DE102014203189A1 - Spiegel-Array - Google Patents
Spiegel-Array Download PDFInfo
- Publication number
- DE102014203189A1 DE102014203189A1 DE102014203189.3A DE102014203189A DE102014203189A1 DE 102014203189 A1 DE102014203189 A1 DE 102014203189A1 DE 102014203189 A DE102014203189 A DE 102014203189A DE 102014203189 A1 DE102014203189 A1 DE 102014203189A1
- Authority
- DE
- Germany
- Prior art keywords
- mirror
- individual mirrors
- illumination
- individual
- facet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
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- 238000012937 correction Methods 0.000 claims description 27
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- 238000009826 distribution Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 10
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- 229910052751 metal Inorganic materials 0.000 description 11
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
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- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QLJCFNUYUJEXET-UHFFFAOYSA-K aluminum;trinitrite Chemical compound [Al+3].[O-]N=O.[O-]N=O.[O-]N=O QLJCFNUYUJEXET-UHFFFAOYSA-K 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Gyroscopes (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014203189.3A DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
| JP2016553587A JP6568865B2 (ja) | 2014-02-21 | 2015-02-17 | ミラーアレイ |
| KR1020167025881A KR102424717B1 (ko) | 2014-02-21 | 2015-02-17 | 미러 어레이 |
| PCT/EP2015/053287 WO2015124555A1 (de) | 2014-02-21 | 2015-02-17 | Spiegel-array |
| US15/226,358 US9874819B2 (en) | 2014-02-21 | 2016-08-02 | Mirror array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014203189.3A DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102014203189A1 true DE102014203189A1 (de) | 2015-08-27 |
Family
ID=52595296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102014203189.3A Ceased DE102014203189A1 (de) | 2014-02-21 | 2014-02-21 | Spiegel-Array |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9874819B2 (https=) |
| JP (1) | JP6568865B2 (https=) |
| KR (1) | KR102424717B1 (https=) |
| DE (1) | DE102014203189A1 (https=) |
| WO (1) | WO2015124555A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019206865A1 (de) * | 2019-05-13 | 2020-11-19 | Carl Zeiss Smt Gmbh | Verfahren zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| DE102022209427A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen |
| DE102022209411A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen |
| DE102023126597A1 (de) * | 2023-09-29 | 2025-04-03 | Carl Zeiss Smt Gmbh | Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9185291B1 (en) | 2013-06-13 | 2015-11-10 | Corephotonics Ltd. | Dual aperture zoom digital camera |
| CN108535839B (zh) | 2013-07-04 | 2022-02-08 | 核心光电有限公司 | 小型长焦透镜套件 |
| CN108989649B (zh) | 2013-08-01 | 2021-03-19 | 核心光电有限公司 | 具有自动聚焦的纤薄多孔径成像系统及其使用方法 |
| US9392188B2 (en) | 2014-08-10 | 2016-07-12 | Corephotonics Ltd. | Zoom dual-aperture camera with folded lens |
| CN112327463B (zh) | 2015-01-03 | 2022-10-14 | 核心光电有限公司 | 微型长焦镜头模块和使用该镜头模块的相机 |
| KR102088603B1 (ko) | 2015-04-16 | 2020-03-13 | 코어포토닉스 리미티드 | 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화 |
| EP4425424A3 (en) | 2015-08-13 | 2024-11-20 | Corephotonics Ltd. | Dual aperture zoom camera with video support and switching / non-switching dynamic control |
| US10488631B2 (en) | 2016-05-30 | 2019-11-26 | Corephotonics Ltd. | Rotational ball-guided voice coil motor |
| KR20240036133A (ko) | 2016-06-19 | 2024-03-19 | 코어포토닉스 리미티드 | 듀얼 애퍼처 카메라 시스템에서의 프레임 동기화 |
| KR102903119B1 (ko) | 2016-07-07 | 2025-12-22 | 코어포토닉스 리미티드 | 폴디드 옵틱용 선형 볼 가이드 보이스 코일 모터 |
