200928615 九、發明說明 【發明所屬之技術領域】 本發明係關於使圖案曝光於在電子電路基板、液晶元 件用玻璃基板、PDP用玻璃元件基板等之表面形成有光阻 層之平面基板的曝光裝置。 ' 【先前技術】 Q 爲了在電子電路基板（印刷電路基板）等之基板上形 成圖案，使用光微影法。該光微影法係在基板上之光阻層 表面形成光之圖案，依此選擇性使光阻層感光，藉由浸漬 於蝕刻處理液使光阻層溶解，並且蝕刻被其部分覆蓋之基 ' 板表面的手法。如此之光微影法，作爲曝光基板之方法之 —，有對基板之曝光對象面重疊光罩，隔著該光罩利用光 使被塗佈於基板之感光材層曝光之接觸曝光方式。本案發 明雖然爲關於如此接觸曝光方式之曝光裝置，但是即使在 〇 於不利用光罩的直接曝光（Direct Imaging)裝置中亦可以被 應用於曝光工作台之洗淨等。 在如此接觸曝光方式之曝光裝置中，當一旦被外部環 境中之塵埃污染之基板被搬入，由於附著於該基板之各面 之塵埃接觸於光罩，使得塵埃轉印至該光罩而使光罩污染 。當如此光罩被污染時，於曝光該被污染之基板之時，則 產生附著於光罩之透光部之塵埃遮蔽光，而使得其影映在 基板之光阻層，因此在顯像處理後圖案產生缺口等之缺陷 -5- 200928615 於此，在各曝光部中’各自需要用以執行對光罩表面 (接觸於基板之面）或是被導入之基板之曝光對象面（接 觸於光罩之面）進行除塵之除塵手段。以往除塵手段具備 有在外周面形成有黏著層之黏著滾輪’和使黏著力比該黏 著滾輪之黏著層更強之黏著層朝向外側捲繞的轉印滾輪’ 將黏著滾輪在除塵對象面上滾動’使黏著滾輪之黏著層附 著塵埃，以互相外周面彼此接觸之方式使被動旋轉，依此 ❹ 使塵埃更轉印至轉印滾輪而予以集塵。在該方式中，被集 聚於轉印滾輪之黏著層之塵埃，藉由取下1圈份黏著層可 以簡單廢棄。 例如，參考文獻1所記載之曝光裝置中，在將基板搬 ' 入於工作台上之搬入載體前端設置有可上下摇動的除塵滾 輪，隨著基板搬入至工作台上之動作除塵原版表面，並且 隨著自工作台上退避之動作除塵基板之曝光對象面，之後 _ 將塵埃轉印至轉印滾輪1 7。 ❹ 在此，當被搬入至曝光裝置之基板被污染時，基板則 強固被固定於工作台表面，由於該固定手段之作用，不可 避免自基板本體剝落光阻材料、基材片等。如此一來，在 工作台上所發生之塵埃，附著於該基板以及之後被固定於 該工作台之基板之背面。當將塵埃附著於該背面之基板直 接移動至下一個工程時，由於在基板之圖案形成引起重大 缺陷，故必須除塵工作台上表面。 記載於參考文獻1之裝置中，以基板無固定於工作台 上之狀態直接使搬入載體及除塵滾輪動作，除塵光罩表面 -6 - 200928615 及工作台表面。 再者，參考文獻2表示於曝光工作台之正前方設置除 塵手段除塵基板中之曝光對象面之構成。若將該除塵手段 設置於第1面用之曝光部和反轉裝置之間，或是反轉手段 和第2面用之曝光部之間用以基板之第2面除塵用，則可 以除塵上述基板之第2面。 * 〔參考文獻1〕日本特許3533380號公報 Q 〔參考文獻2〕日本特許2847808號公報 【發明內容】 發明所欲解決之課題 ' 但是，專利文獻丨所記載之裝置因將1根黏著滾輪兼 作爲用以除塵存在於上方之光罩表面，和存在於下方之工 作台上表面之塵埃，故必須使該1根黏著滾輪在垂直方向 _ 搖動。因此，在專利文獻1所記載之裝置中，無法總使黏 Ο 著滾輪和轉印滾輪接觸。因此，在該裝置中，雖然把轉印 滾輪設置在工作台外之固定位置，並且使黏著滾輪可獨立 移動，但是在如此之構成中，有附著於該黏著滾輪之黏著 層的塵埃會蓄積，使黏著滾輪之除塵能力急劇下降之問題 〇 在此，本發明係提供一種在曝光裝置之曝光部中，使 在除塵對象面上滾動之黏著滾輪總是接觸於直徑比此大之 轉印滾輪，並藉由該動作使附著於黏著滾輪之塵埃立即轉 印至該轉印滾輪，而延長粘著滾輪之壽命，並可以藉由一 200928615 個除塵裝置之一連串移動，同時除塵光罩表面以及工作台 表面之除塵手段。 用以解決課題之手段 爲了解決上述課題而所硏發出之本發明之曝光裝置之 第1實施型態爲 ' 爲一種對基板之表面隔著光罩使光之圖案予以曝光之 〇 曝光裝置，設置有保持上述光罩之光罩保持手段。在與被 保持於上述光罩保持手段之光罩對向之側，具有將基板平 行固定於該光罩之固定面之工作台，和使藉由上述光罩保 持手段所保持之光罩和上述工作台之固定面相對地接近及 分離之移動機構載置在框體。 再者，其特徵又爲其具備 有：隔著被上述光罩保持手段所保持之光罩，使光朝向被 上述工作台之固定面保持之基板照射的光源；洗淨單元， t 該洗淨單元具備：框架、藉由與被上述光罩保持手段所保 Ο 持之光罩表面及上述固定面平行之旋轉軸而被樞支於上述 框架，並具有形成有黏著層之外周面的轉印滾輪、以外周 面接觸於上述轉印滾輪的外周面，並且較該轉印滾輪更接 近於上述光罩之方式，藉由與上述旋轉軸平行之旋轉軸而 被樞支於上述框架，並在上述外周面形成有黏著層之第1 黏著滾輪，以及以外周面接觸於上述轉印滾輪的外周面， 並且較該轉印滾輪更接近於上述工作台之方式，藉由與上 述各旋轉軸平行之旋轉軸而被樞支於上述框架，並在上述 外周面形成有黏著層之第2黏著滾輪；和在與上述旋轉軸 -8- 200928615 正交之面內使上述洗淨單元移動之移動台。 再者，本發明之第2實施型態，爲一種對基板表面隔 著光罩使光之圖案予以曝光之曝光裝置，其特徵爲具備有 :保持上述光罩之保持手段；在與被上述光罩保持手段所 保持之光罩對向之側，具有將基板平行固定於該光罩之固 定面的工作台；使藉由上述光罩保持手段所保持之光罩和 • 上述工作台之固定面相對地接近及分離之移動機構；隔著 φ 被上述光罩保持手段所保持之光罩，使光朝向被上述工作 台固定面所保持之基板照射之光源；洗淨單元，該洗淨單 元具有框架、藉由與被上述框架保持手段所保持之光罩表 面及與上述固定面平行之旋轉軸被樞支於上述框架，並具 ' 有形成有黏著層之外周面的轉印滾輪、以外周面接觸於上 述轉印滾輪的外周面，並且較上述轉印滾輪更接近於上述 光罩之方式，藉由與上述旋轉軸平行之旋轉軸而被樞支於 上述框架，並在上述外周面形成有黏著層之第1黏著滾輪 〇 、以及以外周面接觸於上述轉印滾輪的外周面之方式，藉 由與上述各旋轉軸平行之旋轉軸而被樞支於上述框架，並 在上述外周面形成有黏著層的中間滾輪、和以外周面接觸 於上述轉印滾輪的外周面，並且較該轉印滾輪更接近於上 述工作台之方式，藉由與上述各旋轉軸平行之旋轉軸而被 樞支於上述框架，並在上述外周面形成有黏著層之第2黏 著滾輪；在與上述旋轉軸正交之面內使上述洗淨單元移動 之移動台；和控制手段，用以控制上述移動機構及上述移 動台，在上述第1黏著滾輪接觸於被保持於上述光罩保持 -9- 200928615 手段之光罩之同時，在上述第2黏著滾輪接觸於上述工作 台之固定面之狀態下，使上述洗淨單元朝與上述光罩之表 面及上述固定面平行並且正交於上述各旋轉軸之方向移動 〇 當藉由上述般所構成之本發明時，在洗淨單元之框架 上，光罩專用之第1黏著滾輪和工作台之固定面專用之第 • 2黏著滾輪，皆被樞支成使其外周面總是接觸於轉印滾輪 φ 之外周面。因此，不需要複雜之機構仍可將第1黏著滾輪 之位置配置成較轉印滾輪之位置更接近於光罩，而於該第 1黏著滾輪接觸於光罩之時不使轉印滾輪接觸於該光罩， 並且將第2黏著滾輪之位置較轉印滾輪之位置更接近於工 " 作台，而於第2黏著滾輪接觸於工作台之固定面之時不使 轉印滾輪接觸於該固定面。再者，因可以使轉印滾輪之外 徑大於各黏著滾輪之外徑，故轉印滾輪之黏著滾輪之壽命 變長，即使塵埃之量較多亦可以充分執行除塵。 〇 並且，當藉由上述本發明之第2實施型態時，因可同 時對光罩除塵和對工作台之固定面除塵’故可以縮短除塵 所需之作業時間。 〔發明效果〕 藉由上述般所構成之本發明的曝光裝置，不用採用複 雜之構成，可以總將轉印滾輪接觸於直徑比此小之在除麈 對象面上滾動之黏著滾輪’並且藉由一個除塵手段之一連 串移動，可有效地除塵光罩表面和工作台表面。 -10- 200928615 【實施方式】 以下，根據圖面，說明本發明之實施型態。 (曝光裝置之全體構成） 第1圖爲表示依據本實施型態之曝光裝置之槪略構成 • 的側面透視圖。如該圖所示般，該曝光裝置係藉由在水平 φ 方向（由第1圖左側朝向右側）配置投入部1、第1曝光 部2、反轉部3、第2曝光部4、排出部5而構成。再者， 本曝光裝置之全體係由第2圖所不之控制系統而被控制^ 投入部1具有工作台1，爲使作業員或是無圖示之機 ' 械人載置基板w於該工作台1之上，以使第1機械手6 將未曝光之基板W從此抬起。 該第1機械手臂6具有延伸於第1圖之左右方向之腕 部，在該腕部之兩端各具備有裝卸自如吸附基板W並可 〇 升降之墊片。然後，藉由無圖示之線性滑件使第1機械手 臂6全體移動至第1圖之左右方向，將藉由圖中左端之墊 片而吸附之基板W從投入部1移送至第1曝光部2，而放 置在其工作台8上，並將藉由圖中右端之墊片而吸附之基 板W從第1曝光部2移送至反轉部3，而載置在其反轉裝 置9內並退避。 第1曝光部2爲，在自投入部1移送之基板W之第1 面重疊光罩10’並將使光阻層感光之紫外光隔著該光罩 10照射’依此將當作光罩10之透光部所描畫出之圖案曝 -11 - 200928615 光於第1面上之光阻層的裝置。因此，該第1曝光部2係 由，當基板W藉由第1機械手臂6被載置於工作台8後 ，使該工作台8和該基板W朝向光罩10接近並使其接觸 ，又可使其分離之使工作台8升降之上昇機構55，和保持 光罩10之光罩保持手段之支持器11，和發出用以使光阻 層感光之光的光源14而構成。[Technical Field] The present invention relates to an exposure apparatus for exposing a pattern to a planar substrate on which a photoresist layer is formed on an electronic circuit board, a glass substrate for a liquid crystal element, a glass element substrate for PDP, or the like. . [Prior Art] Q In order to form a pattern on a substrate such as an electronic circuit board (printed circuit board), a photolithography method is used. The photolithography method forms a pattern of light on the surface of the photoresist layer on the substrate, thereby selectively sensitizing the photoresist layer, dissolving the photoresist layer by immersing in the etching treatment solution, and etching the portion covered by the portion thereof. 'The method of the board surface. In the photolithography method, as a method of exposing a substrate, there is a contact exposure method in which a mask is placed on a surface of an exposure target of a substrate, and a photosensitive material layer coated on the substrate is exposed by light through the photomask. The present invention is an exposure apparatus for such exposure exposure, but can be applied to cleaning of an exposure stage or the like even in a Direct Imaging apparatus which does not use a photomask. In the exposure apparatus of the exposure exposure method, when the substrate contaminated by the dust in the external environment is carried in, the dust adhering to the respective surfaces of the substrate contacts the mask, so that the dust is transferred to the mask to make the light Cover pollution. When the mask is contaminated, when the contaminated substrate is exposed, the dust shielding light adhering to the light transmitting portion of the mask is caused to be reflected on the photoresist layer of the substrate, so that the image processing is performed. Defects such as gaps in the rear pattern-5-200928615 Here, in each of the exposure portions, 'each of which is required to perform an exposure target surface (contact with light) on the surface of the mask (surface contacting the substrate) or the substrate to be introduced The surface of the cover is used for dust removal. In the past, the dust removing means includes an adhesive roller which has an adhesive layer formed on the outer peripheral surface, and a transfer roller which winds the adhesive layer which is stronger than the adhesive layer of the adhesive roller toward the outside. The roller is rolled on the dust removing surface. 'The dust adheres to the adhesive layer of the adhesive roller, and the outer peripheral surface is passively rotated to contact each other, whereby the dust is more transferred to the transfer roller to collect dust. In this manner, the dust collected on the adhesive layer of the transfer roller can be easily discarded by taking one coat of the adhesive layer. For example, in the exposure apparatus described in Reference 1, a dust removing roller that can be oscillated up and down is provided at the front end of the loading carrier that carries the substrate into the table, and the surface of the original dust removing plate is carried as the substrate is loaded onto the table. Then, as the object to be exposed of the substrate is removed from the work on the workbench, the dust is transferred to the transfer roller 17 afterwards. ❹ Here, when the substrate carried into the exposure apparatus is contaminated, the substrate is strongly fixed to the surface of the table, and the photoresist member, the substrate sheet, and the like are not peeled off from the substrate body due to the action of the fixing means. As a result, dust generated on the stage adheres to the substrate