KR102093603B1 - 고분자 박막상에 디지털 미세 패턴들 연속 생성 - Google Patents

고분자 박막상에 디지털 미세 패턴들 연속 생성 Download PDF

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Publication number
KR102093603B1
KR102093603B1 KR1020140083679A KR20140083679A KR102093603B1 KR 102093603 B1 KR102093603 B1 KR 102093603B1 KR 1020140083679 A KR1020140083679 A KR 1020140083679A KR 20140083679 A KR20140083679 A KR 20140083679A KR 102093603 B1 KR102093603 B1 KR 102093603B1
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South Korea
Prior art keywords
conveyor
patterned
thin film
fine
polymer thin
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KR1020140083679A
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English (en)
Korean (ko)
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KR20150009923A (ko
Inventor
매튜 존슨 데이비드
알. 볼켈 아민
스티븐 파슈케위츠 존
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팔로 알토 리서치 센터 인코포레이티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/005—Curtain coaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/007—Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F16/00—Transfer printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/06—Developing
    • G03G13/10—Developing using a liquid developer, e.g. liquid suspension
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/02—Apparatus for electrographic processes using a charge pattern for laying down a uniform charge, e.g. for sensitising; Corona discharge devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Micromachines (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020140083679A 2013-07-17 2014-07-04 고분자 박막상에 디지털 미세 패턴들 연속 생성 Expired - Fee Related KR102093603B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/944,843 US9348231B2 (en) 2013-07-17 2013-07-17 Continuously producing digital micro-scale patterns on a thin polymer film
US13/944,843 2013-07-17

Publications (2)

Publication Number Publication Date
KR20150009923A KR20150009923A (ko) 2015-01-27
KR102093603B1 true KR102093603B1 (ko) 2020-04-16

Family

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Family Applications (1)

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KR1020140083679A Expired - Fee Related KR102093603B1 (ko) 2013-07-17 2014-07-04 고분자 박막상에 디지털 미세 패턴들 연속 생성

Country Status (6)

Country Link
US (1) US9348231B2 (enExample)
EP (1) EP2827192B1 (enExample)
JP (1) JP6293589B2 (enExample)
KR (1) KR102093603B1 (enExample)
CN (1) CN104290317B (enExample)
TW (1) TWI631424B (enExample)

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JP6037914B2 (ja) * 2013-03-29 2016-12-07 富士フイルム株式会社 保護膜のエッチング方法およびテンプレートの製造方法
US9884437B2 (en) 2014-06-20 2018-02-06 Palo Alto Research Center Incorporated Integral vasculature
EP2974813A1 (de) * 2014-07-17 2016-01-20 MTU Aero Engines GmbH Anlage und verfahren zur generativen herstellung und/oder reparatur von bauteilen
US10384432B2 (en) * 2016-02-19 2019-08-20 Palo Alto Research Center Incorporated Hierarchical laminates fabricated from micro-scale, digitally patterned films
US10838297B2 (en) * 2016-09-16 2020-11-17 3M Innovative Properties Company Method of making a nanostructured cylindrical roll
US10710283B2 (en) 2016-12-22 2020-07-14 Palo Alto Research Center Incorporated Membrane surface hydrophobicity through electro-hydrodynamic film patterning
GB201701182D0 (en) * 2017-01-24 2017-03-08 Univ Birmingham Surface enhanced raman scattering apparatus and method
NO342507B1 (en) * 2017-03-29 2018-06-04 Condalign As A method for forming av body comprising at least one through-going passage
EP3671342B1 (en) * 2018-12-20 2021-03-17 IMEC vzw Induced stress for euv pellicle tensioning
US11732378B2 (en) * 2019-10-02 2023-08-22 Palo Alto Research Center Incorporated Three dielectric electrohydrodynamic patterning
CN112644158B (zh) * 2020-06-28 2023-02-28 正扬科技有限公司 连续式紫外光固化装置
CN112895408B (zh) * 2020-12-28 2022-05-20 杭州电子科技大学 基于相场模型的聚合物表面微结构可控成形机理研究方法
WO2022178426A1 (en) * 2021-02-21 2022-08-25 The Regents Of The University Of California Roll-to-roll based 3d printing through computed axial lithography

Citations (4)

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JP2007062095A (ja) 2005-08-30 2007-03-15 Ricoh Co Ltd プラスチック成形品の製造方法、及びその製造装置
KR100789581B1 (ko) 2005-08-17 2007-12-28 주식회사 엘지화학 이온 성분을 함유하는 코팅액을 이용한 패턴 형성 방법
KR101265321B1 (ko) 2005-11-14 2013-05-20 엘지디스플레이 주식회사 스탬프 제조 방법, 그를 이용한 박막트랜지스터 및액정표시장치의 제조 방법
JP5473440B2 (ja) 2008-07-04 2014-04-16 ツィンファ ユニバーシティ タッチパネルを利用した液晶表示パネルの製造方法

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US2476282A (en) * 1945-01-09 1949-07-19 American Viscose Corp Textile products and production thereof
US4166089A (en) * 1969-11-13 1979-08-28 Agfa-Gevaert N.V. Corona free pinning of extruded polymer film
ATE294648T1 (de) * 1999-12-23 2005-05-15 Univ Massachusetts Verfahren zur herstellung von submikron mustern auf filmen
KR20050025545A (ko) * 2001-05-16 2005-03-14 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 전기장을 사용하여 광 중합 화합물내에 나노스케일의패턴을 생성하기 위한 방법 및 시스템
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
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MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
ITTO20020772A1 (it) * 2002-09-06 2004-03-07 Fiat Ricerche Metodo per la realizzazione di strutture tridimensionali
JP2006506474A (ja) * 2002-10-11 2006-02-23 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー パターニングされたフィブリル表面を有するフィルム、ならびにフィルムを製造するための方法および装置
US7163611B2 (en) 2003-12-03 2007-01-16 Palo Alto Research Center Incorporated Concentration and focusing of bio-agents and micron-sized particles using traveling wave grids
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KR20090108853A (ko) * 2008-04-14 2009-10-19 삼성전자주식회사 무기물 패턴 형성용 조성물 및 그를 이용한 무기물패턴형성 방법
JP5542313B2 (ja) * 2008-06-18 2014-07-09 協立化学産業株式会社 パターン形成方法
JP5129665B2 (ja) * 2008-06-25 2013-01-30 パナソニック株式会社 プラズマ処理装置

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KR100789581B1 (ko) 2005-08-17 2007-12-28 주식회사 엘지화학 이온 성분을 함유하는 코팅액을 이용한 패턴 형성 방법
JP2007062095A (ja) 2005-08-30 2007-03-15 Ricoh Co Ltd プラスチック成形品の製造方法、及びその製造装置
KR101265321B1 (ko) 2005-11-14 2013-05-20 엘지디스플레이 주식회사 스탬프 제조 방법, 그를 이용한 박막트랜지스터 및액정표시장치의 제조 방법
JP5473440B2 (ja) 2008-07-04 2014-04-16 ツィンファ ユニバーシティ タッチパネルを利用した液晶表示パネルの製造方法

Also Published As

Publication number Publication date
EP2827192B1 (en) 2019-02-27
JP6293589B2 (ja) 2018-03-14
US20150022790A1 (en) 2015-01-22
TW201518868A (zh) 2015-05-16
CN104290317A (zh) 2015-01-21
TWI631424B (zh) 2018-08-01
US9348231B2 (en) 2016-05-24
EP2827192A1 (en) 2015-01-21
KR20150009923A (ko) 2015-01-27
CN104290317B (zh) 2018-06-05
JP2015020434A (ja) 2015-02-02

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