KR102375841B1 - 가요성 기판상에 전자 장치를 형성하는 방법 - Google Patents

가요성 기판상에 전자 장치를 형성하는 방법 Download PDF

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KR102375841B1
KR102375841B1 KR1020177001247A KR20177001247A KR102375841B1 KR 102375841 B1 KR102375841 B1 KR 102375841B1 KR 1020177001247 A KR1020177001247 A KR 1020177001247A KR 20177001247 A KR20177001247 A KR 20177001247A KR 102375841 B1 KR102375841 B1 KR 102375841B1
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South Korea
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flexible substrate
porous membrane
electronic device
membrane
electronic material
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KR20170023959A (ko
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마르티네즈 카르멘 클로틸데 마요르가
피레스 루이스 미겔 밥티스타
이카 아르벤 메르코시
Original Assignee
푼다시오 인스티투트 카탈라 데 나노시엔시아 이 나노테크놀로히아 (아이씨엔2)
펀다시오 프리바다 인스티튜시오 카탈라나 드 르세르카 아이 에스투디스 아반카츠
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002—Organic membrane manufacture
    • B01D67/0023—Organic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0032—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B01D67/0034—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods by micromachining techniques, e.g. using masking and etching steps, photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/12—Composite membranes; Ultra-thin membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • B01D71/0211—Graphene or derivates thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/48—Polyesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/18—Printed circuits structurally associated with non-printed electric components
    • H05K1/189—Printed circuits structurally associated with non-printed electric components characterised by the use of flexible or folded printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1275—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/08—Polysaccharides
    • B01D71/12—Cellulose derivatives
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0137—Materials
    • H05K2201/0145—Polyester, e.g. polyethylene terephthalate [PET], polyethylene naphthalate [PEN]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Printing Methods (AREA)
  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
KR1020177001247A 2014-06-20 2015-06-19 가요성 기판상에 전자 장치를 형성하는 방법 Active KR102375841B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14382240 2014-06-20
EP14382240.1 2014-06-20
PCT/EP2015/063842 WO2015193486A1 (en) 2014-06-20 2015-06-19 Method of forming an electronic device on a flexible substrate

Publications (2)

Publication Number Publication Date
KR20170023959A KR20170023959A (ko) 2017-03-06
KR102375841B1 true KR102375841B1 (ko) 2022-03-17

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KR1020177001247A Active KR102375841B1 (ko) 2014-06-20 2015-06-19 가요성 기판상에 전자 장치를 형성하는 방법

Country Status (12)