and is then fixed to the back surface of the substrate of the table. When the substrate to which the dust adheres to the back surface is directly moved to the next project, since the pattern formation on the substrate causes a major defect, it is necessary to remove the upper surface of the table. According to the apparatus of Reference 1, the loading carrier and the dust removing roller are directly operated in a state where the substrate is not fixed to the table, and the surface of the dust mask is -6 - 200928615 and the surface of the table. Further, Reference 2 shows a configuration in which an exposure target surface in a dust removing substrate of a dust removing means is disposed directly in front of the exposure table. When the dust removing means is provided between the exposure portion for the first surface and the reversing device, or between the reversing means and the exposure portion for the second surface for dust removal on the second surface of the substrate, the dust can be removed. The second side of the substrate. [Reference 1] Japanese Patent No. 3533380 [Jobs 2] Japanese Patent No. 2847808 (Draft) [Problems to be Solved by the Invention] However, the device described in Patent Document 兼 uses one adhesive roller as both It is used to remove the dust on the surface of the reticle above and the dust on the upper surface of the table below, so the one roller must be shaken in the vertical direction. Therefore, in the device described in Patent Document 1, the adhesive roller and the transfer roller cannot always be brought into contact with each other. Therefore, in the apparatus, although the transfer roller is disposed at a fixed position outside the table, and the adhesive roller can be independently moved, in such a configuration, dust adhering to the adhesive layer of the adhesive roller accumulates, The problem of drastically reducing the dust-removing ability of the adhesive roller is as follows. The present invention provides an adhesive roller that rolls on the surface of the dust-removing object in the exposure portion of the exposure device, and always contacts the transfer roller having a larger diameter. And by this action, the dust attached to the adhesive roller is immediately transferred to the transfer roller, thereby prolonging the life of the adhesive roller, and can be moved by one of the 200928615 dust removing devices, and the surface of the dust removing mask and the table The means of dust removal on the surface. Means for Solving the Problem The first embodiment of the exposure apparatus of the present invention which has been developed to solve the above problems is a type of exposure apparatus for exposing a pattern of light to a surface of a substrate via a mask. There is a reticle holding means for maintaining the above reticle. a working surface on which the substrate is fixed in parallel to the fixing surface of the reticle, and a reticle held by the reticle holding means, and the above-mentioned side opposite to the reticle held by the reticle holding means The moving mechanism in which the fixed surface of the table is relatively close and separated is placed on the frame. Furthermore, it is characterized in that it is provided with a light source that illuminates the substrate held by the fixed surface of the table via a photomask held by the mask holding means; and the cleaning unit t cleans The unit includes: a frame pivotally supported by the frame by a rotating shaft parallel to the surface of the reticle held by the reticle holding means and the fixing surface, and having a transfer surface formed with an outer surface of the adhesive layer a roller, the outer peripheral surface is in contact with the outer peripheral surface of the transfer roller, and is closer to the reticle than the transfer roller, and is pivotally supported by the frame by a rotating shaft parallel to the rotating shaft, and a first adhesive roller having an adhesive layer formed on the outer peripheral surface thereof, and an outer peripheral surface contacting the outer peripheral surface of the transfer roller, and being closer to the table than the transfer roller, by being parallel to each of the rotary axes a second adhesive roller that is pivotally supported by the frame and has an adhesive layer formed on the outer peripheral surface; and the cleaning unit is moved in a plane orthogonal to the rotating shaft -8-200928615 Mobile station. Furthermore, a second embodiment of the present invention is an exposure apparatus for exposing a pattern of light to a surface of a substrate via a mask, and is characterized in that: a holding means for holding the mask; a side of the reticle held by the cover holding means, having a table for fixing the substrate in parallel to the fixing surface of the reticle; a reticle held by the reticle holding means and a fixing surface of the table a moving mechanism that is relatively close to and separated from each other; a light source that is held by the mask holding means via φ to direct light toward a substrate held by the table fixing surface; and a cleaning unit having the cleaning unit The frame is pivotally supported by the frame on the surface of the reticle held by the frame holding means and the rotating shaft parallel to the fixing surface, and has a transfer roller having a peripheral surface formed with an adhesive layer, and the periphery The surface is in contact with the outer peripheral surface of the transfer roller, and is closer to the reticle than the transfer roller, and is pivotally supported by the frame by a rotating shaft parallel to the rotating shaft And the first adhesive roller 形成 having the adhesive layer formed on the outer peripheral surface thereof, and the outer peripheral surface contacting the outer peripheral surface of the transfer roller, and being pivotally supported by the frame by a rotation axis parallel to each of the rotation axes And an intermediate roller having an adhesive layer formed on the outer peripheral surface thereof, and an outer peripheral surface of the transfer roller contacting the outer peripheral surface, and closer to the table than the transfer roller, by using each of the rotating shafts a second adhesive roller that is pivotally supported by the parallel rotating shaft and has an adhesive layer formed on the outer peripheral surface; a moving table that moves the cleaning unit in a plane orthogonal to the rotating shaft; and a control means And controlling the moving mechanism and the mobile station, wherein the first adhesive roller contacts the photomask held by the mask retaining device -9-200928615, and the second adhesive roller contacts the workbench In the state of the fixing surface, the cleaning unit is moved in a direction parallel to the surface of the reticle and the fixing surface and orthogonal to the rotation axis In the invention of the present invention, the first adhesive roller dedicated to the photomask and the second adhesive roller dedicated to the fixing surface of the table are pivotally supported on the frame of the cleaning unit so that the outer peripheral surface thereof is always It is in contact with the outer peripheral surface of the transfer roller φ. Therefore, the position of the first adhesive roller can be disposed closer to the reticle than the position of the transfer roller without requiring a complicated mechanism, and the transfer roller is not brought into contact when the first adhesive roller contacts the reticle. The reticle, and the position of the second adhesive roller is closer to the working position than the position of the transfer roller, and the transfer roller is not contacted when the second adhesive roller contacts the fixed surface of the table Fixed surface. Further, since the outer diameter of the transfer roller can be made larger than the outer diameter of each of the adhesive rollers, the life of the adhesive roller of the transfer roller becomes long, and dust can be sufficiently performed even if the amount of dust is large. Further, according to the second embodiment of the present invention described above, since the dust can be removed at the same time and the fixed surface of the table can be dusted, the working time required for dust removal can be shortened. [Effect of the Invention] According to the exposure apparatus of the present invention configured as described above, the transfer roller can be always brought into contact with the adhesion roller which is smaller in diameter than the one on the surface of the object to be removed without using a complicated structure. A series of dust removal means can effectively remove the surface of the reticle and the surface of the workbench. -10-200928615 [Embodiment] Hereinafter, embodiments of the present invention will be described based on the drawings. (Composite configuration of the exposure apparatus) Fig. 1 is a side perspective view showing a schematic configuration of the exposure apparatus according to the present embodiment. As shown in the figure, the exposure apparatus arranges the input unit 1, the first exposure unit 2, the inversion unit 3, the second exposure unit 4, and the discharge unit in the horizontal φ direction (from the left side toward the right side in the first drawing). 5 constitutes. Furthermore, the entire system of the exposure apparatus is controlled by the control system not shown in Fig. 2. The input unit 1 has a table 1 for the worker or the device (not shown) to mount the substrate w. Above the table 1, the first robot 6 lifts the unexposed substrate W therefrom. The first robot arm 6 has a wrist portion extending in the left-right direction of Fig. 1, and each of the two ends of the wrist portion is provided with a gasket for detachably attaching and absorbing the substrate W and elevating and lowering. Then, the entire first arm 6 is moved to the left-right direction of FIG. 1 by a linear slider (not shown), and the substrate W adsorbed by the spacer at the left end in the drawing is transferred from the input unit 1 to the first exposure. The portion 2 is placed on the table 8 and the substrate W adsorbed by the spacer at the right end in the drawing is transferred from the first exposure unit 2 to the inversion unit 3, and placed in the reversing device 9 And retreat. The first exposure unit 2 is configured such that the photomask 10 ′ is superimposed on the first surface of the substrate W transferred from the input unit 1 and the ultraviolet light that is exposed to the photoresist layer is irradiated through the photomask 10 . The pattern drawn by the light-transmissive part of 10 is exposed to the device of the photoresist layer on the first surface. Therefore, in the first exposure unit 2, when the substrate W is placed on the table 8 by the first robot arm 6, the table 8 and the substrate W are brought close to and brought into contact with the mask 10, and The rising mechanism 55 for moving the table 8 up and down, the holder 11 for holding the mask holding means of the mask 10, and the light source 14 for emitting light for the photoresist layer can be formed.
- 光源14係由例如短弧燈等或是高壓燈等之各種UV φ 燈或是被鋪設於平面上之LED等，依基板W之光阻層之 反映條件而選擇出。並且，具備有效率佳地使自光源14 所發出之光線誘導至基板之鏡、透鏡等亦可。再者，光罩 1 〇爲，在被矩形框（框架）所保持之玻璃、丙烯板等上貼 ' 付遮光構件或描畫，致使需要光透過之處成爲透光部。並 且，工作台8之上表面與被支持器11所保持之光罩10表 面平行，開口有連通於無圖示之吸引泵的多數吸引口。透 過該些吸引口吸引空氣，在該工作台8上表面吸附固定基 〇 板W使其與光罩10表面平行，即固定成使該上表面作爲 « 固定面而發揮功能。並且，與上述相反，藉由上昇機構55 使保持光罩10之支持器11下降，而接近於工作台8亦可 。因此，該上昇機構55相當於相對地接近或分離藉由支 持器11所保持之光罩10和工作台8之固定面之移動機構 〇 再者’在第1圖中，雖然描畫出機械手臂6位於光罩 10之正下方，但是光罩10也可配置在與紙面正交之方向 相對離開於第1機械手臂6的位置。在此情形，在工作台 -12- 200928615 8除昇降之功能外’需要水平移動於與紙面正交之方向的 功能。在如此之構成中，於工作台8昇降時，無須使第1 機械手臂6退避，再者’容易遮蔽來自光源14之漏光。 並且’針對用以除塵第1曝光部2之光罩1〇之下表面和 工作台8之上表面之洗淨單元12，在後述中有詳細說明。 反轉部3內藏有用以反轉藉由第1機械手臂6自第1 ' 曝光部2被移送之第1面完成曝光之基板w的反轉裝置9 φ ，及將藉由該反轉裝置9而被反轉之基板W之第2面予 以除塵的洗淨單元1 3。 第2曝光部4具有與第1曝光部2相同之構成。因此 ，在第1圖中，對與第1曝光部2共同之第2曝光部4之 ' 零件賦予與第1曝光部2相同之號碼，省略各個說明。 該第2機械手臂7具有延伸於第1圖之左右方向之腕 部，在該腕部之兩端各具備有裝卸自如吸附基板W並可 升降之墊片。然後，藉由無圖示之線性滑件使第2機械手 ❹ 臂7全體移動至第1圖之左右方向，將藉由圖中左端之墊 " 片而吸附之基板W從反轉部3移送至第2曝光部4，而放 置在其工作台8上，並將藉由圖中右端之墊片而吸附之基 板W從第2曝光部4移送至排出部5，而放置在排出部5 之工作台5a上。如此被放置在排出部5之工作台5a上之 曝光完成之基板W藉由作業員或是無圖示之機器人取出 ，而移動至下一個處理工程。並且，針對被設置在第2曝 光部4和排出部5之間，用以除塵第2曝光部4之光罩10 之下表面和工作台8之上表面之洗淨單元12，在後述中有 -13- 200928615 詳細說明。 ( 各 曝 光部之 洗淨 單 元 ) 各 圖 將藉 由各 機 械 手 臂6 、7的基板W之移送方向 稱 爲 厂 Z 方 向」 ，並 將 工 作 台8 之升降方向 (垂直方向） 稱 爲 厂 y 方 向」 ，並 將 各 正 交於 z方向及y 之方向稱爲 「X 方 向 j 〇 Q 在第4圖至第9圖中表示針對用以除塵被搭載於第2 曝光部之光罩10之下表面和工作台8上表面之洗淨單元 12之動作。排出部5係由無圖示之將Y-Z台移動至垂直 方向之移動手段和將該洗淨單元移動至曝光部4方向之驅- The light source 14 is selected by various UV φ lamps such as short arc lamps or high voltage lamps or LEDs laid on a flat surface, depending on the reflection conditions of the photoresist layer of the substrate W. Further, it is also possible to provide a mirror, a lens, or the like that efficiently induces light emitted from the light source 14 to the substrate. Further, in the photomask 1 , a light-shielding member or a drawing is attached to a glass, an acrylic plate or the like held by a rectangular frame (frame), so that a light-transmitting portion is required where light is transmitted. Further, the upper surface of the table 8 is parallel to the surface of the reticle 10 held by the holder 11, and a plurality of suction ports that communicate with a suction pump (not shown) are opened. The air is sucked through the suction ports, and the base plate W is suction-fixed on the upper surface of the table 8 so as to be parallel to the surface of the reticle 10, i.e., fixed so that the upper surface functions as a «fixing surface. Further, contrary to the above, the holder 11 holding the mask 10 is lowered by the ascending mechanism 55, and is close to the table 8. Therefore, the ascending mechanism 55 corresponds to a moving mechanism that relatively closes or separates the fixed surface of the reticle 10 and the table 8 held by the holder 11 ′′ in the first figure, although the robot arm 6 is drawn. It is located directly under the reticle 10, but the reticle 10 may be disposed at a position away from the first robot arm 6 in a direction orthogonal to the plane of the paper. In this case, in addition to the function of lifting and lowering on the workbench -12-200928615, the function of moving horizontally in the direction orthogonal to the paper surface is required. In such a configuration, when the table 8 is moved up and down, it is not necessary to retract the first robot arm 6, and it is easy to shield the light leakage from the light source 14. Further, the cleaning unit 12 for the lower surface of the mask 1 用以 for dusting the first exposure unit 2 and the upper surface of the table 8 will be described in detail later. The inverting unit 3 incorporates an inverting device 9 φ for reversing the substrate w on which the first surface of the first robot arm 6 is transferred from the first 'exposure unit 2 to complete exposure, and the reversing device 9 is a cleaning unit 13 that removes dust from the second surface of the substrate W that has been inverted. The second exposure unit 4 has the same configuration as the first exposure unit 2 . Therefore, in the first drawing, the same components as those of the first exposure unit 2 are given to the same components as the first exposure unit 4, and the description thereof is omitted. The second robot arm 7 has a wrist portion extending in the left-right direction of Fig. 1, and each of the two ends of the wrist portion is provided with a gasket for detachably adsorbing the substrate W and being movable up and down. Then, the entire second robot arm 7 is moved to the left-right direction of the first figure by a linear slider (not shown), and the substrate W adsorbed by the pad at the left end in the figure is moved from the inverting portion 3. After being transferred to the second exposure unit 4, it is placed on the table 8, and the substrate W adsorbed by the spacer at the right end in the drawing is transferred from the second exposure unit 4 to the discharge unit 5, and placed in the discharge unit 5. On the workbench 5a. The exposed substrate W thus placed on the table 5a of the discharge unit 5 is taken out by the operator or a robot (not shown) and moved to the next processing. Further, the cleaning unit 12 for removing the lower surface of the mask 10 of the second exposure unit 4 and the upper surface of the table 8 between the second exposure unit 4 and the discharge unit 5 is described later. -13- 200928615 Detailed description. (The cleaning unit of each exposure unit) The transfer direction of the substrate W by each of the robot arms 6 and 7 is referred to as the factory Z direction, and the lifting direction (vertical direction) of the table 8 is referred to as the factory y direction. The directions orthogonal to the z direction and y are referred to as "X direction j 〇Q". Figs. 4 to 9 show the lower surface of the reticle 10 mounted on the second exposure portion for dust removal. And the operation of the cleaning unit 12 on the upper surface of the table 8. The discharge unit 5 is a moving means for moving the YZ table to the vertical direction (not shown) and driving the cleaning unit to the direction of the exposure unit 4.
' 動部所構成。該Y-Z台之驅動手段可藉由移動於Y及Z 方向之導軌，和各個內藏之致動器而移動Y-Z台。 各洗淨單元12被收容於箱形之框架12，在其上流側 (第1圖中之左側）之下緣及上緣形成缺口。 在第3圖 〇 表示除去框架之狀態。自藉由該些缺口所形成之各開口， * 以朝向X方向而架於框架12內之各旋轉軸5 7a、5 7a爲中 心而可旋轉地被樞支的各黏著滾輪57、57之外周面之一 部分各個呈突出。該些各黏著滾輪57、57具有形成有黏 著層之外周面。 第3圖爲自上流側觀看各洗淨單元12之狀態的透視 圖，但是如該第3圖及上述第1圖所示般’兩黏著滾輪57 、57之各個外周面接觸於直徑充分大於其之轉印滾輪58 ，該轉印滾輪58藉由平行於上述黏著滾輪57、57而被架 -14- 200928615 於框架12a內之旋轉軸58a而旋轉自如地被樞支。然後’ 上側之黏著滾輪（第1黏著滾輪）57被配置成較轉印滾輪 58接近光罩，下側之黏著滾輪（第2黏著滾輪）57被配 置成較轉印滾輪58接近光罩。 在轉印滾輪5 8之外周面，將黏著面朝向外側捲繞著 黏著力較黏著滾輪57、57之外周面之黏著層強的黏著膠 • 帶。然後，該轉印滾輪5 8藉由被固定於框架1 2a之側面 @ 並且與旋轉軸58a直接偶合之驅動馬達53’旋轉驅動。因 此，轉印滾輪58藉由該驅動達53旋轉，依此傳動黏著滾 輪57、57，由洗淨單元12全體藉由y-z台40朝與轉印滾 輪58之旋轉方向相反之方向而被移動，而在除塵對象面 ' 滾動，使附著於除塵對象面上之塵埃附著於其外周面。如 此一來，附著於黏著滾輪46之外周面之塵埃藉由被轉印 至轉印滾輪58表面，而被集聚於該轉印滾輪58。如此一 來藉由轉印滾輪58而被回收之塵埃由自轉印滾輪58之外 ❹ 周面取下黏著膠帶1圈份而被廢棄。 並且，驅動馬達5 3即使不直接固定於轉印滾輪5 8之 旋轉軸58a，例如爲經被固定於其他位置之皮帶等之傳達 手段而驅動轉印滾輪58之構成亦可。再者，驅動馬達53 即使被連接於任一之轉印滾輪5 9亦可。 (各曝光部之控制） 上述之各曝光部2、4之工作台8之上昇機構55及吸 引泵54、光源14、Y-Z台40以及驅動馬達53各如第2 -15- 200928615 圖所示般，被連接於控制各曝光部2、4全體動作之控制 裝置之第1曝光部控制器56及第2曝光部控制器51，自 該些第1曝光部控制器5 6及第2曝光部控制器5 1供給控 制訊號及驅動電力，隨著特定序列而執行動作。並且，該 些第1曝光部控制器56及第2曝光部控制器51本體係被 連接於控制曝光裝置全體之動作之全體控制器50，藉由該 • 全體控制器5 0而被控制動作時序等。 〇 以下’以第4圖至第9圖說明各曝光部控制器51、56 控制各曝光部2、4之洗淨單元12之序列。並且，第1曝 光部控制器5 1所執行之控制和第2曝光部控制器5 6所執 行之控制，僅有動作時序及洗淨單元12之退避位置爲不 ' 同’在第1曝光部2之洗淨單元12係在搬入部1內，在 第2曝光部4之洗淨單元12係在排出部5內，除此之外 完全相同。在此’以第2曝光部4爲例執行以下之說明。 第4圖係表示在第2曝光部4中，藉由無圖示之吸引 © 泵54而被吸附於工作台8上之基板W，依據以上昇機構 55使工作台8上昇，依此抵接於光罩1〇之狀態。在該狀 態中，第2曝光部控制器51藉由使光源14發光，隔著光 罩10使基板W之第2面曝光，而曝光被描畫於光罩1〇 之圖案。此時’洗淨單元12依據藉由第2曝光部控制器 51而被控制之Y-Z台40，退避至排出部5內。 接著’第2曝光部控制器51藉由控制上昇機構55， 使工作台8下降至其上表面與通道位準相同面，停止吸引 泵54。在該狀態中’機械手臂7把持工作台8上之工件 -16- 200928615 w(參照第5圖），移動工件W至排出部5(參照第1圖 )。 接著，第2曝光部控制器5 1藉由控制Y_Z台40，移 動洗淨單元12至第6圖所示之初期位置即是第1黏著滾 輪57抵接於光罩10下表面之一端的位置。並且，第6圖 所描畫之虛線爲爲了控制Υ-Ζ台40事先設定於第2曝光 ' 部控制器51之洗淨單元12之移動軌跡（在圖中，表示黏 φ 著滾輪5 7之中心之移動軌跡）。即是，第2曝光部控制 器51係以沿著該虛線所示之移動軌跡而使洗淨單元1 2移 動之方式，控制Υ-Ζ台40。洗淨單元12首先在ζ方向從 第6圖所示之位置水平移動至第7圖所示之位置。在該期 ' 間第2曝光部控制器5 1藉由使驅動馬達5 3旋轉，使上側 黏著滾輪57以與洗淨單元12本體之移動速度相同之周速 度朝圖中時鐘方向旋轉。依此，將黏著滾輪57邊加壓而 滾動於光罩1〇之下表面，使光罩10之下表面（抵接於基 〇 板之面）除塵。 接著，工作台8上昇，並且洗淨單元12從第7圖所 示之位置下降至第8圖所示之位置，而使第2黏著滾輪57 接觸於工作台8之上表面。 並且，洗淨單元12在ζ方向從第8圖所示之位置水 平移動至第9圖所示之位置。在該期間，因驅動馬達53 朝同方向旋轉，故第2黏著滾輪57以與洗淨單元12本體 之移動速度相同之周速度朝圖中時鐘方向旋轉。依此，黏 著滾輪在工作台8之上表面滾動，工作台8之上表面被除 -17- 200928615 塵。 並且，第10圖係表示在第丨曝光部2中除塵光罩10 之下表面’在反轉部3中除塵基板w之第2面，在第2 曝光部4中除塵工作台8之上表面的狀態。 並且，在各曝光部2、4中的除麈，在工作台8和光 罩1〇之間產生有空間時進行即可，可以事先以一定之曝 ' 光循環而開始除塵亦可’也可以結束任意曝光之後，剛剛 @ 排出基板W之後開始除塵亦可。 (藉由本實施型態的優點） 在本實施例中，各曝光部2、4之洗淨單元12於上下 ' 具備有黏著滾輪57、57，各接觸於相同之轉印滾輪58。 若藉由本實施型態，使一台洗淨單元在z方向往返，在工 作台8上一往返之期間可以除塵光罩10之下表面和工作 台8之上表面。洗淨單元12因預先具備有光罩下表面用 〇 而設置於高於轉印滾輪58之位置的黏著滾輪57，和工作 台上表面用而設置於低於轉印滾輪58之位置的黏著滾輪 57，故不需要使黏著滾輪大於轉印滾輪，或使黏著滾輪構 成爲對轉印滾輪公轉自如，或自轉印滾輪獨立移動黏著滾 輪。 〔第2實施型態〕 (曝光裝置之全體構成） 第11圖爲表示依據本實施型態之曝光裝置之全體構 -18 - 200928615 成的側面透視圖。如該第1 1圖所示般，本發明之第2實 施型態比起上述第1實施型態，僅有各曝光部2、4中之 洗淨單元21之構成以及藉由各曝光部控制器51、56之 X-Y台40以及對於上昇機構55的控制內容不同，其他構 成則爲共同。因此，在第1 1圖中，針對與第1實施型態 之第1圖所示之構成共同之要素，賦予與第1圖相同之號 • 碼，省略其說明。 〇 (各曝光部之洗淨單元） 藉由本實施型態之各曝光部2、4之洗淨單元21也藉 由無圖示之Y-Z台而被支撐，在Y-Z平面內描畫特定軌道 般被移動。 再者，各洗淨單元21被收容於箱形之框架21a，在其 上流側（第1圖中之左側）之下緣及上緣形成缺口。自藉 . 由該些缺口所形成之各開口，以朝向X方向而架於框架 O 21a內之各旋轉軸57a、57a爲中心而可旋轉地被樞支的各 黏著滾輪57、57之外周面之一部分各個呈突出。該些黏 著滾輪57、57具有形成有黏著層之外周面。 第12圖爲表示自上流側觀看各洗淨單元21之狀態的 透視圖。 如該第12圖及上述第1圖所示般，上側之黏著滾輪 (第1黏著滾輪）5 7係其外周面直接接觸於經與此平行被 架於框架21a內之旋轉軸58a而樞支成旋轉自如之轉印滾 輪58之外周面。該轉印滾輪58之直徑大於各黏著滾輪57 -19- 200928615 、57，上側之黏著滾輪（第1黏著滾輪）57被配置於 轉印滾輪58更接近於光罩。 在轉印滾輪58之外周面’捲繞著其黏著面朝向 的黏著力較黏著滾輪57、57之外周面之黏著層強的 膠帶。然後，該轉印滾輪58藉由被固定於框架12a 面並且與旋轉軸58a直接偶合之驅動馬達53，旋轉驅 • 因此，轉印滾輪58藉由該驅動馬達53旋轉，依此傳動 φ 側之黏著滾輪（第1黏著滾輪）57，由洗淨單元13全 藉由y-z台40朝與轉印滾輪58之旋轉方向相反之方向 被移動，而在除塵對象面滾動，使附著於除塵對象面上 塵埃附著於其外周面。如此一來，附著於黏著滾輪46 ' 外周面之塵埃藉由被轉印至轉印滾輪47表面，而被集 於該轉印滾輪47。 再者，下側之黏著滾輪5 7係其外周面接觸於經與 平行被架於框架21a內之旋轉軸22 a而樞支成旋轉自如 〇 中間滾輪22之外周面。該中間滾輪22之外周面又接觸 轉印滾輪58之外周面。然後，下側之黏著滾輪（第2 著滾輪）57較該轉印滾輪58接近於工作台8。'The Ministry of Motion. The Y-Z stage driving means can move the Y-Z stage by moving the guide rails in the Y and Z directions and the respective built-in actuators. Each of the cleaning units 12 is housed in the box-shaped frame 12, and a notch is formed on the upper edge and the upper edge of the upstream side (the left side in Fig. 1). In Figure 3, the status of the frame is removed. From the respective openings formed by the notches, * the outer circumferences of the respective adhesive rollers 57, 57 rotatably pivoted about the respective rotation axes 57a, 57a of the frame 12 in the X direction. One of the faces is highlighted. Each of the adhesive rollers 57, 57 has a peripheral surface formed with an adhesive layer. 3 is a perspective view showing a state in which the respective cleaning units 12 are viewed from the upstream side, but as shown in FIG. 3 and the first FIG. 1 , the outer peripheral surfaces of the two adhesive rollers 57 and 57 are in contact with the diameter sufficiently larger than The transfer roller 58 is rotatably pivotally supported by the rotating shaft 58a in the frame 12a by the frame 14-200928615 in parallel with the above-described adhesive rollers 57, 57. Then, the upper adhesive roller (first adhesive roller) 57 is disposed closer to the mask than the transfer roller 58, and the lower adhesive roller (second adhesive roller) 57 is disposed closer to the mask than the transfer roller 58. On the outer peripheral surface of the transfer roller 58, an adhesive tape having a stronger adhesive force than the adhesive layer on the outer peripheral surface of the adhesive rollers 57, 57 is wound toward the outer side. Then, the transfer roller 58 is rotationally driven by a drive motor 53' fixed to the side surface @ of the frame 12a and directly coupled to the rotary shaft 58a. Therefore, the transfer roller 58 is rotated by the drive 53, whereby the adhesive rollers 57 and 57 are driven, and the entire cleaning unit 12 is moved by the yz table 40 in a direction opposite to the rotation direction of the transfer roller 58. On the other hand, the surface of the dust-removing object is 'rolled, so that the dust adhering to the surface of the dust-removing object adheres to the outer peripheral surface. As a result, the dust adhering to the outer peripheral surface of the adhesive roller 46 is collected on the transfer roller 58 by being transferred to the surface of the transfer roller 58. As a result, the dust recovered by the transfer roller 58 is discarded by taking one portion of the adhesive tape from the outer surface of the transfer roller 58 and removing the dust. Further, the drive motor 53 may be configured to drive the transfer roller 58 by, for example, a transmission means such as a belt fixed to another position, without being directly fixed to the rotary shaft 58a of the transfer roller 58. Further, the drive motor 53 may be connected to any of the transfer rollers 59. (Control of each exposure unit) The ascending mechanism 55 of the table 8 of each of the exposure units 2 and 4, the suction pump 54, the light source 14, the YZ stage 40, and the drive motor 53 are each as shown in the figure 2-15-200928615. The first exposure unit controller 56 and the second exposure unit controller 51 that are connected to the control device that controls the overall operation of each of the exposure units 2 and 4 are controlled by the first exposure unit controller 56 and the second exposure unit. The device 5 1 supplies control signals and drive power, and performs actions in accordance with a specific sequence. Further, the first exposure unit controller 56 and the second exposure unit controller 51 are connected to the entire controller 50 that controls the operation of the entire exposure apparatus, and the operation timing is controlled by the entire controller 50. Wait. 〇 Hereinafter, the sequence of the cleaning units 12 of the respective exposure units 2 and 4 will be described with reference to the fourth to ninth drawings. Further, the control executed by the first exposure unit controller 51 and the control executed by the second exposure unit controller 56 have only the operation timing and the retracted position of the cleaning unit 12 are not the same as in the first exposure unit. The cleaning unit 12 of 2 is in the loading unit 1, and the cleaning unit 12 of the second exposure unit 4 is in the discharge unit 5, and is otherwise identical. Here, the following description will be made by taking the second exposure unit 4 as an example. Fig. 4 shows a substrate W that is attracted to the table 8 by the suction pump 54 (not shown) in the second exposure unit 4, and the table 8 is raised by the raising mechanism 55, thereby abutting In the state of the mask. In this state, the second exposure unit controller 51 exposes the second surface of the substrate W via the mask 10 by causing the light source 14 to emit light, and the exposure is drawn on the pattern of the mask 1〇. At this time, the cleaning unit 12 is retracted into the discharge unit 5 in accordance with the Y-Z stage 40 controlled by the second exposure unit controller 51. Next, the second exposure unit controller 51 stops the suction pump 54 by controlling the ascending mechanism 55 to lower the table 8 to the same surface as the upper surface of the channel. In this state, the robot 7 grips the workpiece -16 - 200928615 w (see Fig. 5) on the table 8, and moves the workpiece W to the discharge portion 5 (see Fig. 1). Next, the second exposure unit controller 5 1 controls the Y_Z stage 40 to move the cleaning unit 12 to the initial position shown in FIG. 6 , that is, the position where the first adhesive roller 57 abuts on one end of the lower surface of the reticle 10 . . Further, the broken line drawn in Fig. 6 is a movement trajectory for controlling the cleaning unit 12 of the second exposure 'control unit 51 in advance (in the figure, the center of the sticky φ roller 5 7 is shown). The movement track). In other words, the second exposure unit controller 51 controls the cymbal unit 40 so as to move the cleaning unit 12 along the movement trajectory indicated by the broken line. The cleaning unit 12 first moves horizontally from the position shown in Fig. 6 to the position shown in Fig. 7 in the x direction. In this period, the second exposure unit controller 51 rotates the drive motor 53 to rotate the upper adhesive roller 57 in the clockwise direction in the figure at the same peripheral speed as the moving speed of the main body of the cleaning unit 12. Accordingly, the adhesive roller 57 is pressed to roll on the lower surface of the mask 1 to dedust the lower surface of the mask 10 (the surface abutting against the base sheet). Then, the table 8 is raised, and the cleaning unit 12 is lowered from the position shown in Fig. 7 to the position shown in Fig. 8, and the second adhesive roller 57 is brought into contact with the upper surface of the table 8. Further, the cleaning unit 12 is horizontally moved from the position shown in Fig. 8 to the position shown in Fig. 9 in the x direction. During this period, since the drive motor 53 rotates in the same direction, the second adhesive roller 57 rotates in the clockwise direction in the figure at the same peripheral speed as the moving speed of the main body of the cleaning unit 12. Accordingly, the adhesive roller rolls on the upper surface of the table 8, and the upper surface of the table 8 is removed by -17-200928615. Further, Fig. 10 shows the second surface of the dust removing substrate w in the lower surface of the dust removing hood 10 in the second exposure unit 2, and the upper surface of the dust removing table 8 in the second exposure unit 4. status. Further, in the respective exposure portions 2, 4, the removal of the ridges may be performed when there is a space between the table 8 and the reticle 1 ,, and the dust may be started in a predetermined "light cycle" or may be ended. After any exposure, the dust can be started just after the substrate W is ejected. (Advantages of the present embodiment) In the present embodiment, the cleaning units 12 of the respective exposure portions 2, 4 are provided with the adhesive rollers 57, 57 on the upper and lower sides, each contacting the same transfer roller 58. According to this embodiment, a cleaning unit is reciprocated in the z direction, and the lower surface of the reticle 10 and the upper surface of the table 8 can be removed during a round trip on the work table 8. The cleaning unit 12 is provided with an adhesive roller 57 which is provided at a position higher than the transfer roller 58 in advance with a cymbal lower surface cymbal, and an adhesive roller which is disposed at a position lower than the transfer roller 58 for the upper surface of the table. 57, so it is not necessary to make the adhesive roller larger than the transfer roller, or the adhesive roller is configured to revolve freely to the transfer roller, or to independently move the adhesive roller from the transfer roller. [Second embodiment] (Entire configuration of the exposure apparatus) Fig. 11 is a side perspective view showing the entire configuration of the exposure apparatus according to the present embodiment -18 - 200928615. As shown in the first embodiment, the second embodiment of the present invention has only the configuration of the cleaning unit 21 in each of the exposure units 2 and 4 and the exposure unit control unit as compared with the first embodiment. The XY table 40 of the devices 51, 56 and the control contents for the ascending mechanism 55 are different, and the other configurations are common. Therefore, in the first embodiment, the same components as those in the first embodiment of the first embodiment are denoted by the same reference numerals as in the first embodiment, and the description thereof will be omitted. 