KR102145934B1 - 광경화 패턴의 형성 방법 - Google Patents

광경화 패턴의 형성 방법 Download PDF

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Publication number
KR102145934B1
KR102145934B1 KR1020140060386A KR20140060386A KR102145934B1 KR 102145934 B1 KR102145934 B1 KR 102145934B1 KR 1020140060386 A KR1020140060386 A KR 1020140060386A KR 20140060386 A KR20140060386 A KR 20140060386A KR 102145934 B1 KR102145934 B1 KR 102145934B1
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KR
South Korea
Prior art keywords
light
pattern
wavelength
group
integral value
Prior art date
Application number
KR1020140060386A
Other languages
English (en)
Korean (ko)
Other versions
KR20150133514A (ko
Inventor
최화섭
백기범
박근영
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020140060386A priority Critical patent/KR102145934B1/ko
Priority to JP2015099341A priority patent/JP6557054B2/ja
Priority to CN201510257148.8A priority patent/CN105093846B/zh
Publication of KR20150133514A publication Critical patent/KR20150133514A/ko
Application granted granted Critical
Publication of KR102145934B1 publication Critical patent/KR102145934B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020140060386A 2014-05-20 2014-05-20 광경화 패턴의 형성 방법 KR102145934B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020140060386A KR102145934B1 (ko) 2014-05-20 2014-05-20 광경화 패턴의 형성 방법
JP2015099341A JP6557054B2 (ja) 2014-05-20 2015-05-14 光硬化パターンの形成方法
CN201510257148.8A CN105093846B (zh) 2014-05-20 2015-05-20 光固化图案的形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140060386A KR102145934B1 (ko) 2014-05-20 2014-05-20 광경화 패턴의 형성 방법

Publications (2)

Publication Number Publication Date
KR20150133514A KR20150133514A (ko) 2015-11-30
KR102145934B1 true KR102145934B1 (ko) 2020-08-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140060386A KR102145934B1 (ko) 2014-05-20 2014-05-20 광경화 패턴의 형성 방법

Country Status (3)

Country Link
JP (1) JP6557054B2 (ja)
KR (1) KR102145934B1 (ja)
CN (1) CN105093846B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102646460B1 (ko) * 2015-07-24 2024-03-11 스미또모 가가꾸 가부시끼가이샤 조성물 및 표시 장치
JP7270204B2 (ja) * 2018-11-09 2023-05-10 互応化学工業株式会社 皮膜の製造方法及びプリント配線板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010032985A (ja) 2008-06-30 2010-02-12 Fujifilm Corp 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
US20110228201A1 (en) 2010-03-22 2011-09-22 Chi-Mei Corporation Photosensitive resin composition for color filter and color filter using same

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
JP3856412B2 (ja) * 1997-09-02 2006-12-13 東洋合成工業株式会社 パターン形成方法
EP1209695B1 (en) * 2000-11-24 2004-10-06 Sony International (Europe) GmbH Selective metallisation of nucleic acids via metal nanoparticles produced in-situ
WO2004015497A1 (ja) * 2002-08-07 2004-02-19 Mitsubishi Chemical Corporation 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
JP4410134B2 (ja) * 2005-03-24 2010-02-03 日立ビアメカニクス株式会社 パターン露光方法及び装置
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
JP2008263092A (ja) * 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP2009069224A (ja) * 2007-09-10 2009-04-02 Fujifilm Corp 樹脂製薄膜及びその製造方法、並びに液晶用カラーフィルタ及びその製造方法
JP2010018797A (ja) * 2008-06-11 2010-01-28 Sekisui Chem Co Ltd 光学部品用硬化性組成物、光学部品用接着剤及び有機エレクトロルミネッセンス素子用封止剤
TWI477904B (zh) * 2010-03-26 2015-03-21 Sumitomo Chemical Co Photosensitive resin composition
JP2011209594A (ja) * 2010-03-30 2011-10-20 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP2013011867A (ja) * 2011-05-31 2013-01-17 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010032985A (ja) 2008-06-30 2010-02-12 Fujifilm Corp 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
US20110228201A1 (en) 2010-03-22 2011-09-22 Chi-Mei Corporation Photosensitive resin composition for color filter and color filter using same

Also Published As

Publication number Publication date
CN105093846B (zh) 2017-06-23
JP6557054B2 (ja) 2019-08-07
CN105093846A (zh) 2015-11-25
KR20150133514A (ko) 2015-11-30
JP2015219526A (ja) 2015-12-07

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