JP5004786B2 - Reversing part of exposure equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can remove dust from a second face of a workpiece after inverted, without increasing the total length of the apparatus along a conveying direction of the workpiece. <P>SOLUTION: An inverting device 9 includes: a suction base having a housing concave portion; a supporting member freely rotatably supporting the suction base around a horizontally set rotation axis, from an initial state to over 180 degrees; a rotation driving motor rotating the suction base with respect to the supporting member; an open/close base opening and closing the housing concave portion; and a rotation motor rotating the open/close base. A cleaning unit is held so as to be movable by a Y-Z table. An inverting section controller rotates the suction base from such a state that the suction base is in the initial state as well as the open/close base is in a closed state, stops the suction base at a position where the housing concave portion exceeds a horizontal direction and is tilted, opens the open/close base, allows the cleaning unit to remove dust from the surface of a workpiece W, and subsequently, turns the suction base into a horizontal direction. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention is incorporated in an exposure apparatus that exposes a pattern on a planar substrate (work) having a photoresist layer formed on both sides of an electronic circuit substrate, a glass substrate for a liquid crystal element, a glass element substrate for a PDP, etc. The present invention relates to a reversing unit for reversing the substrate between the exposure apparatus for back and the exposure apparatus for the back surface.

  Electronic circuit boards (printed circuit boards) are mounted on electronic devices such as mobile phones, various mobiles, and personal computers, for example, but it is necessary to mount a large number of circuit components on the board. There is a need for a substrate on which is formed. In addition, a pattern may be formed on both the front and back surfaces of a glass substrate for a liquid crystal element, a glass element substrate for a PDP, or the like. As an exposure apparatus used for manufacturing a substrate having a pattern formed on both the front and back surfaces, in order to improve processing efficiency, the workpiece is moved in one direction so that the front and back surfaces can be sequentially exposed. In general, an exposure unit for the first surface and an exposure unit for the second surface are separately provided, and a reversing device for reversing the workpiece between the two exposure devices is installed.

  In addition, as an exposure method in each exposure apparatus, a contact method and a proximity method in which a mask is overlapped on the outer surface of the workpiece, and light is applied to the photosensitive agent layer applied to the workpiece through the mask, A direct exposure method in which a pattern is drawn on a photoresist layer by projecting an image of the pattern onto the photoresist layer or modulating the laser beam while scanning has been put into practical use. In any method, in order to form a precise pattern, it is necessary to incorporate a vacuum suction device or a clamp device into the stage on which the work is to be placed, and to fix the work to the stage surface.

  However, since dust, dust, or dust such as photoresist material and base material pieces peeled off from the work fixed to the stage in front of the substrate is inevitably scattered on the stage surface, the stage surface is not Due to fixing the work as it is without performing maintenance work, there arises a problem that these dusts are transferred to the work. Specifically, in the above-described exposure apparatus capable of continuously forming patterns on both the front and back surfaces of the workpiece, if dust is present on the stage in the exposure unit for the first surface, it adheres to the second surface of the workpiece. However, when the workpiece is reversed by the reversing device and transferred to the exposure unit for the second surface, the second surface becomes the exposure target surface. As a result, the dust adhering to the second surface shields the light and the shadow is reflected in the photoresist layer, which causes defects such as circuit continuity or short circuit after development processing. is there.

  For this reason, in an exposure apparatus capable of continuously forming patterns on both the front and back surfaces of the workpiece, the dust transferred to the second surface of the workpiece on the first surface stage is transferred to the second surface on the second surface stage. Before the surface is exposed, it is necessary to remove it from the second surface.

  In order to cope with such a need, a dust removing device that has been conventionally used in an exposure apparatus is installed between the stage of the exposure unit for the first surface and the stage of the exposure unit for the second surface. It is conceivable to remove dust from the second surface (hereinafter referred to as “dust removal”). The following Patent Documents 1 to 3 disclose conventional dust removing devices.

  For example, in Patent Document 1, an adhesive roller (dust removal roller 16) is attached to the tip of a handler (loading carrier 18) that moves horizontally to place a work (substrate 11) on a stage (exposure table 18) of an exposure apparatus. The surface of the workpiece (substrate 11) placed on the stage (exposure table 18) by the handler (carrying carrier 18) is removed by the adhesive roller (dust removing roller 16) when the handler (carrying carrier 18) is retracted. And the structure which collect | recovers the dust collected by this adhesion roller (dust removal roller 16) with a transfer roller (17) is disclosed. If this dust remover is used for a handler that places a workpiece on the stage for the second surface, dust removal can be performed on the second surface of the workpiece described above.

  Patent Document 2 discloses a configuration in which a dust removing device (dust removing means 8) is provided immediately before the exposure device (exposure stage C) to remove dust from the exposure target surface of the workpiece (substrate 1). If this dust remover is installed toward the second surface of the workpiece between the exposure unit for the first surface and the reversing device, or between the reversing device and the exposure unit for the second surface, the above-mentioned Dust removal can be performed on the second surface of the workpiece.

Further, although Patent Document 3 does not use a flat base material that is a base of a substrate as a workpiece, the workpiece (printed erasable paper) is passed between the adhesive roller 11 and the non-adhesive roller 13 to pass the workpiece. A configuration for removing dust (toner) from (printed erasable paper) is disclosed. The dust removing device is arranged so that the second surface of the workpiece contacts the adhesive roller 11 between the exposure unit for the first surface and the reversing device, or between the reversing device and the exposure unit for the second surface. If it installs, dust removal with respect to the 2nd surface of the workpiece | work mentioned above can be performed.
Japanese Patent No. 353380 Japanese Patent No. 2847808 Japanese Patent No. 2840486

  However, even if a dust removing device that removes the second surface of the workpiece is installed between the exposure unit for the first surface and the reversing device, the second surface is reversed when the work is reversed by the reversing device. Since it must come into contact with any member of the device, it will eventually be contaminated by that member of the reversing device. Even if a dust removing device is installed between the reversing device and the second surface exposure unit, the dust removing device must be installed between the reversing device and the second surface exposure unit. Therefore, there arises a problem that the length of the entire exposure apparatus in the horizontal direction becomes long. Further, in the configuration in which the upper and lower sides of the workpiece are sandwiched between rollers as in Patent Document 3 described above, when the workpiece is bent and wrinkled, it is difficult to apply pressure uniformly to the entire area of the workpiece. There is a problem that it cannot be operated.

  Therefore, in the present invention, a reversing device is installed between the exposure unit for the first surface and the exposure unit for the second surface, and the workpiece is exposed to the first surface exposure unit, the reversing device, and the second surface. In an exposure apparatus that exposes both surfaces of the workpiece by transferring the parts in order, without increasing the overall length of the apparatus in the workpiece transfer direction, and with respect to the second surface of the workpiece after being reversed by the reversing device. An object of the present invention is to provide a dust removing device for a reversing device, which is capable of dust removal and can realize such a purpose.

  The reversing unit of the exposure apparatus of the present invention devised to solve the above-described problem is a workpiece in an exposure apparatus that sequentially exposes the first and second surfaces of the workpiece while moving the workpiece in the horizontal direction. A reversing unit installed between a first exposure unit that exposes the first surface and a second exposure unit that exposes the second surface, wherein one plane is used as a holding surface for holding a workpiece And a support mechanism for supporting the base at least 180 degrees from an initial state in which the holding surface is oriented horizontally and downward, with a rotation axis facing a direction parallel to the holding surface as a center, and A rotation drive mechanism for rotating the base via a support mechanism, a dust removing device for removing dust attached to the surface of the workpiece by contacting the surface of the workpiece, a moving mechanism for moving the dust removing device, rotation By controlling the moving mechanism and the moving mechanism, the base is rotated from the initial state, and the base is stopped at a position where the holding surface is inclined with respect to the horizontal direction. A controller that moves the dust removing device in contact with the surface of the workpiece held by the holding surface of the base, and then rotates the base so that the holding surface faces in a horizontal direction. Features.

  When the reversing unit is incorporated in the exposure apparatus, when the base is in the initial state, the work on which the first surface is exposed in the first exposure unit is held by the holding surface. Thereafter, the controller controls the rotation drive mechanism to rotate the base and stop the holding surface at a position inclined with respect to the horizontal direction. Therefore, the controller controls the moving mechanism to remove the dust on the surface by moving the dust removing device on the surface while bringing the dust removing device into contact with the surface of the workpiece. After the dust removal of the workpiece is completed in this manner, the controller controls the rotation drive mechanism to rotate the base to a position where the holding surface faces upward and becomes horizontal. Thereafter, the workpiece held on the holding surface of the base is moved to the second exposure unit.

  According to the exposure apparatus of the present invention configured as described above, dust is removed in a state where the work is inclined with respect to the horizontal direction, so that the moving range of the dust removing apparatus in the horizontal direction by the moving mechanism can be reduced. As a result, the width in the horizontal direction of the entire inverting device can be suppressed.

  Hereinafter, a plurality of embodiments of the present invention will be described based on the drawings.

Embodiment 1

<Overall configuration of exposure apparatus>
In the exposure apparatus according to the present embodiment, a planar substrate formed by laminating a metal film and a photoresist layer remaining as circuit wirings after exposure and etching processes on both surfaces is a workpiece W, and the photoresist layer on each surface of the workpiece is formed on the photoresist layer. On the other hand, the pattern is exposed by a contact method. Therefore, in the exposure apparatus of the present embodiment, in addition to incorporating a dust removing device for removing dust on the second surface of the work after reversal in the reversing unit, each exposure unit is provided with dust removal on the lower surface of the mask (the surface in contact with the work). It is necessary to incorporate a dust removing device for this purpose. If dust adheres to the translucent part of the mask, the above-mentioned drawing defects occur, and even if dust adheres to the light shielding part, the dust contacts the work when the mask comes into contact with the work. It is transferred and this contaminates the downstream device. For the same reason, it is necessary to remove the dust on the table surface of each exposure apparatus. In this embodiment, the same dust remover can remove dust on the lower surface of the mask and dust on the upper surface of the table in the same exposure apparatus. It has been devised.

FIG. 1 is a side perspective view showing a schematic configuration of the exposure apparatus according to the present embodiment. As shown in FIG. 1, this exposure apparatus is arranged in a horizontal direction (from the left side to the right side in FIG. 1). It is configured by arranging the part 5.
The input unit 1 includes a stage 1a on which an operator or a robot (not shown) places an unexposed workpiece W so as to be picked up by the first handler 6.

  The first handler 6 has arms extending in the left-right direction in FIG. 1, and is provided with pads that can removably attract the workpiece W at both ends of the arms, respectively. Then, by moving the entire first handler 6 in the left-right direction of FIG. 1 by a linear slide (not shown), the workpiece W adsorbed by the pad at the left end in the figure is transferred from the input unit 1 to the first exposure unit 2 The workpiece W left on the stage 8 and sucked by the rightmost pad in the drawing is transferred from the first exposure unit 2 to the reversing unit 3 and left in the reversing device 9.

  The first exposure unit 2 superimposes the mask 10 on the first surface of the workpiece W transferred from the input unit 1, and irradiates light (for example, ultraviolet light) in a wavelength band for exposing the photoresist layer through the mask 10. Is a device for exposing the photoresist layer on the first surface to the pattern drawn as the translucent portion of the mask 10. Therefore, in the first exposure unit 2, the workpiece W is placed by the first handler 6, and the stage 8 that raises and lowers the workpiece W toward the mask 10, and a holder that holds the mask 10. 11 and a light source 12 that emits light for exposing the photoresist layer. A number of suction ports communicating with a suction pump (not shown) are opened on the surface of the stage 8, and the work W is adsorbed on the surface of the stage 8 by sucking air through these suction ports. In FIG. 1, the handler 6 is depicted so as to be directly below the mask 10, but the mask 10 is disposed at a position shifted in a direction perpendicular to the paper surface with respect to the first handler 6. Also good. In this case, the stage 8 needs to have a function of moving horizontally in a direction perpendicular to the paper surface in addition to the function of moving up and down. When such a configuration is adopted, it is not necessary to retract the first handler 6 when the table 8 is moved up and down, and the leakage light from the UV lamp 12 can be easily blocked. The cleaning unit 12 provided between the input unit 1 and the first exposure unit 2 for removing dust from the lower surface of the mask 10 and the upper surface of the stage 8 of the first exposure unit 2 will be described in detail later.

  The reversing unit 3 includes a reversing device 9 for reversing the workpiece W on which the first surface transferred from the first exposure unit 2 by the first handler 6 has been exposed, and the first of the workpieces W reversed by the reversing device 9. A cleaning unit 13 for removing dust on the two surfaces is incorporated. Detailed configurations of the reversing device 9 and the cleaning unit 13 will be described in detail later.

  The second exposure unit 4 has the same configuration as the first exposure unit 2. Accordingly, in FIG. 1, parts of the second exposure unit 4 that are common to the first exposure unit 2 are assigned the same numbers as those of the first exposure unit 2, and individual descriptions are omitted.

The second handler 7 has arms extending in the left-right direction in FIG. 1, and is provided with pads for detachably adsorbing the workpiece W at both ends of the arms so as to be lifted and lowered. Then, by moving the entire second handler 7 in the left-right direction in FIG. 1 by a linear slide (not shown), the workpiece W adsorbed by the leftmost pad in the figure is transferred from the reversing unit 3 to the second exposure unit 4 and The workpiece W left on the stage 8 and sucked by the rightmost pad in the figure is transferred from the second exposure unit 4 to the discharge unit 5 and left on the stage 5a of the discharge unit 5. Thus, the exposed workpiece W placed on the stage 5a of the discharge unit 5 is taken out by an operator or a robot (not shown) and moved to the next processing step. The cleaning unit 12 provided between the second exposure unit 4 and the discharge unit 5 and for removing dust from the lower surface of the mask 10 and the upper surface of the stage 8 of the second exposure unit 4 will be described in detail later.
<Reversing device of reversing unit>

  2 is a perspective view showing the reversing device 9 in the initial state with the viewpoint at the upper left in FIG. 1, FIG. 3 is a plan view showing the same state as FIG. 2, and FIG. 5 is a side view showing the same state from the same direction as FIG. 1, FIG. 5 is a front view showing the same state as FIG. 2 with a viewpoint on the first exposure unit 2, and FIG. It is sectional drawing which shows the longitudinal cross section along the VI-VI line in FIG. FIG. 7 is a front view showing a state in which the open / close bases 21 and 22 are opened after reversal with a viewpoint on the first exposure unit 2 side. 8 is a perspective view showing a state in which the open / close bases 21 and 22 are closed and raised from the state of FIG. 7 with the viewpoint at the upper right in FIG. 1, and FIG. 9 shows the same state as FIG. 10 is a side view showing the same state as FIG. 8 from the same direction as FIG. 1, and FIG. 11 is a back view showing the same state as FIG. 8 with the viewpoint on the second exposure unit 4 side. FIG.

