JP2014059494A - Dust remover in exposure equipment and dust removal method therefor - Google Patents

Dust remover in exposure equipment and dust removal method therefor Download PDF

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JP2014059494A
JP2014059494A JP2012205315A JP2012205315A JP2014059494A JP 2014059494 A JP2014059494 A JP 2014059494A JP 2012205315 A JP2012205315 A JP 2012205315A JP 2012205315 A JP2012205315 A JP 2012205315A JP 2014059494 A JP2014059494 A JP 2014059494A
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dust
dust removal
roller
dust removing
exposure apparatus
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JP5893537B2 (en
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Masaaki Matsuda
政昭 松田
Akira Morita
亮 森田
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Orc Manufacturing Co Ltd
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Orc Manufacturing Co Ltd
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Priority to JP2012205315A priority Critical patent/JP5893537B2/en
Priority to TW102123760A priority patent/TWI603159B/en
Priority to PCT/JP2013/073938 priority patent/WO2014045885A1/en
Priority to CN201380040503.5A priority patent/CN104508561B/en
Priority to KR1020157002557A priority patent/KR102062419B1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Life Sciences & Earth Sciences (AREA)
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  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a dust remover in exposure equipment in which there is no risk that dust, trash or foreign matter and the like temporarily stuck to a dust removal roller and removed during dust removal restick to an object for dust removal, and to obtain a dust removal method therefor.SOLUTION: Provided is a dust remover in exposure equipment in which a pattern is exposed to a photosensitive substrate, comprising: a dust removal roller capable of contacting/removing to the dust removal surface of a dust removal object in the exposure equipment from the outer circumference; and a moving mechanism of relatively moving the dust removal roller and the dust removal object, and it is characterized in that the circumferential length of the dust removal roller is set so as to be longer than the contact movement distance with the dust removal surface of the dust removal object.

Description

本発明は、感光性基板に対してパターンを露光させる露光装置に関し、特にその除塵装置及び除塵方法に関する。   The present invention relates to an exposure apparatus that exposes a pattern to a photosensitive substrate, and more particularly to a dust removal apparatus and a dust removal method thereof.

プリント基板、半導体基板等の各種基板の製造には、フォトレジスト（感光材料）を塗布したワーク（感光性基板）に所定のパターンを露光して焼き付け、その後エッチング工程によりワーク上にパターンを形成するフォトグラフィ技術を用いた露光装置が広く用いられている。このような露光装置には、マスクとワークを密着させて露光するコンタクト露光方式、マスクとワークが非接触のプロキシミティギャップ方式およびプロジェクション方式、マスクを持たないダイレクト露光方式等の各種が知られている。また、ワークの両面を露光する両面露光方式、片面のみに露光を行う片面露光方式も知られている。   For the production of various substrates such as printed boards and semiconductor substrates, a predetermined pattern is exposed and baked on a work (photosensitive substrate) coated with a photoresist (photosensitive material), and then a pattern is formed on the work by an etching process. An exposure apparatus using a photolithography technique is widely used. Various types of exposure apparatuses such as a contact exposure method in which a mask and a workpiece are in close contact with each other, a proximity gap method and a projection method in which the mask and the workpiece are not in contact, and a direct exposure method without a mask are known. Yes. Also known are a double-sided exposure method in which both sides of a workpiece are exposed and a single-sided exposure method in which exposure is performed on only one side.

いずれの方式の露光装置においても、外部環境において塵、ゴミあるいは異物等（以下では適宜これらを「塵」と総称する）に汚染されたワークが露光装置内に入ると、汚染されたワーク自体に露光欠陥、現像欠陥が生じてしまう。また、ワークを載置する露光テーブルや、マスクを用いる装置ではマスクに塵が転写されてしまい、同様に露光欠陥、現像欠陥の原因となる可能性がある。また、ワークのフォトレジストからの発塵も同様の問題を生じさせる。   In any type of exposure apparatus, when a workpiece contaminated with dust, debris, foreign matter, or the like (hereinafter collectively referred to as “dust” as appropriate) enters the exposure apparatus in the external environment, the contaminated workpiece itself is exposed. Exposure defect and development defect occur. Further, in an exposure table on which a workpiece is placed or an apparatus using a mask, dust is transferred to the mask, which may similarly cause exposure defects and development defects. Also, dust generation from the photoresist of the work causes the same problem.