Country Link
EP (1) EP3158397B1 (enExample)
JP (1) JP6734787B2 (enExample)
KR (1) KR102375841B1 (enExample)
CN (1) CN106662805B (enExample)
AU (1) AU2015276028A1 (enExample)
BR (1) BR112016029321A2 (enExample)
CA (1) CA2954435C (enExample)
DK (1) DK3158397T3 (enExample)
ES (1) ES2664346T3 (enExample)
IL (1) IL249534B (enExample)
SG (1) SG11201610437TA (enExample)
WO (1) WO2015193486A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3530617A1 (en) 2018-02-27 2019-08-28 Fundacio Privada Institut Catala de Nanociencia I Nanotecnologia (ICN2) Method of forming a porous graphene-based macroscopic structure
KR102130323B1 (ko) * 2018-06-04 2020-07-06 한국화학연구원 기능성 물질을 이용한 패턴 필름의 제조방법 및 기능성 물질을 이용한 패턴 필름의 전사방법
JP7190129B2 (ja) * 2018-10-01 2022-12-15 ヒューグルエレクトロニクス株式会社 イオン分布可視化装置及びイオン分布可視化システム
EP3772086A1 (en) 2019-08-01 2021-02-03 Fundació Institut Català de Nanociència i Nanotecnologia (ICN2) Method to form a laser-scribed rgo pattern on a substrate
CN110972411B (zh) * 2019-10-22 2022-12-06 深圳丹邦科技股份有限公司 基于量子碳基膜的柔性线路板基材及其制备方法
CN110658677B (zh) * 2019-11-12 2021-08-13 京东方科技集团股份有限公司 一种压印方法、压印结构及显示基板
CN111554756B (zh) * 2020-05-15 2022-04-15 京东方科技集团股份有限公司 光电探测器、显示基板
US12172576B2 (en) * 2021-10-26 2024-12-24 Ford Global Technologies, Llc System and method for approaching vehicle detection
CN114280287A (zh) * 2021-12-24 2022-04-05 杭州电子科技大学 一种基于二硫化钨的柔性生物传感器及其制备方法
CN118726934B (zh) * 2024-06-19 2025-05-30 浙江大学 一种二维材料微图案阵列大面积印刷及转移方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003262635A (ja) 2002-03-08 2003-09-19 Nitto Denko Corp 吸水性基材を用いた、生物学的親和性に基づく物質の測定方法およびそのためのキット
JP2006270094A (ja) 2005-03-24 2006-10-05 Samsung Sdi Co Ltd 有機薄膜のパターニング方法、それを利用した有機薄膜トランジスタ及びその製造方法、有機薄膜トランジスタを備えた平板表示装置
US20070065977A1 (en) 2005-09-21 2007-03-22 University Of Florida Research Foundation, Inc. Low temperature methods for forming patterned electrically conductive thin films and patterned articles therefrom
US20090311489A1 (en) 2007-08-27 2009-12-17 Lynn Sheehan Laser patterning of a carbon nanotube layer
US20100127242A1 (en) 2008-11-24 2010-05-27 Chongwu Zhou Transparent electronics based on transfer printed carbon nanotubes on rigid and flexible substrates
JP2013058599A (ja) * 2011-09-08 2013-03-28 Sumitomo Chemical Co Ltd 有機半導体素子用電極及びその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11174017A (ja) * 1997-12-08 1999-07-02 Akebono Brake Res & Dev Center Ltd 微生物電極及び微生物センサ
AU2003249324A1 (en) * 2002-07-19 2004-02-09 University Of Florida Transparent electrodes from single wall carbon nanotubes
US8216541B2 (en) * 2008-09-03 2012-07-10 Nanotek Instruments, Inc. Process for producing dispersible and conductive nano graphene platelets from non-oxidized graphitic materials
KR101502172B1 (ko) * 2008-12-12 2015-03-13 엘지디스플레이 주식회사 플렉서블 표시장치의 제조 방법
CN102452239A (zh) * 2010-10-22 2012-05-16 韩国科学技术院 图案转印方法和图案转印装置以及利用该方法制造的产品
LT5943B (lt) * 2011-10-20 2013-06-25 Vilniaus Universitetas Plono elektrai laidaus permatomo grafeno sluoksnio gamybos būdas

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003262635A (ja) 2002-03-08 2003-09-19 Nitto Denko Corp 吸水性基材を用いた、生物学的親和性に基づく物質の測定方法およびそのためのキット
JP2006270094A (ja) 2005-03-24 2006-10-05 Samsung Sdi Co Ltd 有機薄膜のパターニング方法、それを利用した有機薄膜トランジスタ及びその製造方法、有機薄膜トランジスタを備えた平板表示装置
US20070065977A1 (en) 2005-09-21 2007-03-22 University Of Florida Research Foundation, Inc. Low temperature methods for forming patterned electrically conductive thin films and patterned articles therefrom
WO2007035838A2 (en) 2005-09-21 2007-03-29 University Of Florida Research Foundation, Inc. Low temperature methods for forming patterned electrically conductive thin films and patterned articles therefrom
US20090311489A1 (en) 2007-08-27 2009-12-17 Lynn Sheehan Laser patterning of a carbon nanotube layer
US20100127242A1 (en) 2008-11-24 2010-05-27 Chongwu Zhou Transparent electronics based on transfer printed carbon nanotubes on rigid and flexible substrates
JP2013058599A (ja) * 2011-09-08 2013-03-28 Sumitomo Chemical Co Ltd 有機半導体素子用電極及びその製造方法

Also Published As

Publication number Publication date
CN106662805B (zh) 2020-07-28
EP3158397A1 (en) 2017-04-26
JP2017526165A (ja) 2017-09-07
US20170123310A1 (en) 2017-05-04
CA2954435C (en) 2023-02-14
JP6734787B2 (ja) 2020-08-05
CA2954435A1 (en) 2015-12-23
IL249534A0 (en) 2017-02-28
SG11201610437TA (en) 2017-01-27
BR112016029321A2 (pt) 2017-08-22
EP3158397B1 (en) 2018-01-03
IL249534B (en) 2021-12-01
DK3158397T3 (en) 2018-04-16
CN106662805A (zh) 2017-05-10
ES2664346T3 (es) 2018-04-19
WO2015193486A1 (en) 2015-12-23
AU2015276028A1 (en) 2017-02-02
KR20170023959A (ko) 2017-03-06

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