  As shown in these drawings, the reversing device 9 includes a pair of guide rails 20 and 20 laid on a frame (not shown) in the reversing unit 3 in parallel with the handlers 6 and 7, Between the pair of linear slides 23, 23 guided by 20 so as to be slidable only in the longitudinal direction, and the linear slides 23, 23, the longitudinal direction is referred to as the direction of each rail 20 (hereinafter referred to as “z direction” for convenience). ) And a vertical direction (for convenience, hereinafter referred to as “y direction”), respectively, and spanned and fixed in directions orthogonal to each other (for convenience, hereinafter referred to as “x direction”), and both ends thereof (support portions 24a, 24a). ) Is bent at a right angle upward in the y direction, and a support member 24 having a shape equivalent to that of the support member 24, and a rotary shaft (movement of the workpiece W) provided in the vicinity of the upper ends of the support portions 24a and 24a in the x direction. And a pair of rotary plates 25 and 25 each made of a plate-like member held inside the column member 24 so as to be rotatable around a rotation axis provided in a direction perpendicular to the direction). The lifting tables 26, 26 having a rectangular shape fixed on the inner side surface thereof in the initial direction in the y direction, and the lifting tables 26 are disposed so as to sandwich the lifting tables 26 from both sides in the z direction. 26, a set (four in total) of prismatic sliders 27, 27 that are slidably held only in the y direction in the initial state, and one end surface of each pair of sliders 27, 27 (in the initial state) Cylinder pedestal 28 spanned between the lower end surfaces) and fixed so as to project inward (near the center of the reversing device 9), and at an angle formed by each pair of sliders 27 and 27 and the cylinder pedestal 28 Contact An opening / closing base bracket 29 fixed in such a manner, a pair of opening / closing bases 21 and 22 pivotally supported with respect to each of the opening / closing brackets 29 and 29 by an axis directed in the z direction, and both the lifting tables 26 and 26. A suction base 30 fixed between the inner surfaces and a stay (not shown in FIG. 8) 31 are fixed to the downstream side (right side in FIG. 1) of the frame (not shown) of the reversing unit 3, and one end thereof Is connected to the center of the column member 24, and the reversing device moving cylinder 33 for projecting and retracting the shaft 32 oriented in the z direction is fixed to the outer surface of one column portion 24a, and the rotating plate 25 is connected to the rotating plate 25 via the rotation shaft. A rotary drive motor (servo motor) 34 that rotates and is fixed to the surface (lower surface in the initial state) of each cylinder pedestal 28, and one end thereof passes through each cylinder pedestal 28 and moves up Lifting cylinders 35, 35 for projecting and retracting the shaft 36 connected to the descending table 26, and fixed to the respective open / close base brackets 29, 29, so that the open / close bases 21, 22 rotate with respect to the open / close base brackets 29, 29. The opening / closing motors 37 and 37 are made up of.

  The suction base 30 as a “base” has a substantially square planar shape as shown in FIG. 3, so that the side surface located on the downstream side in the initial state is flush with one slider 27. It is sandwiched and fixed between the lift tables 26 and 26. The inner surface of the suction base 30 (the surface facing both the open / close bases 21 and 22) is recessed so as to have a rectangular cross section, leaving ribs 30a and 30a formed along both side edges in the X direction. This dent is an accommodation recess 30b as a holding surface for accommodating the workpiece W. As shown in FIG. 6, a large number of suction ports 30c communicating with a suction pump 44 (see FIG. 13) as vacuum suction means are opened on the surface of the housing recess 30b, and communicated with the suction ports 30c. By sucking air through the vacuum exhaust pipe 30d, the workpiece W accommodated in the accommodation recess 30b is vacuum-sucked.

  The support column 24, the rotary shaft, and the rotary plates 25 and 25 described above can rotate at least 180 degrees from the initial state in which the suction base 30 (base) faces the inner surface (holding surface) of the housing recess 30a horizontally and downward. It corresponds to a supporting mechanism for supporting. The rotation drive motor 34 corresponds to a rotation drive mechanism that rotates the suction base 30 (base) via a support mechanism.

  The open / close base brackets 29 and 29 have a shape equivalent to a shape obtained by cutting a central portion in the X direction from a rectangular frame having an outer edge overlapping the outer edge of the suction base 30. The open / close bases 21 and 22 are accommodated in the X direction inside the inner edges of the open / close base brackets 29 and 29 with a slight clearance. Each of the open / close bases 21 and 22 is pivotally supported by a rotating shaft that is stretched in the z direction between the bent portions at both ends in the z direction of each open / close base bracket 29, Opened and closed in the center. The clearance described above is provided in order to avoid interference between the open / close bases 21 and 22 and the open / close base brackets during the rotation. Each open / close bracket 29 is fixed to the pair of sliders 27 and 27 and the cylinder base 28 so that both end surfaces in the z direction and side surfaces in the x direction are flush with the suction base 30 and parallel to the ribs 30a. Has been.

  Each open / close motor 37 is fixed to the end face of each open / close base bracket 29 located on the downstream side in the initial state, and rotationally drives each open / close base 21, 22 through the rotating shaft.

  Each of the open / close bases 21 and 22 is two rectangular plates, and the positions in the z direction coincide with each other in the vicinity of the open / close motors 37 and 37 on the inner side surface (the surface facing the suction base 30). In addition, positioning pins 21a and 22a having the same shape are formed to protrude. The heights of the positioning pins 21a and 22a are lower than the depth of the accommodating recess 30a of the suction base 30 and the thickness of the workpiece W.

  With the above configuration, when the reversing device moving cylinder 33 retracts the shaft 32, the entire device constructed on the slider 23, in particular, the suction base 30 and the open / close bases 21 and 22 are moved along the guide rail 20 with z. It moves toward the direction downstream side (right side in FIG. 1).

  Further, when the rotation drive motor 34 drives the rotation plate 25 to rotate, the entire apparatus constructed between the column portions 24a, 24a, in particular, the suction base 30 and the open / close bases 21, 22 are along the rotation axis. Reverse. Note that the rotation of the suction base 30 and the open / close bases 21 and 22 is restricted based on the control of the rotation drive motor 34 in a range where the suction base 30 or the open / close bases 21 and 22 do not contact the guide rail. That is, the counterclockwise rotation in FIG. 1 is restricted at the rotation position (that is, the initial rotation position) where the receiving recess 30b of the suction base 30 is horizontal, and the clockwise rotation is the initial rotation. It is regulated at a rotational position exceeding 180 degrees and not reaching 270 degrees from the position. Since the rotation drive motor 34 is a servo motor, if the suction base 30 is stopped at a predetermined rotational position based on the control for this, even if a force is applied to the suction base 30 from the outside, the state is maintained. Will be maintained.

  When both lift cylinders 35 retract the shaft 36, each slider 27 slides along the lift table 26, and both open / close base brackets 29, 29 and open / close bases 21, 22 fixed thereto are suction bases 30. And the open / close base brackets 29 and 29 are stopped at the positions where they come into contact with the ribs 30a and 30a of the suction base 30. Conversely, when both the lift cylinders 35 extend the shaft 36, the sliders 27 slide along the lift table 26, and the open / close base brackets 29, 29 and the open / close bases 21, 22 fixed thereto are suction bases 30. Before the both open / close bases 21 and 22 and the suction base 30 are reversed, the inner surfaces of the open / close bases 21 and 22 are lowered on the surface of the table 8 in the exposure units 2 and 4 (the dashed line in FIG. 1). Stop at a position that is flush with the pass level indicated by.

When both opening / closing motors 37, 37 rotate both opening / closing bases 21, 22, the both opening / closing bases 21, 22 are perpendicular to the suction base 33 as shown in FIG. Thus, the housing recess 30b of the suction base 33 is exposed to the outside.
<Reversing unit cleaning unit>

  12 is a perspective view showing the entire cleaning unit 13 from the same direction as FIG. As shown in FIG. 12, the cleaning unit 13 as a dustproof device is held in the reversing unit 3 by a YZ table 40 as a moving mechanism. The Z-Y table 40 has a pair of guide rails 41 and 41 fixed to a frame (not shown) of the reversing unit 3 in the y direction, and a pair of slidably held in the y direction by the guide rails 41. Y tables 42, 42, a guide rail 43 spanned between the two y tables 42, 42 in the z direction, a z table 44 slidably held in the z direction by the guide rails, and x It is comprised from the stay 45 fixed so that it might protrude from the z table 44 toward the direction. The y tables 42 and 42 and the z table 44 are slid and positioned with respect to the guide rails 41 and 43 by built-in actuators, respectively.