〇 (cleaning unit of each exposure unit) The cleaning unit 21 of each of the exposure units 2 and 4 of the present embodiment is also supported by a YZ stage (not shown), and is moved like a specific track in the YZ plane. . Further, each of the cleaning units 21 is housed in the box-shaped frame 21a, and a notch is formed on the lower edge and the upper edge of the upstream side (the left side in Fig. 1). Each of the openings formed by the notches is a peripheral surface of each of the adhesive rollers 57 and 57 rotatably pivoted about the respective rotation shafts 57a and 57a of the frame O 21a in the X direction. Some of them are prominent. The adhesive rollers 57, 57 have peripheral surfaces formed with an adhesive layer. Fig. 12 is a perspective view showing a state in which the respective cleaning units 21 are viewed from the upstream side. As shown in Fig. 12 and Fig. 1, the upper adhesive roller (first adhesive roller) 57 has its outer peripheral surface directly in contact with the pivot shaft 58a which is placed in the frame 21a in parallel with the pivot shaft. The outer peripheral surface of the transfer roller 58 is freely rotatable. The transfer roller 58 has a larger diameter than each of the adhesive rollers 57 -19- 200928615, 57, and the upper adhesive roller (first adhesive roller) 57 is disposed closer to the reticle than the transfer roller 58. The outer peripheral surface of the transfer roller 58 is wound with a tape having a stronger adhesive force toward the adhesive surface than the adhesive layer on the outer peripheral surface of the adhesive rollers 57 and 57. Then, the transfer roller 58 is rotated by the drive motor 53 fixed to the surface of the frame 12a and coupled directly to the rotary shaft 58a. Therefore, the transfer roller 58 is rotated by the drive motor 53, thereby transmitting the φ side. The cleaning roller (first adhesive roller) 57 is moved by the yz table 40 in the direction opposite to the rotation direction of the transfer roller 58 by the cleaning unit 13, and is rolled on the dust-removing surface to adhere to the dust-removing surface. Dust adheres to its outer peripheral surface. As a result, the dust adhering to the outer peripheral surface of the adhesive roller 46' is collected by the transfer roller 47 by being transferred to the surface of the transfer roller 47. Further, the lower side of the adhesive roller 57 is formed such that its outer peripheral surface is in contact with the outer peripheral surface of the intermediate roller 22 so as to be pivotally supported by the rotating shaft 22a which is supported in parallel with the frame 21a. The outer peripheral surface of the intermediate roller 22 is in contact with the outer peripheral surface of the transfer roller 58. Then, the lower side of the adhesive roller (second roller) 57 is closer to the table 8 than the transfer roller 58.
上述中間滾輪22之外徑大於黏著滾輪57，並且小 轉印滾輪58，形成在其外周面之黏著層之黏著力比黏著 輪57之黏著力強，比轉印滾輪58之黏著力弱。因此， 上述般，當藉由驅動馬達53使轉印滾輪58旋轉驅動時 則經由中間滾輪22，下側之黏著滾輪（第2黏著滾輪） 朝與上側黏著滾輪57相反方向旋轉。然後，藉由Y-Z 該 側 著 側 〇 上 體 而 之 之 聚 此 之 於 黏 於 滾 如 > 57 台 -20- 200928615 40使洗淨單元13全體朝與其旋轉方向相反方向移動’ 側之黏著滾輪5 7則在除塵對象面上滾動，依此附著於 側之黏著滾輪5 7表面之塵埃，被轉印至黏著力比此強 中間滾輪22，並且被轉印至黏著力更強之轉印滾輪58 〇 如上述般，藉由各黏著滾輪57、57而自各除塵對 * 面被除塵之塵埃皆集聚於轉印滾輪58。然後，被集聚之 〇 埃由自轉印滾輪58之外周面取下黏著膠帶1圈份而被 棄。 (各曝光部之控制） ' 接著，在第2實施型態中，以第13圖至第20圖說 各曝光部控制器51、56控制各曝光部2、4之洗淨單元 之步驟。同樣在本實施型態中，第1曝光部控制器5 1 . 執行之控制和第2曝光部控制器56所執行之控制，也 © 有動作時序及洗淨單元21之退避位置（第1曝光部2 « 洗淨單元21係退避在搬入部1內，第2曝光部4之洗 單元21係退避在排出部5內）不同，除此之外完全相 。在此，以第2曝光部控制器5 1爲例執行以下之說明。 第13圖係表示在第2曝光部4中，藉由吸引泵54 被吸附於工作台8上之基板W，依據以上昇機構55使 作台8上昇，依此抵接於光罩1 〇之狀態。在該狀態中 第2曝光部控制器51藉由使光源14發光，隔著光罩 使基板W之第2面曝光，而曝光被描畫於光罩10之圖 下 下 之 上 象 塵 廢 明 2 1 所 僅 之 淨 同 而 工 ， 10 案 -21 - 200928615 。此時’洗淨單元12依據藉由第2曝光部控制器51而被 控制之Y-Z台40，退避至排出部5內。 接著，第2曝光部控制器51藉由控制上昇機構55, 使工作台8下降至其上表面與通道位準相同面，停止吸引 泵54。在該狀態下，機械手臂7把持工作台8上之工件 W，而移動至排出部5。參照第14圖。 • 接著，第2曝光部控制器51藉由控制Y_Z台40，使 0 洗淨單元1 2進入至光罩1 0和工作台8之間的空間（第1 5 圖），移動洗淨單元12至使上側之黏著滾輪（第1黏著 滾輪）57位於光罩10下面之一端的正下方的位置爲止。 ' 接著，第2曝光部控制器5 1藉由控制Υ-Ζ台40，使洗淨 單元21移動至上側黏著滾輪57抵接於光罩10下面之一 端的位置爲止，並且對光罩1〇施加微壓力。再者，洗淨 單元21之上側之黏著滾輪57配合抵接於光罩10之時序 ，第2曝光部控制器5 1藉由控制上昇機構55，使工作台 Q 8上昇，使其上表面抵接於洗淨單元21之下側之黏著滾輪 ’ （第2黏著滾輪）57，並且對該黏著滾輪57施予微壓力 (第16圖）。 並且，第2曝光控制器51當藉由驅動驅動馬達53使 轉印滾輪58朝圖中時鐘方向旋轉時，上側之黏著滾輪57 則朝圖中反時鐘方向旋轉，並且下側黏著滾輪57由於介 存中間滾輪22，以與上側黏著滾輪57相同之旋轉速度朝 圖中時鐘方向預以旋轉。在此’第2曝光部控制器51藉 由控制Υ-Ζ台40，以與各黏著滾輪57之周速度同步之速 -22- 200928615 度，使洗淨單元21在z方向從第16圖所示之位置移動至 第17圖所示之位置。在該移動中，上側之黏著滾輪57 一 面接觸於光罩10之下表面一面滾動，使得該下表面被除 塵，同時下側之黏著滾輪57 —面接觸於工作台8之上表 面一面滾動，使得該上表面被除塵。即是，藉由洗淨單元 21移動於一方向，對該些兩面完成除塵。 * 最後第2曝光部控制器51依據無圖示之感測器之輸 @ 出，確認洗淨單元21到達至工作台8之另一端時，藉由 控制上昇機構55，使其上表面下降至與通道位準相同面（ 第18圖），並且藉由控制Y-Z台40，使洗淨單元12微 ' 量下降，退避至開放對光罩10之壓力的方向（參照第19 • 圖）。然後，第2曝光部控制器51藉由控制Y-Z台40， 以與除塵時之移動速度不同之高速度，在z方向移動洗淨 單元21，而回收於排出部5。 並且，第10圖係表示在第1曝光部2中完成對光罩 Q 10以及工作台8執行完除塵（第17圖的階段），在第2曝 光部4中正要執行除塵的狀態。 (藉由本實施型態之優點） 當藉由上述般構成之本實施型態之曝光裝置時，完全 取得依據上述第1實施型態之優點之外，可以同時完成對 光罩10之下表面之除塵和對工作台8之上表面之除塵， 並且將上側之黏著滾輪57加壓至光罩1〇，並且將工作台 加壓至下側之黏著滾輪57之壓力因可以藉由工作台8之 -23- 200928615 上昇機構55而賦予，故可抑制洗淨單元21自投入部1或 是排出部5出發而完成一連串之除塵後至再次歸還至投入 部1或是排出部5爲止之時間至最小限。即爲，不用添加 新機構，且可將曝光步驟以外之停機時間抑制成最小。 (反轉部之洗淨單元） 第22圖表示曝光裝置之全容貌，在第1曝光部洗淨 單元12洗淨光罩面，在第2曝光部洗淨單元12洗淨曝光 工作台面，並且在反轉部洗淨單元13洗淨基板W之第2 面。 洗淨單元1 3被收容於箱形之殻體，其上流側（第22 圖中之左側）之下緣形成有缺口，在依此形成的開口，黏 著滾輪46旋轉自如地安裝成其旋轉軸朝向X方向。該洗 淨單元13之黏著滾輪46接觸於經與此平行之旋轉軸而被 保持旋轉自如之轉印滾輪47，藉由該轉印滾輪47旋轉而 傳動，在除塵對象面上滾動’抓住附著於除塵對象面上之 麈埃，並使該塵埃轉印在具有更強黏著力之轉印滾輪47 之表面。 (反轉部之控制系統） 接著’以第22圖至第30圖說明反轉部控制器49、第 1曝光部控制器56及全體控制器5〇控制反轉裝置60、反 轉部3之洗淨單元13及第1曝光部2之工作台8之上昇 機構55之步驟。 -24- 200928615 靜止之反轉部控制器49(第23圖）係藉由上昇機構 55使曝光工作台面64a(第21圖）上昇（第24圖），並控 制驅動馬達65，使固定平台64旋轉（第23圖中之時鐘方 向）（第2 5圖）至保持面6 4 a從水平方向朝下流側傾斜 45度爲止。當如此傾斜完保持面64a後，反轉部控制器 49藉由控制Y-Z平台40，在y-z平面內使洗淨單元} 3移 動’接著將黏著滾輪46在被固定於保持面64a之工件W 之第2面上滾動。具體而言，洗淨單元13係使其黏著滾 輪46之外周面線接觸於工件w之上流側之端緣（第26 圖），接著’藉由驅動馬達4 8經轉印滾輪4 7而使黏著滾 輪46(第26圖中之時鐘方向）同步旋轉，並且與保持面 4 6 a平行，以朝下流側傾斜下降之方式移動。在該移動之 途中，黏著滾輪46 —面加壓工件W之第2面上，一面滾 動，除塵該第2面（第27圖）。然後，洗淨單元13係當 黏著滾輪4 6到達至工件W之下流側之端緣時，則使黏著 滾輪46從工件W之第2面離開，而回歸至初期位置（第 28 圖）。 接著，反轉部控制器49係使驅動馬達65逆轉，將固 定平台64返回至使保持面46a成爲水平之旋轉位置（參 照第29圖）。此時’固定平台64之保持保持面46a係加 工至與通道位準相同面爲止。在此’反轉部控制器49停 止吸引泵44的吸引’在全體控制器50之控制下’上述第 2機械手臂7拿起工件W而使其移動至第2曝光部4(參 照第30圖）。 -25- 200928615 (藉由本實施型態的優點） 除塵工件W之第2面的洗淨單元13設置在反轉部3 中之反轉裝置9之上方。因此，因無需在反轉裝置9和第 2曝光部4之間確保除塵裝置之設置空間，故可以將曝光 裝置全體之z方向（工件W移動之方向）抑制成較短。再 者，在除塵工件W之第2面之時，固定工件W之吸附基 座30係以對水平方向傾斜之狀態下執行除塵。因此，2方 向中之洗淨單元1 3之移動寬度爲相對於工件寬度之傾斜 角的餘弦則足夠。即是，可以較將吸附基座3 0朝向水平 施予除塵之時，減少z方向中之洗淨單元13之移動空間 ，並且可以抑制反轉部3之z方向中之寬度擴大。並且， 若吸附基座30之傾斜角越大，上述效果越提升，但是即 使將吸附基座30朝水平時，較反轉裝置9全體所佔之z 方向之區域縮小洗淨單元13之移動空間，亦無法縮窄至 反轉部3之2方向之寬度以上。再者，當傾斜角越大時， 於除塵後將吸附基座3 0返回至水平所需之時間則增加。 因此，針對該傾斜角，以設爲30度以內之角度爲佳。 並且，上述效果因藉由從吸附基座30水平位置傾斜 而取得，故自初期狀態旋轉180度而到達水平之前停止吸 附基座30而除塵也包含在本發明之範圍。 【圖式簡單說明】 第1圖爲本發明之第1實施型態之曝光裝置之槪略側 -26- 200928615 面透視圖。 第2圖爲表示曝光裝置之控制系統之電路構成之方塊 圖。 第3圖爲各曝光部之洗淨單兀之正面透視圖。 第4圖爲各曝光部之洗淨單元之動作說明圖。 第5圖爲各曝光部之洗淨單元之動作說明圖。 • 第6圖爲各曝光部之洗淨單元之動作說明圖。 @ 第7圖爲各曝光部之洗淨單元之動作說明圖。 第8圖爲各曝光部之洗淨單元之動作說明圖。 第9圖爲各曝光部之洗淨單元之動作說明圖。 ' 第圖爲表示各洗淨單元各執行除塵之狀態圖。 • 第丨1圖爲本發明之第2實施型態之曝光裝置之槪略 側面透視圖。 第12圖爲各曝光部之洗淨單元之正面透視圖。 第13圖爲各曝光部之洗淨單元之動作說明圖。 0 第14圖爲各曝光部之洗淨單元之動作說明圖。 ' 第15圖爲各曝光部之洗淨單元之動作說明圖。 第16圖爲各曝光部之洗淨單元之動作說明圖。 第17圖爲各曝光部之洗淨單元之動作說明圖。 第18圖爲各曝光部之洗淨單元之動作說明圖。 第19圖爲各曝光部之洗淨單元之動作說明圖。 第20圖爲各曝光部之洗淨單元之動作說明圖。 第21圖爲反轉裝置之背面圖。 第22圖爲表示各洗淨單元各執行除麈之狀態圖。 -27- 200928615 第23圖爲反轉裝置及洗淨單元之動作說明圖。 第24圖爲反轉裝置及洗淨單元之動作說明圖。 第25圖爲反轉裝置及洗淨單元之動作說明圖。 第26圖爲反轉裝置及洗淨單元之動作說明圖。 第27圖爲反轉裝置及洗淨單元之動作說明圖。 第28圖爲反轉裝置及洗淨單元之動作說明圖。 第29圖爲反轉裝置及洗淨單元之動作說明圖。 第30圖爲反轉裝置及洗淨單元之動作說明圖。 【主要元件符號說明】 2 :第1曝光部 3 :反轉部 4 :第2曝光部 8 :工作台 9 :反轉裝置 10 :光罩 14 : UV 燈 21 :開關基座 22 :開關基座 24 :支柱部 25 :旋轉板 26 :昇降台 27 :滑動件 29 :開關座插件 -28- 200928615 ❹ :吸附基座 :旋轉驅動馬達 :旋轉馬達 :Y-Z 台 :反轉部控制器 :反轉裝置 :固定台 :驅動馬達 :Y平台 -29-The outer diameter of the intermediate roller 22 is larger than that of the adhesive roller 57, and the adhesion of the small transfer roller 58 to the adhesive layer formed on the outer peripheral surface thereof is stronger than that of the adhesive roller 57, and is weaker than that of the transfer roller 58. Therefore, when the transfer roller 58 is rotationally driven by the drive motor 53, the lower roller roller (the second adhesive roller) rotates in the opposite direction to the upper adhesive roller 57 via the intermediate roller 22. Then, by YZ, the side upper side of the upper body is gathered and adhered to the roll such as > 57 sets -20- 200928615 40 to move the entire cleaning unit 13 in the opposite direction to the direction of rotation. 