JP6293589B2 - 高分子薄膜におけるデジタル・マイクロスケール・パターンの連続的生産 - Google Patents
高分子薄膜におけるデジタル・マイクロスケール・パターンの連続的生産 Download PDFInfo
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- JP6293589B2 JP6293589B2 JP2014133380A JP2014133380A JP6293589B2 JP 6293589 B2 JP6293589 B2 JP 6293589B2 JP 2014133380 A JP2014133380 A JP 2014133380A JP 2014133380 A JP2014133380 A JP 2014133380A JP 6293589 B2 JP6293589 B2 JP 6293589B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/005—Curtain coaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/007—Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F16/00—Transfer printing apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G13/00—Electrographic processes using a charge pattern
- G03G13/06—Developing
- G03G13/10—Developing using a liquid developer, e.g. liquid suspension
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/02—Apparatus for electrographic processes using a charge pattern for laying down a uniform charge, e.g. for sensitising; Corona discharge devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Micromachines (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Description
Claims (5)
- マイクロスケールのパターン状構造を生産するシステムであって、
第1経路に沿って移動するように制約された第1表面を有する第1コンベアと、
第2経路に沿って移動するように制約された第2表面を有するコンベアであって、前記第1経路および前記第2経路は、前記第1表面と前記第2表面の間で画定された最小間隔がギャップ領域内に生ずるように配列される、第2コンベアと、
前記第1表面の第1表面領域が、前記第2表面の対応する第2表面領域に同時に前記ギャップ領域の中を通過するように、整合速度で前記第1コンベアおよび前記第2コンベアを移動させる手段と、
前記第1表面領域に硬化性液体薄膜を配置する手段であって、前記第1表面領域が前記ギャップ領域から上流に位置決めされるとき、前記硬化性液体薄膜の第1部分が前記第1表面領域に配置されるようにする手段と、
前記第1表面領域に配置された前記硬化性液体薄膜の前記第1部分が、前記ギャップ領域の中を前記第1表面領域が通過中に電気流体力学(EHD)パターン形成型変形を受けるように、前記第1コンベアと前記第2コンベアの間に電界を発生させる手段であって、それによって前記第1部分が、マイクロスケールのパターン形状を有するパターン状液体機能を形成する、手段と、
前記パターン状液体機能を凝固させて、前記マイクロスケールのパターン形状を有する固体のマイクロスケールのパターン状構造を形成する手段と、
を備え、
前記硬化性液体薄膜を配置する手段は、液体高分子薄膜を形成する手段を備え、前記液体高分子薄膜の内部では、ナノ構造が最初の方向付けで分散し、
前記電界を発生させる手段は、前記ナノ構造を前記マイクロスケールのパターン状構造において前記第1表面に対して垂直な方向付けに整列させる手段を備える、システム。 - 前記第1表面領域に硬化性液体薄膜を配置する手段は、スロット・コーティング・システム、スロット・ダイ・コーティング・システム、スライド・コーティング・システム、およびカーテン・コーティング・システムのうちの1つを備える、請求項1に記載のシステム。
- 前記第1コンベアおよび前記第2コンベアの少なくとも一方は、導電性材料および誘電性材料の一方を備える、請求項1に記載のシステム。
- 前記電界を発生させる手段は、前記第1コンベアに配置された前記導電性材料および誘電性材料の一方に第1電圧を印加する手段と、前記第2コンベアに配置された前記導電性材料および誘電性材料の一方に第2電圧を印加する手段とを備え、前記第1電圧は、前記第1電圧および前記第2電圧によって前記電界が発生するように前記第2電圧から相違する、請求項3に記載のシステム。
- 前記パターン状液体機能は、硬化性高分子を含み、
前記パターン状液体機能を凝固させる手段は、紫外線(UV)硬化システム、可視光硬化システム、および集束型熱硬化システムのうちの1つを備える、請求項1に記載のシステム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/944,843 | 2013-07-17 | ||
US13/944,843 US9348231B2 (en) | 2013-07-17 | 2013-07-17 | Continuously producing digital micro-scale patterns on a thin polymer film |
Publications (3)
Publication Number | Publication Date |
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JP2015020434A JP2015020434A (ja) | 2015-02-02 |
JP2015020434A5 JP2015020434A5 (ja) | 2017-08-10 |
JP6293589B2 true JP6293589B2 (ja) | 2018-03-14 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014133380A Active JP6293589B2 (ja) | 2013-07-17 | 2014-06-27 | 高分子薄膜におけるデジタル・マイクロスケール・パターンの連続的生産 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9348231B2 (ja) |
EP (1) | EP2827192B1 (ja) |
JP (1) | JP6293589B2 (ja) |
KR (1) | KR102093603B1 (ja) |
CN (1) | CN104290317B (ja) |
TW (1) | TWI631424B (ja) |
Families Citing this family (12)
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JP6037914B2 (ja) * | 2013-03-29 | 2016-12-07 | 富士フイルム株式会社 | 保護膜のエッチング方法およびテンプレートの製造方法 |
US9884437B2 (en) | 2014-06-20 | 2018-02-06 | Palo Alto Research Center Incorporated | Integral vasculature |
EP2974813A1 (de) * | 2014-07-17 | 2016-01-20 | MTU Aero Engines GmbH | Anlage und verfahren zur generativen herstellung und/oder reparatur von bauteilen |
US10384432B2 (en) | 2016-02-19 | 2019-08-20 | Palo Alto Research Center Incorporated | Hierarchical laminates fabricated from micro-scale, digitally patterned films |
