KR102062419B1 - Dust removal device and dust removal method for exposure device - Google Patents

Abstract

A dust removal device and a vibration damping method of the exposure apparatus, wherein dust, rubbish or foreign matter, once attached to the vibration damping roller during dust removal, is not likely to be reattached to the vibration damping object.
An exposure apparatus for exposing a pattern to a photosensitive substrate, wherein the peripheral surface of the exposure apparatus is foldable on a vibration damping surface of the vibration damping object and the peripheral surface of the vibration damping roller is in contact with the vibration damping surface of the vibration damping object. And a moving mechanism for relatively moving the damping roller and the damping object so that the damping roller rotates, and the circumferential length of the damping roller is a circumferential surface of the damping roller by the shifting mechanism and a damping surface of the damping object. The vibration damping apparatus of the exposure apparatus characterized by being set longer than the contact movement distance with a.

Description

DUST REMOVAL DEVICE AND DUST REMOVAL METHOD FOR EXPOSURE DEVICE

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for exposing a pattern to a photosensitive substrate, and more particularly, to a vibration damping apparatus and a vibration damping method thereof.

In the manufacture of various substrates such as a printed circuit board and a semiconductor substrate, a predetermined pattern is exposed and printed on a work (photosensitive substrate) coated with a photoresist (photosensitive material), and then the pattern is formed on the work by an etching process. Exposure apparatuses using a photolithography technique for forming a film have been widely used. Such exposure apparatuses are known, such as a contact exposure method in which a mask and a work are brought into close contact with each other, a non-contact proximity gap method and a projection method, and a direct exposure method without a mask. Moreover, the double-sided exposure system which exposes both surfaces of a workpiece | work, and the single-sided exposure system which exposes only one surface are also known.

In any type of exposure apparatus, when a workpiece contaminated with dust, garbage, or foreign matter (hereinafter, collectively referred to as "dust" as appropriate) enters the exposure apparatus in the external environment, exposure defects and development occur in the contaminated workpiece itself. Defects arise. Moreover, in the exposure table which mounts a workpiece | work, and the apparatus using a mask, dust may be transcribe | transferred into a mask, and it may become a cause of an exposure defect and a development defect similarly. In addition, oscillation from the photoresist of the work also causes the same problem.

Japanese Patent Laid-Open No. 2002-162749 Japanese Patent Laid-Open No. 2007-25436 Japanese Patent Laid-Open No. 2009-157249

Patent document 1, 2, 3 carries out the vibration damping roller (adhesive roller) which has an adhesive material in a circumferential surface in order to carry out the damping of the damping object (work, exposure table, or mask) of such an exposure apparatus on the surface of a damping object. A vibration damper is proposed.

However, in the damping apparatus of patent document 1, when the damping roller is driven on a mask and an exposure table, there exists a possibility that the dust once attached to the damping roller may move (reattach) to a mask or an exposure table again. Although the vibration damping apparatus of patent document 2 has provided the vibration damping roller for mask vibration damping and the vibration damping roller for dust exposure table separately, similarly, the dust once attached to the vibration damping roller moves to a mask or an exposure table again (reattachment). There is a concern. Since the damping apparatus of patent document 3 provides the damping roller which isolate | separates each of a workpiece | work, an exposure table, and a mask in one cleaning unit, an apparatus enlarges and weights. Moreover, unlike the vibration damping apparatus of patent documents 1 and 2, there exists a problem that it cannot combine with the conveying apparatus of a workpiece | work.

SUMMARY OF THE INVENTION The present invention provides a dust removal apparatus and a vibration damping method of an exposure apparatus in which there is no fear that dust, garbage or foreign matter once attached to the vibration damping roller and removed during dust removal will be reattached to the vibration damping object. The purpose is to get.

In the exposure apparatus of the exposure apparatus of this invention, the exposure apparatus which exposes a pattern with respect to a photosensitive board | substrate, The dust removal roller which can be folded to the vibration damping surface of the damping object in the said exposure apparatus by the circumferential surface, and the said damping And a movement mechanism for relatively moving the vibration damping roller and the vibration damping object such that the vibration damping roller rotates while the peripheral surface of the roller is in contact with the vibration damping surface of the vibration damping object. And a contact movement distance between the circumferential surface of the vibration damping roller and the vibration damping surface of the vibration damping object.

As the vibration damping roller, a plurality of vibration damping rollers are provided for rolling a divided vibration damping surface obtained by dividing a plurality of vibration damping surfaces of a single vibration damping object. It can be set longer than the contact travel distance with the surface.

As the vibration damping roller, first and second vibration damping rollers for rolling the first and second vibration damping surfaces obtained by dividing the vibration damping surface of a single vibration damping object into two are provided, and the circumferential length of the first vibration damping roller is The circumferential surface of the first damping roller is set longer than the contact movement distance between the circumferential surface of the first damping roller and the first divided damping surface, and the circumferential length of the second damping roller and the second divided damping surface. It can be set longer than the contact moving distance with.

The vibration suppression apparatus of the exposure apparatus of the present invention further includes a control unit for alternately performing transmission on the first divided vibration suppression surface of the first vibration suppression roller and transmission on the second divided vibration suppression surface of the second vibration suppression roller. It is desirable to.

The said vibration damping roller can also be comprised by the single roller which rolls on the all vibration damping surface of a single damping object.

The said moving mechanism can also serve as the workpiece | work movement mechanism which hold | maintains and moves a photosensitive board | substrate.

The vibration damping object may include one or more of a photosensitive substrate, an exposure table, and a mask.

It is preferable that the dust removal apparatus of the exposure apparatus of this invention further includes the dust collecting apparatus which collects the dust adhered to the said vibration damping roller.

The dust removal method of the exposure apparatus of this invention is a dust removal process which electrically rotates a damping roller, making the circumferential surface contact with the damping surface of the dust removal object in an exposure apparatus, and cleans the circumferential surface of the said damping roller in which the damping process was complete | finished. In the dust removal method of the exposure apparatus which performs a cleaning process alternately, in one vibration damping process, vibration damping is carried out without contacting the same part on the circumferential surface of the said damping roller to the damping surface of the said damping object twice. Vibration damping by less than one revolution).

According to the present invention, the vibration damping roller does not come into contact with the vibration damping surface of the vibration damping object twice during vibration damping (the vibration damping roller is damped by transmission of less than one rotation). For this reason, there is no possibility that the dust, garbage, or foreign matter once attached to the vibration damping roller and removed during vibration is not reattached to the vibration damping object, and exposure defects and development defects due to the reattachment can be prevented in advance.

BRIEF DESCRIPTION OF THE DRAWINGS It is a side perspective view which shows schematic structure of the damping apparatus of the exposure apparatus which concerns on one Embodiment of this invention.
2 is a plan view showing a detailed configuration of a vibration suppression apparatus (cleaning unit).
3 is a side view showing a detailed configuration of a vibration suppression apparatus (cleaning unit).
Fig. 4 is a rear view showing the positional relationship between the vibration suppression roller and the transfer roller.
Fig. 5 is a diagram showing a relationship between the circumferential lengths of the first vibration damping roller and the second vibration damping roller and the vibration damping surface of the workpiece as the vibration damping object.
Fig. 6 is a diagram showing a relationship between the circumferential lengths of the first vibration damping roller and the second vibration damping roller and the vibration damping surface of the exposure table as the vibration damping object.
Fig. 7 is a diagram showing a relationship between the circumferential lengths of the first vibration damping roller and the second vibration damping roller and the vibration damping surface of the mask serving as the vibration damping object.
8 is a first process diagram showing the operation of the vibration suppression apparatus of the exposure apparatus.
9 is a second process chart showing the operation of the vibration suppression apparatus of the exposure apparatus.
10 is a third process diagram showing the operation of the vibration suppression apparatus of the exposure apparatus.
11 is a fourth process diagram showing the operation of the vibration suppression apparatus of the exposure apparatus.
12 is a fifth process diagram showing the operation of the vibration suppression apparatus of the exposure apparatus.
FIG. 13 is a sixth process chart showing the operation of the vibration suppression apparatus of the exposure apparatus. FIG.
Fig. 14 is a seventh process chart showing the operation of the vibration suppression apparatus of the exposure apparatus.

EMBODIMENT OF THE INVENTION Hereinafter, with reference to FIGS. 1-14, one Embodiment of the damping apparatus of the exposure apparatus by this invention is described. This embodiment applies this invention to the exposure apparatus EX of the type which exposes on both surfaces of a workpiece | work by the contact exposure system which closely contacts a mask and a workpiece | work, and exposes. Each direction of x, y, z in the following description is based on the arrow direction described in the drawing.

The workpiece | work (photosensitive board | substrate and the damping object) W used by this embodiment consists of a flat base material which laminated | stacked the metal film and photoresist layer which remain as circuit wiring after an exposure and an etching process, respectively on both surfaces.

<Overall Configuration of Exposure Unit>

As shown in FIG. 1, the exposure apparatus EX includes the input unit 1, the first exposure unit 2, the inversion unit 3, and the second exposure unit 4 in the order from left to right in FIG. 1. ) And a discharge part (5).

The injection | throwing-in part 1 is a delivery opening for carrying in unexposed workpiece | work (photosensitive board | substrate, the damping object) W from the exterior of exposure apparatus EX to the inside. In the injection | throwing-in part 1, the stage 1a for mounting the workpiece | work W carried in by an operator or a conveying apparatus (not shown) is provided.

