 2007-11-29 | Institut Für Automatisierung Und Informatik Gmbh | Elektromotorische einrichtung zur betätigung von gaswechselventilen |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2012130768A2 (en) | 2011-03-25 | 2012-10-04 | Carl Zeiss Smt Gmbh | Mirror array |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007052256A (ja) * | 2005-08-18 | 2007-03-01 | Fujifilm Corp | 回転変位型光変調素子及びこれを用いた光学装置 |
| US7804603B2 (en) * | 2006-10-03 | 2010-09-28 | Asml Netherlands B.V. | Measurement apparatus and method |
| US20080100816A1 (en) * | 2006-10-31 | 2008-05-01 | Asml Netherlands B.V. | Lithographic apparatus and method |
| KR101440762B1 (ko) * | 2007-02-06 | 2014-09-17 | 칼 짜이스 에스엠테 게엠베하 | 마이크로리소그래피 투영 노광 장치의 조명 시스템 내의 다수의 미러 어레이들을 감시하는 방법 및 장치 |
| JP5329520B2 (ja) * | 2007-03-27 | 2013-10-30 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 低角度で入射する補正光を用いる補正光学素子 |
| JP5487118B2 (ja) * | 2008-02-15 | 2014-05-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| DE102009033223A1 (de) * | 2008-10-31 | 2010-05-06 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithographie |
| DE102010040811A1 (de) * | 2010-09-15 | 2012-03-15 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| DE102012213515A1 (de) * | 2012-08-01 | 2014-02-06 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102014203188A1 (de) * | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage |
-
2014
- 2014-02-21 DE DE102014203189.3A patent/DE102014203189A1/de not_active Ceased
-
2015
- 2015-02-17 JP JP2016553587A patent/JP6568865B2/ja active Active
- 2015-02-17 KR KR1020167025881A patent/KR102424717B1/ko active Active
- 2015-02-17 WO PCT/EP2015/053287 patent/WO2015124555A1/de not_active Ceased
-
2016
- 2016-08-02 US US15/226,358 patent/US9874819B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US7145269B2 (en) | 2004-03-10 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, Lorentz actuator, and device manufacturing method |
| WO2007134574A1 (de) | 2006-05-18 | 2007-11-29 | Institut Für Automatisierung Und Informatik Gmbh | Elektromotorische einrichtung zur betätigung von gaswechselventilen |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2012130768A2 (en) | 2011-03-25 | 2012-10-04 | Carl Zeiss Smt Gmbh | Mirror array |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019206865A1 (de) * | 2019-05-13 | 2020-11-19 | Carl Zeiss Smt Gmbh | Verfahren zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| DE102019206865B4 (de) | 2019-05-13 | 2024-09-12 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| US12164102B2 (en) | 2019-05-13 | 2024-12-10 | Carl Zeiss Smt Gmbh | Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system |
| DE102022209427A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen |
| WO2024052172A1 (de) | 2022-09-09 | 2024-03-14 | Robert Bosch Gmbh | Mikrospiegelanordnung mit federnd gelagerten einzelspiegelelementen |
| DE102022209411A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen |
| WO2024052150A1 (de) | 2022-09-09 | 2024-03-14 | Robert Bosch Gmbh | Mikrospiegelanordnung mit einer anzahl von einzelspiegelelementen |
| DE102023126597A1 (de) * | 2023-09-29 | 2025-04-03 | Carl Zeiss Smt Gmbh | Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017509918A (ja) | 2017-04-06 |
| US20160342095A1 (en) | 2016-11-24 |
| JP6568865B2 (ja) | 2019-08-28 |
| KR20160124205A (ko) | 2016-10-26 |
| WO2015124555A1 (de) | 2015-08-27 |
| US9874819B2 (en) | 2018-01-23 |
| KR102424717B1 (ko) | 2022-07-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102014203189A1 (de) | Spiegel-Array | |
| DE102014203188A1 (de) | Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage | |
| EP3485313B1 (de) | Sensor-einrichtung | |
| DE102011003928B4 (de) | Beleuchtungsoptik für die Projektionslithographie | |
| DE102013201509A1 (de) | Optisches Bauelement | |
| DE102011006100A1 (de) | Spiegel-Array | |
| DE102013201506A1 (de) | Optisches Bauelement | |
| CN101446773A (zh) | 无掩膜光子电子点格栅阵列光刻机 | |
| DE102013209442A1 (de) | Optisches Bauelement | |
| WO2018177724A1 (de) | Optisches system sowie verfahren | |
| DE102018203925A1 (de) | Strahlformungs- und Beleuchtungssystem für eine Lithographieanlage und Verfahren | |
| TWI283435B (en) | Lithographic apparatus and device manufacturing method | |
| EP2841977B1 (de) | Optisches bauelement zur führung eines strahlungsbündels | |
| DE102014202755A1 (de) | Verfahren zur Verlagerung mindestens eines optischen Bauelements | |
| DE102018201457A1 (de) | Beleuchtungsoptik für die Projektionslithographie | |
| WO2026068465A1 (de) | Ansteuervorrichtung, optisches system und lithographieanlage | |
| DE102011006003A1 (de) | Beleuchtungsoptik zum Einsatz in einer Projektionsbelichtungsanlage für die Mikrolithografie | |
| JP2006049898A (ja) | リソグラフィ装置及びデバイス製造方法 | |
| WO2024223536A1 (de) | Einzelspiegel für einen facettenspiegel einer beleuchtungsoptik einer projektionsbelichtungsanlage | |
| DE102013213842A1 (de) | Optisches Bauelement | |
| DE102015220144A1 (de) | Optisches System und Lithographieanlage | |
| DE102021202768A1 (de) | Facettensystem und lithographieanlage | |
| DE102012207048A1 (de) | Verfahren zur Herstellung einer optischen Baugruppe | |
| DE102012206609B4 (de) | Strahlführungsoptik für ein Vielstrahlsystem sowie Verfahren | |
| DE102022203438B4 (de) | Optische Anordnung, optisches Modul, optische Abbildungseinrichtung und -verfahren, Verfahren zum Abstützen eines optischen Elements, mit aktiv verkippbarem optischem Element |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: G02B0005090000 Ipc: G02B0026080000 |
|
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |