KR102065671B1 - 웨이퍼형 파티클 센서 - Google Patents

웨이퍼형 파티클 센서 Download PDF

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Publication number
KR102065671B1
KR102065671B1 KR1020180004594A KR20180004594A KR102065671B1 KR 102065671 B1 KR102065671 B1 KR 102065671B1 KR 1020180004594 A KR1020180004594 A KR 1020180004594A KR 20180004594 A KR20180004594 A KR 20180004594A KR 102065671 B1 KR102065671 B1 KR 102065671B1
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KR
South Korea
Prior art keywords
light
outside air
light emitting
path
unit
Prior art date
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KR1020180004594A
Other languages
English (en)
Korean (ko)
Other versions
KR20190086272A (ko
Inventor
김백상
Original Assignee
주식회사 지티에스엠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 주식회사 지티에스엠 filed Critical 주식회사 지티에스엠
Priority to KR1020180004594A priority Critical patent/KR102065671B1/ko
Priority to CN201811246070.XA priority patent/CN110034038A/zh
Publication of KR20190086272A publication Critical patent/KR20190086272A/ko
Application granted granted Critical
Publication of KR102065671B1 publication Critical patent/KR102065671B1/ko

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Dispersion Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020180004594A 2018-01-12 2018-01-12 웨이퍼형 파티클 센서 KR102065671B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020180004594A KR102065671B1 (ko) 2018-01-12 2018-01-12 웨이퍼형 파티클 센서
CN201811246070.XA CN110034038A (zh) 2018-01-12 2018-10-25 晶片型粒子传感器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020180004594A KR102065671B1 (ko) 2018-01-12 2018-01-12 웨이퍼형 파티클 센서

Publications (2)

Publication Number Publication Date
KR20190086272A KR20190086272A (ko) 2019-07-22
KR102065671B1 true KR102065671B1 (ko) 2020-01-13

Family

ID=67234983

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180004594A KR102065671B1 (ko) 2018-01-12 2018-01-12 웨이퍼형 파티클 센서

Country Status (2)

Country Link
KR (1) KR102065671B1 (zh)
CN (1) CN110034038A (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN217981161U (zh) * 2020-08-06 2022-12-06 空感美监测有限公司 光散射微尘测量装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101154236B1 (ko) * 2011-09-21 2012-06-18 (주)랩코 슬림형 공기중 부유입자 측정센서
US20150177144A1 (en) 2013-12-20 2015-06-25 Azbil Corporation Particle detecting device and particle detecting method
KR101932446B1 (ko) 2017-11-30 2019-03-20 케이앤제이엔지니어링 주식회사 지하철 미세먼지 모니터링 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61159135A (ja) * 1984-12-31 1986-07-18 Canon Inc 粒子解析装置
JPH05312712A (ja) * 1992-05-11 1993-11-22 Mitsubishi Electric Corp 微細粒子測定方法及び微細粒子測定装置
JP3231956B2 (ja) * 1994-08-24 2001-11-26 シャープ株式会社 光電式煙感知器
JP4599181B2 (ja) * 2005-01-31 2010-12-15 アマノ株式会社 粉塵濃度検出装置
CN103575624A (zh) * 2012-08-06 2014-02-12 金济远 光学粒子测量装置
JP2014219264A (ja) * 2013-05-08 2014-11-20 神栄テクノロジー株式会社 粒子測定装置
CN204302153U (zh) * 2014-10-20 2015-04-29 崔海林 颗粒物传感器
JP6688966B2 (ja) * 2015-07-27 2020-04-28 パナソニックＩｐマネジメント株式会社 粒子検出センサ
KR101966492B1 (ko) * 2016-03-25 2019-04-05 현대자동차주식회사 차량용 먼지 센서

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101154236B1 (ko) * 2011-09-21 2012-06-18 (주)랩코 슬림형 공기중 부유입자 측정센서
US20150177144A1 (en) 2013-12-20 2015-06-25 Azbil Corporation Particle detecting device and particle detecting method
KR101932446B1 (ko) 2017-11-30 2019-03-20 케이앤제이엔지니어링 주식회사 지하철 미세먼지 모니터링 방법

Also Published As

Publication number Publication date
KR20190086272A (ko) 2019-07-22
CN110034038A (zh) 2019-07-19

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