CN109790639B (zh) * | 2016-09-16 | 2021-07-06 | 3M创新有限公司 | 制造纳米结构化柱形轧辊的方法 |
US10710283B2 (en) | 2016-12-22 | 2020-07-14 | Palo Alto Research Center Incorporated | Membrane surface hydrophobicity through electro-hydrodynamic film patterning |
GB201701182D0 (en) * | 2017-01-24 | 2017-03-08 | Univ Birmingham | Surface enhanced raman scattering apparatus and method |
EP3671342B1 (en) * | 2018-12-20 | 2021-03-17 | IMEC vzw | Induced stress for euv pellicle tensioning |
US11732378B2 (en) * | 2019-10-02 | 2023-08-22 | Palo Alto Research Center Incorporated | Three dielectric electrohydrodynamic patterning |
CN112644158B (zh) * | 2020-06-28 | 2023-02-28 | 正扬科技有限公司 | 连续式紫外光固化装置 |
CN112895408B (zh) * | 2020-12-28 | 2022-05-20 | 杭州电子科技大学 | 基于相场模型的聚合物表面微结构可控成形机理研究方法 |
US20240012330A1 (en) * | 2021-02-21 | 2024-01-11 | The Regents Of The University Of California | Roll-to-roll based 3d printing through computed axial lithography |
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US2476282A (en) * | 1945-01-09 | 1949-07-19 | American Viscose Corp | Textile products and production thereof |
US4166089A (en) * | 1969-11-13 | 1979-08-28 | Agfa-Gevaert N.V. | Corona free pinning of extruded polymer film |
AU779699B2 (en) * | 1999-12-23 | 2005-02-10 | Universitat Konstanz | Methods and apparatus for forming submicron patterns on films |
KR20050025545A (ko) * | 2001-05-16 | 2005-03-14 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 전기장을 사용하여 광 중합 화합물내에 나노스케일의패턴을 생성하기 위한 방법 및 시스템 |
US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
JP2003343964A (ja) * | 2002-05-29 | 2003-12-03 | Glocal:Kk | 冷凍装置 |
MY164487A (en) * | 2002-07-11 | 2017-12-29 | Molecular Imprints Inc | Step and repeat imprint lithography processes |
US6908861B2 (en) * | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
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JP2006506474A (ja) * | 2002-10-11 | 2006-02-23 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | パターニングされたフィブリル表面を有するフィルム、ならびにフィルムを製造するための方法および装置 |
US7163611B2 (en) | 2003-12-03 | 2007-01-16 | Palo Alto Research Center Incorporated | Concentration and focusing of bio-agents and micron-sized particles using traveling wave grids |
KR100789581B1 (ko) | 2005-08-17 | 2007-12-28 | 주식회사 엘지화학 | 이온 성분을 함유하는 코팅액을 이용한 패턴 형성 방법 |
US20070048448A1 (en) * | 2005-08-17 | 2007-03-01 | Kim Dae H | Patterning method using coatings containing ionic components |
JP2007062095A (ja) | 2005-08-30 | 2007-03-15 | Ricoh Co Ltd | プラスチック成形品の製造方法、及びその製造装置 |
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KR20090108853A (ko) * | 2008-04-14 | 2009-10-19 | 삼성전자주식회사 | 무기물 패턴 형성용 조성물 및 그를 이용한 무기물패턴형성 방법 |
JP5542313B2 (ja) * | 2008-06-18 | 2014-07-09 | 協立化学産業株式会社 | パターン形成方法 |
JP5129665B2 (ja) * | 2008-06-25 | 2013-01-30 | パナソニック株式会社 | プラズマ処理装置 |
CN101620348B (zh) | 2008-07-04 | 2011-07-27 | 清华大学 | 触摸式液晶显示屏的制备方法 |
-
2013
- 2013-07-17 US US13/944,843 patent/US9348231B2/en not_active Expired - Fee Related
-
2014
- 2014-06-26 CN CN201410298767.7A patent/CN104290317B/zh not_active Expired - Fee Related
- 2014-06-27 JP JP2014133380A patent/JP6293589B2/ja active Active
- 2014-07-04 KR KR1020140083679A patent/KR102093603B1/ko active IP Right Grant
- 2014-07-15 TW TW103124243A patent/TWI631424B/zh not_active IP Right Cessation
- 2014-07-17 EP EP14177409.1A patent/EP2827192B1/en not_active Not-in-force
Also Published As
Publication number | Publication date |
---|---|
US20150022790A1 (en) | 2015-01-22 |
EP2827192B1 (en) | 2019-02-27 |
EP2827192A1 (en) | 2015-01-21 |
TWI631424B (zh) | 2018-08-01 |
KR20150009923A (ko) | 2015-01-27 |
US9348231B2 (en) | 2016-05-24 |
CN104290317B (zh) | 2018-06-05 |
KR102093603B1 (ko) | 2020-04-16 |
JP2015020434A (ja) | 2015-02-02 |
TW201518868A (zh) | 2015-05-16 |
CN104290317A (zh) | 2015-01-21 |
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