GB201705202D0 - System and method for remote sensing a plasma - Google Patents

System and method for remote sensing a plasma

Info

Publication number
GB201705202D0
GB201705202D0 GBGB1705202.8A GB201705202A GB201705202D0 GB 201705202 D0 GB201705202 D0 GB 201705202D0 GB 201705202 A GB201705202 A GB 201705202A GB 201705202 D0 GB201705202 D0 GB 201705202D0
Authority
GB
United Kingdom
Prior art keywords
plasma
remote sensing
sensing
remote
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB1705202.8A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dublin City University
Original Assignee
Dublin City University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dublin City University filed Critical Dublin City University
Priority to GBGB1705202.8A priority Critical patent/GB201705202D0/en
Publication of GB201705202D0 publication Critical patent/GB201705202D0/en
Priority to KR1020197028391A priority patent/KR102311686B1/ko
Priority to CN201880023299.9A priority patent/CN110520960B/zh
Priority to PCT/EP2018/057556 priority patent/WO2018177965A1/en
Priority to EP18717529.4A priority patent/EP3602602B1/en
Priority to US16/498,049 priority patent/US11476098B2/en
Priority to JP2019553120A priority patent/JP7115759B2/ja
Priority to US17/946,189 priority patent/US12278095B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
GBGB1705202.8A 2017-03-31 2017-03-31 System and method for remote sensing a plasma Ceased GB201705202D0 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
GBGB1705202.8A GB201705202D0 (en) 2017-03-31 2017-03-31 System and method for remote sensing a plasma
KR1020197028391A KR102311686B1 (ko) 2017-03-31 2018-03-23 플라즈마를 원격 감지하기 위한 시스템 및 방법
CN201880023299.9A CN110520960B (zh) 2017-03-31 2018-03-23 用于远程感测等离子体的系统和方法
PCT/EP2018/057556 WO2018177965A1 (en) 2017-03-31 2018-03-23 System and method for remote sensing a plasma
EP18717529.4A EP3602602B1 (en) 2017-03-31 2018-03-23 System and method for remote sensing a plasma
US16/498,049 US11476098B2 (en) 2017-03-31 2018-03-23 System and method for remote sensing a plasma
JP2019553120A JP7115759B2 (ja) 2017-03-31 2018-03-23 プラズマを遠隔検知するためのシステムおよび方法
US17/946,189 US12278095B2 (en) 2017-03-31 2022-09-16 System and method for remote sensing a plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB1705202.8A GB201705202D0 (en) 2017-03-31 2017-03-31 System and method for remote sensing a plasma

Publications (1)

Publication Number Publication Date
GB201705202D0 true GB201705202D0 (en) 2017-05-17

Family

ID=58682689

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB1705202.8A Ceased GB201705202D0 (en) 2017-03-31 2017-03-31 System and method for remote sensing a plasma

Country Status (7)

