KR102095312B1 - 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치 - Google Patents

포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치 Download PDF

Info

Publication number
KR102095312B1
KR102095312B1 KR1020130025665A KR20130025665A KR102095312B1 KR 102095312 B1 KR102095312 B1 KR 102095312B1 KR 1020130025665 A KR1020130025665 A KR 1020130025665A KR 20130025665 A KR20130025665 A KR 20130025665A KR 102095312 B1 KR102095312 B1 KR 102095312B1
Authority
KR
South Korea
Prior art keywords
group
structural unit
acid
resin composition
photosensitive resin
Prior art date
Application number
KR1020130025665A
Other languages
English (en)
Korean (ko)
Other versions
KR20130105420A (ko
Inventor
사토루 야마다
타케시 안도
켄타 야마자키
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20130105420A publication Critical patent/KR20130105420A/ko
Application granted granted Critical
Publication of KR102095312B1 publication Critical patent/KR102095312B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K65/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element and at least one organic radiation-sensitive element, e.g. organic opto-couplers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/151—Copolymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electroluminescent Light Sources (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020130025665A 2012-03-12 2013-03-11 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치 KR102095312B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-054088 2012-03-12
JP2012054088A JP5528493B2 (ja) 2012-03-12 2012-03-12 ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

Publications (2)

Publication Number Publication Date
KR20130105420A KR20130105420A (ko) 2013-09-25
KR102095312B1 true KR102095312B1 (ko) 2020-03-31

Family

ID=49387885

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130025665A KR102095312B1 (ko) 2012-03-12 2013-03-11 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치

Country Status (3)

Country Link
JP (1) JP5528493B2 (zh)
KR (1) KR102095312B1 (zh)
TW (1) TWI595320B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6492444B2 (ja) * 2013-09-04 2019-04-03 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び電子デバイス
JP2015069179A (ja) * 2013-09-30 2015-04-13 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び表示素子
KR102194820B1 (ko) * 2014-06-10 2020-12-24 삼성디스플레이 주식회사 수지 조성물, 이를 사용하는 표시 장치의 제조 방법 및 그 방법으로 제조된 표시 장치
JPWO2015198603A1 (ja) * 2014-06-25 2017-04-20 株式会社Ｊｏｌｅｄ 有機ｅｌ表示パネルの製造方法
JP2016017172A (ja) * 2014-07-11 2016-02-01 Dic株式会社 含フッ素熱分解性樹脂、レジスト組成物、カラーフィルター保護膜用組成物、レジスト膜及びカラーフィルター保護膜
KR102071376B1 (ko) 2015-08-31 2020-01-30 후지필름 가부시키가이샤 경화성 조성물, 경화막의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
EP3778674A4 (en) * 2018-05-14 2022-01-05 The School Corporation Kansai University NEW FERROELECTRIC MATERIAL
CN112205075A (zh) * 2018-05-30 2021-01-08 电化株式会社 有机电致发光显示元件用密封剂
JPWO2020054559A1 (ja) * 2018-09-10 2021-09-16 セントラル硝子株式会社 含フッ素樹脂組成物
JP6797351B2 (ja) * 2019-03-28 2020-12-09 Dic株式会社 含フッ素熱分解性樹脂、レジスト組成物、カラーフィルター保護膜用組成物、レジスト膜及びカラーフィルター保護膜
JP7473811B2 (ja) * 2020-09-08 2024-04-24 セントラル硝子株式会社 光硬化性組成物、その硬化物、電子デバイスおよび光学部材

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011065207A1 (ja) * 2009-11-30 2011-06-03 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
WO2011096400A1 (ja) * 2010-02-02 2011-08-11 日産化学工業株式会社 ポジ型感光性樹脂組成物及び撥液性被膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006099380A2 (en) * 2005-03-11 2006-09-21 E.I. Dupont De Nemours And Company Photoimageable, thermosettable fluorinated resists
JP2007101762A (ja) * 2005-10-03 2007-04-19 Jsr Corp 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成
JP5623896B2 (ja) * 2010-01-15 2014-11-12 富士フイルム株式会社 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
CN102746457A (zh) * 2011-04-19 2012-10-24 住友化学株式会社 树脂和包含其的光刻胶组合物
JP5742661B2 (ja) * 2011-10-25 2015-07-01 信越化学工業株式会社 ポジ型レジスト組成物及びパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011065207A1 (ja) * 2009-11-30 2011-06-03 Jsr株式会社 感放射線性組成物及びレジストパターン形成方法
WO2011096400A1 (ja) * 2010-02-02 2011-08-11 日産化学工業株式会社 ポジ型感光性樹脂組成物及び撥液性被膜

Also Published As

Publication number Publication date
KR20130105420A (ko) 2013-09-25
TWI595320B (zh) 2017-08-11
JP5528493B2 (ja) 2014-06-25
TW201341961A (zh) 2013-10-16
JP2013186450A (ja) 2013-09-19

Similar Documents

Publication Publication Date Title
KR102095312B1 (ko) 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치
JP5873450B2 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機ｅｌ表示装置
JP5531034B2 (ja) 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置及び液晶表示装置
KR101729599B1 (ko) 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법
JP5542851B2 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
KR20140148431A (ko) 화학 증폭형 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치
JP6038951B2 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
KR20120065947A (ko) 포지티브형 감광성 수지 조성물
JP2013210607A (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP2013171101A (ja) ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP2013210558A (ja) 化学増幅型ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
WO2013125624A1 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JPWO2014126088A1 (ja) 感光性樹脂組成物、これを用いた硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
JP5795748B2 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
WO2013157459A1 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP6017301B2 (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
JP5546568B2 (ja) ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
KR20150107847A (ko) 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 액정 표시 장치 및 유기 el 표시 장치
KR101763685B1 (ko) 감광성 수지 조성물, 경화막의 제조방법, 경화막, 유기 el 표시장치 및 액정 표시장치
JP2014010200A (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
WO2014088018A1 (ja) 硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
KR102098125B1 (ko) 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치
JP2014071300A (ja) 感光性樹脂組成物、これを用いた硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
JP2013178420A (ja) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置及び液晶表示装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant