KR102089136B1 - 임프린트 장치, 임프린트 방법, 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법, 및 물품 제조 방법 Download PDF

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KR102089136B1
KR102089136B1 KR1020177035053A KR20177035053A KR102089136B1 KR 102089136 B1 KR102089136 B1 KR 102089136B1 KR 1020177035053 A KR1020177035053 A KR 1020177035053A KR 20177035053 A KR20177035053 A KR 20177035053A KR 102089136 B1 KR102089136 B1 KR 102089136B1
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substrate
imprint
pattern
imprint material
holding unit
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KR20180002818A (ko
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히로시 사토
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020177035053A 2015-05-13 2016-05-09 임프린트 장치, 임프린트 방법, 및 물품 제조 방법 Active KR102089136B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015098491A JP6562707B2 (ja) 2015-05-13 2015-05-13 インプリント装置、インプリント方法及び物品の製造方法
JPJP-P-2015-098491 2015-05-13
PCT/JP2016/002271 WO2016181644A1 (en) 2015-05-13 2016-05-09 Imprint apparatus, imprinting method, and method of manufacturing product

Publications (2)

Publication Number Publication Date
KR20180002818A KR20180002818A (ko) 2018-01-08
KR102089136B1 true KR102089136B1 (ko) 2020-03-13

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KR1020177035053A Active KR102089136B1 (ko) 2015-05-13 2016-05-09 임프린트 장치, 임프린트 방법, 및 물품 제조 방법

Country Status (7)

Country Link
US (2) US20180136557A1 (https=)
JP (1) JP6562707B2 (https=)
KR (1) KR102089136B1 (https=)
CN (1) CN107615450A (https=)
SG (1) SG11201708862WA (https=)
TW (1) TWI629709B (https=)
WO (1) WO2016181644A1 (https=)

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TWI840811B (zh) 2015-02-23 2024-05-01 日商尼康股份有限公司 基板處理系統及基板處理方法、以及元件製造方法
KR102688211B1 (ko) * 2015-02-23 2024-07-24 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
HK1246871A1 (en) 2015-02-23 2018-09-14 Nikon Corporation Measurement device, lithography system and exposure device, and management method, superposition measurement method and device manufacturing method
JP7022615B2 (ja) * 2018-02-26 2022-02-18 キヤノン株式会社 インプリント方法、インプリント装置、モールドの製造方法、および、物品の製造方法
US11740554B2 (en) * 2018-10-11 2023-08-29 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP7327973B2 (ja) * 2019-03-29 2023-08-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7263088B2 (ja) * 2019-04-08 2023-04-24 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP7222811B2 (ja) * 2019-06-04 2023-02-15 キオクシア株式会社 インプリント装置、インプリント方法、及び半導体装置の製造方法
JP2024003899A (ja) * 2022-06-28 2024-01-16 キヤノン株式会社 インプリントシステム、基板、インプリント方法、レプリカモールド製造方法及び、物品の製造方法

Citations (8)

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US20050138988A1 (en) 2003-12-29 2005-06-30 Asml Netherlands B.V. Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
US20070252960A1 (en) 2004-12-09 2007-11-01 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Producing Method
US20100029084A1 (en) * 2008-07-29 2010-02-04 Takeshi Koshiba Pattern forming method and pattern forming device
US20100320631A1 (en) * 2009-06-23 2010-12-23 Masaru Suzuki Method of processing substrate and imprint device
JP2011091124A (ja) 2009-10-21 2011-05-06 Ricoh Co Ltd 光インプリント方法
JP2011114309A (ja) 2009-11-30 2011-06-09 Canon Inc インプリント装置
JP2011129720A (ja) * 2009-12-17 2011-06-30 Canon Inc インプリント装置、モールド及び物品の製造方法
US20120091611A1 (en) 2010-10-13 2012-04-19 Canon Kabushiki Kaisha Imprint method and apparatus

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US8098362B2 (en) * 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
JP2009088264A (ja) 2007-09-28 2009-04-23 Toshiba Corp 微細加工装置およびデバイス製造方法
US7815824B2 (en) * 2008-02-26 2010-10-19 Molecular Imprints, Inc. Real time imprint process diagnostics for defects
JP2012009831A (ja) * 2010-05-21 2012-01-12 Tokyo Electron Ltd インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP5754965B2 (ja) * 2011-02-07 2015-07-29 キヤノン株式会社 インプリント装置、および、物品の製造方法
JP5498448B2 (ja) * 2011-07-21 2014-05-21 株式会社東芝 インプリント方法及びインプリントシステム
JP6412317B2 (ja) * 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP6494185B2 (ja) * 2013-06-26 2019-04-03 キヤノン株式会社 インプリント方法および装置
JP5909210B2 (ja) * 2013-07-11 2016-04-26 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6312379B2 (ja) * 2013-07-19 2018-04-18 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、リソグラフィシステム、プログラム、物品の製造方法
JP6282069B2 (ja) * 2013-09-13 2018-02-21 キヤノン株式会社 インプリント装置、インプリント方法、検出方法及びデバイス製造方法
JP2015079954A (ja) * 2013-09-13 2015-04-23 キヤノン株式会社 リソグラフィシステムおよび物品の製造方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050138988A1 (en) 2003-12-29 2005-06-30 Asml Netherlands B.V. Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
US20070252960A1 (en) 2004-12-09 2007-11-01 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Producing Method
US20100029084A1 (en) * 2008-07-29 2010-02-04 Takeshi Koshiba Pattern forming method and pattern forming device
US20100320631A1 (en) * 2009-06-23 2010-12-23 Masaru Suzuki Method of processing substrate and imprint device
JP2011091124A (ja) 2009-10-21 2011-05-06 Ricoh Co Ltd 光インプリント方法
JP2011114309A (ja) 2009-11-30 2011-06-09 Canon Inc インプリント装置
JP2011129720A (ja) * 2009-12-17 2011-06-30 Canon Inc インプリント装置、モールド及び物品の製造方法
US20120091611A1 (en) 2010-10-13 2012-04-19 Canon Kabushiki Kaisha Imprint method and apparatus

Also Published As

Publication number Publication date
WO2016181644A1 (en) 2016-11-17
US20180136557A1 (en) 2018-05-17
US20220026800A1 (en) 2022-01-27
TWI629709B (zh) 2018-07-11
SG11201708862WA (en) 2017-11-29
KR20180002818A (ko) 2018-01-08
TW201642318A (zh) 2016-12-01
JP2016213418A (ja) 2016-12-15
JP6562707B2 (ja) 2019-08-21
CN107615450A (zh) 2018-01-19

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