KR102241267B1 - 현상 방법, 현상 장치 및 기억 매체 - Google Patents

현상 방법, 현상 장치 및 기억 매체 Download PDF

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Publication number
KR102241267B1
KR102241267B1 KR1020150126339A KR20150126339A KR102241267B1 KR 102241267 B1 KR102241267 B1 KR 102241267B1 KR 1020150126339 A KR1020150126339 A KR 1020150126339A KR 20150126339 A KR20150126339 A KR 20150126339A KR 102241267 B1 KR102241267 B1 KR 102241267B1
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KR
South Korea
Prior art keywords
substrate
developer
contact portion
nozzle
liquid reservoir
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KR1020150126339A
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English (en)
Korean (ko)
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KR20160030057A (ko
Inventor
히로후미 다케구치
유이치 데라시타
다케시 시모아오키
고오스케 요시하라
Original Assignee
도쿄엘렉트론가부시키가이샤
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Publication of KR20160030057A publication Critical patent/KR20160030057A/ko
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Publication of KR102241267B1 publication Critical patent/KR102241267B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
KR1020150126339A 2014-09-08 2015-09-07 현상 방법, 현상 장치 및 기억 매체 KR102241267B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-182432 2014-09-08
JP2014182432A JP6289318B2 (ja) 2014-09-08 2014-09-08 現像方法、現像装置及び記憶媒体

Publications (2)

Publication Number Publication Date
KR20160030057A KR20160030057A (ko) 2016-03-16
KR102241267B1 true KR102241267B1 (ko) 2021-04-15

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ID=55469674

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150126339A KR102241267B1 (ko) 2014-09-08 2015-09-07 현상 방법, 현상 장치 및 기억 매체

Country Status (3)

Country Link
JP (1) JP6289318B2 (ja)
KR (1) KR102241267B1 (ja)
CN (1) CN105404103B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6798390B2 (ja) * 2017-03-30 2020-12-09 東京エレクトロン株式会社 現像方法、現像装置及び記憶媒体

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000173906A (ja) * 1998-12-10 2000-06-23 Dainippon Screen Mfg Co Ltd 現像液供給方法及び現像装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088944A (ja) * 1983-10-21 1985-05-18 Fujitsu Ltd レジスト膜の現像方法
JPH0822952A (ja) * 1994-07-07 1996-01-23 Dainippon Screen Mfg Co Ltd 基板回転式現像処理方法及びその装置
JPH09167747A (ja) * 1995-12-14 1997-06-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3589890B2 (ja) * 1999-03-02 2004-11-17 大日本スクリーン製造株式会社 現像液供給方法及び現像装置
JP4566376B2 (ja) * 2000-10-02 2010-10-20 株式会社半導体エネルギー研究所 半導体装置の製造方法
JP3914842B2 (ja) * 2001-10-23 2007-05-16 有限会社ユーエムエス 有機被膜の除去方法および除去装置
JP4553266B2 (ja) * 2007-04-13 2010-09-29 東京エレクトロン株式会社 熱処理装置、制御定数の自動調整方法及び記憶媒体
JP4900116B2 (ja) * 2007-07-30 2012-03-21 東京エレクトロン株式会社 現像方法、現像装置及び記憶媒体
JP5084656B2 (ja) * 2008-07-29 2012-11-28 東京エレクトロン株式会社 現像処理方法及び現像処理装置
JP4893799B2 (ja) 2009-10-23 2012-03-07 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体
JP5698487B2 (ja) 2010-09-29 2015-04-08 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
US20150050602A1 (en) * 2011-12-06 2015-02-19 National Institute Of Advanced Industrial Science And Technology Spin Development Method and Apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000173906A (ja) * 1998-12-10 2000-06-23 Dainippon Screen Mfg Co Ltd 現像液供給方法及び現像装置

Also Published As

Publication number Publication date
CN105404103B (zh) 2020-03-10
CN105404103A (zh) 2016-03-16
KR20160030057A (ko) 2016-03-16
JP2016058488A (ja) 2016-04-21
JP6289318B2 (ja) 2018-03-07

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