Country Link
US (2) US11476098B2 (enExample)
EP (1) EP3602602B1 (enExample)
JP (1) JP7115759B2 (enExample)
KR (1) KR102311686B1 (enExample)
CN (1) CN110520960B (enExample)
GB (1) GB201705202D0 (enExample)
WO (1) WO2018177965A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110351940B (zh) * 2019-06-11 2021-07-30 中国科学院合肥物质科学研究院 一种用于测量离子回旋辐射的高频磁探针诊断系统
KR20220161453A (ko) * 2020-03-31 2022-12-06 램 리써치 코포레이션 고조파 (harmonic) 측정들 및 균일도 제어를 위한 RF 자기장 센서
GB202005828D0 (en) 2020-04-21 2020-06-03 Univ Dublin City Electromagnetic field signal acquisition system for high signal-t-noise ratios, and electrical noise immunity
GB202016105D0 (en) * 2020-10-09 2020-11-25 Univ Dublin City Non-invasive measurement of plasma systems
CN112820618B (zh) * 2020-12-14 2023-04-07 兰州空间技术物理研究所 一种微型溅射离子泵等离子体诊断装置及诊断方法
EP4020520A1 (en) 2020-12-22 2022-06-29 Impedans Ltd Apparatus for sensing rf signals from rf plasma processing equipment
CN113128050B (zh) * 2021-04-21 2023-04-25 西安电子科技大学 基于波阻抗不变点的等离子体电子密度和碰撞频率联合诊断方法
KR20230050500A (ko) * 2021-10-07 2023-04-17 삼성전자주식회사 아킹 진단 장치와 이를 포함하는 플라즈마 공정 설비, 및 아킹 진단 방법
EP4466954A1 (en) * 2022-01-18 2024-11-27 UCL Business Ltd Plasma discharge monitoring method
KR102706432B1 (ko) * 2022-01-26 2024-10-04 김남헌 웨이퍼 식각을 위한 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법
EP4250335A1 (en) 2022-03-25 2023-09-27 Impedans Ltd Apparatus for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber
KR102732381B1 (ko) * 2022-07-25 2024-11-25 한국기계연구원 박막 안테나형 플라즈마 진단장치 및 이를 포함하는 플라즈마 진단모듈
WO2024025241A1 (ko) * 2022-07-25 2024-02-01 한국기계연구원 플라즈마 진단용 박막형 초고주파 진단기 및 이를 포함하는 플라즈마 진단모듈
KR102790833B1 (ko) * 2022-08-18 2025-04-02 한국핵융합에너지연구원 플라즈마 모니터링용 뷰포트, 이를 포함하는 플라즈마 발생기 및 플라즈마 모니터링 방법
KR102743911B1 (ko) * 2022-10-21 2024-12-18 주식회사 나이스플라즈마 플라즈마 챔버 및 플라즈마 챔버를 이용한 웨이퍼 식각 방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588993A (en) * 1980-11-26 1986-05-13 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Broadband isotropic probe system for simultaneous measurement of complex E- and H-fields
US6566272B2 (en) * 1999-07-23 2003-05-20 Applied Materials Inc. Method for providing pulsed plasma during a portion of a semiconductor wafer process
US7960670B2 (en) 2005-05-03 2011-06-14 Kla-Tencor Corporation Methods of and apparatuses for measuring electrical parameters of a plasma process
JP2005531931A (ja) 2002-07-03 2005-10-20 東京エレクトロン株式会社 半導体プロセスパラメータの非侵入性の測定と解析のための方法と装置
JP4364498B2 (ja) * 2002-10-30 2009-11-18 原田産業株式会社 異常放電検出装置及び方法
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
US20050188922A1 (en) * 2004-02-26 2005-09-01 Tokyo Electron Limited. Plasma processing unit
JP4601439B2 (ja) 2005-02-01 2010-12-22 株式会社日立ハイテクノロジーズ プラズマ処理装置
US7655110B2 (en) * 2006-03-29 2010-02-02 Tokyo Electron Limited Plasma processing apparatus
US7993487B2 (en) 2006-03-29 2011-08-09 Tokyo Electron Limited Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
US20070227677A1 (en) 2006-03-29 2007-10-04 Fu-Lai Yu Cordless window covering
KR101089951B1 (ko) * 2008-03-07 2011-12-05 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치
US20110217925A1 (en) * 2010-03-08 2011-09-08 Mark Rhodes Noise reducing near-field receiver antenna and system
JP5808697B2 (ja) 2012-03-01 2015-11-10 株式会社日立ハイテクノロジーズ ドライエッチング装置及びドライエッチング方法
US20150364300A1 (en) * 2014-06-16 2015-12-17 Lam Research Corporation Determining presence of conductive film on dielectric surface of reaction chamber
KR20160120382A (ko) * 2015-04-07 2016-10-18 삼성전자주식회사 광학 분광 분석 장치 및 플라즈마 처리 장치
KR102417178B1 (ko) * 2015-09-03 2022-07-05 삼성전자주식회사 마이크로파 탐침, 그 탐침을 구비한 플라즈마 모니터링 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법

Also Published As

Publication number Publication date
JP7115759B2 (ja) 2022-08-09
KR102311686B1 (ko) 2021-10-13
EP3602602B1 (en) 2021-01-13
EP3602602A1 (en) 2020-02-05
CN110520960B (zh) 2023-05-23
US11476098B2 (en) 2022-10-18
US20230230821A1 (en) 2023-07-20
JP2020516024A (ja) 2020-05-28
WO2018177965A1 (en) 2018-10-04
KR20200021914A (ko) 2020-03-02
US20210104387A1 (en) 2021-04-08
CN110520960A (zh) 2019-11-29
US12278095B2 (en) 2025-04-15

Similar Documents

Publication Publication Date Title
GB201705202D0 (en) System and method for remote sensing a plasma
GB201716534D0 (en) A gas detection system and method
EP3646051A4 (en) SYSTEM AND METHOD FOR DETECTING OBJECTS
GB2567845B (en) A method and system for combining sensor data
HUE057712T2 (hu) Érzékelõrendszer és eljárás annak elõállítására
PT2946650T (pt) Processo de elaboração de um robot de tratamento do solo e sistema correspondente
SG11202002678RA (en) A tracking system and method
GB201505697D0 (en) A system and method
GB201518641D0 (en) A system and method
GB201509717D0 (en) Method and system for fitting items into a space
EP3371683A4 (en) DESIGN SYSTEM AND METHOD
EP3158505A4 (en) A method and a system for object recognition
IL239524A0 (en) System and method for deploying sensor-based surveillance systems
GB201715872D0 (en) A method of detection
GB201705676D0 (en) Gas Sensor system and method
GB201508702D0 (en) A system and method
GB201719115D0 (en) A monitoring method and system
GB2573672B (en) System and method for opening a vault
GB2567442B (en) A security system and method
SG10201601558QA (en) Systems and Methods for Monitoring A Process Environment
GB2538493B (en) A control method and system
EP3164551A4 (en) Fastening system and method for such a system
SG11202002076QA (en) A sputtering system and method
IL255561A (en) A system and method for threat detection
EP3583275A4 (en) METHOD AND SYSTEM FOR COVERING A WALL STRUCTURE

Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)