KR102080764B1 - 리니어소스 및 그를 가지는 박막증착장치 - Google Patents

리니어소스 및 그를 가지는 박막증착장치 Download PDF

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Publication number
KR102080764B1
KR102080764B1 KR1020140087672A KR20140087672A KR102080764B1 KR 102080764 B1 KR102080764 B1 KR 102080764B1 KR 1020140087672 A KR1020140087672 A KR 1020140087672A KR 20140087672 A KR20140087672 A KR 20140087672A KR 102080764 B1 KR102080764 B1 KR 102080764B1
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KR
South Korea
Prior art keywords
temperature control
control region
heater
temperature
nozzles
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KR1020140087672A
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English (en)
Korean (ko)
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KR20160007262A (ko
Inventor
양호식
정재천
Original Assignee
주식회사 원익아이피에스
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Priority to KR1020140087672A priority Critical patent/KR102080764B1/ko
Priority to CN201510387796.5A priority patent/CN105296928B/zh
Publication of KR20160007262A publication Critical patent/KR20160007262A/ko
Application granted granted Critical
Publication of KR102080764B1 publication Critical patent/KR102080764B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020140087672A 2014-07-11 2014-07-11 리니어소스 및 그를 가지는 박막증착장치 KR102080764B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020140087672A KR102080764B1 (ko) 2014-07-11 2014-07-11 리니어소스 및 그를 가지는 박막증착장치
CN201510387796.5A CN105296928B (zh) 2014-07-11 2015-07-03 线光源及具备此线光源的薄膜蒸镀装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140087672A KR102080764B1 (ko) 2014-07-11 2014-07-11 리니어소스 및 그를 가지는 박막증착장치

Publications (2)

Publication Number Publication Date
KR20160007262A KR20160007262A (ko) 2016-01-20
KR102080764B1 true KR102080764B1 (ko) 2020-02-24

Family

ID=55194729

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140087672A KR102080764B1 (ko) 2014-07-11 2014-07-11 리니어소스 및 그를 가지는 박막증착장치

Country Status (2)

Country Link
KR (1) KR102080764B1 (zh)
CN (1) CN105296928B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102136371B1 (ko) * 2016-06-15 2020-07-21 주식회사 원익아이피에스 리니어소스 및 이를 포함하는 박막증착장치
CN112853271B (zh) * 2019-11-27 2023-11-14 合肥欣奕华智能机器股份有限公司 一种线型蒸发源
KR102547666B1 (ko) * 2021-01-21 2023-06-27 울산대학교 산학협력단 진공 박막 증착용 분자빔 증발원

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101057552B1 (ko) * 2011-02-23 2011-08-17 주식회사 선익시스템 박막 증착을 위한 증착 물질 공급장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100503881C (zh) * 2005-01-21 2009-06-24 三菱重工业株式会社 真空蒸汽沉积设备
KR100666574B1 (ko) * 2005-01-31 2007-01-09 삼성에스디아이 주식회사 증발원
KR101197403B1 (ko) * 2010-06-16 2012-11-05 이영구 다중 증착 방식을 적용한 인라인 증착장치
WO2012029545A1 (ja) * 2010-08-30 2012-03-08 シャープ株式会社 蒸着方法、蒸着装置、及び有機ｅｌ表示装置
CN102808167A (zh) * 2011-06-02 2012-12-05 丽佳达普株式会社 坩埚装置、坩埚装置控制方法、膜厚测量装置及包含它的薄膜沉积设备
KR20130045431A (ko) * 2011-10-26 2013-05-06 주식회사 탑 엔지니어링 증착 효율이 개선된 박막 증착 장치
KR101754356B1 (ko) * 2011-12-15 2017-07-07 주식회사 원익아이피에스 증발원, 증착물질 공급장치, 및 이를 포함하는 증착장치
KR20140038848A (ko) * 2012-09-21 2014-03-31 김승희 유기전계발광소자 박막 제작용 하향식 증발원과 하향식 증착기
KR101432079B1 (ko) * 2012-12-27 2014-08-21 주식회사 선익시스템 유기물 피딩 장치

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101057552B1 (ko) * 2011-02-23 2011-08-17 주식회사 선익시스템 박막 증착을 위한 증착 물질 공급장치

Also Published As

Publication number Publication date
CN105296928B (zh) 2018-03-27
KR20160007262A (ko) 2016-01-20
CN105296928A (zh) 2016-02-03

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