The cleaning unit 13 is housed in a box-shaped casing as shown in FIG. 12, and the lower edge of the upstream side (left side in FIG. 1) is cut away, and the rotation axis is placed in the opening formed thereby. An adhesive roller 46 oriented in the direction is rotatably attached. A longitudinal section along the YZ plane of the cleaning unit 13 is shown in FIG. As shown in this vertical cross section, the adhesive roller 46 comes into contact with a transfer roller 47 that is rotatably held via a rotation shaft parallel to the rotation roller, and is driven by the rotation of the transfer roller 47 to remove dust. It rolls on the surface, entangles the dust adhering to the dust removal target surface, and transfers the dust onto the surface of the transfer roller 47 having a stronger adhesive force. The transfer roller 47 is rotationally driven by a drive motor 48 via a known transmission device such as a chain or a gear.
<Inverter control system>

  The above-described suction pump 44, reversing device moving cylinder 33, rotation drive motor 34, elevating cylinders 35 and 35, rotation motors 37 and 37, y tables 42 and 42, z table 43, and drive motor 48 are shown in FIG. As shown in the figure, it is connected to an inverting unit controller 49 which is a control device for controlling the operation of the entire inverting unit 3 and is supplied with a control signal and driving power from the inverting unit controller 49 to perform an operation according to a predetermined sequence. . The reversing unit controller 49 itself is connected to an overall controller 50 that is a control device that controls the operation of the entire exposure apparatus, and the operation timing and the like are controlled by the overall controller 50. Hereinafter, a sequence in which the reversing unit controller 49 controls each unit of the reversing unit will be described with reference to FIGS. Since the cleaning unit 13 remains stopped while the operations shown in FIGS. 14 to 19 are performed, the illustration thereof is omitted.

  FIG. 14 shows the reversing device 9 in the initial state. In this initial state, both the open / close bases 21 and 22 are parallel to the suction base 30, the both open / close base brackets 29 and 29 are separated from the ribs 30 a and 30 a of the suction base 30, and the column member 24 is the most. It moves to the downstream side (right side in the figure), and the suction base 30 is positioned above each of the open / close bases 21 and 22 and held at a rotational position that faces the horizontal direction. In the initial state shown in FIG. 14, as described above, the inner surfaces of both the open / close bases 21 and 22 are flush with the pass level (the chain line in FIG. 14). In this state, under the control of the overall controller 50, the first handler 6 described above transfers the work W that has been exposed on the first surface by the first exposure unit 2 to both the open / close bases 21 and 22 and the suction base 30. And placed on the inner surfaces of both the open / close bases 21 and 22 at positions where they contact the positioning pins 21a and 22a. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the elevating cylinders 35 and 35 so that both the open / close base brackets 29 and 29 are raised and stopped at positions where they come into contact with the ribs 30a and 30a of the suction base 30. In this position, the first surface of the workpiece W comes into contact with the inner surface of the housing recess 30 a of the suction base 30. However, at this time, the reversing unit controller 49 does not operate the suction pump 44. This state is shown in FIG.

  Next, the reversing unit controller 49 synchronizes the rotation drive motor 34 and the reversing unit moving cylinder 33 to rotate both the open / close bases 21 and 22 and the suction base 30 in the clockwise direction in the drawing, and the column member 24 to the upstream side. Move. By this control, the state of the reversing device 9 changes in the order of FIG. 17, FIG. 18, and FIG.

  As shown in FIG. 17, when both the open / close bases 21 and 22 start to tilt, since the vacuum suction by the suction base 30 is not performed at this time, the workpiece W is positioned by the positioning pins 21a, Since a state of completely abutting 22a can be secured, its posture and position are corrected. At this point, the reversing unit controller 49 operates the suction pump 44 to attract the work W to the inner surface of the housing recess 30 a of the suction base 30. As a result, since the alignment of the workpiece W is automatically completed, it is not necessary to provide a special pre-alignment mechanism in front of the second exposure unit 4.

  In the state of FIG. 19, both the open / close bases 21 and 22 and the suction base 30 are horizontal, and the column member 24 has moved to the most upstream position. From the state shown in FIG. 19, the reversing unit controller 49 further controls the rotation drive motor 34 to further rotate both the open / close bases 21 and 22 and the suction base 30, so that the housing recess 30 a of the suction base 30 faces upward. And it stops in the state which the front-end | tip inclined downward from the horizontal direction (refer FIG. 20). This angle is, for example, 30 degrees from the horizontal direction.

  Next, the reversing unit controller 49 controls both rotary motors 37 and 37 to open both open / close bases 21 and 22. This state is shown in FIG. 21 is a movement locus of the cleaning unit 13 set in advance in the reversing unit controller to control the YZ table 40 (in the figure, the movement of the center of the adhesive roller 46). Shown as a trajectory). That is, the reversing unit controller 49 controls both the y table 42 and the z table 43 so as to move the cleaning unit along the movement locus shown by the broken line.

  Specifically, the cleaning unit 13 first descends from the position shown in FIG. 21 to the position shown in FIG. 22, and adheres to the surface of the second surface of the workpiece W fixed in the accommodating portion 30 a of the suction base 30. The outer peripheral surface of the roller 46 is brought into line contact. Next, the cleaning unit 13 descends obliquely toward the downstream side in parallel with the suction base 30 while synchronously rotating the adhesive roller 46 via the transfer roller 47 by the drive motor 48 (clockwise in FIG. 22). To move. In the middle of this movement, the adhesive roller 46 rolls while pressing on the second surface of the workpiece W to remove dust from the second surface (see FIG. 23). When the adhesive roller 46 reaches the end of the housing portion 30a (see FIG. 24), the cleaning unit 13 is once separated vertically from the suction base 30 (see FIG. 25) and then parallel to the suction base 30. Then, it moves so as to rise obliquely toward the upstream side (see FIG. 26). Then, when the adhesive roller 46 reaches the end of the housing portion 30a (see FIG. 24), the cleaning unit 13 rises vertically and returns to the initial position shown in FIG.

  Next, the reversing unit controller 49 reverses the rotation drive motor 34 and returns it to the rotation position where the suction base 30 is horizontal (see FIG. 27). At this time, the inner surface of the housing recess 30a of the suction base 30 is flush with the pass level. Therefore, the reversing unit controller 49 stops the suction by the suction pump 44. Then, under the control of the overall controller 50, the above-described second handler 7 picks up the workpiece W and moves it to the second exposure unit 4 (see FIG. 28).

  Next, the reversing unit controller 49 controls both rotary motors 37 to close both open / close bases 21 and 22 and return them to a position parallel to the suction base 30. Further, the lift cylinders 35 and 35 are controlled so that the both open / close base brackets 29 and 29 are separated from the ribs 30 a and 30 a of the suction base 30. 8 to 11 described above show this state.

Next, the reversing unit controller 49 controls the reversing device moving cylinder 33 so that the column member 24 moves to the most downstream side (right side in the figure), while the suction base 30 is positioned above the open / close bases 21 and 22. Further, by controlling the rotation drive motor 34 so as to face the horizontal direction, the initial state shown in FIG. 14 is restored.
<Cleaning unit for each exposure unit>

  Similarly to the cleaning unit 13 of the reversing unit 3, the cleaning units 12 and 12 of the exposure units 2 and 4 are supported by a YZ table having the same structure as that shown in FIG. It moves along a preset trajectory in the plane. FIG. 1 also shows a longitudinal section of the cleaning units 12 and 12 in the YZ plane.

