KR102085237B1 - 극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 - Google Patents
극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 Download PDFInfo
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- KR102085237B1 KR102085237B1 KR1020137025614A KR20137025614A KR102085237B1 KR 102085237 B1 KR102085237 B1 KR 102085237B1 KR 1020137025614 A KR1020137025614 A KR 1020137025614A KR 20137025614 A KR20137025614 A KR 20137025614A KR 102085237 B1 KR102085237 B1 KR 102085237B1
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- South Korea
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- optical element
- reflective optical
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- microstructure
- reflective
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Images
Classifications
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Mechanical Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161453269P | 2011-03-16 | 2011-03-16 | |
DE102011015141A DE102011015141A1 (de) | 2011-03-16 | 2011-03-16 | Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement |
DE102011015141.9 | 2011-03-16 | ||
US61/453,269 | 2011-03-16 | ||
PCT/EP2012/054320 WO2012123436A1 (en) | 2011-03-16 | 2012-03-13 | Method for producing a reflective optical component for an euv projection exposure apparatus and component of this type |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020187027667A Division KR20180108902A (ko) | 2011-03-16 | 2012-03-13 | 극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 |
Publications (2)
Publication Number | Publication Date |
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KR20140010116A KR20140010116A (ko) | 2014-01-23 |
KR102085237B1 true KR102085237B1 (ko) | 2020-03-05 |
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KR1020187027667A KR20180108902A (ko) | 2011-03-16 | 2012-03-13 | 극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 |
KR1020137025614A KR102085237B1 (ko) | 2011-03-16 | 2012-03-13 | 극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 |
Family Applications Before (1)
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KR1020187027667A KR20180108902A (ko) | 2011-03-16 | 2012-03-13 | 극자외 투영 노광 장치를 위한 반사 광학 소자를 제조하는 방법 및 이러한 유형의 소자 |
Country Status (7)
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US (1) | US9541685B2 (zh) |
EP (1) | EP2686133B1 (zh) |
JP (1) | JP5989011B2 (zh) |
KR (2) | KR20180108902A (zh) |
DE (1) | DE102011015141A1 (zh) |
TW (1) | TWI567426B (zh) |
WO (1) | WO2012123436A1 (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102011015141A1 (de) * | 2011-03-16 | 2012-09-20 | Carl Zeiss Laser Optics Gmbh | Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement |
TWI596384B (zh) * | 2012-01-18 | 2017-08-21 | Asml荷蘭公司 | 光源收集器元件、微影裝置及元件製造方法 |
JP6232210B2 (ja) * | 2013-06-03 | 2017-11-15 | ギガフォトン株式会社 | ミラー装置、極端紫外光生成装置及び極端紫外光生成システム |
KR20180122657A (ko) | 2016-03-07 | 2018-11-13 | 에이에스엠엘 네델란즈 비.브이. | 다층 반사기, 다층 반사기를 제조하는 방법 및 리소그래피 장치 |
DE102016205893A1 (de) | 2016-04-08 | 2017-10-12 | Carl Zeiss Smt Gmbh | EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage |
DE102016213831A1 (de) * | 2016-07-27 | 2018-02-01 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für die EUV-Lithographie |
DE102016217694A1 (de) | 2016-09-15 | 2016-11-10 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine Projektionsoptik |
US10877192B2 (en) | 2017-04-18 | 2020-12-29 | Saudi Arabian Oil Company | Method of fabricating smart photonic structures for material monitoring |
DE102017217867A1 (de) | 2017-10-09 | 2018-07-26 | Carl Zeiss Smt Gmbh | EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage |
JP2019133119A (ja) * | 2018-02-01 | 2019-08-08 | 日本電信電話株式会社 | 回折素子 |
DE102019200698A1 (de) | 2019-01-21 | 2019-12-05 | Carl Zeiss Smt Gmbh | EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage |
EP3766367A1 (en) * | 2019-07-17 | 2021-01-20 | D. Swarovski KG | Decorative structure |
EP4052071A1 (en) * | 2019-10-29 | 2022-09-07 | Zygo Corporation | Method of mitigating defects on an optical surface and mirror formed by same |
DE102019219179A1 (de) * | 2019-12-09 | 2021-06-10 | Carl Zeiss Smt Gmbh | Optisches Element und Lithographiesystem |
JP7441071B2 (ja) * | 2020-02-20 | 2024-02-29 | 株式会社日立ハイテク | 凹面回折格子の製造方法 |
DE102020206107A1 (de) | 2020-05-14 | 2021-11-18 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines optischen Elements |
DE102020208298A1 (de) | 2020-07-02 | 2022-01-05 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
US20220019001A1 (en) * | 2020-07-15 | 2022-01-20 | Raytheon Company | Visible quality mirror finishing |
CN113238310A (zh) * | 2021-04-30 | 2021-08-10 | 中国建筑材料科学研究总院有限公司 | 一种平坦化的二维光栅及其制备方法 |
DE102021208674A1 (de) | 2021-08-10 | 2023-02-16 | Carl Zeiss Smt Gmbh | EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage |
DE102021214237A1 (de) | 2021-12-13 | 2022-12-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine EUV-Projektionsbelichtungsanlage |
DE102022203644A1 (de) | 2022-04-12 | 2023-04-20 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Substrats und eines reflektiven optischen Elements für die EUV-Lithographie |
CN114988907B (zh) * | 2022-05-31 | 2023-01-06 | 华中科技大学 | 一种高比分梯度铝基碳化硅复合材料反射镜及其制备方法 |
DE102022213822A1 (de) | 2022-12-19 | 2024-06-20 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
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- 2012-03-13 KR KR1020137025614A patent/KR102085237B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
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JP2014514737A (ja) | 2014-06-19 |
EP2686133A1 (en) | 2014-01-22 |
JP5989011B2 (ja) | 2016-09-07 |
US20130335816A1 (en) | 2013-12-19 |
EP2686133B1 (en) | 2021-05-19 |
DE102011015141A1 (de) | 2012-09-20 |
US9541685B2 (en) | 2017-01-10 |
TW201303382A (zh) | 2013-01-16 |
KR20140010116A (ko) | 2014-01-23 |
WO2012123436A1 (en) | 2012-09-20 |
KR20180108902A (ko) | 2018-10-04 |
TWI567426B (zh) | 2017-01-21 |
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