| DE102016217735A1 (de) * | 2016-09-16 | 2018-03-22 | Carl Zeiss Smt Gmbh | Komponente für eine Spiegelanordnung für die EUV-Lithographie |
| WO2018122650A1 (en) | 2016-12-28 | 2018-07-05 | Corephotonics Ltd. | Folded camera structure with an extended light-folding-element scanning range |
| US10884321B2 (en) | 2017-01-12 | 2021-01-05 | Corephotonics Ltd. | Compact folded camera |
| US11111133B1 (en) * | 2017-01-30 | 2021-09-07 | Mirrorcle Technologies, Inc. | MEMS actuators with improved performance and cooling |
| CN114137791A (zh) | 2017-03-15 | 2022-03-04 | 核心光电有限公司 | 具有全景扫瞄范围的照相装置及移动装置 |
| KR102456315B1 (ko) | 2017-11-23 | 2022-10-18 | 코어포토닉스 리미티드 | 컴팩트 폴디드 카메라 구조 |
| EP3848749A1 (en) | 2018-02-05 | 2021-07-14 | Corephotonics Ltd. | Reduced height penalty for folded camera |
| US11640047B2 (en) | 2018-02-12 | 2023-05-02 | Corephotonics Ltd. | Folded camera with optical image stabilization |
| KR102795759B1 (ko) | 2018-04-23 | 2025-04-11 | 코어포토닉스 리미티드 | 연장된 2 자유도 회전 범위를 갖는 광학 경로 폴딩 요소 |
| KR102912051B1 (ko) * | 2018-07-04 | 2026-01-13 | 코어포토닉스 리미티드 | 자동차 또는 감시 애플리케이션을 위한 스캐닝 광학 경로 폴딩 요소들을 구비하는 카메라 |
| US11635596B2 (en) | 2018-08-22 | 2023-04-25 | Corephotonics Ltd. | Two-state zoom folded camera |
| WO2020077154A1 (en) * | 2018-10-10 | 2020-04-16 | Vyas Trilok | Villanova ultra efficient vertical windmill system and method |
| WO2020144528A1 (en) | 2019-01-07 | 2020-07-16 | Corephotonics Ltd. | Rotation mechanism with sliding joint |
| KR102365748B1 (ko) | 2019-07-31 | 2022-02-23 | 코어포토닉스 리미티드 | 카메라 패닝 또는 모션에서 배경 블러링을 생성하는 시스템 및 방법 |
| EP4045959B1 (en) | 2019-12-03 | 2025-02-05 | Corephotonics Ltd. | Actuators for providing an extended two-degree of freedom rotation range |
| US11949976B2 (en) | 2019-12-09 | 2024-04-02 | Corephotonics Ltd. | Systems and methods for obtaining a smart panoramic image |
| KR102811003B1 (ko) | 2020-02-22 | 2025-05-20 | 코어포토닉스 리미티드 | 매크로 촬영을 위한 분할 스크린 기능 |
| EP4097773A4 (en) | 2020-04-26 | 2023-11-01 | Corephotonics Ltd. | TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION |
| CN117372248A (zh) | 2020-05-17 | 2024-01-09 | 核心光电有限公司 | 全视场参考图像的图像拼接 |
| KR20250156831A (ko) | 2020-05-30 | 2025-11-03 | 코어포토닉스 리미티드 | 슈퍼 매크로 이미지를 얻기 위한 시스템 및 방법 |
| CN119355935A (zh) | 2020-07-15 | 2025-01-24 | 核心光电有限公司 | 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的方法 |
| US11637977B2 (en) | 2020-07-15 | 2023-04-25 | Corephotonics Ltd. | Image sensors and sensing methods to obtain time-of-flight and phase detection information |
| CN114270145B (zh) | 2020-07-31 | 2024-05-17 | 核心光电有限公司 | 用于大行程线性位置感测的霍尔传感器-磁体几何结构 |
| KR102598070B1 (ko) | 2020-08-12 | 2023-11-02 | 코어포토닉스 리미티드 | 스캐닝 폴디드 카메라의 광학 이미지 안정화 |
| TWI888016B (zh) | 2021-03-11 | 2025-06-21 | 以色列商核心光電有限公司 | 彈出式照相機系統 |
| EP4726455A2 (en) | 2021-06-08 | 2026-04-15 | Corephotonics Ltd. | Systems and cameras for tilting a focal plane of a super-macro image |
| KR102940165B1 (ko) | 2021-07-21 | 2026-03-16 | 코어포토닉스 리미티드 | 팝-아웃 모바일 카메라 및 액추에이터 |
| EP4500266A1 (en) | 2022-03-24 | 2025-02-05 | Corephotonics Ltd. | Slim compact lens optical image stabilization |
| DE102022203369A1 (de) * | 2022-04-05 | 2023-10-05 | Carl Zeiss Smt Gmbh | Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln |
| EP4573403A1 (en) * | 2022-08-16 | 2025-06-25 | Carl Zeiss SMT GmbH | Micro-optical element |
| DE102022212168A1 (de) | 2022-11-16 | 2024-05-16 | Carl Zeiss Smt Gmbh | EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage |
| DE102022212167A1 (de) | 2022-11-16 | 2023-09-14 | Carl Zeiss Smt Gmbh | EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage |
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| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US7145269B2 (en) | 2004-03-10 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, Lorentz actuator, and device manufacturing method |
