KR102371010B1 - 감광성 필름 적층체 및 그것을 사용하여 형성된 경화물 - Google Patents

감광성 필름 적층체 및 그것을 사용하여 형성된 경화물 Download PDF

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Publication number
KR102371010B1
KR102371010B1 KR1020180005874A KR20180005874A KR102371010B1 KR 102371010 B1 KR102371010 B1 KR 102371010B1 KR 1020180005874 A KR1020180005874 A KR 1020180005874A KR 20180005874 A KR20180005874 A KR 20180005874A KR 102371010 B1 KR102371010 B1 KR 102371010B1
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KR
South Korea
Prior art keywords
photosensitive film
film
photosensitive
resin
group
Prior art date
Application number
KR1020180005874A
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English (en)
Korean (ko)
Other versions
KR20180084674A (ko
Inventor
치히로 후나코시
마리코 시마미야
가즈야 오카다
가즈야 사토
히데유키 이토
야스아키 아라이
노부히토 이토
Original Assignee
다이요 잉키 세이조 가부시키가이샤
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Application filed by 다이요 잉키 세이조 가부시키가이샤 filed Critical 다이요 잉키 세이조 가부시키가이샤
Publication of KR20180084674A publication Critical patent/KR20180084674A/ko
Application granted granted Critical
Publication of KR102371010B1 publication Critical patent/KR102371010B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/24—All layers being polymeric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/558—Impact strength, toughness

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Epoxy Resins (AREA)
KR1020180005874A 2017-01-17 2018-01-17 감광성 필름 적층체 및 그것을 사용하여 형성된 경화물 KR102371010B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2017-006196 2017-01-17
JP2017006196 2017-01-17
JP2017186951A JP6345855B1 (ja) 2017-01-17 2017-09-27 感光性フィルム積層体およびそれを用いて形成された硬化物
JPJP-P-2017-186951 2017-09-27

Publications (2)

Publication Number Publication Date
KR20180084674A KR20180084674A (ko) 2018-07-25
KR102371010B1 true KR102371010B1 (ko) 2022-03-07

Family

ID=62635704

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180005874A KR102371010B1 (ko) 2017-01-17 2018-01-17 감광성 필름 적층체 및 그것을 사용하여 형성된 경화물

Country Status (4)

Country Link
JP (1) JP6345855B1 (zh)
KR (1) KR102371010B1 (zh)
CN (1) CN108327357B (zh)
TW (3) TWI776614B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102604565B1 (ko) * 2019-01-10 2023-11-23 삼성디스플레이 주식회사 윈도우 및 이의 제조 방법
US20220066322A1 (en) 2020-08-26 2022-03-03 Tamura Corporation Photosensitive dry film, and printed wiring board with photosensitive dry film
JPWO2022138468A1 (zh) * 2020-12-25 2022-06-30
JP2022157524A (ja) 2021-03-31 2022-10-14 太陽インキ製造株式会社 電子部材用絶縁膜、および電子部材用絶縁膜を製造する方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010085513A (ja) * 2008-09-30 2010-04-15 Toyo Ink Mfg Co Ltd 感光性ドライフィルム

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JPH0289631A (ja) * 1988-09-27 1990-03-29 Somar Corp ケミカルマットフィルム及びそれを用いた感光性フィルム
JPH0836258A (ja) * 1994-07-25 1996-02-06 Hitachi Chem Co Ltd 感光性エレメント、その積層方法及びレジスト形成方法
JPH0961996A (ja) * 1995-08-28 1997-03-07 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びプラズマディスプレイの背面板の製造法
JP4415175B2 (ja) * 2003-11-06 2010-02-17 ソニー株式会社 電鋳金型の製造方法
CN101341444B (zh) * 2005-12-21 2011-12-14 富士胶片株式会社 感光片以及制造该感光片的方法和装置
CN101432661B (zh) * 2006-04-28 2012-09-05 旭化成电子材料株式会社 感光性树脂层压体
JP2009186510A (ja) * 2008-02-01 2009-08-20 Fujifilm Corp 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP5279423B2 (ja) * 2008-05-19 2013-09-04 富士フイルム株式会社 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
JP5768521B2 (ja) * 2010-07-13 2015-08-26 日立化成株式会社 感光性エレメント、それを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JP5511597B2 (ja) * 2010-09-06 2014-06-04 日東電工株式会社 配線回路基板の製造方法
JP2012116130A (ja) * 2010-12-02 2012-06-21 Fujifilm Corp 金属膜を有する積層体の製造方法
WO2012081680A1 (ja) * 2010-12-16 2012-06-21 日立化成工業株式会社 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2012157135A1 (ja) * 2011-05-17 2012-11-22 三共化成株式会社 成形回路基板の製造方法
CN103764385B (zh) * 2012-06-13 2016-02-17 旭化成电子材料株式会社 功能转印体、功能层的转印方法、封装物以及功能转印膜辊
KR101949302B1 (ko) * 2012-11-19 2019-02-18 타츠타 전선 주식회사 적층 필름 및 차폐 인쇄 배선판
JP5882510B2 (ja) * 2014-06-30 2016-03-09 太陽インキ製造株式会社 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法
JP2017165589A (ja) * 2014-08-01 2017-09-21 旭硝子株式会社 無機膜付き支持基板およびガラス積層体、ならびに、その製造方法および電子デバイスの製造方法
JP2016151578A (ja) * 2015-02-16 2016-08-22 旭化成株式会社 光学基材の製造装置及び光学基材の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010085513A (ja) * 2008-09-30 2010-04-15 Toyo Ink Mfg Co Ltd 感光性ドライフィルム

Also Published As

Publication number Publication date
JP2018116255A (ja) 2018-07-26
KR20180084674A (ko) 2018-07-25
TWI776614B (zh) 2022-09-01
TW202144919A (zh) 2021-12-01
TW202144918A (zh) 2021-12-01
TWI776613B (zh) 2022-09-01
TW201839516A (zh) 2018-11-01
JP6345855B1 (ja) 2018-06-20
TWI735731B (zh) 2021-08-11
CN108327357B (zh) 2021-09-28
CN108327357A (zh) 2018-07-27

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