特開２００２−１６２７４９号公報JP 2002-162749 A 特開２００７−２５４３６号公報JP 2007-25436 A 特開２００９−１５７２４９号公報JP 2009-157249 A

特許文献１、２、３は、このような露光装置の除塵対象物（ワーク、露光テーブルあるいはマスク）の除塵を行うため、周面に粘着材を有する除塵ローラ（粘着ローラ）を除塵対象物表面で転動させる除塵装置を提案している。   In Patent Documents 1, 2, and 3, in order to remove dust from a dust removal object (workpiece, exposure table or mask) of such an exposure apparatus, a dust removal roller (adhesion roller) having an adhesive material on its peripheral surface is used. Has proposed a dust removal device that rolls on.

しかしながら、特許文献１の除塵装置は、除塵ローラがマスクと露光テーブルの上で転動するとき、一旦除塵ローラに付着した塵が再びマスクまたは露光テーブルに移動（再付着）するおそれがある。特許文献２の除塵装置は、マスク除塵用の除塵ローラと露光テーブル除塵用の除塵ローラを個別に設けているが、同様に、一旦除塵ローラに付着した塵が再びマスクまたは露光テーブルに移動（再付着）するおそれがある。特許文献３の除塵装置は、ワーク、露光テーブル及びマスクのそれぞれを除塵する除塵ローラを１つのクリーニングユニットに設けているため、装置が大型化、重量化してしまう。また、特許文献１、２の除塵装置と異なり、ワークの搬送装置との兼用化ができないという問題がある。   However, in the dust removing device of Patent Document 1, when the dust removing roller rolls on the mask and the exposure table, there is a possibility that the dust once attached to the dust removing roller may again move (reattach) to the mask or the exposure table. The dust removal apparatus of Patent Document 2 is provided with a dust removal roller for mask dust removal and a dust removal roller for exposure table dust removal separately. Similarly, dust once adhered to the dust removal roller again moves to the mask or exposure table (re-apply). There is a risk of adhesion). Since the dust removing apparatus of Patent Document 3 is provided with a dust removing roller for removing dust from the workpiece, the exposure table, and the mask in one cleaning unit, the apparatus becomes larger and heavier. In addition, unlike the dust removing apparatuses disclosed in Patent Documents 1 and 2, there is a problem that the apparatus cannot be used as a workpiece transfer apparatus.

本発明は、従来装置についての以上の問題意識に基づき、除塵中に除塵ローラに一旦付着して除去された塵、ゴミあるいは異物等が除塵対象物に再付着するおそれのない露光装置の除塵装置及び除塵方法を得ることを目的とする。   The present invention is based on the above consciousness of the problem with the conventional apparatus, and the dust removing apparatus of the exposure apparatus in which the dust, dust, foreign matters, etc. once attached to the dust removing roller during the dust removal are not likely to be reattached to the dust removing object. And to obtain a dust removal method.

本発明の露光装置の除塵装置は、感光性基板に対してパターンを露光する露光装置において、周面により、前記露光装置内の除塵対象物の除塵表面に接離可能な除塵ローラと、前記除塵ローラの周面を前記除塵対象物の除塵表面に接触させながら、前記除塵ローラが回転するように、前記除塵ローラと除塵対象物とを相対移動させる移動機構と、を備え、前記除塵ローラの周長は、前記移動機構による前記除塵ローラの周面と前記除塵対象物の除塵表面との接触移動距離よりも長く設定されていることを特徴としている。   The dust removing device of the exposure apparatus according to the present invention is an exposure device that exposes a pattern to a photosensitive substrate, and a dust removing roller that can be brought into contact with and separated from a dust removing surface of a dust removing object in the exposure device by a peripheral surface, and the dust removing device. A moving mechanism for moving the dust removal roller and the dust removal object relative to each other so that the dust removal roller rotates while contacting the circumferential surface of the roller with the dust removal surface of the dust removal object. The length is set longer than the contact movement distance between the peripheral surface of the dust removal roller and the dust removal surface of the dust removal object by the moving mechanism.

