JP6568865B2 - ミラーアレイ - Google Patents

ミラーアレイ Download PDF

Info

Publication number
JP6568865B2
JP6568865B2 JP2016553587A JP2016553587A JP6568865B2 JP 6568865 B2 JP6568865 B2 JP 6568865B2 JP 2016553587 A JP2016553587 A JP 2016553587A JP 2016553587 A JP2016553587 A JP 2016553587A JP 6568865 B2 JP6568865 B2 JP 6568865B2
Authority
JP
Japan
Prior art keywords
mirror
facet
individual mirrors
illumination
mirror array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016553587A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017509918A5 (https=
JP2017509918A (ja
Inventor
シュティグ ビーリン
シュティグ ビーリン
マルクス ハウフ
マルクス ハウフ
ラース ヴィッシュマイヤー
ラース ヴィッシュマイヤー
ファビアン ハッカー
ファビアン ハッカー
マルティン エンドレス
マルティン エンドレス
ヨハネス アイゼンメンガー
ヨハネス アイゼンメンガー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2017509918A publication Critical patent/JP2017509918A/ja
Publication of JP2017509918A5 publication Critical patent/JP2017509918A5/ja
Application granted granted Critical
Publication of JP6568865B2 publication Critical patent/JP6568865B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
JP2016553587A 2014-02-21 2015-02-17 ミラーアレイ Active JP6568865B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (3)

Publication Number Publication Date
JP2017509918A JP2017509918A (ja) 2017-04-06
JP2017509918A5 JP2017509918A5 (https=) 2018-03-29
JP6568865B2 true JP6568865B2 (ja) 2019-08-28

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553587A Active JP6568865B2 (ja) 2014-02-21 2015-02-17 ミラーアレイ

Country Status (5)

