JP6640879B2 - 堆積速度を測定するための測定アセンブリ及びその方法 - Google Patents
堆積速度を測定するための測定アセンブリ及びその方法 Download PDFInfo
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- 230000008021 deposition Effects 0.000 title claims description 72
- 238000000034 method Methods 0.000 title claims description 21
- 238000001704 evaporation Methods 0.000 claims description 93
- 238000005259 measurement Methods 0.000 claims description 91
- 239000000463 material Substances 0.000 claims description 75
- 230000008020 evaporation Effects 0.000 claims description 66
- 239000013078 crystal Substances 0.000 claims description 52
- 239000000758 substrate Substances 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 12
- 230000010355 oscillation Effects 0.000 claims description 10
- 239000011364 vaporized material Substances 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000012809 cooling fluid Substances 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000012530 fluid Substances 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- 229910001369 Brass Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010951 brass Substances 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 2
- 229910001020 Au alloy Inorganic materials 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 239000003353 gold alloy Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 15
- 239000010453 quartz Substances 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 230000000694 effects Effects 0.000 description 8
- 239000011368 organic material Substances 0.000 description 8
- 238000012423 maintenance Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 5
- 238000013519 translation Methods 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01G—WEIGHING
- G01G3/00—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances
- G01G3/12—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing
- G01G3/16—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing measuring variations of frequency of oscillations of the body
- G01G3/165—Constructional details
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/036—Analysing fluids by measuring frequency or resonance of acoustic waves
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/01—Indexing codes associated with the measuring variable
- G01N2291/014—Resonance or resonant frequency
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/025—Change of phase or condition
- G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors
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Description
Claims (14)
- 蒸発材料の堆積速度を測定するための測定アセンブリ(100)であって、
前記堆積速度を測定するための発振水晶(110)と、
前記発振水晶(110)を保持するためのホルダ(120)であって、前記発振水晶から前記ホルダまでの熱伝達が向上するように構成されたホルダと、
前記蒸発材料を前記発振水晶(110)に供給するための測定出口(150)から供給された前記蒸発材料を遮断するためのシャッター(140)と
を備え、前記シャッター(140)が、前記発振水晶(110)を前記蒸発材料の温度から保護するための熱保護シールド(141)を備える、測定アセンブリ(100)。 - 前記ホルダは、k=30W/(mK)を上回る熱伝導率kを有する材料を含む、請求項1に記載の測定アセンブリ(100)。
- 前記ホルダ(120)の前記材料が、銅、アルミニウム、銅合金、アルミニウム合金、黄銅、鉄、銀、銀合金、金、金合金、マグネシウム、ウォルフラム、炭化ケイ素及び窒化アルミニウムから成る群から選択された少なくとも1つの材料である、請求項2に記載の測定アセンブリ(100)。
- 熱を前記発振水晶(110)と交換するための熱交換器(132)を更に備える、請求項1から3の何れか一項に記載の測定アセンブリ(100)。
- 前記発振水晶(110)の温度を測定するための温度センサ(131)を更に備える、請求項1から4の何れか一項に記載の測定アセンブリ(100)。
- 前記発振水晶(110)の温度を制御するための温度制御システム(130)であって、温度センサ(131)、熱交換器(132)及びコントローラ(133)のうちの一又は複数を備える温度制御システムを更に備える、請求項1から5の何れか一項に記載の測定アセンブリ(100)。
- 前記シャッター(140)が、前記シャッター(140)を冷却するための少なくとも1つの冷却要素(142)、特に冷却流体を供給するための少なくとも1つの管を備える、請求項1から6の何れか一項に記載の測定アセンブリ(100)。
- 材料蒸発のための蒸発源(200)であって、
材料を蒸発させるように構成されている蒸発るつぼ(210)と、
蒸発材料を供給するための分配管の長さに沿って設けられた一又は複数の出口(222)を有する分配管(220)であって、前記蒸発るつぼ(210)と流体連通している分配管(220)と、
請求項1から7の何れか一項に記載の測定アセンブリ(100)と
を備える蒸発源(200)。 - 前記蒸発材料を前記測定アセンブリ(100)の前記発振水晶(110)に供給するための測定出口(150)を更に備える、請求項8に記載の蒸発源(200)。
- 前記測定出口(150)が、前記蒸発源によって提供された全流量の1/70から前記蒸発源によって提供された前記全流量の1/25までの測定流を提供するように構成されている、請求項9に記載の蒸発源(200)。
- 前記測定出口(150)及び前記測定アセンブリ(100)が、前記分配管(220)の端部、特に前記分配管(220)の前記端部の裏側(224A)に配置されている、請求項10に記載の蒸発源(200)。
- 請求項8から11の何れか一項に記載の少なくとも1つの蒸発源(200)を備える、堆積速度で真空チャンバ(310)の中の基板(333)に材料を塗布するための堆積装置(300)。