前記除塵ローラとして、単一の除塵対象物の除塵表面を複数に分割した分割除塵表面上を転動する複数の除塵ローラを設け、各除塵ローラの周長を、各除塵ローラの周面と各分割除塵表面との接触移動距離よりも長く設定することができる。   As the dust removing roller, a plurality of dust removing rollers that roll on a divided dust removing surface obtained by dividing a dust removing surface of a single dust removing object into a plurality of parts are provided, and the circumferential length of each dust removing roller is set to the circumferential surface of each dust removing roller and each of the dust removing rollers. It can be set longer than the contact movement distance with the divided dust removing surface.

前記除塵ローラとして、単一の除塵対象物の除塵表面を２つに分割した第１、第２の分割除塵表面上を転動する第１、第２の除塵ローラを設け、前記第１の除塵ローラの周長を、前記第１の除塵ローラの周面と前記第１の分割除塵表面との接触移動距離よりも長く設定し、前記第２の除塵ローラの周長を、前記第２の除塵ローラの周面と前記第２の分割除塵表面との接触移動距離よりも長く設定することができる。   As the dust removal roller, there are provided first and second dust removal rollers that roll on the first and second divided dust removal surfaces obtained by dividing the dust removal surface of a single dust removal object into two parts, and the first dust removal roller A circumferential length of the roller is set longer than a contact movement distance between the circumferential surface of the first dust removing roller and the first divided dust removing surface, and the circumferential length of the second dust removing roller is set to the second dust removing roller. It can be set longer than the contact movement distance between the peripheral surface of the roller and the second divided dust removing surface.

本発明の露光装置の除塵装置は、前記第１の除塵ローラの前記第１の分割除塵表面上の転動と、前記第２の除塵ローラの前記第２の分割除塵表面上の転動とを交互に行わせる制御部をさらに備えることが好ましい。   The dust removing device of the exposure apparatus according to the present invention includes rolling on the first divided dust removing surface of the first dust removing roller and rolling on the second divided dust removing surface of the second dust removing roller. It is preferable to further include a control unit that is alternately performed.

前記除塵ローラは、単一の除塵対象物の全除塵表面上を転動する単一ローラから構成することもできる。   The dust removal roller may be constituted by a single roller that rolls on the entire dust removal surface of a single dust removal object.

前記移動機構は、感光性基板を保持して移動させるワーク移動機構を兼ねることができる。   The moving mechanism can also serve as a work moving mechanism that holds and moves the photosensitive substrate.

前記除塵対象物は、感光性基板、露光テーブル及びマスクの１つ以上を含むことができる。   The dust removal object may include one or more of a photosensitive substrate, an exposure table, and a mask.

本発明の露光装置の除塵装置は、前記除塵ローラに付着した塵を集塵する集塵装置をさらに備えることが好ましい。   It is preferable that the dust removing device of the exposure apparatus of the present invention further includes a dust collecting device that collects dust attached to the dust removing roller.

本発明の露光装置の除塵方法は、除塵ローラをその周面を露光装置内の除塵対象物の除塵表面に接触させながら転動させて除塵する除塵工程と、除塵工程が終了した前記除塵ローラの周面を清掃する清掃工程と、を交互に実行する露光装置の除塵方法において、１回の除塵工程においては、前記除塵ローラの周面上の同一部分を前記除塵対象物の除塵表面に二度接触させることなく除塵する（除塵ローラが１回転未満の転動で除塵する）ことを特徴としている。   The dust removal method of the exposure apparatus according to the present invention includes a dust removal process in which dust removal is performed by rolling the dust removal roller in contact with the dust removal surface of the dust removal object in the exposure apparatus, and the dust removal roller that has completed the dust removal process. In the dust removal method of the exposure apparatus that alternately executes the cleaning step of cleaning the peripheral surface, in one dust removal step, the same portion on the peripheral surface of the dust removal roller is applied twice to the dust removal surface of the dust removal object. It is characterized in that dust is removed without contact (the dust removal roller removes dust by rolling less than one rotation).

