KR102327826B1 - 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 Download PDF

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Publication number
KR102327826B1
KR102327826B1 KR1020180016642A KR20180016642A KR102327826B1 KR 102327826 B1 KR102327826 B1 KR 102327826B1 KR 1020180016642 A KR1020180016642 A KR 1020180016642A KR 20180016642 A KR20180016642 A KR 20180016642A KR 102327826 B1 KR102327826 B1 KR 102327826B1
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KR
South Korea
Prior art keywords
substrate
mold
pattern
imprint
region
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KR1020180016642A
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English (en)
Korean (ko)
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KR20180097134A (ko
Inventor
요스케 무라카미
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20180097134A publication Critical patent/KR20180097134A/ko
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Publication of KR102327826B1 publication Critical patent/KR102327826B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020180016642A 2017-02-22 2018-02-12 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법 KR102327826B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017031380A JP6875879B2 (ja) 2017-02-22 2017-02-22 インプリント装置、インプリント方法、および物品の製造方法
JPJP-P-2017-031380 2017-02-22

Publications (2)

Publication Number Publication Date
KR20180097134A KR20180097134A (ko) 2018-08-30
KR102327826B1 true KR102327826B1 (ko) 2021-11-17

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ID=63366215

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KR1020180016642A KR102327826B1 (ko) 2017-02-22 2018-02-12 임프린트 장치, 임프린트 방법, 및 물품의 제조 방법

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JP (1) JP6875879B2 (ja)
KR (1) KR102327826B1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7117955B2 (ja) * 2018-09-18 2022-08-15 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP7286391B2 (ja) * 2019-04-16 2023-06-05 キヤノン株式会社 インプリント装置及び物品の製造方法
JP7241623B2 (ja) * 2019-06-27 2023-03-17 キヤノン株式会社 形成方法、および物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013197107A (ja) 2012-03-15 2013-09-30 Canon Inc インプリント装置及び物品の製造方法
JP2015130448A (ja) * 2014-01-08 2015-07-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016063219A (ja) 2014-09-12 2016-04-25 キヤノン株式会社 インプリント装置、インプリントシステム及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4533358B2 (ja) 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP6120678B2 (ja) * 2013-05-27 2017-04-26 キヤノン株式会社 インプリント方法、インプリント装置及びデバイス製造方法
JP6465577B2 (ja) * 2014-07-11 2019-02-06 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6506521B2 (ja) * 2014-09-17 2019-04-24 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP6457773B2 (ja) * 2014-10-07 2019-01-23 キヤノン株式会社 インプリント方法、インプリント装置及び物品製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013197107A (ja) 2012-03-15 2013-09-30 Canon Inc インプリント装置及び物品の製造方法
JP2015130448A (ja) * 2014-01-08 2015-07-16 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP2016063219A (ja) 2014-09-12 2016-04-25 キヤノン株式会社 インプリント装置、インプリントシステム及び物品の製造方法

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Publication number Publication date
KR20180097134A (ko) 2018-08-30
JP2018137361A (ja) 2018-08-30
JP6875879B2 (ja) 2021-05-26

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