KR102155099B1 - 진공 증착 장치 - Google Patents

진공 증착 장치 Download PDF

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Publication number
KR102155099B1
KR102155099B1 KR1020187033456A KR20187033456A KR102155099B1 KR 102155099 B1 KR102155099 B1 KR 102155099B1 KR 1020187033456 A KR1020187033456 A KR 1020187033456A KR 20187033456 A KR20187033456 A KR 20187033456A KR 102155099 B1 KR102155099 B1 KR 102155099B1
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KR
South Korea
Prior art keywords
nozzle
axis direction
substrate
hole
film
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KR1020187033456A
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English (en)
Korean (ko)
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KR20180129960A (ko
Inventor
료야 키타자와
켄타로 쿠미타
마코토 키쿠치
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가부시키가이샤 알박
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Publication of KR20180129960A publication Critical patent/KR20180129960A/ko
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Publication of KR102155099B1 publication Critical patent/KR102155099B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020187033456A 2016-08-02 2017-07-19 진공 증착 장치 KR102155099B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016152340 2016-08-02
JPJP-P-2016-152340 2016-08-02
PCT/JP2017/026065 WO2018025637A1 (ja) 2016-08-02 2017-07-19 真空蒸着装置

Publications (2)

Publication Number Publication Date
KR20180129960A KR20180129960A (ko) 2018-12-05
KR102155099B1 true KR102155099B1 (ko) 2020-09-11

Family

ID=61073386

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187033456A KR102155099B1 (ko) 2016-08-02 2017-07-19 진공 증착 장치

Country Status (5)

Country Link
JP (1) JP6620244B2 (zh)
KR (1) KR102155099B1 (zh)
CN (1) CN109328244B (zh)
TW (1) TW201814771A (zh)
WO (1) WO2018025637A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7297449B2 (ja) * 2019-01-10 2023-06-26 株式会社アルバック 蒸着装置及びノズル用アダプタ
JP7026143B2 (ja) 2019-01-10 2022-02-25 株式会社アルバック 蒸着装置
JP2020132985A (ja) * 2019-02-25 2020-08-31 株式会社アルバック 真空処理装置及び真空処理方法
CN109868452B (zh) * 2019-03-19 2021-01-01 武汉华星光电半导体显示技术有限公司 冷却板和真空蒸镀装置
KR102551540B1 (ko) 2019-04-19 2023-07-06 가부시키가이샤 아루박 증착원 및 증착 장치
KR102569822B1 (ko) * 2021-02-09 2023-08-23 주식회사 야스 플럭스 조절 가능한 노즐을 구비한 증발원
CN114318237A (zh) * 2021-12-29 2022-04-12 武汉华星光电半导体显示技术有限公司 一种蒸镀装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014201834A (ja) 2013-04-01 2014-10-27 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ 単点リニア蒸発源システム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050211172A1 (en) * 2002-03-08 2005-09-29 Freeman Dennis R Elongated thermal physical vapor deposition source with plural apertures
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
KR20060060994A (ko) * 2004-12-01 2006-06-07 삼성에스디아이 주식회사 증착 소스 및 이를 구비한 증착 장치
KR100687007B1 (ko) * 2005-03-22 2007-02-26 세메스 주식회사 유기전계 발광 소자 제조에 사용되는 유기 박박 증착 장치
JP5346239B2 (ja) 2009-05-21 2013-11-20 株式会社アルバック 真空蒸着装置
KR20120061394A (ko) * 2010-12-03 2012-06-13 삼성모바일디스플레이주식회사 증발원 및 유기물 증착 방법
KR102046440B1 (ko) 2012-10-09 2019-11-20 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법
KR102046441B1 (ko) * 2012-10-12 2019-11-20 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법
CN104099571A (zh) * 2013-04-01 2014-10-15 上海和辉光电有限公司 蒸发源组件和薄膜沉积装置和薄膜沉积方法
KR20150118691A (ko) * 2014-04-15 2015-10-23 엘지전자 주식회사 증착물질 공급 장치 및 이를 구비한 증착 장치
JP6529257B2 (ja) * 2014-12-26 2019-06-12 キヤノントッキ株式会社 真空蒸着装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014201834A (ja) 2013-04-01 2014-10-27 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ 単点リニア蒸発源システム

Also Published As

Publication number Publication date
WO2018025637A1 (ja) 2018-02-08
TW201814771A (zh) 2018-04-16
KR20180129960A (ko) 2018-12-05
CN109328244B (zh) 2021-06-22
JPWO2018025637A1 (ja) 2018-10-18
CN109328244A (zh) 2019-02-12
JP6620244B2 (ja) 2019-12-11

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