The 1st exposure part 2 is an exposure apparatus for exposing to the 1st surface (upper surface) of the unexposed workpiece | work W. As shown in FIG. The 1st exposure part 2 is the exposure table (vibration object) 8 which mounts the workpiece | work W, and the mask (vibration object) in which the predetermined pattern located on the upper part of this exposure table 8 was drawn (10). ) And a light source 14 located above the mask 10. The 1st exposure part 2 is equipped with the lifting mechanism (not shown) which raises and lowers the exposure table 8 with respect to the mask 10, The mask 10 is provided with the lifting table 8 by this lifting mechanism. When raised toward, the mask 10 is in close contact with the first surface (upper surface) of the workpiece W placed on the exposure table 8. When the work W and the mask 10 are brought into close contact with each other, the mask 10 is irradiated with light (for example, ultraviolet light) in a wavelength band in which the photoresist layer of the work W is exposed by the light source 14. ), A predetermined pattern is exposed on the photoresist layer of the first surface (upper surface) of the workpiece W. FIG. Moreover, many suction ports (not shown) are formed in the upper surface of the exposure table 8, and the workpiece | work W adsorb | sucks on the surface of the exposure table 8 by air being sucked through this suction port. It is fixed.

The inversion part 3 is equipped with the inversion apparatus 9 which inverts the upper and lower surfaces of the workpiece | work W by which the 1st surface (upper surface) was exposed by the 1st exposure part 2. As shown in FIG. When the upper and lower surfaces of the workpiece W are inverted by the inverting section 3 (inverting apparatus 9), the first surface of the exposed workpiece W faces the lower surface, and the second surface of the unexposed workpiece W is exposed. Facing this top face.

The 2nd exposure part 4 is an exposure apparatus for exposing the 1st surface (lower surface) to the 2nd surface (upper surface) of the workpiece | work W which was exposed. Since the structure of the 2nd exposure part 4 is the same as that of the structure of the 1st exposure part 2, the same code | symbol is attached | subjected and the description is abbreviate | omitted.

The discharge part 5 is an exit port for carrying out the workpiece | work W by which exposure was carried out by both the 1st exposure part 2 and the 2nd exposure part 4 from the inside of the exposure apparatus EX to the exterior. to be. The discharge part 5 is provided with the stage 5a for mounting the exposed workpiece W, and the workpiece | work W mounted on the stage 5a is attached to an operator or a conveying apparatus (not shown). It is taken out by

The exposure apparatus EX holds a first handler (work movement mechanism) 6 which holds the workpiece W and moves it from the input section 1 to the first exposure section 2 and the inversion section 3. Equipped. The first handler 6 includes an import handler 6a for moving the workpiece W from the stage 1a of the injection unit 1 to the exposure table 8 of the first exposure unit 2, and the workpiece W. FIG. ) Is provided as an independent component with a carrying-out handler 6b for moving) from the exposure table 8 of the 1st exposure part 2 to the inversion apparatus 9 of the inversion part 3. The loading handler 6a and the carrying out handler 6b are equipped with the suction pad P (FIG. 2, FIG. 3) which attaches and detaches a workpiece | work W freely. The carry-in handler 6a and the carry-out handler 6b are movable independently in the left-right direction in FIG. 1 by the conveyance frame 20 mentioned later.

The exposure apparatus EX holds a second handler (work movement mechanism) 7 which holds the workpiece W and moves it from the inverting portion 3 to the second exposure portion 4 and the discharge portion 5. Equipped. The 2nd handler 7 is a carrying handler 7a which moves the workpiece | work W from the inversion apparatus 9 of the inversion part 3 to the exposure table 8 of the 2nd exposure part 4, and the workpiece | work ( The carrying-out handler 7b which moves W) from the exposure table 8 of the 2nd exposure part 4 to the stage 5a of the discharge part 5 is provided as an independent component. The carrying in handler 7a and the carrying out handler 7b are equipped with the suction pad P (FIG. 2, FIG. 3) which attaches and detaches a workpiece | work W freely. The carrying in handler 7a and the carrying out handler 7b are movable independently in the left-right direction in FIG. 1 by the conveyance frame 20 mentioned later.

<Configuration of Vibration Control Device>

The vibration suppression apparatus (cleaning unit) 12 of the same structure is provided in the 1st exposure part 2 and the 2nd exposure part 4, respectively. In FIG.2, FIG.3, only the damping apparatus 12 provided in the 1st exposure part 2 is shown, and the code | symbol corresponding to the component of the 2nd exposure part 4 is shown in parentheses.

As shown in FIG. 2, FIG. 3, the damping apparatus 12 is equipped with the 1st damping apparatus 12a and the 2nd damping apparatus 12b which oppose each other.