- 蒸発材料の堆積速度を測定するための方法(400)であって、
材料を蒸発させること(410)と、
前記蒸発材料の第1の部分を基板に塗布すること(420)と、
前記蒸発材料の第2の部分を発振水晶(110)に転向させること(430)と、
請求項1から7の何れか一項に記載の測定アセンブリ(100)を使用することによって、前記堆積速度を測定すること(440)と
を含む方法(400)。 - 前記堆積速度を測定すること(420)が、特に温度制御システム(130)によって、前記測定アセンブリ(100)と熱を交換することを含む、請求項13に記載の方法(400)。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/EP2015/063637 WO2016202388A1 (en) | 2015-06-17 | 2015-06-17 | Measurement assembly for measuring a deposition rate and method therefore |
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JP2018519423A JP2018519423A (ja) | 2018-07-19 |
JP6640879B2 true JP6640879B2 (ja) | 2020-02-05 |
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JP2017563281A Expired - Fee Related JP6640879B2 (ja) | 2015-06-17 | 2015-06-17 | 堆積速度を測定するための測定アセンブリ及びその方法 |
Country Status (5)
Country | Link |
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JP (1) | JP6640879B2 (ja) |
KR (1) | KR102082193B1 (ja) |
CN (1) | CN107810410A (ja) |
TW (1) | TW201710535A (ja) |
WO (1) | WO2016202388A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3749796B1 (en) * | 2018-02-05 | 2022-06-08 | Applied Materials, Inc. | Deposition apparatus for depositing evaporated material and methods therefor |
JP7102418B2 (ja) * | 2018-04-18 | 2022-07-19 | アプライド マテリアルズ インコーポレイテッド | 蒸発した材料を基板の上に堆積するための蒸発源、堆積装置、蒸発した材料の蒸気圧を測定するための方法、及び蒸発した材料の蒸発速度を決定するための方法 |
CN112703269A (zh) * | 2018-09-19 | 2021-04-23 | 应用材料公司 | 预处理用于测量沉积速率的振荡晶体的预处理方法、沉积速率测量装置、蒸发源和沉积设备 |
CN112912533B (zh) * | 2018-11-28 | 2023-10-24 | 应用材料公司 | 用于沉积蒸发的材料的沉积源、沉积装置及其方法 |
Family Cites Families (12)
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JPH0734248A (ja) * | 1993-07-23 | 1995-02-03 | Toyota Motor Corp | 水晶式膜厚計 |
US6558735B2 (en) * | 2001-04-20 | 2003-05-06 | Eastman Kodak Company | Reusable mass-sensor in manufacture of organic light-emitting devices |
JP2005091345A (ja) * | 2003-08-13 | 2005-04-07 | Fuji Photo Film Co Ltd | 蒸着型蛍光体シートの製造方法および装置並びに蒸着型蛍光体シート |
JP4976087B2 (ja) * | 2005-09-15 | 2012-07-18 | 日本電波工業株式会社 | 高安定用とした恒温型の水晶発振器 |
JP2008276998A (ja) * | 2007-04-26 | 2008-11-13 | Sony Corp | 膜厚センサ、薄膜形成装置、有機el表示装置の製造装置、及び有機el表示装置の製造方法 |
EP2261388A1 (en) * | 2009-06-12 | 2010-12-15 | Applied Materials Inc. a Corporation of the State of Delaware | Deposition rate monitor device, evaporator, coating installation, method for applying vapor to a substrate and method of operating a deposition rate monitor device |
JP2012169168A (ja) * | 2011-02-15 | 2012-09-06 | Hitachi High-Technologies Corp | 水晶発振式膜厚モニタ装置、及び、これを用いたel材料の蒸発源装置と薄膜形成装置 |
EP2508645B1 (en) * | 2011-04-06 | 2015-02-25 | Applied Materials, Inc. | Evaporation system with measurement unit |
DE102011111613B4 (de) * | 2011-08-25 | 2013-03-07 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Sensoranordnung zur Charakterisierung von Plasmabeschichtungs-, Plasmaätz- und Plasmabehandlungsprozessen sowie Verfahren zur Ermittlung von Kenngrößen in diesen Prozessen |
JP2014070969A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | レートセンサ及びリニアソース並びに蒸着装置 |
JP2014109047A (ja) * | 2012-11-30 | 2014-06-12 | Panasonic Corp | 真空蒸着装置 |
US9506895B2 (en) * | 2013-05-17 | 2016-11-29 | Inficon, Inc. | Combined crystal retainer and contact system for deposition monitor sensors |
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2015
- 2015-06-17 KR KR1020177037768A patent/KR102082193B1/ko active IP Right Grant
- 2015-06-17 CN CN201580080972.9A patent/CN107810410A/zh active Pending
- 2015-06-17 JP JP2017563281A patent/JP6640879B2/ja not_active Expired - Fee Related
- 2015-06-17 WO PCT/EP2015/063637 patent/WO2016202388A1/en active Application Filing
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JP2018519423A (ja) | 2018-07-19 |
KR20180014084A (ko) | 2018-02-07 |
CN107810410A (zh) | 2018-03-16 |
TW201710535A (zh) | 2017-03-16 |
KR102082193B1 (ko) | 2020-02-27 |
WO2016202388A1 (en) | 2016-12-22 |
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