Each cleaning unit 12 is accommodated in a box-shaped casing. However, unlike FIG. 12, the lower edge and the upper edge of the upstream side (left side in FIG. 1) are cut out, and adhesive rollers 57, 57 with the rotation axis directed in the x direction are formed in the openings formed thereby. Each is attached rotatably. FIG. 29 is a perspective view showing a state in which each cleaning unit 13 is viewed from the upstream side. As shown in FIGS. 29 and 1, the two adhesive rollers 57, 57 come into contact with a transfer roller 58 that is rotatably held via a rotation shaft parallel to the rotation roller, and the transfer roller 58 rotates. , Rolls on the dust removal target surface, entangles the dust adhering to the dust removal target surface, and transfers the dust onto the surface of the transfer roller 58 having a stronger adhesive force. The transfer roller 58 is rotationally driven by a drive motor 53 fixed to the outside of the casing.
<Control of each exposure unit>

  As shown in FIG. 13, the overall controller 50 further has a first exposed portion controller 56 for controlling the first exposed portion 2 and a second exposed portion controller 51 for controlling the second exposed portion 4. , Supplying control signals. The YZ table 52, the drive motor 53, the raising mechanism 55 of the stage 8, the suction pump 54 of the stage 8, and the UV lamp 12 are connected to the exposed controller 51, 55, respectively. Control signals and drive power are respectively supplied from the controllers 51 and 55 (in FIG. 13, only those connected to the second exposure unit controller 51 are shown and connected to the first exposure unit controller 56). The illustration of what is present is omitted.) Hereinafter, a sequence in which the exposure unit controllers 51 and 56 control the cleaning units 12 of the exposure units 2 and 4 will be described with reference to FIGS. 30 to 35. Note that the control performed by the first exposure unit controller 51 and the control performed by the second exposure unit controller 56 are the operation timing and the retracted position of the cleaning unit 12 (the cleaning unit 12 of the first exposure unit 2 is in the carry-in unit 1, The cleaning unit 12 of the two exposure unit 4 is the same except for the discharge unit 5). Therefore, the following description will be given by taking the second exposure unit controller 51 as an example.

  FIG. 30 shows a state in which the work W adsorbed on the stage 8 by the suction pump 54 is brought into contact with the mask 10 by raising the stage 8 by the raising mechanism 55 in the second exposure unit 4. Yes. In this state, the second exposure unit controller 51 exposes the pattern drawn on the mask 10 by exposing the second surface of the workpiece W over the mask 10 by causing the UV lamp 12 to emit light. At this time, the cleaning unit 12 is retracted into the discharge unit 5 by the YZ table 52 controlled by the second exposure unit 4.

  Next, the second exposure unit controller 51 controls the raising mechanism 55 to lower the stage 8 until the upper surface thereof is flush with the pass level, and stops the suction pump 54. In this state, the handler 7 grips the workpiece W on the stage 8 (see FIG. 31) and moves it to the discharge unit 5 (see FIG. 1).

  Next, the second exposure unit controller 51 controls the YZ table 52 to bring the cleaning unit 12 into the initial position shown in FIG. 32, that is, the upper adhesive roller 57 contacts one end of the lower surface of the mask 10. Move to the specified position. 32 is a movement locus of the cleaning unit 12 set in advance in the second exposure unit controller 51 in order to control the YZ table 52 (in the drawing, the upper adhesive roller in the figure). 57 shown as a movement locus at the center). That is, the second exposure unit controller 51 controls the YZ table 52 so as to move the cleaning unit 12 along the movement locus shown by the broken line.

  Specifically, the cleaning unit 12 first horizontally moves in the z direction from the position shown in FIG. 32 to the position shown in FIG. During this time, the second exposure unit controller 51 rotates the drive motor 53 to rotate the upper adhesive roller 57 counterclockwise in the drawing in synchronization with the moving speed of the cleaning unit 12 itself. As a result, the lower surface of the mask 10 rolls while being pressed by the adhesive roller 57, and the lower surface of the mask 10 is dedusted.

  Next, the stage 8 is slightly raised, and the cleaning unit 12 is lowered from the position shown in FIG. 33 to the position shown in FIG. 34 to bring the lower adhesive roller 57 into contact with the upper surface of the stage 8.

  Next, the cleaning unit 12 horizontally moves in the z direction from the position shown in FIG. 34 to the position shown in FIG. During this time, since the drive motor 53 continues to rotate in the same direction, the lower adhesive roller 57 rotates counterclockwise in the figure in synchronization with the moving speed of the cleaning unit 12 itself. As a result, the adhesive roller 57 rolls on the upper surface of the stage 8 and dust is removed from the upper surface of the stage 8.

  36, the first exposure unit 2 performs dust removal on the lower surface of the mask 10, the reversing unit 3 performs dust removal on the second surface of the workpiece W, and the second exposure unit 4 performs dust removal on the upper surface of the stage 8. It shows a state where dust is being removed.

Note that the dust removal timing in each of the exposure units 2 and 4 may be any timing that allows a space between the stage 8 and the mask 10, and dust removal may be started in a predetermined exposure cycle in advance, or any The dust removal may be started when the exposure is completed and the workpiece W is discharged.
<Advantages of this embodiment>
1. Advantage of providing cleaning unit 13 for removing dust on second surface of work W above reversing device 9 in reversing unit 3

According to this embodiment, the cleaning unit 13 for removing dust from the second surface of the workpiece W is installed above the reversing device 9 in the reversing unit 3. Accordingly, since it is not necessary to secure a space for installing the dust removing device between the reversing device 9 and the second exposure unit 4, the size of the entire exposure device in the z direction (direction in which the workpiece W moves) can be suppressed.
2. Advantages of the reversing device 9 rotating the suction base 30 over 180 degrees from the initial state, and removing the dust with the tip inclined obliquely downward.

  According to the present embodiment, when dust is removed from the second surface of the workpiece W using the cleaning unit 13, dust removal is performed in a state where the suction base 30 to which the workpiece W is fixed is inclined with respect to the horizontal direction. As a result, the moving width of the cleaning unit 13 in the z direction is sufficient by the cosine of the inclination angle with respect to the width of the workpiece. Therefore, since the moving space of the cleaning unit 13 in the z direction can be reduced as compared with the case where dust removal is performed with the suction base 30 directed horizontally, the z of the reversing unit 3 can be compared with the case where the cleaning unit 13 is not provided. An increase in the width in the direction can be suppressed. The above effect improves as the inclination angle of the suction base 30 increases. However, when the suction base 30 is oriented horizontally, the moving space of the cleaning unit 13 is larger than the z-direction region occupied by the entire reversing device 9. Even if it is narrowed, there is an upper limit that the width of the reversing part 3 in the z direction cannot be further narrowed. Further, when the inclination angle increases, the time required to return the suction base 30 to the horizontal after dust removal increases. Therefore, it is desirable that the inclination angle is within 30 degrees. This can also prevent the suction force required for the suction base 30 from becoming excessive.

  Since the above effect is obtained by tilting the suction base 30 from the horizontal, it is also included in the scope of the present invention that the suction base 30 is rotated 180 degrees from the initial state and stopped before reaching the horizontal. It is. However, as described above, if dust removal is performed in a state of being rotated over 180 degrees, the moving space in the vertical direction of the cleaning unit 13 can be set at a low position. There is an advantage that it can be suppressed.

In this embodiment, the suction base 30 is rotationally positioned by the rotation drive motor 34 that is a servo motor. The suction base 30 itself is a rigid plate. Accordingly, since the pressure of the cleaning unit 13 against the workpiece W of the adhesive roller 46 can be increased, even if the workpiece W is bent and wrinkled, dust can be removed by applying a certain pressure.
3. Advantages of the cleaning units 12 of the exposure units 2 and 4 having adhesive rollers 57 and 57 on the upper and lower sides.