The 1st vibration damper 12a and the 2nd vibration damper 12b are hold | maintained by the conveyance frame 20 arrange | positioned in the 1st exposure part 2 (2nd exposure part 4). The conveyance frame 20 slides freely in a y direction (work conveyance direction) by a pair of guide rails 21 which are fixed members extended in the y direction (work conveyance direction), and the pair of guide rails 21. A pair of y-direction moving tables 22 supported, a connecting frame 23 extending in the x direction across the y-direction moving table 22 to span the pair of guide rails 21, a pair of y A pair of z direction movement tables 25 in which the slide is freely supported in the z direction (gravity direction) by the direction movement table 22, and approaches from each other in the y direction from the pair of z direction movement tables 25 A pair of stays 26 protruded so as to protrude. The pair of z direction movement tables 25 is freely supported by the pair of guide rails 24 which are the fixing members extended in the z direction (gravity direction). The y direction movement table 22 and the z direction movement table 25 are slid and positioned with respect to the guide rail 21 and the guide rail 24 by the actuator which is not shown in figure.

The 1st damping apparatus 12a is equipped with the 1st damping roller 16a which turned the rotating shaft to the x direction. This 1st damping roller 16a is rotatably supported by the one front-end | tip of a pair of stay 26. As shown in FIG. The 2nd vibration damper 12b is equipped with the 2nd vibration damper roller 16b which turned the rotating shaft to the x direction. This 2nd damping roller 16b is rotatably supported by the other tip part of the pair of stays 26. As shown in FIG. An adhesive layer is formed on the outer circumferential surfaces of the first damping roller 16a and the second damping roller 16b. The material of the 1st damping roller 16a and the 2nd damping roller 16b can be suitably selected according to the damping object, and the material of silicone rubber type is generally selected.

The conveyance frame 20 folds the 1st damping roller 16a and the 2nd damping roller 16b with respect to the damping surface of the workpiece | work W, the exposure table 8, or the mask 10 which are objects to be damped. At the same time, the circumferential surfaces of the first vibration damping roller 16a and the second vibration damping roller 16b are rotated while contacting the vibration damping surface of the object to be damped, so that the first vibration damping roller 16a and the second vibration damping roller 16b and A moving mechanism for relatively moving the vibration damping object is configured. Following the movement of the conveying frame 20, when the 1st damping roller 16a and the 2nd damping roller 16b rotate to move on the damping surface of a damping object, the 1st damping roller 16a and the 2nd damping roller By the adhesive force of the adhesive material of the outer peripheral surface of (16b), the dust adhering on the damping surface of the damping object can be wound up.

The exposure apparatus EX is provided with a control unit 16c for controlling the driving of the first vibration suppression roller 16a and the second vibration suppression roller 16b by the conveyance frame (moving mechanism) 20. The controller 16c alternately performs rolling on the damping object by the first damping roller 16a and rolling on the damping object by the second damping roller 16b. That is, the control part 16c controls the conveyance frame 20 so that the 1st damping roller 16a and the 2nd damping roller 16b may not rotate on the damping target object simultaneously. Thereby, it can prevent that the 1st damping roller 16a and the 2nd damping roller 16b interfere on the damping object.

As shown to FIG. 2, FIG. 3, the import handler 6a of the 1st handler 6, and the carrying out handler 6b (2nd handler) of one and the other of the pair of connection frames 23 of the conveyance frame 20 are shown. The carrying in handler 7a and the carrying out handler 7b of (7) are fixed, respectively, and the 1st damping roller 16a and the loading handler 6a (loading handler 7a) and the 2nd damping roller 16b are fixed, respectively. And export handler 6b (export handler 7b) move together. That is, the conveyance frame 20 constitutes the moving mechanism which moves the 1st damping roller 16a and the 2nd damping roller 16b, and cooperates with the 1st handler 6 and the 2nd handler 7 The workpiece | work movement mechanism which moves the workpiece | work W is comprised (it also serves as a movement mechanism and a workpiece movement mechanism).

