KR102241267B1 - 현상 방법, 현상 장치 및 기억 매체 - Google Patents
현상 방법, 현상 장치 및 기억 매체 Download PDFInfo
- Publication number
- KR102241267B1 KR102241267B1 KR1020150126339A KR20150126339A KR102241267B1 KR 102241267 B1 KR102241267 B1 KR 102241267B1 KR 1020150126339 A KR1020150126339 A KR 1020150126339A KR 20150126339 A KR20150126339 A KR 20150126339A KR 102241267 B1 KR102241267 B1 KR 102241267B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- developer
- contact portion
- nozzle
- liquid reservoir
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
- G03F7/0022—Devices or apparatus
- G03F7/0025—Devices or apparatus characterised by means for coating the developer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014182432A JP6289318B2 (ja) | 2014-09-08 | 2014-09-08 | 現像方法、現像装置及び記憶媒体 |
JPJP-P-2014-182432 | 2014-09-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160030057A KR20160030057A (ko) | 2016-03-16 |
KR102241267B1 true KR102241267B1 (ko) | 2021-04-15 |
Family
ID=55469674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020150126339A KR102241267B1 (ko) | 2014-09-08 | 2015-09-07 | 현상 방법, 현상 장치 및 기억 매체 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6289318B2 (ja) |
KR (1) | KR102241267B1 (ja) |
CN (1) | CN105404103B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6798390B2 (ja) * | 2017-03-30 | 2020-12-09 | 東京エレクトロン株式会社 | 現像方法、現像装置及び記憶媒体 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000173906A (ja) * | 1998-12-10 | 2000-06-23 | Dainippon Screen Mfg Co Ltd | 現像液供給方法及び現像装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6088944A (ja) * | 1983-10-21 | 1985-05-18 | Fujitsu Ltd | レジスト膜の現像方法 |
JPH0822952A (ja) * | 1994-07-07 | 1996-01-23 | Dainippon Screen Mfg Co Ltd | 基板回転式現像処理方法及びその装置 |
JPH09167747A (ja) * | 1995-12-14 | 1997-06-24 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP3589890B2 (ja) * | 1999-03-02 | 2004-11-17 | 大日本スクリーン製造株式会社 | 現像液供給方法及び現像装置 |
JP4566376B2 (ja) * | 2000-10-02 | 2010-10-20 | 株式会社半導体エネルギー研究所 | 半導体装置の製造方法 |
JP3914842B2 (ja) * | 2001-10-23 | 2007-05-16 | 有限会社ユーエムエス | 有機被膜の除去方法および除去装置 |
JP4553266B2 (ja) * | 2007-04-13 | 2010-09-29 | 東京エレクトロン株式会社 | 熱処理装置、制御定数の自動調整方法及び記憶媒体 |
JP4900116B2 (ja) * | 2007-07-30 | 2012-03-21 | 東京エレクトロン株式会社 | 現像方法、現像装置及び記憶媒体 |
JP5084656B2 (ja) * | 2008-07-29 | 2012-11-28 | 東京エレクトロン株式会社 | 現像処理方法及び現像処理装置 |
JP4893799B2 (ja) | 2009-10-23 | 2012-03-07 | 東京エレクトロン株式会社 | 現像装置、現像方法及び記憶媒体 |
JP5698487B2 (ja) | 2010-09-29 | 2015-04-08 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP5920736B2 (ja) * | 2011-12-06 | 2016-05-18 | 国立研究開発法人産業技術総合研究所 | スピン現像方法および装置 |
-
2014
- 2014-09-08 JP JP2014182432A patent/JP6289318B2/ja active Active
-
2015
- 2015-09-07 KR KR1020150126339A patent/KR102241267B1/ko active IP Right Grant
- 2015-09-08 CN CN201510566734.0A patent/CN105404103B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000173906A (ja) * | 1998-12-10 | 2000-06-23 | Dainippon Screen Mfg Co Ltd | 現像液供給方法及び現像装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6289318B2 (ja) | 2018-03-07 |
CN105404103B (zh) | 2020-03-10 |
JP2016058488A (ja) | 2016-04-21 |
KR20160030057A (ko) | 2016-03-16 |
CN105404103A (zh) | 2016-03-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102201956B1 (ko) | 현상 방법 및 현상 장치 | |
JP5994749B2 (ja) | 現像装置、現像方法及び記憶媒体 | |
JP4900116B2 (ja) | 現像方法、現像装置及び記憶媒体 | |
JP5212538B2 (ja) | 現像方法、現像装置及び記憶媒体 | |
KR20150064667A (ko) | 도포막 형성 장치, 도포막 형성 방법, 및 기억 매체 | |
KR20160065757A (ko) | 현상 처리 방법, 컴퓨터 기억 매체 및 현상 처리 장치 | |
JP2016029703A (ja) | 現像装置 | |
KR102607485B1 (ko) | 기판 처리 방법, 기판 처리 장치 및 기억 매체 | |
KR102241267B1 (ko) | 현상 방법, 현상 장치 및 기억 매체 | |
KR20160028983A (ko) | 현상 방법, 현상 장치 및 기억 매체 | |
KR102174024B1 (ko) | 초임계 처리 장치 | |
JP6409205B2 (ja) | 現像方法、現像装置及び記憶媒体 | |
KR102391975B1 (ko) | 초임계 처리 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right |