In the present embodiment, the cleaning unit 12 of each exposure unit 2, 4 is provided with adhesive rollers 57, 57 on the top and bottom, and is in contact with the same transfer roller 58. By adopting such a configuration, according to the present embodiment, it is possible to remove dust from the lower surface of the mask 10 and the upper surface of the stage during one reciprocation while one cleaning unit 12 reciprocates in the z direction. Such an effect is possible even with a cleaning unit having only one adhesive roller. However, in order to realize this, the adhesive roller has a larger diameter than the transfer roller, the adhesive roller is configured to revolve with respect to the transfer roller, or the adhesive roller is moved independently from the transfer roller. Ingenuity is required. However, if the adhesive roller has a diameter larger than that of the transfer roller, there arises a problem that the life of the transfer roller is shortened, and the mechanism is complicated to configure the adhesive roller so that it can revolve with respect to the transfer roller. If the adhesive roller is moved independently from the transfer roller, there arises a problem that the adhesive force of the adhesive roller is reduced during dust removal. In the present embodiment, the cleaning unit 12 includes an adhesive roller 57 installed at a position higher than the transfer roller 58 for the mask lower surface and an adhesive roller 57 installed at a position lower than the transfer roller 58 for the stage upper surface. Therefore, there is a merit that such a problem does not occur at all.
4). In addition to removing the second surface of the workpiece W at the reversing unit 3, the merit of removing the dust at the lower surface of the mask 10 and the upper surface of the stage 8 at each exposure unit 2 and 4

  As described above, if dust is removed from the second surface of the workpiece W by the cleaning unit 13 on the way from the reversing device 9 to the stage of the second exposure unit 4, the dust is attached to the second surface in the first exposure unit. It is possible to solve the problem that a defect occurs in the wiring pattern formed on the two surfaces. However, if there is too much dust adhering at the first exposure unit 2, there is a possibility that dust removal by the cleaning unit 13 is not sufficiently performed. Therefore, it is desirable to remove dust so that dust does not adhere to the second surface of the workpiece W in the first exposure unit 2 in the first place. Therefore, in the present embodiment, the cleaning unit 12 is provided in the first exposure unit 2 to perform dust removal on the lower surface of the mask 10 and the upper surface of the stage 8.

  Further, even if dust is removed from the second surface before the work W is fixed on the stage 8 of the second exposure unit 4, if the dust adheres to the mask of the second exposure unit 4, the defect is It will occur. Therefore, in the present embodiment, the cleaning unit 12 is provided in the second exposure unit 4 to perform dust removal on the lower surface of the mask 10 and the upper surface of the stage 8.

Embodiment 2

  The second embodiment of the present invention is different from the first embodiment described above only in the configuration of the inverting device and the first handler, and the other configurations are common. That is, in the second embodiment, the reversing device also serves as a part of the function of the first handler (the function of transferring the workpiece W from the first exposure unit 2 to the reversing unit 3). The configuration is different from that of the reversing device 9 in the embodiment. Therefore, in order to avoid duplication of explanation, in FIG. 37 to FIG. 49, the same reference numerals as those of the first embodiment are attached to the configurations common to those of the first embodiment in the second embodiment. The description will be omitted, and only the reversing device 60 will be described below.

  FIG. 37 is a side perspective view of the exposure apparatus according to the second embodiment, and corresponds to FIG. 1 relating to the first embodiment. FIG. 38 is a rear view showing a state in which the reversing device 60 in the second embodiment is viewed from the downstream side (right side in FIG. 37). 37 and 38, the first exposure unit 2 completes exposure of the first surface of the work W fixed on the stage 8, and the stage 8 is lowered to the position of the pass line (dashed line) ( 2 shows a state in which the reversing device 60 is in an initial state). Although not shown in FIG. 37, the first exposure unit 2 and the second exposure unit 4 are each provided with a cleaning unit 12, and the stage 1a of the input unit 1 to the stage of the first exposure unit 2 are provided. A first handler 6 for transferring the workpiece W is provided on 8.

  As shown in FIGS. 37 and 38, a plate-like frame 61 facing in the horizontal direction from the first exposure unit 2 to the reversing unit 3 is fixed to the casing of the first exposure unit 2 and the reversing unit 3. Is installed. Note that the raising mechanism 55 of the stage 8 of the first exposure unit 2 is installed so as to penetrate the frame 61.

  On the frame 61, a pair of linear guides 62, 62 are installed in parallel with each other in the z direction. Note that the pair of linear guides 62 and 62 are installed with the stage 8 of the first exposure unit 2 sandwiched in the x direction and at a sufficient distance from the width of the stage 8.

  A plate-like reversing unit table 63 is stretched over the linear guides 62 and 62. The reversing part table 63 is cut away on the upstream side (left side in FIG. 37) and the downstream side, and the entire planar shape is H-shaped. The upstream side is cut away in order to avoid interference with the ascending mechanism 55 of the stage 8 when the reversing unit 60 moves into the first exposure unit 2 (see FIGS. 41 to 43). The reason for notching is to allow a fixed table 64 (described later) to tilt for dust removal (see FIG. 47).

  At the center of both side edges in the x direction on the upper surface of the reversing unit table 63, there are multi-stage y-stages corresponding to the slider 27 and the lifting table 26 in the first embodiment (in FIG. 66 is shown). A fixed table 64 corresponding to the suction base 30 of the first embodiment is supported between the tips of the pair of y stages 66 and 66 so as to be rotatable about a rotation axis directed in the x direction. Yes. Therefore, the fixed table 64 is raised and lowered in the y direction by the two y stages 66 and 66 extending and contracting in synchronization.

  The rotation shaft for pivotally supporting the fixed table 64 on both y stages 66 and 66 passes through the center of both side edges in the x direction of the fixed table 64, and one end thereof is the front y stage in FIG. 66, and directly connected to a drive motor 65 fixed to the outer surface near the tip of the y stage 66. The drive motor 65 corresponds to the rotation drive motor 34 in the first embodiment, and the fixed table 64 can be reversed in the yz plane by rotationally driving the rotation shaft.

  The fixed table 64 has a substantially square planar shape, and on one side (a plane facing upward in the initial state shown in FIGS. 37 and 38) 64a, a large number communicated with a suction pump 44 (not shown). The suction port 64b is opened, and the suction pump 44 sucks air through these suction ports 64b, so that the workpiece W in surface contact with the surface 64a is vacuum-sucked. That is, this 64a functions as a “holding surface”.

  The fixed table 64 must straddle the stage 8 when the reverse recording 60 is moved into the first exposure unit 2. Therefore, the width of the fixed table 64 in the x direction is wider than the width of the upper surface of the stage 8 in the x direction, and both the y stages 66 and 66 are installed at positions where a certain gap is opened from each side edge of the stage 8. ing.

  Further, the adhesive roller 46 of the cleaning unit 13 for removing dust from the second surface of the work W fixed on the holding surface 64a of the reversing device 60 has a width in the x direction of the holding surface 64a as shown in FIG. It has the above length.

  As described above, other configurations in the second embodiment are the same as those in the first embodiment. For example, the cleaning unit 13 of the reversing unit 3 has the same configuration as that of the first embodiment, is supported by the same YZ table 40 as that of the first embodiment, and moves in the yz plane. Is done. The Y table 42 and Z table 43 constituting the YZ table 40, the drive motor 48 constituting the cleaning unit 13, and the suction pump 44 described above are connected to the reversing unit controller 49 shown in FIG. Yes. However, depending on the difference in the configuration of the reversing devices 9 and 60 between the first embodiment and the second embodiment, the reversing unit controller 49 includes the reversing device moving cylinder 33 and the rotation drive motor in the first embodiment. 34, instead of the elevating cylinder 35 and the phrase motor 37, a drive mechanism for the linear slides 62, 62, a drive motor 65, and y stages 66, 66 are connected.