本発明によれば、除塵ローラは、除塵中に、その同一部分が除塵対象物の除塵表面に二度接触することがない（除塵ローラが１回転未満の転動で除塵する）。このため、除塵中に除塵ローラに一旦付着して除去された塵、ゴミあるいは異物等が除塵対象物に再付着するおそれがなく、再付着に起因する露光欠陥や現像欠陥を未然に防止することができる。   According to the present invention, during the dust removal, the same portion of the dust removal roller does not contact the dust removal surface of the dust removal object twice (the dust removal roller removes the dust by rolling less than one rotation). For this reason, there is no possibility that dust, dust, or foreign matter once adhered to the dust removal roller during dust removal will reattach to the object to be removed, and it is possible to prevent exposure defects and development defects due to reattachment. Can do.

本発明の一実施形態に係る露光装置の除塵装置の概略構成を示す側面透視図である。1 is a side perspective view showing a schematic configuration of a dust removing device of an exposure apparatus according to an embodiment of the present invention. 除塵装置（クリーニングユニット）の詳細な構成を示す平面図である。It is a top view which shows the detailed structure of a dust remover (cleaning unit). 除塵装置（クリーニングユニット）の詳細な構成を示す側面図である。It is a side view which shows the detailed structure of a dust remover (cleaning unit). 除塵ローラと転写ローラとの位置関係を示す二面図である。FIG. 4 is a two-side view illustrating a positional relationship between a dust removal roller and a transfer roller. 第１除塵ローラ及び第２除塵ローラの周長（有効径）と除塵対象物であるワークの除塵表面との関係を示す図である。It is a figure which shows the relationship between the circumference (effective diameter) of a 1st dust removal roller and a 2nd dust removal roller, and the dust removal surface of the workpiece | work which is a dust removal object. 第１除塵ローラ及び第２除塵ローラの周長（有効径）と除塵対象物である露光テーブルの除塵表面との関係を示す図である。It is a figure which shows the relationship between the circumference (effective diameter) of a 1st dust removal roller and a 2nd dust removal roller, and the dust removal surface of the exposure table which is a dust removal target object. 第１除塵ローラ及び第２除塵ローラの周長（有効径）と除塵対象物であるマスクの除塵表面との関係を示す図である。It is a figure which shows the relationship between the circumference (effective diameter) of a 1st dust removal roller and a 2nd dust removal roller, and the dust removal surface of the mask which is a dust removal target object. 露光装置の除塵装置の動作を示す第１工程図である。It is a 1st process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第２工程図である。It is a 2nd process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第３工程図である。It is a 3rd process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第４工程図である。It is a 4th process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第５工程図である。It is a 5th process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第６工程図である。It is a 6th process figure which shows operation | movement of the dust removal apparatus of exposure apparatus. 露光装置の除塵装置の動作を示す第７工程図である。It is a 7th process figure which shows operation | movement of the dust removal apparatus of exposure apparatus.

以下、図１ないし図１４を参照して、本発明による露光装置の除塵装置の一実施形態について説明する。本実施形態は、マスクとワークを密着させて露光するコンタクト露光方式によりワークの両面に露光するタイプの露光装置ＥＸに本発明を適用したものである。以下の説明におけるｘ、ｙ、ｚの各方向は、図中に記載した矢線方向を基準としている。   Hereinafter, an embodiment of a dust removing device of an exposure apparatus according to the present invention will be described with reference to FIGS. In the present embodiment, the present invention is applied to an exposure apparatus EX of a type in which exposure is performed on both surfaces of a work by a contact exposure method in which a mask and a work are brought into close contact with each other. Each direction of x, y, z in the following description is based on the arrow direction described in the figure.

本実施形態で使用するワーク（感光性基板、除塵対象物）Ｗは、露光及びエッチング処理後に回路配線として残る金属膜とフォトレジスト層とを両面に夫々積層した平面基材からなる。   A workpiece (photosensitive substrate, dust removal object) W used in the present embodiment is made of a planar base material in which a metal film and a photoresist layer that remain as circuit wiring after exposure and etching processes are laminated on both surfaces.

＜露光装置の全体構成＞
図１に示すように、露光装置ＥＸは、図１中の左側から右側に向けて順に、投入部１、第１露光部２、反転部３、第２露光部４、及び排出部５を備えている。 <Overall configuration of exposure apparatus>
As shown in FIG. 1, the exposure apparatus EX includes an input unit 1, a first exposure unit 2, a reversing unit 3, a second exposure unit 4, and a discharge unit 5 in order from the left side to the right side in FIG. ing.