As shown in FIG. 1, FIG. 3, FIG. 4, the exposure apparatus EX collects the dust adhered to the outer peripheral surfaces of the 1st dust removal roller 16a and the 2nd vibration damping roller 16b, and cleans | exposes the outer peripheral surface ( Dust collector (18). The transfer roller 18 is supported by the frame 17 (separate from the conveyance frame 20) provided in the 1st exposure part 2 and the 2nd exposure part 4. The transfer roller 18 is rotationally driven by the drive motor 27 through a known transmission device such as a chain or a gear, and on the outer circumferential surface of the transfer roller 18 than the first damping roller 16a and the second damping roller 16b. The tape which has strong adhesive force is wound. The 1st damping roller 16a and the 2nd damping roller 16b contact the transfer roller 18 in the cleaning position, and follow-up rotation by the rotation of the transfer roller 18. FIG. As a result, the dust adhering to the outer peripheral surfaces of the 1st damping roller 16a and the 2nd damping roller 16b is transferred to the surface of the transfer roller 18, and is collect | recovered. The dust collected by the transfer roller 18 is discarded by peeling off the adhesive tape once from the outer peripheral surface of the transfer roller 18. In addition, for ease of peeling and replacement of the transfer roller 18, a guide rail 19 is provided at the base of the frame 17, and the transfer roller 18 is removed by removing a stopper (not shown). Can be taken out to the worker side. Moreover, when the 1st damping roller 16a and the 2nd damping roller 16b are in the cleaning position, the frame 17 performs electrostatic removal of the 1st damping roller 16a and the 2nd damping roller 16b. The static eliminator 28 is provided.

Now, with reference to FIGS. 5, 6, and 7, attention is paid to the circumferential lengths of the first vibration damping roller 16a and the second vibration damping roller 16b. 5 shows a case in which the workpiece W placed on the exposure table 8 is a vibration suppression object, FIG. 6 shows a case in which the exposure table 8 is a vibration suppression object, and FIG. 7 shows a case in which the mask 10 is a vibration suppression object. Are respectively shown.

As shown in FIG. 5, the vibration damping surface WS of the workpiece | work W which is a vibration damping object is divided equally into the 1st damping surface (partially damped surface) WS1 and the 2nd damping surface (partially damped surface) WS2. The first vibration damping roller 16a drives the first vibration damping surface WS1 and the second vibration damping roller 16b rolls the second vibration damping surface WS2. The circumferential length 16ar of the first damping roller 16a is a contact movement distance between the circumferential surface of the first damping roller 16a and the first damping surface WS1 (first damping surface WS1 in FIG. 5). ), And the circumferential length 16br of the 2nd damping roller 16b is the contact movement distance (FIG.) Of the circumferential surface of the 2nd damping roller 16b and the 2nd damping surface WS2. It is set longer than the width | variety of the 2nd damping surface WS2 in five.

As shown in FIG. 6, the damping surface 8S of the exposure table 8 which is a damping object is equally divided into the 1st damping surface (partially damped surface) 8S1 and the 2nd damping surface (partially damped surface) 8S2. It is divided, and the 1st damping roller 16a rolls on the 1st damping surface 8S1, and the 2nd damping roller 16b rolls on the 2nd damping surface 8S2. And the circumferential length 16ar of the 1st damping roller 16a is the contact movement distance of the circumferential surface of the 1st damping roller 16a and the 1st damping surface 8S1 (1st damping surface 8S1 in FIG. 6). ), And the circumferential length 16br of the 2nd damping roller 16b is the contact movement distance (FIG.) Of the circumferential surface of the 2nd damping roller 16b and the 2nd damping surface 8S2. It is set longer than the width of the 2nd damping surface 8S2 in 6).

As shown in Fig. 7, the vibration damping surface 10S of the mask 10, which is a vibration damping object, is divided equally into a first vibration damping surface (partially damped surface) 10S1 and a second vibration damping surface (partially damped surface) 10S2. The first vibration damping roller 16a drives the first vibration damping surface 10S1, and the second vibration damping roller 16b rolls the second vibration damping surface 10S2. And the circumferential length 16ar of the 1st damping roller 16a is the contact movement distance of the circumferential surface of the 1st damping roller 16a and the 1st damping surface 10S1 (1st damping surface 10S1 in FIG. 7). ), And the circumferential length 16br of the 2nd damping roller 16b is the contact movement distance (FIG.) Of the circumferential surface of the 2nd damping roller 16b and the 2nd damping surface 10S2. It is set longer than the width of the 2nd damping surface 10S2 in 7).

Therefore, when the 1st damping roller 16a and the 2nd damping roller 16b roll and dust-proof the damping surface of a damping object, the same on the peripheral surface of the 1st damping roller 16a and the 2nd damping roller 16b. The part does not contact the damping surface of the damping object twice (the first damping roller 16a and the second damping roller 16b are damped by less than one rotation). For this reason, the dust once stuck to the 1st dust removal roller 16a and the 2nd dust removal roller 16b during dust removal does not have to be reattached to a dust removal object, and the exposure defect and image development defect resulting from reattachment are not shown. To prevent it.

<Operation of the vibration damper of the exposure apparatus>

8-14, the operation | movement of the damping apparatus 12 of the exposure apparatus EX of this embodiment is demonstrated. Here, the case where the exposure table 8 is damped after removing the mask 10 by using the mask 10 and the exposure table 8 of the 1st exposure part 2 as a damping object is demonstrated.