  Hereinafter, in the second embodiment, the reversing unit controller 49, the first exposure unit controller 56, and the overall controller 50 are the reversing device 60, the cleaning unit 13 of the reversing unit 3, and the raising mechanism 55 of the stage 8 of the first exposure unit 2. A sequence for controlling the above will be described with reference to FIGS. 37 and 39 to 49.

  From the initial state shown in FIG. 37, first, the reversing unit controller 49 raises the fixed stage 64 by extending both the y stages 66 and 66 of the reversing device 60. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed table 64 by 180 degrees so that the holding surface 64a faces downward. At this time, the height of the holding surface 64a is higher than the pass line (dashed line). This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive mechanism of the linear slides 62 and 62 to move the reversing device 60 to the first exposure unit 2 with the holding surface 64a facing downward, and the fixed table 64 is moved. , Disposed above the stage 8. This state is shown in FIG.

  Next, the reversing unit controller 49 contracts both the y stages 66 and 66 of the reversing device 60 to lower the fixed stage 64, so that the work W fixed on the upper surface of the stage 8 has been exposed. The holding surface 64a is brought into surface contact with the surface. This state is shown in FIG.

  When the contact between the holding surface 64a and the workpiece W is detected by a sensor (not shown), the reversing unit controller 49 stops the contraction of both the y stages 66 and 66 and operates the suction pump 44 to hold the workpiece W. Vacuum suction is applied to the surface 64a. At this time, the first exposure unit controller 56 stops the vacuum suction by the suction pump 54 of the stage 8 according to an instruction from the overall controller 50. In this way, the reversing unit controller 49 extends both the y stages 66 and 66 of the reversing device 60 while the work W is vacuum-sucked to the holding surface 64a, thereby raising the fixed stage 64 and moving the work W to the stage. 8 is separated from the top surface. This state is shown in FIG.

  Next, the reversing unit controller 49 returns the reversing device 60 to the initial position in the reversing unit 3 by controlling the driving mechanism of the linear slides 62 and 62. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed table 64 by 180 degrees so that the holding surface 64a faces upward. This state is shown in FIG.

  Next, the reversing unit controller 49 contracts both the y-stages 66 and 66 of the reversing device 60 to lower the fixed stage 64 so that the holding surface 46a is flush with the pass line. The reason why the fixed stage 64 is lowered is to lower the moving area of the cleaning unit 13 for dust removal with respect to the workpiece W held on the holding surface 46a. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed stage 64 (clockwise in FIG. 46) until the holding surface 46a is inclined 45 degrees from the horizontal direction to the downstream side. When the holding surface 46a is thus tilted, the reversing unit controller 49 controls the yz table 40 to move the cleaning unit 13 in the yz plane, thereby causing the adhesive roller 46 to move. Rolls on the second surface of the workpiece W fixed to the holding surface 46a. Specifically, the cleaning unit 13 brings the outer peripheral surface of the adhesive roller 46 into line contact with the upstream edge of the workpiece W, and then the drive motor 48 moves the adhesive roller 46 through the transfer roller 47 ( While being rotated synchronously (clockwise in FIG. 46), it moves parallel to the holding surface 46a so as to descend obliquely toward the downstream side. In the middle of this movement, the adhesive roller 46 rolls while pressing on the second surface of the workpiece W, and removes the second surface (see FIG. 47). When the adhesive roller 46 reaches the downstream edge of the workpiece W, the cleaning unit 13 separates the adhesive roller 46 from the second surface of the workpiece W and returns to the initial position (see FIG. 48).

  Next, the reversing unit controller 49 reverses the drive motor 65 to return the fixed stage 64 to the rotational position where the holding surface 46a is horizontal (see FIG. 48). At this time, the holding surface 46a of the fixed stage 64 is flush with the pass level. Therefore, the reversing unit controller 49 stops the suction by the suction pump 44. Then, under the control of the overall controller 50, the second handler 7 described above picks up the workpiece W and moves it to the second exposure unit 4 (see FIG. 49).

  Thereafter, the second exposure unit 4 exposes the second surface of the workpiece W, the workpiece W is taken out from the discharge unit 5, and the first exposure unit 2 exposes the next surface of the next workpiece W to the first surface. When completed, the initial state shown in FIG. 37 is restored.

Embodiment 3

  In the third embodiment of the present invention, the cleaning unit 13 ′ of the reversing unit 3 is disposed below the fixed table 64 of the reversing device 60 ′, compared to the second embodiment described above, and the upper surface of the casing thereof. The main difference is that the adhesive roller 46 is disposed at the downstream edge of the cleaning unit. As a result, the cleaning unit 13 removes dust from the second surface of the work W fixed to the holding surface 64a facing downward. In order to secure the moving area of the cleaning unit 13, the shapes of the frame 61 ′ and the reversing unit table 63 ′ are different from those of the second embodiment, and the control sequence by the reversing unit controller 49 is also the second embodiment. The form is different. For other configurations, the third embodiment is exactly the same as the second embodiment. Therefore, in order to avoid duplication of description, the same reference numerals as those of the second embodiment are given in FIGS. The description will be omitted, and only the differences from the second embodiment will be described below.

  FIG. 50 is a side perspective view of the exposure apparatus according to the third embodiment, and corresponds to FIG. 37 relating to the second embodiment. FIG. 51 is a rear view showing the reversing device 60 ′ in the third embodiment as viewed from the downstream side (right side in FIG. 50). 50 and 51, the first exposure unit 2 completes the exposure of the first surface of the workpiece W fixed on the stage 8, and the stage 8 is lowered to the position of the pass line (dashed line) ( 2 shows a state in which the reversing device 60 is in an initial state). In FIG. 50, although not shown, the first exposure unit 2 and the second exposure unit 4 are each provided with a cleaning unit 12, and the stage 1a of the input unit 1 to the stage of the first exposure unit 2 A first handler 6 for transferring the workpiece W is provided on 8.

  As shown in FIGS. 50 and 51, in the reversing unit 3, the moving area of the cleaning unit 13 'by the YZ table 40 occupies the lower side of the reversing device 60 at the initial position. Accordingly, since a space must be secured in the moving area of the cleaning unit 13 ′, the frame 61 ′ and the reversing unit table 63 ′ are cut out at locations that conflict with the moving area. As a result of this notch, the planar shape of the reversing part table 63 ′ cannot maintain the same H shape as that of the second embodiment. Instead, in the third embodiment, as will be described later, dust removal is performed while the fixed table 64 is raised. Therefore, even if the holding surface 64a is inclined, the fixed table 64 interferes with the reversing unit table 63 ′. Therefore, the notch for avoiding interference with the fixed table 64 is not necessary in the reversing unit table 63 ′. Therefore, the planar shape of the reversing unit table 63 ′ in the third embodiment avoids interference with the ascending mechanism of the stage 8 of the first exposure unit 2 and conflict with the moving region of the cleaning unit 13 ′ in the reversing unit 3. In order to do this, only the upstream side is open and has a U shape. Further, since the cleaning unit 13 ′ passes between both the y stages 66, 66 of the reversing device 60 and comes into contact with the reversing table 64, as shown in FIG. The distance between the stages 66 and 66 is narrower.

  Hereinafter, in the third embodiment, the reversing unit controller 49, the first exposure unit controller 56, and the overall controller 50 move the reversing device 60 ′, the cleaning unit 13 ′ of the reversing unit 3, and the stage 8 of the first exposure unit 2. A sequence for controlling the mechanism 55 will be described with reference to FIGS. 50 and 52 to 63.