Country Link
US (1) US9874819B2 (https=)
JP (1) JP6568865B2 (https=)
KR (1) KR102424717B1 (https=)
DE (1) DE102014203189A1 (https=)
WO (1) WO2015124555A1 (https=)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9185291B1 (en) 2013-06-13 2015-11-10 Corephotonics Ltd. Dual aperture zoom digital camera
CN108535839B (zh) 2013-07-04 2022-02-08 核心光电有限公司 小型长焦透镜套件
CN108989649B (zh) 2013-08-01 2021-03-19 核心光电有限公司 具有自动聚焦的纤薄多孔径成像系统及其使用方法
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
CN112327463B (zh) 2015-01-03 2022-10-14 核心光电有限公司 微型长焦镜头模块和使用该镜头模块的相机
KR102088603B1 (ko) 2015-04-16 2020-03-13 코어포토닉스 리미티드 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화
EP4425424A3 (en) 2015-08-13 2024-11-20 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
US10488631B2 (en) 2016-05-30 2019-11-26 Corephotonics Ltd. Rotational ball-guided voice coil motor
KR20240036133A (ko) 2016-06-19 2024-03-19 코어포토닉스 리미티드 듀얼 애퍼처 카메라 시스템에서의 프레임 동기화
KR102903119B1 (ko) 2016-07-07 2025-12-22 코어포토닉스 리미티드 폴디드 옵틱용 선형 볼 가이드 보이스 코일 모터
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie
WO2018122650A1 (en) 2016-12-28 2018-07-05 Corephotonics Ltd. Folded camera structure with an extended light-folding-element scanning range
US10884321B2 (en) 2017-01-12 2021-01-05 Corephotonics Ltd. Compact folded camera
US11111133B1 (en) * 2017-01-30 2021-09-07 Mirrorcle Technologies, Inc. MEMS actuators with improved performance and cooling
CN114137791A (zh) 2017-03-15 2022-03-04 核心光电有限公司 具有全景扫瞄范围的照相装置及移动装置
KR102456315B1 (ko) 2017-11-23 2022-10-18 코어포토닉스 리미티드 컴팩트 폴디드 카메라 구조
EP3848749A1 (en) 2018-02-05 2021-07-14 Corephotonics Ltd. Reduced height penalty for folded camera
US11640047B2 (en) 2018-02-12 2023-05-02 Corephotonics Ltd. Folded camera with optical image stabilization
KR102795759B1 (ko) 2018-04-23 2025-04-11 코어포토닉스 리미티드 연장된 2 자유도 회전 범위를 갖는 광학 경로 폴딩 요소
KR102912051B1 (ko) * 2018-07-04 2026-01-13 코어포토닉스 리미티드 자동차 또는 감시 애플리케이션을 위한 스캐닝 광학 경로 폴딩 요소들을 구비하는 카메라
US11635596B2 (en) 2018-08-22 2023-04-25 Corephotonics Ltd. Two-state zoom folded camera
WO2020077154A1 (en) * 2018-10-10 2020-04-16 Vyas Trilok Villanova ultra efficient vertical windmill system and method
WO2020144528A1 (en) 2019-01-07 2020-07-16 Corephotonics Ltd. Rotation mechanism with sliding joint
DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
KR102365748B1 (ko) 2019-07-31 2022-02-23 코어포토닉스 리미티드 카메라 패닝 또는 모션에서 배경 블러링을 생성하는 시스템 및 방법
EP4045959B1 (en) 2019-12-03 2025-02-05 Corephotonics Ltd. Actuators for providing an extended two-degree of freedom rotation range
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
KR102811003B1 (ko) 2020-02-22 2025-05-20 코어포토닉스 리미티드 매크로 촬영을 위한 분할 스크린 기능
EP4097773A4 (en) 2020-04-26 2023-11-01 Corephotonics Ltd. TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION
CN117372248A (zh) 2020-05-17 2024-01-09 核心光电有限公司 全视场参考图像的图像拼接
KR20250156831A (ko) 2020-05-30 2025-11-03 코어포토닉스 리미티드 슈퍼 매크로 이미지를 얻기 위한 시스템 및 방법
CN119355935A (zh) 2020-07-15 2025-01-24 核心光电有限公司 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的方法
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
CN114270145B (zh) 2020-07-31 2024-05-17 核心光电有限公司 用于大行程线性位置感测的霍尔传感器-磁体几何结构
KR102598070B1 (ko) 2020-08-12 2023-11-02 코어포토닉스 리미티드 스캐닝 폴디드 카메라의 광학 이미지 안정화
TWI888016B (zh) 2021-03-11 2025-06-21 以色列商核心光電有限公司 彈出式照相機系統
EP4726455A2 (en) 2021-06-08 2026-04-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
KR102940165B1 (ko) 2021-07-21 2026-03-16 코어포토닉스 리미티드 팝-아웃 모바일 카메라 및 액추에이터
EP4500266A1 (en) 2022-03-24 2025-02-05 Corephotonics Ltd. Slim compact lens optical image stabilization
DE102022203369A1 (de) * 2022-04-05 2023-10-05 Carl Zeiss Smt Gmbh Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
EP4573403A1 (en) * 2022-08-16 2025-06-25 Carl Zeiss SMT GmbH Micro-optical element
DE102022209427A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
DE102022212168A1 (de) 2022-11-16 2024-05-16 Carl Zeiss Smt Gmbh EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage
DE102022212167A1 (de) 2022-11-16 2023-09-14 Carl Zeiss Smt Gmbh EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage
DE102023126597A1 (de) * 2023-09-29 2025-04-03 Carl Zeiss Smt Gmbh Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
US7804603B2 (en) * 2006-10-03 2010-09-28 Asml Netherlands B.V. Measurement apparatus and method
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
WO2008095695A2 (de) * 2007-02-06 2008-08-14 Carl Zeiss Smt Ag Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage
JP5329520B2 (ja) * 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
EP2243047B1 (en) * 2008-02-15 2021-03-31 Carl Zeiss SMT GmbH Facet mirror for use in a projection exposure apparatus for microlithography
JP5355699B2 (ja) 2008-10-20 2013-11-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 放射線ビームを案内するための光学モジュール
KR101258344B1 (ko) * 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
DE102009045694B4 (de) 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012213515A1 (de) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203188A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
KR102424717B1 (ko) 2022-07-25
WO2015124555A1 (de) 2015-08-27
US20160342095A1 (en) 2016-11-24
JP2017509918A (ja) 2017-04-06
KR20160124205A (ko) 2016-10-26
DE102014203189A1 (de) 2015-08-27
US9874819B2 (en) 2018-01-23

Similar Documents

Publication Publication Date Title
JP6568865B2 (ja) ミラーアレイ
KR102401868B1 (ko) 투영 노광 시스템의 오브젝트 필드를 조명하는 방법
JP5487118B2 (ja) マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP6530603B2 (ja) 光学コンポーネント
JP6415564B2 (ja) 光学コンポーネント
JP5106692B2 (ja) 投影リソグラフィのための照明光学ユニット
TWI610140B (zh) 用於投射曝光裝置的照射光學單元
JP2006216917A (ja) 照明光学系、露光装置およびデバイス製造方法
TWI813949B (zh) 用於琢面鏡的琢面總成
JP5530424B2 (ja) 光学素子を支持する装置、及びそれを形成する方法
US20260043996A1 (en) Individual mirror for a faceted mirror of an illumination optical unit of a projection exposure system
CN111656245A (zh) 投射光刻的照明光学单元
JP2009194204A (ja) 露光装置、露光システムおよびデバイス製造方法
US9915872B2 (en) Optical component
JP6246907B2 (ja) 光学素子及び当該光学素子に対する放射の影響を低減する手段を備えた光学コンポーネント
US9261695B2 (en) Illumination system of a microlithographic projection exposure apparatus
JP2009164284A (ja) パターン形成基板、露光方法およびデバイスの製造方法
JP2006203135A (ja) 光学装置、調整方法、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161027

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20180216

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190129

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20190122

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190228

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190515

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20190606

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190624

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20190805

R150 Certificate of patent or registration of utility model

Ref document number: 6568865

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250