投入部１は、未露光のワーク（感光性基板、除塵対象物）Ｗを露光装置ＥＸの外部から内部に搬入するための搬入口である。投入部１には、作業者または搬送装置（図示せず）によって搬入されたワークＷを載置するためのステージ１ａが設けられている。   The input unit 1 is a carry-in port for carrying an unexposed workpiece (photosensitive substrate, dust removal object) W from the outside of the exposure apparatus EX. The input unit 1 is provided with a stage 1a for placing a workpiece W carried by an operator or a transfer device (not shown).

第１露光部２は、未露光のワークＷの第１面（上面）に露光するための露光装置である。第１露光部２は、ワークＷを載置する露光テーブル（除塵対象物）８と、この露光テーブル８の上方に位置する所定のパターンが描かれたマスク（除塵対象物）１０と、このマスク１０の上方に位置する光源１４とを備えている。第１露光部２は、露光テーブル８をマスク１０に対して昇降させる昇降機構（図示せず）を備えており、この昇降機構によって露光テーブル８をマスク１０に向けて上昇させたとき、露光テーブル８に載置されたワークＷの第１面（上面）にマスク１０が密着する。ワークＷとマスク１０を密着させた状態で、光源１４によってワークＷのフォトレジスト層を感光させる波長帯域の光（例えば紫外光）を照射すると、マスク１０に描かれた所定のパターンがワークＷの第１面（上面）のフォトレジスト層に露光される。なお、露光テーブル８の上面には多数の吸引口（図示せず）が形成されており、この吸引口を通じて空気が吸引されることによって、露光テーブル８の表面にワークＷが吸着固定される。   The first exposure unit 2 is an exposure apparatus for exposing the first surface (upper surface) of the unexposed workpiece W. The first exposure unit 2 includes an exposure table (dust removal object) 8 on which the workpiece W is placed, a mask (dust removal object) 10 on which a predetermined pattern is placed above the exposure table 8, and the mask. 10 and a light source 14 located above 10. The first exposure unit 2 includes an elevating mechanism (not shown) that raises and lowers the exposure table 8 relative to the mask 10. When the exposure table 8 is raised toward the mask 10 by the elevating mechanism, the exposure table The mask 10 is in close contact with the first surface (upper surface) of the workpiece W placed on the substrate 8. When the light source 14 irradiates light (for example, ultraviolet light) in a wavelength band that exposes the photoresist layer of the work W with the work W and the mask 10 in close contact with each other, a predetermined pattern drawn on the mask 10 is formed on the work W. The photoresist layer on the first surface (upper surface) is exposed. A number of suction ports (not shown) are formed on the upper surface of the exposure table 8, and the work W is attracted and fixed to the surface of the exposure table 8 by sucking air through the suction ports.

反転部３は、第１露光部２によって第１面（上面）が露光されたワークＷの上下面を反転させる反転装置９を備えている。反転部３（反転装置９）によってワークＷの上下面を反転させると、露光済みのワークＷの第１面が下面を向き、未露光のワークＷの第２面が上面を向く。   The reversing unit 3 includes a reversing device 9 that reverses the upper and lower surfaces of the workpiece W whose first surface (upper surface) is exposed by the first exposure unit 2. When the upper and lower surfaces of the workpiece W are reversed by the reversing unit 3 (reversing device 9), the first surface of the exposed workpiece W faces the lower surface, and the second surface of the unexposed workpiece W faces the upper surface.

第２露光部４は、第１面（下面）が露光済みのワークＷの第２面（上面）に露光するための露光装置である。第２露光部４の構成は、第１露光部２の構成と同一であるため、同一の符号を付してその説明を省略する。   The second exposure unit 4 is an exposure apparatus for exposing the second surface (upper surface) of the workpiece W whose first surface (lower surface) has been exposed. Since the structure of the 2nd exposure part 4 is the same as the structure of the 1st exposure part 2, the same code | symbol is attached | subjected and the description is abbreviate | omitted.