  From the initial state shown in FIG. 50, the reversing unit controller 49 first raises the fixed stage 64 by extending both the y stages 66 and 66 of the reversing device 60 '. At this time, the yz table 40 retracts the cleaning unit 13 'to the most downstream position at the lower limit of the moving region so as not to interfere with the reversing unit table 63'. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed table 64 by 180 degrees so that the holding surface 64a faces downward. At this time, the height of the holding surface 64a is higher than the pass line (dashed line). This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive mechanism of the linear slides 62, 62 to move the reversing device 60 ′ to the first exposure unit 2 with the holding surface 64 a facing downward, and the fixed table 64. Is disposed above the stage 8. This state is shown in FIG.

  Next, the reversing unit controller 49 lowers the fixed stage 64 by contracting both the y stages 66 and 66 of the reversing device 60 ′, and the work W fixed on the upper surface of the stage 8 has been exposed. The holding surface 64a is brought into surface contact with one surface. This state is shown in FIG.

  When the contact between the holding surface 64a and the workpiece W is detected by a sensor (not shown), the reversing unit controller 49 stops the contraction of both the y stages 66 and 66 and operates the suction pump 44 to hold the workpiece W. Vacuum suction is applied to the surface 64a. At this time, the first exposure unit controller 56 stops the vacuum suction by the suction pump 54 of the stage 8 according to an instruction from the overall controller 50. In this way, the reversing unit controller 49 extends both the y-stages 66 and 66 of the reversing device 60 ′ while the work W is vacuum-sucked to the holding surface 64a, thereby raising the fixed stage 64 and moving the work W It is separated from the upper surface of the stage 8. This state is shown in FIG.

  Next, the reversing unit controller 49 returns the reversing device 60 ′ to the initial position in the reversing unit 3 by controlling the drive mechanism of the linear slides 62 and 62. This state is shown in FIG.

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed stage 64 (clockwise in FIG. 57) until the holding surface 46a is inclined 45 degrees upstream from the horizontal direction. This state is shown in FIG. When the holding surface 46a is thus tilted, the reversing unit controller 49 controls the yz table 40 to move the cleaning unit 13 ′ in the yz plane, thereby moving the adhesive roller 46. Then, it rolls on the second surface of the workpiece W fixed to the holding surface 46a. Specifically, the cleaning unit 13 ′ causes the outer peripheral surface of the adhesive roller 46 to come into line contact with the downstream edge of the workpiece W (see FIG. 59), and then the drive motor 48 passes the transfer roller 47 through. Then, while rotating the adhesive roller 46 synchronously (clockwise in FIG. 59), it moves parallel to the holding surface 46a so as to rise obliquely toward the upstream side. In the middle of this movement, the adhesive roller 46 rolls while pressing the second surface of the work W, and removes the second surface. When the adhesive roller 46 reaches the upstream edge of the workpiece W (see FIG. 60), the cleaning unit 13 ′ separates the adhesive roller 46 from the second surface of the workpiece W and returns to the initial position ( (See FIG. 61).

  Next, the reversing unit controller 49 controls the drive motor 65 to rotate the fixed table 64 135 degrees clockwise (or 225 degrees counterclockwise) in FIG. And turn upward. Then, the reversing unit controller 49 contracts both the y stages 66 and 66 of the reversing device 60 ′ to lower the fixed stage 64 so that the holding surface 46 a is flush with the pass line. This state is shown in FIG.

  Next, the reversing unit controller 49 stops the suction by the suction pump 44, and under the control of the overall controller 50, the above-described second handler 7 picks up the workpiece W and moves it to the second exposure unit 4 (see FIG. 63). ).

  Thereafter, the second exposure unit 4 exposes the second surface of the workpiece W, the workpiece W is taken out from the discharge unit 5, and the first exposure unit 2 exposes the next surface of the next workpiece W to the first surface. When completed, the initial state shown in FIG. 50 is restored.

1 is a schematic side perspective view of an exposure apparatus according to a first embodiment of the present invention. Perspective view of the reversing device in the initial state Top view of the reversing device in the initial state Side view of the reversing device in the initial state Front view of the reversing device in the initial state Vertical sectional view taken along line VI-VI in FIGS. 3 and 4 Front view showing a state in which both opening and closing bases are opened after reversing Perspective view of reversing device after reversal Plan view of reversing device after reversal Side view of reversing device after reversing Rear view of reversing device after reversing Perspective view of cleaning unit and YZ table Block diagram showing circuit configuration of control system of exposure apparatus Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Explanation of operation of reversing device Operation explanatory diagram of the cleaning unit Operation explanatory diagram of the cleaning unit Operation explanatory diagram of the cleaning unit Operation explanatory diagram of the cleaning unit Operation explanatory diagram of the cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Front perspective view of the cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit Operation explanatory diagram of cleaning unit of each exposure unit The figure which shows the state in which each cleaning unit is performing dust removal, respectively. Schematic side perspective view of an exposure apparatus according to a second embodiment of the present invention Rear view of reversing device Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Schematic side perspective view of an exposure apparatus that is the third embodiment of the present invention Rear view of reversing device Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit Operation explanatory diagram of reversing device and cleaning unit

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 1st exposure part 3 Inversion part 4 2nd exposure part 8 Stage 9 Inversion apparatus 10 Mask 12 UV lamp 21 Opening / closing base 22 Opening / closing base 24 Supporting part 25 Rotating plate 26 Lifting table 27 Slider 29 Opening / closing base bracket 30 Adsorption base 34 Rotation drive Motor 37 Rotating motor 40 YZ table 49 Reversing unit controller 60 Reversing device 64 Fixed table 65 Drive motor 66 y stage

Claims (4)

A first exposure unit that exposes the first surface of the workpiece and a second exposure unit that exposes the second surface in an exposure apparatus that sequentially exposes the first and second surfaces of the workpiece while moving the workpiece in the horizontal direction. Reversing part installed between and
A plate-like base used as a holding surface on which one plane holds the workpiece;
A support mechanism that supports the base so as to be rotatable at least 180 degrees from an initial state in which the holding surface is oriented horizontally and downward, with a rotation axis directed in a direction parallel to the holding surface as a center;
A rotation drive mechanism for rotating the base via the support mechanism;
A dust removing device for removing dust adhering to the surface of the workpiece by contacting the surface of the workpiece;
A moving mechanism for moving the dust removing device;
By controlling the rotation driving mechanism and the moving mechanism, the base is rotated from a state where the base is in the initial state, and the base is stopped at a position where the holding surface is inclined with respect to the horizontal direction. And a controller for rotating the base so that the holding surface faces in a horizontal direction after the dust removing device is moved on the surface of the workpiece held on the holding surface of the base while being in contact with the workpiece. An inversion portion of the exposure apparatus characterized by the above. The support mechanism rotatably supports the base in a range exceeding 180 degrees from the initial state,
The controller stops the base at a position exceeding 180 degrees from the initial state, and then moves the dust removing device while contacting the surface of the workpiece held on the holding surface of the base, 2. The reversing unit of an exposure apparatus according to claim 1, wherein the base is reversed so that the holding surface faces in a horizontal direction. 2. The reversing unit of an exposure apparatus according to claim 1, wherein the dust removing device includes an adhesive roller that causes dust attached to the surface of the workpiece to adhere to the surface of the workpiece by rolling the surface of the workpiece. The controller stops the base at a position where the holding surface faces downward and is inclined with respect to the horizontal direction, and then moves the dust removing device over the surface of the work held by the holding surface of the base. 2. The reversing unit of an exposure apparatus according to claim 1, wherein the base is reversed so that the holding surface is moved upward while being in contact with each other, and the holding surface is directed upward and horizontal.