First, the unexposed work W carried in by an operator or a conveying apparatus (not shown) is mounted on the stage 1a of the input part 1. Then, the work W is moved from the stage 1a of the input part 1 to the exposure table 8 of the first exposure part 2 by the loading handler 6a of the first handler 6. . The workpiece | work W moved to the exposure table 8 is suction-fixed by the suction port (not shown) formed in the upper surface of the exposure table 8. Next, the exposure table 8 is raised toward the mask 10 by a lifting mechanism (not shown), and the mask (on the first surface (upper surface) of the workpiece W placed on the exposure table 8 is formed. 10) Then, the predetermined pattern drawn on the mask 10 by irradiating light (for example, ultraviolet light) in a wavelength band in which the photoresist layer of the workpiece W is exposed by the light source 14 in this close contact state. Is exposed on the photoresist layer of the first surface (upper surface) of the workpiece W. FIG. Next, the exposure table 8 is lowered by an elevating mechanism (not shown) until the upper surface thereof becomes the surface level and the surface one (Fig. 1), and the exposure table 8 is sucked up. The adsorption of the work W by the population (not shown) is released. Then, the workpiece W is moved from the exposure table 8 of the first exposure unit 2 to the inversion unit 9 of the inversion unit 3 by the carrying out handler 6b of the first handler 6.

After the workpiece W is moved to the inverting device 9 of the inverting part 3, the dust removal operation of the mask 10 and the exposure table 8 of the first exposure part 2 by the vibration suppression device 12 is performed. Is executed.

First, as shown in FIG. 8, after moving the 1st damping apparatus 12a and the 2nd damping apparatus 12b to an initial position, the 1st damping roller of the 1st damping apparatus 12a is carried out by the conveyance frame 20. FIG. By driving 16a, the first vibration damping surface 10S1 is driven on the first vibration damping roller 16a, and the first vibration damping surface 10S1 of the mask 10 is damped.

Next, as shown in FIG. 9, the 1st vibration damper is moved by the conveyance frame 20 to the cleaning position which contacts the transfer roller 18, and rotates the transfer roller 18. FIG. Cleaning of the roller 16a is started. At the same time, by driving the second vibration suppression roller 16b of the second vibration suppression apparatus 12b by the conveying frame 20, the second vibration suppression surface 10S2 is transferred to the second vibration suppression roller 16b and the mask ( The second vibration damping surface 10S2 of 10) is damped.

Next, as shown in FIG. 10, 2nd vibration damping is carried out by moving the 2nd damping roller 16b to the cleaning position which contacts the transfer roller 18 by the conveyance frame 20, and rotating the transfer roller 18. FIG. Cleaning of the roller 16b is started.

As shown in FIG. 11, when cleaning of the 1st damping roller 16a is complete | finished, the 1st of the 1st damping apparatus 12a is carried out by the conveyance frame 20, with cleaning of the 2nd damping roller 16b continuing. By driving the damping roller 16a, the first damping surface 8S1 is driven on the first damping roller 16a, and the first damping surface 8S1 of the exposure table 8 is damped. While the 1st vibration damping surface 8S1 of the exposure table 8 is damped, the cleaning of the 2nd damping roller 16b is complete | finished.

Then, as shown in FIG. 12, the 1st vibration damping roller 16a is moved to the cleaning position which contacts the transfer roller 18 by the conveyance frame 20, and 1st vibration damping is carried out by rotating the transfer roller 18. FIG. Cleaning of the roller 16a is started. At the same time, by driving the second vibration damping roller 16b of the second vibration damper 12b by the conveying frame 20, the second vibration damping surface 8S2 is transferred to the second vibration damping roller 16b, thereby exposing the exposure table. The second damping surface 8S2 of (8) is damped.

Next, as shown in FIG. 13, the 2nd vibration damping roller 16b is moved to the cleaning position which contacts the transfer roller 18 by the conveyance frame 20, and 2nd vibration damping by rotating the transfer roller 18 is carried out. Cleaning of the roller 16b is started.

Finally, as shown in FIG. 14, cleaning of the 1st damping roller 16a is complete | finished, the 1st damping apparatus 12a is moved to an initial position, and after that, cleaning of the 2nd damping roller 16b is complete | finished, The second vibration damper 12b is moved to the initial position.

As described above, in the vibration suppression method of the exposure apparatus EX of the present embodiment, the vibration suppression process of the vibration suppression object by the first vibration suppression roller 16a and the second vibration suppression roller 16b, and the first vibration suppression in which the vibration suppression process is completed. The cleaning process which cleans the peripheral surfaces of the roller 16a and the 2nd damping roller 16b with the transfer roller 18 is performed alternately.

