TWI631424B - 用於製造微型圖案化的結構的系統 - Google Patents

用於製造微型圖案化的結構的系統 Download PDF

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Publication number
TWI631424B
TWI631424B TW103124243A TW103124243A TWI631424B TW I631424 B TWI631424 B TW I631424B TW 103124243 A TW103124243 A TW 103124243A TW 103124243 A TW103124243 A TW 103124243A TW I631424 B TWI631424 B TW I631424B
Authority
TW
Taiwan
Prior art keywords
patterned
conveyor belt
micro
liquid
area
Prior art date
Application number
TW103124243A
Other languages
English (en)
Chinese (zh)
Other versions
TW201518868A (zh
Inventor
大衛馬修 強森
阿敏Ｒ 佛克
約翰 帕斯奇克威茲
Original Assignee
帕洛阿爾托研究中心公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 帕洛阿爾托研究中心公司 filed Critical 帕洛阿爾托研究中心公司
Publication of TW201518868A publication Critical patent/TW201518868A/zh
Application granted granted Critical
Publication of TWI631424B publication Critical patent/TWI631424B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/005—Curtain coaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/007—Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F16/00—Transfer printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/06—Developing
    • G03G13/10—Developing using a liquid developer, e.g. liquid suspension
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/02—Apparatus for electrographic processes using a charge pattern for laying down a uniform charge, e.g. for sensitising; Corona discharge devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Micromachines (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
TW103124243A 2013-07-17 2014-07-15 用於製造微型圖案化的結構的系統 TWI631424B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/944,843 US9348231B2 (en) 2013-07-17 2013-07-17 Continuously producing digital micro-scale patterns on a thin polymer film
US13/944,843 2013-07-17

Publications (2)

Publication Number Publication Date
TW201518868A TW201518868A (zh) 2015-05-16
TWI631424B true TWI631424B (zh) 2018-08-01

Family

ID=51211592

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103124243A TWI631424B (zh) 2013-07-17 2014-07-15 用於製造微型圖案化的結構的系統

Country Status (6)

Country Link
US (1) US9348231B2 (enExample)
EP (1) EP2827192B1 (enExample)
JP (1) JP6293589B2 (enExample)
KR (1) KR102093603B1 (enExample)
CN (1) CN104290317B (enExample)
TW (1) TWI631424B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6037914B2 (ja) * 2013-03-29 2016-12-07 富士フイルム株式会社 保護膜のエッチング方法およびテンプレートの製造方法
US9884437B2 (en) 2014-06-20 2018-02-06 Palo Alto Research Center Incorporated Integral vasculature
EP2974813A1 (de) * 2014-07-17 2016-01-20 MTU Aero Engines GmbH Anlage und verfahren zur generativen herstellung und/oder reparatur von bauteilen
US10384432B2 (en) 2016-02-19 2019-08-20 Palo Alto Research Center Incorporated Hierarchical laminates fabricated from micro-scale, digitally patterned films
WO2018052895A2 (en) * 2016-09-16 2018-03-22 3M Innovative Properties Company Method of making a nanostructured cylindrical roll
US10710283B2 (en) 2016-12-22 2020-07-14 Palo Alto Research Center Incorporated Membrane surface hydrophobicity through electro-hydrodynamic film patterning
GB201701182D0 (en) * 2017-01-24 2017-03-08 Univ Birmingham Surface enhanced raman scattering apparatus and method
NO342507B1 (en) * 2017-03-29 2018-06-04 Condalign As A method for forming av body comprising at least one through-going passage
EP3671342B1 (en) * 2018-12-20 2021-03-17 IMEC vzw Induced stress for euv pellicle tensioning
US11732378B2 (en) * 2019-10-02 2023-08-22 Palo Alto Research Center Incorporated Three dielectric electrohydrodynamic patterning
CN112644158B (zh) * 2020-06-28 2023-02-28 正扬科技有限公司 连续式紫外光固化装置
CN112895408B (zh) * 2020-12-28 2022-05-20 杭州电子科技大学 基于相场模型的聚合物表面微结构可控成形机理研究方法
US20240012330A1 (en) * 2021-02-21 2024-01-11 The Regents Of The University Of California Roll-to-roll based 3d printing through computed axial lithography

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2476282A (en) * 1945-01-09 1949-07-19 American Viscose Corp Textile products and production thereof
WO2004033190A2 (en) * 2002-10-11 2004-04-22 E. I. Du Pont De Nemours And Company Film having a patterned fibrillar surface, and method and apparatus for making the film
TW200514626A (en) * 2001-05-16 2005-05-01 Univ Texas Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166089A (en) * 1969-11-13 1979-08-28 Agfa-Gevaert N.V. Corona free pinning of extruded polymer film
US6391217B2 (en) * 1999-12-23 2002-05-21 University Of Massachusetts Methods and apparatus for forming submicron patterns on films
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
JP2003343964A (ja) * 2002-05-29 2003-12-03 Glocal:Kk 冷凍装置
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
ITTO20020772A1 (it) * 2002-09-06 2004-03-07 Fiat Ricerche Metodo per la realizzazione di strutture tridimensionali
US7163611B2 (en) 2003-12-03 2007-01-16 Palo Alto Research Center Incorporated Concentration and focusing of bio-agents and micron-sized particles using traveling wave grids
TWI345804B (en) * 2005-08-17 2011-07-21 Lg Chemical Ltd Patterning method using coatings containing ionic components
KR100789581B1 (ko) 2005-08-17 2007-12-28 주식회사 엘지화학 이온 성분을 함유하는 코팅액을 이용한 패턴 형성 방법
JP2007062095A (ja) 2005-08-30 2007-03-15 Ricoh Co Ltd プラスチック成形品の製造方法、及びその製造装置
KR101265321B1 (ko) 2005-11-14 2013-05-20 엘지디스플레이 주식회사 스탬프 제조 방법, 그를 이용한 박막트랜지스터 및액정표시장치의 제조 방법
KR20090108853A (ko) * 2008-04-14 2009-10-19 삼성전자주식회사 무기물 패턴 형성용 조성물 및 그를 이용한 무기물패턴형성 방법
JP5542313B2 (ja) * 2008-06-18 2014-07-09 協立化学産業株式会社 パターン形成方法
JP5129665B2 (ja) * 2008-06-25 2013-01-30 パナソニック株式会社 プラズマ処理装置
CN101620348B (zh) 2008-07-04 2011-07-27 清华大学 触摸式液晶显示屏的制备方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2476282A (en) * 1945-01-09 1949-07-19 American Viscose Corp Textile products and production thereof
TW200514626A (en) * 2001-05-16 2005-05-01 Univ Texas Method and system for fabricating nanoscale patterns in light curable compositions using an electric field
WO2004033190A2 (en) * 2002-10-11 2004-04-22 E. I. Du Pont De Nemours And Company Film having a patterned fibrillar surface, and method and apparatus for making the film

Also Published As

Publication number Publication date
KR102093603B1 (ko) 2020-04-16
EP2827192A1 (en) 2015-01-21
JP2015020434A (ja) 2015-02-02
US20150022790A1 (en) 2015-01-22
JP6293589B2 (ja) 2018-03-14
EP2827192B1 (en) 2019-02-27
KR20150009923A (ko) 2015-01-27
CN104290317A (zh) 2015-01-21
US9348231B2 (en) 2016-05-24
TW201518868A (zh) 2015-05-16
CN104290317B (zh) 2018-06-05

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