5 7 is rolled on the surface of the dust removing object, and the dust adhering to the surface of the adhesive roller 57 on the side is transferred to the intermediate roller 22 with the adhesive force stronger than this, and is transferred to the transfer roller which is more adhesive. 58. As described above, the dust that has been dusted from each of the dust removing surfaces by the respective adhesion rollers 57, 57 is collected on the transfer roller 58. Then, the accumulated enamel was removed by taking one portion of the adhesive tape from the outer peripheral surface of the transfer roller 58 and discarding it. (Control of each exposure unit) Next, in the second embodiment, the steps of controlling the cleaning units of the exposure units 2 and 4 by the exposure unit controllers 51 and 56 will be described with reference to Figs. 13 to 20 . Also in the present embodiment, the control performed by the first exposure unit controller 5 1 and the control executed by the second exposure unit controller 56 also have the operation timing and the retracted position of the cleaning unit 21 (first exposure). The part 2 « the cleaning unit 21 is retracted in the loading unit 1 and the washing unit 21 of the second exposure unit 4 is retracted in the discharge unit 5), and is completely different. Here, the following description will be made by taking the second exposure unit controller 5 1 as an example. Fig. 13 is a view showing the substrate W that is attracted to the table 8 by the suction pump 54 in the second exposure unit 4, and the table 8 is raised by the ascending mechanism 55, thereby abutting on the mask 1 status. In this state, the second exposure unit controller 51 exposes the second surface of the substrate W via the mask by causing the light source 14 to emit light, and the exposure is drawn on the lower surface of the mask 10 as shown in Fig. 2 1 Only the net work, 10 case-21 - 200928615. At this time, the cleaning unit 12 is retracted into the discharge unit 5 in accordance with the Y-Z stage 40 controlled by the second exposure unit controller 51. Next, the second exposure unit controller 51 controls the ascending mechanism 55 to lower the table 8 to the same surface as the upper surface of the channel, and stops the suction pump 54. In this state, the robot arm 7 grips the workpiece W on the table 8 and moves to the discharge portion 5. Refer to Figure 14. • Next, the second exposure unit controller 51 controls the Y_Z stage 40 to cause the 0 cleaning unit 12 to enter the space between the reticle 10 and the table 8 (Fig. 1 5), and moves the cleaning unit 12 The upper adhesive roller (first adhesive roller) 57 is located at a position directly below one end of the lower surface of the reticle 10. Then, the second exposure unit controller 5 1 moves the cleaning unit 21 to a position where the upper adhesive roller 57 abuts on one end of the lower surface of the reticle 10 by controlling the cymbal-cymbal 40, and the reticle 1 Apply a slight pressure. Further, when the adhesive roller 57 on the upper side of the cleaning unit 21 is engaged with the timing of the contact with the photomask 10, the second exposure unit controller 51 raises the table Q 8 by controlling the ascending mechanism 55 to bring the upper surface thereof into contact. The adhesive roller ' (second adhesive roller) 57 attached to the lower side of the cleaning unit 21 is applied with a slight pressure to the adhesive roller 57 (Fig. 16). Further, when the second exposure controller 51 rotates the transfer roller 58 in the clockwise direction in the figure by driving the drive motor 53, the upper adhesive roller 57 rotates in the counterclockwise direction in the drawing, and the lower adhesive roller 57 is introduced. The intermediate roller 22 is pre-rotated in the clock direction in the figure at the same rotational speed as the upper adhesive roller 57. Here, the 'second exposure unit controller 51 controls the crucible 40 to synchronize the peripheral speed of each of the adhesive rollers 57 to -22-200928615 degrees, and the cleaning unit 21 is in the z direction from the 16th figure. The position shown moves to the position shown in Figure 17. In this movement, the upper side of the adhesive roller 57 is rolled on one side of the lower surface of the reticle 10, so that the lower surface is dusted, and the lower side of the adhesive roller 57 is in surface contact with the upper surface of the table 8 to roll. The upper surface is dusted. That is, by the cleaning unit 21 moving in one direction, dust removal is performed on the two sides. * Finally, the second exposure unit controller 51 determines that the cleaning unit 21 has reached the other end of the table 8 according to the output of the sensor (not shown), and controls the raising mechanism 55 to lower the upper surface thereof. The surface of the channel is the same as that of the channel (Fig. 18), and by controlling the YZ stage 40, the cleaning unit 12 is slightly reduced in amount and retracted to the direction in which the pressure on the mask 10 is opened (refer to Fig. 19). Then, the second exposure unit controller 51 controls the Y-Z stage 40 to move the cleaning unit 21 in the z direction at a high speed different from the moving speed at the time of dust removal, and collects it in the discharge unit 5. In the first exposure unit 2, the dust removal of the mask Q 10 and the table 8 is completed (the stage of Fig. 17), and the dust removal is being performed in the second exposure unit 4. (Advantages of this embodiment) When the exposure apparatus of the present embodiment configured as described above is completely obtained in accordance with the advantages of the first embodiment described above, the lower surface of the mask 10 can be simultaneously completed. Dust removal and dusting of the upper surface of the table 8, and pressing the upper side of the adhesive roller 57 to the reticle 1 〇, and pressurizing the table to the lower side of the adhesive roller 57 can be relied on by the table 8 -23- 200928615 The lifting mechanism 55 is provided, so that it is possible to suppress the time from the completion of the series of dust removal by the cleaning unit 21 from the input unit 1 or the discharge unit 5 until the return to the input unit 1 or the discharge unit 5 is minimized. limit. That is, there is no need to add a new mechanism, and the downtime other than the exposure step can be suppressed to a minimum. (cleaning unit of the reversing unit) Fig. 22 shows the entire appearance of the exposure apparatus, the first exposure unit cleaning unit 12 cleans the mask surface, and the second exposure unit cleaning unit 12 cleans the exposure table surface, and The second cleaning unit 13 cleans the second surface of the substrate W. The cleaning unit 13 is housed in a box-shaped casing, and a lower edge of the upstream side (the left side in FIG. 22) is formed with a notch, and in the opening formed thereby, the adhesive roller 46 is rotatably mounted as its rotation axis. Facing the X direction. The adhesive roller 46 of the cleaning unit 13 is in contact with the transfer roller 47 that is rotatably held by the rotation shaft parallel thereto, and is driven by the rotation of the transfer roller 47 to roll on the surface of the dust-removing object. The dust on the surface of the dust