KR102190465B1 - 광학 미러, 엑스선 형광 분석 장치 및 엑스선 형광 분석 방법 - Google Patents

광학 미러, 엑스선 형광 분석 장치 및 엑스선 형광 분석 방법 Download PDF

Info

Publication number
KR102190465B1
KR102190465B1 KR1020157025068A KR20157025068A KR102190465B1 KR 102190465 B1 KR102190465 B1 KR 102190465B1 KR 1020157025068 A KR1020157025068 A KR 1020157025068A KR 20157025068 A KR20157025068 A KR 20157025068A KR 102190465 B1 KR102190465 B1 KR 102190465B1
Authority
KR
South Korea
Prior art keywords
carrier
ray
optical mirror
sample
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020157025068A
Other languages
English (en)
Korean (ko)
Other versions
KR20150128721A (ko
Inventor
볼케르 뢰씨거
Original Assignee
헬무트 휘셔 게엠베하 인스티투트 휘어 엘렉트로닉 운트 메쓰테크닉
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 헬무트 휘셔 게엠베하 인스티투트 휘어 엘렉트로닉 운트 메쓰테크닉 filed Critical 헬무트 휘셔 게엠베하 인스티투트 휘어 엘렉트로닉 운트 메쓰테크닉
Publication of KR20150128721A publication Critical patent/KR20150128721A/ko
Application granted granted Critical
Publication of KR102190465B1 publication Critical patent/KR102190465B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020157025068A 2013-03-07 2014-02-27 광학 미러, 엑스선 형광 분석 장치 및 엑스선 형광 분석 방법 Active KR102190465B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013102270.7A DE102013102270A1 (de) 2013-03-07 2013-03-07 Optischer Spiegel, Röntgenfluoreszenzanalysegerät und Verfahren zur Röntgenfluoreszenzanalyse
DE102013102270.7 2013-03-07
PCT/EP2014/053799 WO2014135429A1 (de) 2013-03-07 2014-02-27 Optischer spiegel, röntgenfluoreszenzanalysegerät und verfahren zur röntgenfluoreszenzanalyse

Publications (2)

Publication Number Publication Date
KR20150128721A KR20150128721A (ko) 2015-11-18
KR102190465B1 true KR102190465B1 (ko) 2020-12-14

Family

ID=50190427

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157025068A Active KR102190465B1 (ko) 2013-03-07 2014-02-27 광학 미러, 엑스선 형광 분석 장치 및 엑스선 형광 분석 방법

Country Status (11)

Country Link
US (1) US9880329B2 (enExample)
EP (1) EP2965067B1 (enExample)
JP (1) JP6521384B2 (enExample)
KR (1) KR102190465B1 (enExample)
CN (2) CN110702718A (enExample)
CA (1) CA2899081C (enExample)
DE (1) DE102013102270A1 (enExample)
ES (1) ES2835715T3 (enExample)
HK (1) HK1212027A1 (enExample)
MX (1) MX345821B (enExample)
WO (1) WO2014135429A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101716860B1 (ko) * 2016-05-30 2017-03-27 주식회사 아이에스피 엑스선 형광분석 장치
KR20180052019A (ko) * 2016-11-09 2018-05-17 고려대학교 산학협력단 X선 형광분석 원자층 증착 장치 및 x선 형광분석 원자층 증착 방법
EP3540417B1 (en) 2016-12-15 2023-04-05 Horiba, Ltd. X-ray detection device
CN106802428B (zh) * 2017-01-19 2019-01-01 中国科学院上海应用物理研究所 一种耐辐射和高热负载的x射线成像探测器
WO2020002965A1 (en) * 2018-06-25 2020-01-02 Mirion Technologies (Canberra), Inc Apparatus for visualizing a movable radiation source
KR102209768B1 (ko) 2019-05-20 2021-01-29 (주)고도기연 정밀노즐 세척 장치
DE102022105838B3 (de) * 2022-03-14 2023-08-17 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät
CN115993713B (zh) * 2023-03-22 2023-06-09 西安玄瑞光电科技有限公司 一种折反式超大视场x射线显微耦合光学成像系统

