CN202482418U - 线性蒸发源机构及具有该机构的精控蒸发装置 - Google Patents
线性蒸发源机构及具有该机构的精控蒸发装置 Download PDFInfo
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- CN202482418U CN202482418U CN2012200182398U CN201220018239U CN202482418U CN 202482418 U CN202482418 U CN 202482418U CN 2012200182398 U CN2012200182398 U CN 2012200182398U CN 201220018239 U CN201220018239 U CN 201220018239U CN 202482418 U CN202482418 U CN 202482418U
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- evaporation source
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- 238000001704 evaporation Methods 0.000 title claims abstract description 195
- 230000008020 evaporation Effects 0.000 title claims abstract description 192
- 238000009413 insulation Methods 0.000 claims abstract description 85
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims description 54
- 239000013078 crystal Substances 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 15
- 239000007921 spray Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 239000003351 stiffener Substances 0.000 claims description 10
- 238000010791 quenching Methods 0.000 claims description 9
- 230000002459 sustained effect Effects 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 18
- 238000000576 coating method Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 2
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 45
- 239000000126 substance Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2012200182398U CN202482418U (zh) | 2012-01-13 | 2012-01-13 | 线性蒸发源机构及具有该机构的精控蒸发装置 |
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CN2012200182398U CN202482418U (zh) | 2012-01-13 | 2012-01-13 | 线性蒸发源机构及具有该机构的精控蒸发装置 |
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CN202482418U true CN202482418U (zh) | 2012-10-10 |
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CN2012200182398U Expired - Fee Related CN202482418U (zh) | 2012-01-13 | 2012-01-13 | 线性蒸发源机构及具有该机构的精控蒸发装置 |
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CN (1) | CN202482418U (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102703866A (zh) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | 线性蒸发源装置及具有该装置的蒸发速率精控式蒸发设备 |
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2012
- 2012-01-13 CN CN2012200182398U patent/CN202482418U/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102703866A (zh) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | 线性蒸发源装置及具有该装置的蒸发速率精控式蒸发设备 |
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