removing object is transferred to the surface of the transfer roller 47 having a stronger adhesive force. (Control system of the reversing unit) Next, the reversing unit controller 49, the first exposure unit controller 56, and the entire controller 5A are controlled by the 22nd to 30th drawings to control the inverting device 60 and the inverting unit 3 The steps of the cleaning unit 13 and the raising mechanism 55 of the table 8 of the first exposure unit 2. -24- 200928615 The stationary inversion portion controller 49 (Fig. 23) raises the exposure work surface 64a (Fig. 21) by the ascending mechanism 55 (Fig. 24), and controls the drive motor 65 to fix the platform 64. Rotation (clock direction in Fig. 23) (Fig. 25) to the holding surface 6 4 a is inclined by 45 degrees from the horizontal direction toward the downstream side. When the holding surface 64a is thus tilted, the inverting portion controller 49 moves the cleaning unit}3 in the yz plane by controlling the YZ stage 40. Then, the adhesive roller 46 is attached to the workpiece W fixed to the holding surface 64a. Scroll on the second side. Specifically, the cleaning unit 13 is such that the outer peripheral surface of the adhesive roller 46 is in contact with the end edge of the upper side of the workpiece w (Fig. 26), and then by the drive motor 48 via the transfer roller 47. The adhesive roller 46 (the clock direction in Fig. 26) rotates in synchronization, and is parallel to the holding surface 46a, and moves in such a manner as to descend toward the lower flow side. During the movement, the adhesive roller 46 presses the second surface of the workpiece W and rolls it to remove the second surface (Fig. 27). Then, when the cleaning roller 16 reaches the end edge of the flow side of the workpiece W, the cleaning roller 13 separates the adhesive roller 46 from the second surface of the workpiece W and returns to the initial position (Fig. 28). Next, the reversing unit controller 49 reverses the drive motor 65 to return the fixed stage 64 to the rotational position at which the holding surface 46a is horizontal (refer to Fig. 29). At this time, the holding holding surface 46a of the fixed platform 64 is processed to the same plane as the channel level. Here, the 'reverse portion controller 49 stops the suction of the suction pump 44'. Under the control of the overall controller 50, the second robot arm 7 picks up the workpiece W and moves it to the second exposure unit 4 (see FIG. 30). ). -25- 200928615 (Advantageous to the present embodiment) The cleaning unit 13 of the second surface of the dust removing workpiece W is disposed above the inverting device 9 in the reversing portion 3. Therefore, since it is not necessary to secure the installation space of the dust removing device between the inverting device 9 and the second exposure portion 4, the z direction of the entire exposure device (the direction in which the workpiece W is moved) can be suppressed to be short. Further, at the time of the second surface of the dust removing workpiece W, the adsorption base 30 for fixing the workpiece W is subjected to dust removal in a state of being inclined in the horizontal direction. Therefore, it is sufficient that the moving width of the cleaning unit 13 in the two directions is the cosine of the inclination angle with respect to the width of the workpiece. In other words, when the suction base 30 is horizontally applied to the dust removal, the movement space of the cleaning unit 13 in the z direction can be reduced, and the width of the inversion portion 3 in the z direction can be suppressed from increasing. Further, if the inclination angle of the adsorption susceptor 30 is larger, the above effect is improved. However, even when the adsorption susceptor 30 is horizontal, the area of the z direction which is smaller than the entire reversing device 9 is reduced in the movement space of the cleaning unit 13. Also, it cannot be narrowed to the width of the two directions of the inversion portion 3 or more. Further, when the inclination angle is larger, the time required to return the adsorption base 30 to the level after dust removal increases. Therefore, it is preferable to set the inclination angle to an angle of 30 degrees or less. Further, since the above effect is obtained by tilting from the horizontal position of the adsorption susceptor 30, it is also included in the scope of the present invention to stop the adsorption susceptor 30 and to remove the dust before the initial state is rotated by 180 degrees. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view of the side of the exposure apparatus of the first embodiment of the present invention -26-200928615. Fig. 2 is a block diagram showing the circuit configuration of the control system of the exposure apparatus. Fig. 3 is a front perspective view of the cleaning unit of each exposure unit. Fig. 4 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Fig. 5 is an explanatory view of the operation of the cleaning unit of each exposure unit. • Fig. 6 is an explanatory diagram of the operation of the cleaning unit of each exposure unit. @ Fig. 7 is an explanatory diagram of the operation of the cleaning unit of each exposure unit. Fig. 8 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Fig. 9 is an explanatory view showing the operation of the cleaning unit of each exposure unit. The figure is a state diagram showing the dust removal performed by each of the cleaning units. Fig. 1 is a schematic side perspective view showing the exposure apparatus of the second embodiment of the present invention. Figure 12 is a front perspective view of the cleaning unit of each exposure unit. Fig. 13 is an explanatory view showing the operation of the cleaning unit of each exposure unit. 0 Fig. 14 is an explanatory diagram of the operation of the cleaning unit of each exposure unit. Fig. 15 is an explanatory view of the operation of the cleaning unit of each exposure unit. Fig. 16 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Fig. 17 is a view showing the operation of the cleaning unit of each exposure unit. Fig. 18 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Fig. 19 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Fig. 20 is an explanatory view showing the operation of the cleaning unit of each exposure unit. Figure 21 is a rear view of the inversion device. Fig. 22 is a view showing a state in which each of the cleaning units performs deburring. -27- 200928615 Figure 23 is an explanatory diagram of the operation of the reversing device and the cleaning unit. Fig. 24 is an explanatory view of the operation of the inverting device and the cleaning unit. Fig. 25 is an explanatory view of the operation of the inverting device and the cleaning unit. Figure 26 is an explanatory view of the operation of the inverting device and the cleaning unit. Figure 27 is an explanatory view of the operation of the inverting device and the cleaning unit. Figure 28 is an explanatory view of the operation of the inverting device and the cleaning unit. Figure 29 is an explanatory view of the operation of the inverting device and the cleaning unit. Figure 30 is an explanatory view of the operation of the inverting device and the cleaning unit. [Description of main component symbols] 2: First exposure unit 3: Inversion unit 4: Second exposure unit 8: Table 9: Inverting device 10: Mask 14: UV lamp 21: Switch base 22: Switch base 24: Post portion 25: Rotating plate 26: Elevating table 27: Sliding member 29: Switch base insert -28- 200928615 ❹: Adsorption base: Rotary drive motor: Rotating motor: YZ Table: Reverse unit controller: Reversing device : Fixed table: Drive motor: Y platform -29-