Here, although the damping operation in the first exposure unit 2 has been described, the same vibration suppression operation is performed in the second exposure unit 4 as well. The timing at which vibration is performed in the first exposure part 2 and the second exposure part 4 may be a timing at which a space is generated between the exposure table 8 and the mask 10, and the vibration is removed at a predetermined exposure cycle in advance. The aspect which starts, or the aspect which starts vibration damping at the timing which the arbitrary exposure is completed and the workpiece | work W is discharged is possible.

In addition, the procedure to perform vibration damping in the 1st exposure part 2 and the 2nd exposure part 4 is an example to the last, It is not limited to this. For example, dust removal by the 2nd vibration suppression apparatus 12b (2nd vibration damper roller 16b) is performed first, and dust removal by the 1st vibration damper 12a (1st vibration damper roller 16a) is performed later. Also good. In addition, dust removal of the exposure table 8 may be performed first, and vibration removal of the mask 10 may be performed later. In addition, the first vibration suppression apparatus 12a (first vibration suppression roller 16a) and the second vibration suppression apparatus 12b (second vibration suppression roller 16b) may simultaneously start the vibration suppression operation.

Thus, according to this embodiment, the circumferential length 16ar of the 1st damping roller 16a is made into the circumferential surface of the 1st damping roller 16a, and the 1st damping surfaces WS1, 8S1, 10S1 of a damping object. It is set longer than the contact movement distance, and the circumferential length 16br of the second vibration damping roller 16b is formed between the circumferential surface of the second vibration damping roller 16b and the second vibration damping surfaces WS2, 8S2, 10S2. It is set longer than the contact movement distance. Therefore, in the one damping process, when the 1st damping roller 16a and the 2nd damping roller 16b drive and damp the damping surface of the damping object, the 1st damping roller 16a and the 2nd damping roller ( The same portion on the circumferential surface of 16b does not contact the vibration damping surface of the vibration damping object twice (the first vibration damping roller 16a and the second vibration damping roller 16b are damped by less than one rotation). For this reason, the dust once stuck to the 1st dust removal roller 16a and the 2nd dust removal roller 16b during dust removal does not have to be reattached to a dust removal object, and the exposure defect and image development defect resulting from reattachment are not shown. To prevent it.

In the above embodiment, the case where the two vibration damping rollers of the 1st vibration damper roller 16a and the 2nd vibration damper roller 16b were provided was demonstrated and demonstrated, but it drives the whole vibration damping surface on a single damping object. It is also possible to install a single damping roller. In this case, the circumferential length of the single damping roller is set longer than the contact movement distance between the circumferential surface of the single damping roller and the damping surface of the damping object.

In the above embodiment, although the case where two vibration damping rollers of the 1st vibration damper roller 16a and the 2nd vibration damper roller 16b were provided was demonstrated and demonstrated, the aspect which provides three or more vibration damper rollers is also possible. In this case, the circumferential length of each damping roller is made longer than the contact movement distance between the circumferential surface of each damping roller and each divided damping surface of a damping object.

In the above embodiment, although the exposure apparatus EX of the type which exposes on both surfaces of a workpiece in order by the contact exposure system which closely adheres and exposes a mask and a workpiece (photosensitive board | substrate) was illustrated and demonstrated, the application target of this invention applies this to this. It is not limited to. For example, the present invention, in addition to the contact exposure method, the mask and the work is in close proximity and non-contact proximity gap method, a direct exposure method, a mask that directly draws a pattern by scanning while modulating light without a mask and It can apply to the exposure apparatus of various systems, such as the projection system in which the projection optical system is provided between board | substrates. Moreover, this invention is applicable to the exposure apparatus of the double-sided simultaneous exposure system which exposes both surfaces of a workpiece simultaneously, and the single-sided exposure system which exposes only one surface of a workpiece | work.

In the above embodiment, although the horizontal type exposure apparatus which performs exposure, conveying a workpiece | work in the horizontal direction was illustrated and demonstrated, this invention is applicable also to the vertical type exposure apparatus which exposes while conveying a workpiece | work in a vertical direction.

In the above-mentioned embodiment, although the case where the workpiece | work (photosensitive board | substrate), the exposure table, or the mask was made into the damping object was demonstrated and demonstrated, all the members to which dust adheres in the inside of an exposure apparatus can be made into a damping object.

In the above embodiment, the case where the transfer roller (dust collector) 18 which collects the dust adhered to the 1st damping roller 16a and the 2nd damping roller 16b was used was demonstrated and demonstrated. However, the transfer roller (dust collector) 18 is omitted, and whenever the damping operation by the first damping roller 16a and the second damping roller 16b ends, the first damping roller 16a and the second damping are performed. The mode which peels off the adhesive material (adhesive tape) once from the outer peripheral surface of the roller 16b is also possible. In this aspect, each time the adhesive material (adhesive tape) is peeled off from the outer circumferential surfaces of the first vibration damping roller 16a and the second vibration damping roller 16b, the circumferential length thereof becomes small, so that the amount of winding of the adhesive material (adhesive tape) is reduced. As the reference with the smallest state, the circumferential lengths of the first vibration damping roller 16a and the second vibration damping roller 16b are set.