| WO2007134574A1 (de) | 2006-05-18 | 2007-11-29 | Institut Für Automatisierung Und Informatik Gmbh | Elektromotorische einrichtung zur betätigung von gaswechselventilen |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2012130768A2 (en) | 2011-03-25 | 2012-10-04 | Carl Zeiss Smt Gmbh | Mirror array |
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| JP2007052256A (ja) | 2005-08-18 | 2007-03-01 | Fujifilm Corp | 回転変位型光変調素子及びこれを用いた光学装置 |
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| US20080100816A1 (en) * | 2006-10-31 | 2008-05-01 | Asml Netherlands B.V. | Lithographic apparatus and method |
| WO2008095695A2 (de) * | 2007-02-06 | 2008-08-14 | Carl Zeiss Smt Ag | Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage |
| JP5329520B2 (ja) * | 2007-03-27 | 2013-10-30 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 低角度で入射する補正光を用いる補正光学素子 |
| EP2243047B1 (en) * | 2008-02-15 | 2021-03-31 | Carl Zeiss SMT GmbH | Facet mirror for use in a projection exposure apparatus for microlithography |
| KR101258344B1 (ko) * | 2008-10-31 | 2013-04-30 | 칼 짜이스 에스엠티 게엠베하 | Ｅｕｖ 마이크로리소그래피용 조명 광학 기기 |
| DE102010040811A1 (de) * | 2010-09-15 | 2012-03-15 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| DE102012213515A1 (de) * | 2012-08-01 | 2014-02-06 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102014203188A1 (de) * | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage |
-
2014
- 2014-02-21 DE DE102014203189.3A patent/DE102014203189A1/de not_active Ceased
-
2015
- 2015-02-17 JP JP2016553587A patent/JP6568865B2/ja active Active
- 2015-02-17 KR KR1020167025881A patent/KR102424717B1/ko active Active
- 2015-02-17 WO PCT/EP2015/053287 patent/WO2015124555A1/de not_active Ceased
-
2016
- 2016-08-02 US US15/226,358 patent/US9874819B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US7145269B2 (en) | 2004-03-10 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus, Lorentz actuator, and device manufacturing method |
| WO2007134574A1 (de) | 2006-05-18 | 2007-11-29 | Institut Für Automatisierung Und Informatik Gmbh | Elektromotorische einrichtung zur betätigung von gaswechselventilen |
| WO2010049076A2 (de) | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
| DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2012130768A2 (en) | 2011-03-25 | 2012-10-04 | Carl Zeiss Smt Gmbh | Mirror array |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019206865A1 (de) * | 2019-05-13 | 2020-11-19 | Carl Zeiss Smt Gmbh | Verfahren zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| DE102019206865B4 (de) | 2019-05-13 | 2024-09-12 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system |
| US12164102B2 (en) | 2019-05-13 | 2024-12-10 | Carl Zeiss Smt Gmbh | Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system |
| DE102022209427A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen |
| DE102022209411A1 (de) | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen |
| WO2024052172A1 (de) | 2022-09-09 | 2024-03-14 | Robert Bosch Gmbh | Mikrospiegelanordnung mit federnd gelagerten einzelspiegelelementen |
| WO2024052150A1 (de) | 2022-09-09 | 2024-03-14 | Robert Bosch Gmbh | Mikrospiegelanordnung mit einer anzahl von einzelspiegelelementen |
| DE102023126597A1 (de) * | 2023-09-29 | 2025-04-03 | Carl Zeiss Smt Gmbh | Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102424717B1 (ko) | 2022-07-25 |
| WO2015124555A1 (de) | 2015-08-27 |
| US20160342095A1 (en) | 2016-11-24 |
| JP2017509918A (ja) | 2017-04-06 |
| JP6568865B2 (ja) | 2019-08-28 |
| KR20160124205A (ko) | 2016-10-26 |
| US9874819B2 (en) | 2018-01-23 |
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