ES2835715T3 - Espejo óptico, dispositivo de análisis de fluorescencia de rayos X y procedimiento para el análisis de fluorescencia de rayos X - Google Patents
Espejo óptico, dispositivo de análisis de fluorescencia de rayos X y procedimiento para el análisis de fluorescencia de rayos X Download PDFInfo
- Publication number
- ES2835715T3 ES2835715T3 ES14707366T ES14707366T ES2835715T3 ES 2835715 T3 ES2835715 T3 ES 2835715T3 ES 14707366 T ES14707366 T ES 14707366T ES 14707366 T ES14707366 T ES 14707366T ES 2835715 T3 ES2835715 T3 ES 2835715T3
- Authority
- ES
- Spain
- Prior art keywords
- ray
- support
- sample
- optical mirror
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 54
- 238000004876 x-ray fluorescence Methods 0.000 title claims abstract description 37
- 238000004458 analytical method Methods 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims description 7
- 238000005259 measurement Methods 0.000 claims abstract description 36
- 230000005855 radiation Effects 0.000 claims abstract description 32
- 239000004033 plastic Substances 0.000 claims description 10
- 229920003023 plastic Polymers 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 7
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 7
- -1 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims 2
- 239000010408 film Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 208000032538 Depersonalisation Diseases 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011104 metalized film Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 238000009681 x-ray fluorescence measurement Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013102270.7A DE102013102270A1 (de) | 2013-03-07 | 2013-03-07 | Optischer Spiegel, Röntgenfluoreszenzanalysegerät und Verfahren zur Röntgenfluoreszenzanalyse |
| PCT/EP2014/053799 WO2014135429A1 (de) | 2013-03-07 | 2014-02-27 | Optischer spiegel, röntgenfluoreszenzanalysegerät und verfahren zur röntgenfluoreszenzanalyse |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2835715T3 true ES2835715T3 (es) | 2021-06-23 |
Family
ID=50190427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES14707366T Active ES2835715T3 (es) | 2013-03-07 | 2014-02-27 | Espejo óptico, dispositivo de análisis de fluorescencia de rayos X y procedimiento para el análisis de fluorescencia de rayos X |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US9880329B2 (enExample) |
| EP (1) | EP2965067B1 (enExample) |
| JP (1) | JP6521384B2 (enExample) |
| KR (1) | KR102190465B1 (enExample) |
| CN (2) | CN105008905A (enExample) |
| CA (1) | CA2899081C (enExample) |
| DE (1) | DE102013102270A1 (enExample) |
| ES (1) | ES2835715T3 (enExample) |
| HK (1) | HK1212027A1 (enExample) |
| MX (1) | MX345821B (enExample) |
| WO (1) | WO2014135429A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101716860B1 (ko) * | 2016-05-30 | 2017-03-27 | 주식회사 아이에스피 | 엑스선 형광분석 장치 |
| KR20180052019A (ko) * | 2016-11-09 | 2018-05-17 | 고려대학교 산학협력단 | X선 형광분석 원자층 증착 장치 및 x선 형광분석 원자층 증착 방법 |
| WO2018110265A1 (ja) * | 2016-12-15 | 2018-06-21 | 株式会社堀場製作所 | 放射線検出装置 |
| CN106802428B (zh) * | 2017-01-19 | 2019-01-01 | 中国科学院上海应用物理研究所 | 一种耐辐射和高热负载的x射线成像探测器 |
| WO2020002965A1 (en) * | 2018-06-25 | 2020-01-02 | Mirion Technologies (Canberra), Inc | Apparatus for visualizing a movable radiation source |
| KR102209768B1 (ko) | 2019-05-20 | 2021-01-29 | (주)고도기연 | 정밀노즐 세척 장치 |
| DE102022105838B3 (de) * | 2022-03-14 | 2023-08-17 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät |
| CN115993713B (zh) * | 2023-03-22 | 2023-06-09 | 西安玄瑞光电科技有限公司 | 一种折反式超大视场x射线显微耦合光学成像系统 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54178532U (enExample) * | 1978-06-06 | 1979-12-17 | ||
| JPS5758300U (enExample) * | 1980-09-22 | 1982-04-06 | ||
| JPS57129156U (enExample) | 1981-02-04 | 1982-08-12 | ||
| DE3239379A1 (de) * | 1982-10-23 | 1984-04-26 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Vorrichtung zum messen der dicke duenner schichten |
| DE3314281A1 (de) | 1982-10-23 | 1984-10-25 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Vorrichtung zum messen der dicke duenner schichten |
| JPH01257210A (ja) * | 1988-04-06 | 1989-10-13 | Seiko Instr Inc | ケイ光ｘ線膜厚計 |
| DE4021388A1 (de) * | 1990-07-05 | 1992-01-16 | Twin City Int Inc | Vorrichtung zum messen der staerke eines ueberzuges |
| US5247395A (en) * | 1992-05-11 | 1993-09-21 | Eugene Martinez | Thin film mirror |
| US5708696A (en) * | 1996-09-17 | 1998-01-13 | Dentsply Research & Development Corp. | Positioning device for an X-ray machine |
| DE19710420C2 (de) | 1997-03-13 | 2001-07-12 | Helmut Fischer Gmbh & Co | Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz |
| JP3883153B2 (ja) * | 1998-04-10 | 2007-02-21 | 松下電器産業株式会社 | Ｘ線基板検査装置 |
| JP3996821B2 (ja) | 2002-03-27 | 2007-10-24 | 株式会社堀場製作所 | Ｘ線分析装置 |
| CN1603945A (zh) * | 2003-09-29 | 2005-04-06 | Ge医疗系统环球技术有限公司 | 光辐照器，灯组件和x射线装置 |
| CA2709215C (en) | 2008-01-28 | 2013-07-02 | Reflective X-Ray Optics Llc | Optical alignment system and alignment method for radiographic x-ray imaging |
| DE102009009602A1 (de) * | 2008-10-27 | 2010-04-29 | Ifg - Institute For Scientific Instruments Gmbh | Spektralauflösende elektronische Röntgenkamera |
| DE102010017543A1 (de) * | 2010-06-23 | 2011-12-29 | Surgiceye Gmbh | Vorrichtung und Verfahren zur kombinierten optischen und nuklearen Bilderfassung |
-
2013
- 2013-03-07 DE DE102013102270.7A patent/DE102013102270A1/de not_active Withdrawn
-
2014
- 2014-02-27 EP EP14707366.2A patent/EP2965067B1/de active Active
- 2014-02-27 CN CN201480011675.4A patent/CN105008905A/zh active Pending
- 2014-02-27 KR KR1020157025068A patent/KR102190465B1/ko active Active
- 2014-02-27 MX MX2015011729A patent/MX345821B/es active IP Right Grant
- 2014-02-27 JP JP2015560622A patent/JP6521384B2/ja active Active
- 2014-02-27 US US14/761,493 patent/US9880329B2/en active Active
- 2014-02-27 WO PCT/EP2014/053799 patent/WO2014135429A1/de not_active Ceased
- 2014-02-27 CA CA2899081A patent/CA2899081C/en active Active
- 2014-02-27 ES ES14707366T patent/ES2835715T3/es active Active
- 2014-02-27 CN CN201911010330.8A patent/CN110702718A/zh active Pending
- 2014-02-27 HK HK15112747.4A patent/HK1212027A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN110702718A (zh) | 2020-01-17 |
| HK1212027A1 (zh) | 2016-07-08 |
| WO2014135429A1 (de) | 2014-09-12 |
| EP2965067A1 (de) | 2016-01-13 |
| EP2965067B1 (de) | 2020-09-09 |
| MX2015011729A (es) | 2016-01-15 |
| MX345821B (es) | 2017-02-16 |
| CA2899081C (en) | 2021-04-06 |
| DE102013102270A1 (de) | 2014-09-11 |
| KR20150128721A (ko) | 2015-11-18 |
| CA2899081A1 (en) | 2014-09-12 |
| JP6521384B2 (ja) | 2019-05-29 |
| US9880329B2 (en) | 2018-01-30 |
| JP2016509231A (ja) | 2016-03-24 |
| CN105008905A (zh) | 2015-10-28 |
| KR102190465B1 (ko) | 2020-12-14 |
| US20150362639A1 (en) | 2015-12-17 |
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