[Industry availability]

The vibration suppression apparatus and vibration damping method of the exposure apparatus of this invention are suitable for application to the vibration suppression apparatus and vibration damping method of the exposure apparatus which expose a pattern with respect to a photosensitive substrate, for example.

EX exposure device
W work (photosensitive substrate, dustproof object)
WS damping surface
WS1 1st damping surface (divided damping surface)
WS2 2nd damping surface (divided damping surface)
1 input
1a stage
2 first exposure unit
3 inversion
4 Second exposure part
5 outlet
5a stage
6 first handler (work movement mechanism)
6a import handler
6b export handler
7 second handler (work movement mechanism)
7a import handler
7b export handler
8 Exposure Table (Dust Removal Object)
8S damping surface
8S1 1st damping surface (divided damping surface)
8S2 2nd damping surface (divided damping surface)
9 reverse device
10 masks
10S damping surface
10S1 1st damping surface (divided damping surface)
10S2 2nd damping surface (partitioned damping surface)
12 Vibration Control Unit (Cleaning Unit)
12a first vibration damper
12b 2nd vibration damper
14 light source
16a first dust removal roller
Circumferential length of the 16ar first dust removal roller
16b 2nd damping roller
Circumferential length of 16br 2nd damping roller
16c controller
17 frames
18 Transfer roller (dust collector)
19 guide rail
20 conveying frame (moving mechanism, work movement mechanism)
21 guide rail
22 y directional table
23 connection frames
24 guide rail
25 z direction moving table
26 stays
27 drive motor
28 static eliminator

Claims (9)

In the exposure apparatus which exposes a pattern with respect to a photosensitive board | substrate,
A vibration damping roller which is foldable on the vibration damping surface of the vibration damping object in the exposure apparatus and has a cylindrical shape by a circumferential surface;
And a movement mechanism for moving the vibration damping roller such that the vibration damping roller can move while rotating on the vibration damping object while contacting a circumferential surface of the vibration damping roller with the vibration damping surface of the vibration damping object.
The circumferential length of the said damping roller is set longer than the contact movement distance of the circumferential surface of the said damping roller by the said moving mechanism, and the damping surface of the said damping object, The damping apparatus of the exposure apparatus characterized by the above-mentioned. The method of claim 1,
The vibration damping roller is provided with a plurality so as to rotate on the divided vibration damping surface obtained by dividing a plurality of vibration damping surfaces of a single vibration damping object.
The circumferential length of each damping roller is set to be longer than the contact movement distance of the circumferential surface of each damping roller and each divided damping surface. The method of claim 2,
The vibration damping roller includes first and second vibration damping rollers so as to rotate the first and second divided vibration damping surfaces on which the vibration damping surface of a single vibration damping object is divided into two.
The circumferential length of the said 1st damping roller is set longer than the contact movement distance of the circumferential surface of the said 1st damping roller and said 1st division damping surface,
The circumferential length of the said 2nd damping roller is set to be longer than the contact movement distance of the circumferential surface of the said 2nd damping roller, and the said 2nd divided damping surface. The method of claim 3,
And a control unit for alternately performing rolling on the first divided vibration isolating surface of the first damping roller and rolling on the second divided vibration isolating surface of the second damping roller. The method of claim 1,
The vibration damper of the exposure apparatus, wherein the vibration damper comprises a single roller for rolling the entire vibration damping surface of the single vibration damping object. The method according to any one of claims 1 to 5,
The said vibration mechanism is a vibration damper of the exposure apparatus which serves as the workpiece movement mechanism which hold | maintains and moves a photosensitive board | substrate. The method according to any one of claims 1 to 5,
The said vibration damping object is a vibration damping apparatus of the exposure apparatus containing any one or more of a photosensitive board | substrate, an exposure table, and a mask. The method according to any one of claims 1 to 5,
And a dust collecting apparatus for collecting dust attached to the dust removing roller. A vibration damping step of causing the vibration damping roller to be driven to vibrate while contacting the circumferential surface thereof with the vibration damping surface of the vibration damping object in the exposure apparatus;
In the dust removal method of the exposure apparatus which alternately performs the cleaning process of cleaning the circumferential surface of the said damping roller which the vibration damping process was complete | finished,
The vibration damping roller has a cylindrical shape and is movable while rotating while maintaining a state of contact with the vibration damping surface of the vibration damping object.
The dust removal method of the exposure apparatus in one vibration damping process WHEREIN: The same part on the circumferential surface of the said damping roller is damped, without contacting the damping surface of the said damping object twice.

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