KR102311686B1 - 플라즈마를 원격 감지하기 위한 시스템 및 방법 - Google Patents

플라즈마를 원격 감지하기 위한 시스템 및 방법 Download PDF

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KR102311686B1
KR102311686B1 KR1020197028391A KR20197028391A KR102311686B1 KR 102311686 B1 KR102311686 B1 KR 102311686B1 KR 1020197028391 A KR1020197028391 A KR 1020197028391A KR 20197028391 A KR20197028391 A KR 20197028391A KR 102311686 B1 KR102311686 B1 KR 102311686B1
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plasma
field
plasma source
frequency
antenna
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KR20200021914A (ko
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패트릭 제이. 맥널리
숀 켈리
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더블린 시티 유니버시티
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020197028391A 2017-03-31 2018-03-23 플라즈마를 원격 감지하기 위한 시스템 및 방법 Active KR102311686B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB1705202.8A GB201705202D0 (en) 2017-03-31 2017-03-31 System and method for remote sensing a plasma
GB1705202.8 2017-03-31
PCT/EP2018/057556 WO2018177965A1 (en) 2017-03-31 2018-03-23 System and method for remote sensing a plasma

Publications (2)

Publication Number Publication Date
KR20200021914A KR20200021914A (ko) 2020-03-02
KR102311686B1 true KR102311686B1 (ko) 2021-10-13

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Country Status (7)

Country Link
US (2) US11476098B2 (enExample)
EP (1) EP3602602B1 (enExample)
JP (1) JP7115759B2 (enExample)
KR (1) KR102311686B1 (enExample)
CN (1) CN110520960B (enExample)
GB (1) GB201705202D0 (enExample)
WO (1) WO2018177965A1 (enExample)

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CN110351940B (zh) * 2019-06-11 2021-07-30 中国科学院合肥物质科学研究院 一种用于测量离子回旋辐射的高频磁探针诊断系统
KR20220161453A (ko) * 2020-03-31 2022-12-06 램 리써치 코포레이션 고조파 (harmonic) 측정들 및 균일도 제어를 위한 RF 자기장 센서
GB202005828D0 (en) * 2020-04-21 2020-06-03 Univ Dublin City Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity
GB202016105D0 (en) * 2020-10-09 2020-11-25 Univ Dublin City Non-invasive measurement of plasma systems
CN112820618B (zh) * 2020-12-14 2023-04-07 兰州空间技术物理研究所 一种微型溅射离子泵等离子体诊断装置及诊断方法
EP4020520A1 (en) * 2020-12-22 2022-06-29 Impedans Ltd Apparatus for sensing rf signals from rf plasma processing equipment
CN113128050B (zh) * 2021-04-21 2023-04-25 西安电子科技大学 基于波阻抗不变点的等离子体电子密度和碰撞频率联合诊断方法
KR20230050500A (ko) * 2021-10-07 2023-04-17 삼성전자주식회사 아킹 진단 장치와 이를 포함하는 플라즈마 공정 설비, 및 아킹 진단 방법
US20250118531A1 (en) * 2022-01-18 2025-04-10 Ucl Business Ltd Plasma Discharge Monitoring Method
KR102706432B1 (ko) * 2022-01-26 2024-10-04 김남헌 웨이퍼 식각을 위한 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법
EP4250335A1 (en) 2022-03-25 2023-09-27 Impedans Ltd Apparatus for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber
KR102732381B1 (ko) * 2022-07-25 2024-11-25 한국기계연구원 박막 안테나형 플라즈마 진단장치 및 이를 포함하는 플라즈마 진단모듈
WO2024025241A1 (ko) * 2022-07-25 2024-02-01 한국기계연구원 플라즈마 진단용 박막형 초고주파 진단기 및 이를 포함하는 플라즈마 진단모듈
KR102790833B1 (ko) * 2022-08-18 2025-04-02 한국핵융합에너지연구원 플라즈마 모니터링용 뷰포트, 이를 포함하는 플라즈마 발생기 및 플라즈마 모니터링 방법
KR102743911B1 (ko) * 2022-10-21 2024-12-18 주식회사 나이스플라즈마 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법

Citations (2)

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WO2004006298A2 (en) 2002-07-03 2004-01-15 Tokyo Electron Limited Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters
US20070227667A1 (en) 2006-03-29 2007-10-04 Tokyo Electron Limited Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma

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US4588993A (en) * 1980-11-26 1986-05-13 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Broadband isotropic probe system for simultaneous measurement of complex E- and H-fields
US6566272B2 (en) * 1999-07-23 2003-05-20 Applied Materials Inc. Method for providing pulsed plasma during a portion of a semiconductor wafer process
US7960670B2 (en) * 2005-05-03 2011-06-14 Kla-Tencor Corporation Methods of and apparatuses for measuring electrical parameters of a plasma process
JP4364498B2 (ja) * 2002-10-30 2009-11-18 原田産業株式会社 異常放電検出装置及び方法
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
US20050188922A1 (en) * 2004-02-26 2005-09-01 Tokyo Electron Limited. Plasma processing unit
JP4601439B2 (ja) 2005-02-01 2010-12-22 株式会社日立ハイテクノロジーズ プラズマ処理装置
US20070227677A1 (en) 2006-03-29 2007-10-04 Fu-Lai Yu Cordless window covering
US7655110B2 (en) * 2006-03-29 2010-02-02 Tokyo Electron Limited Plasma processing apparatus
KR101089951B1 (ko) * 2008-03-07 2011-12-05 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치
US20110217925A1 (en) * 2010-03-08 2011-09-08 Mark Rhodes Noise reducing near-field receiver antenna and system
JP5808697B2 (ja) 2012-03-01 2015-11-10 株式会社日立ハイテクノロジーズ ドライエッチング装置及びドライエッチング方法
US20150364300A1 (en) * 2014-06-16 2015-12-17 Lam Research Corporation Determining presence of conductive film on dielectric surface of reaction chamber
KR20160120382A (ko) * 2015-04-07 2016-10-18 삼성전자주식회사 광학 분광 분석 장치 및 플라즈마 처리 장치
KR102417178B1 (ko) * 2015-09-03 2022-07-05 삼성전자주식회사 마이크로파 탐침, 그 탐침을 구비한 플라즈마 모니터링 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004006298A2 (en) 2002-07-03 2004-01-15 Tokyo Electron Limited Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters
US20070227667A1 (en) 2006-03-29 2007-10-04 Tokyo Electron Limited Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma

Also Published As

Publication number Publication date
EP3602602B1 (en) 2021-01-13
KR20200021914A (ko) 2020-03-02
US20210104387A1 (en) 2021-04-08
GB201705202D0 (en) 2017-05-17
CN110520960B (zh) 2023-05-23
WO2018177965A1 (en) 2018-10-04
CN110520960A (zh) 2019-11-29
US11476098B2 (en) 2022-10-18
US20230230821A1 (en) 2023-07-20
EP3602602A1 (en) 2020-02-05
JP2020516024A (ja) 2020-05-28
US12278095B2 (en) 2025-04-15
JP7115759B2 (ja) 2022-08-09

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