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004144478A (ja) * 2002-03-27 2004-05-20 Horiba Ltd Ｘ線分析装置および方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54178532U (enExample) * 1978-06-06 1979-12-17
JPS5758300U (enExample) * 1980-09-22 1982-04-06
JPS57129156U (enExample) * 1981-02-04 1982-08-12
DE3239379A1 (de) * 1982-10-23 1984-04-26 Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen Vorrichtung zum messen der dicke duenner schichten
DE3314281A1 (de) 1982-10-23 1984-10-25 Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen Vorrichtung zum messen der dicke duenner schichten
JPH01257210A (ja) * 1988-04-06 1989-10-13 Seiko Instr Inc ケイ光ｘ線膜厚計
DE4021388A1 (de) * 1990-07-05 1992-01-16 Twin City Int Inc Vorrichtung zum messen der staerke eines ueberzuges
US5247395A (en) * 1992-05-11 1993-09-21 Eugene Martinez Thin film mirror
US5708696A (en) * 1996-09-17 1998-01-13 Dentsply Research & Development Corp. Positioning device for an X-ray machine
DE19710420C2 (de) 1997-03-13 2001-07-12 Helmut Fischer Gmbh & Co Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz
JP3883153B2 (ja) * 1998-04-10 2007-02-21 松下電器産業株式会社 Ｘ線基板検査装置
CN1603945A (zh) 2003-09-29 2005-04-06 Ge医疗系统环球技术有限公司 光辐照器，灯组件和x射线装置
KR101140199B1 (ko) 2008-01-28 2012-05-02 리플렉티브 엑스-레이 옵틱스 엘엘씨 Ｘ선 촬영법에 의한 ｘ선 촬상을 위한 광학 위치 맞춤 시스템 및 위치 맞춤 방법
DE102009009602A1 (de) * 2008-10-27 2010-04-29 Ifg - Institute For Scientific Instruments Gmbh Spektralauflösende elektronische Röntgenkamera
DE102010017543A1 (de) * 2010-06-23 2011-12-29 Surgiceye Gmbh Vorrichtung und Verfahren zur kombinierten optischen und nuklearen Bilderfassung

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004144478A (ja) * 2002-03-27 2004-05-20 Horiba Ltd Ｘ線分析装置および方法

Also Published As

Publication number Publication date
HK1212027A1 (zh) 2016-07-08
EP2965067A1 (de) 2016-01-13
MX345821B (es) 2017-02-16
CN105008905A (zh) 2015-10-28
JP6521384B2 (ja) 2019-05-29
MX2015011729A (es) 2016-01-15
CN110702718A (zh) 2020-01-17
US9880329B2 (en) 2018-01-30
JP2016509231A (ja) 2016-03-24
ES2835715T3 (es) 2021-06-23
DE102013102270A1 (de) 2014-09-11
CA2899081A1 (en) 2014-09-12
CA2899081C (en) 2021-04-06
WO2014135429A1 (de) 2014-09-12
EP2965067B1 (de) 2020-09-09
US20150362639A1 (en) 2015-12-17
KR20150128721A (ko) 2015-11-18

Similar Documents

Publication Publication Date Title
KR102190465B1 (ko) 광학 미러, 엑스선 형광 분석 장치 및 엑스선 형광 분석 방법
CN114729907B (zh) 用于计算机层析x射线荧光成像的系统和方法
US5778039A (en) Method and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF)
US7555102B1 (en) Systems and methods for imaging using radiation from laser produced plasmas
US20190353802A1 (en) X-ray detector and x-ray imaging apparatus
JP6851107B2 (ja) Ｘ線分析装置
US8891728B2 (en) Specimen supporting member for X-ray microscope image observation, specimen containing cell for X-ray microscope image observation, and X-ray microscope
Metzkes et al. An online, energy-resolving beam profile detector for laser-driven proton beams
CN108028161A (zh) 用于带电粒子束装置的分段式检测器
EP1044457B1 (en) X-ray irradiation apparatus including an x-ray source provided with a capillary optical system
JP6352616B2 (ja) Ｘ線計測装置
JP2764505B2 (ja) 電子分光方法とこれを用いた電子分光装置
Tata et al. A gated Thomson parabola spectrometer for improved ion and neutral atom measurements in intense laser produced plasmas
JP2009236622A (ja) 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置
JPH11281597A (ja) 光電子分光装置及び表面分析法
Andreev et al. Spatial resolving power of laser plasma ionography
JP3339267B2 (ja) Ｘ線分析方法およびｘ線分析装置
Khaplanov et al. Advances in detection for neutron reflectometry with time-resolved imaging detectors
JP3860641B2 (ja) 蛍光ｘ線分析装置
JPH07280750A (ja) 波長分散型ｘ線分光装置
Aoi et al. Radiophotoluminescent observation of X-ray microbeam track in silver-activated phosphate glass
JPH01118757A (ja) 表面分析装置のマスク
Violet Instrumentation for X-ray diagnostics of plasmas
Koester et al. Quantitative analysis of thin samples by differential absorption imaging using a laser-plasma soft X-ray source
JPS6353457A (ja) 二次元走査型状態分析装置

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6