排出部５は、第１露光部２と第４露光部４によって両面に露光が施されたワークＷを露光装置ＥＸの内部から外部へ搬出するための搬出口である。排出部５には、露光済みのワークＷを載置するためのステージ５ａが設けられており、ステージ５ａ上に載置されたワークＷが作業者または搬送装置（図示せず）によって搬出される。   The discharge unit 5 is a carry-out port for carrying out the work W that has been exposed on both sides by the first exposure unit 2 and the fourth exposure unit 4 from the inside of the exposure apparatus EX to the outside. The discharge unit 5 is provided with a stage 5a for placing the exposed workpiece W, and the workpiece W placed on the stage 5a is carried out by an operator or a transport device (not shown). .

露光装置ＥＸは、ワークＷを保持してこれを投入部１から第１露光部２そして反転部３へと移動させる第１ハンドラ（ワーク移動機構）６を備えている。第１ハンドラ６は、ワークＷを投入部１のステージ１ａから第１露光部２の露光テーブル８に移動させる搬入ハンドラ６ａと、ワークＷを第１露光部２の露光テーブル８から反転部３の反転装置９に移動させる搬出ハンドラ６ｂとを独立した構成要素として備えている。搬入ハンドラ６ａと搬出ハンドラ６ｂは、ワークＷを着脱自在に吸着する吸着パッドＰ（図２、図３）を備えている。搬入ハンドラ６ａと搬出ハンドラ６ｂは、後述する搬送フレーム２０によって図１中の左右方向に独立して移動可能となっている。   The exposure apparatus EX includes a first handler (work moving mechanism) 6 that holds the work W and moves the work W from the loading unit 1 to the first exposure unit 2 and the reversing unit 3. The first handler 6 includes a carry-in handler 6 a that moves the workpiece W from the stage 1 a of the loading unit 1 to the exposure table 8 of the first exposure unit 2, and a workpiece W that moves from the exposure table 8 of the first exposure unit 2 to the reversing unit 3. The carry-out handler 6b moved to the reversing device 9 is provided as an independent component. The carry-in handler 6a and the carry-out handler 6b include a suction pad P (FIGS. 2 and 3) that sucks the workpiece W in a detachable manner. The carry-in handler 6a and the carry-out handler 6b can be moved independently in the left-right direction in FIG.

露光装置ＥＸは、ワークＷを保持してこれを反転部３から第２露光部４そして排出部５へと移動させる第２ハンドラ（ワーク移動機構）７を備えている。第２ハンドラ７は、ワークＷを反転部３の反転装置９から第２露光部４の露光テーブル８に移動させる搬入ハンドラ７ａと、ワークＷを第２露光部４の露光テーブル８から排出部５のステージ５ａに移動させる搬出ハンドラ７ｂとを独立した構成要素として備えている。搬入ハンドラ７ａと搬出ハンドラ７ｂは、ワークＷを着脱自在に吸着する吸着パッドＰ（図２、図３）を備えている。搬入ハンドラ７ａと搬出ハンドラ７ｂは、後述する搬送フレーム２０によって図１中の左右方向に独立して移動可能となっている。   The exposure apparatus EX includes a second handler (work movement mechanism) 7 that holds the work W and moves the work W from the reversing unit 3 to the second exposure unit 4 and the discharge unit 5. The second handler 7 includes a carry-in handler 7 a that moves the work W from the reversing device 9 of the reversing unit 3 to the exposure table 8 of the second exposure unit 4, and the work W is discharged from the exposure table 8 of the second exposure unit 4. The unloading handler 7b to be moved to the stage 5a is provided as an independent component. The carry-in handler 7a and the carry-out handler 7b include a suction pad P (FIGS. 2 and 3) that sucks the workpiece W in a detachable manner. The carry-in handler 7a and the carry-out handler 7b can be moved independently in the left-right direction in FIG.

＜除塵装置の構成＞
第１露光部２及び第２露光部４にはそれぞれ同一構成の除塵装置（クリーニングユニット）１２が設けられている。図２、図３では、第１露光部２に設けられた除塵装置１２のみを描いており、第２露光部４の構成要素に対応する符号を括弧書きで示している。 <Configuration of dust removal device>
Each of the first exposure unit 2 and the second exposure unit 4 is provided with a dust removing device (cleaning unit) 12 having the same configuration. 2 and 3, only the dust removing device 12 provided in the first exposure unit 2 is illustrated, and the reference numerals corresponding to the components of the second exposure unit 4 are shown in parentheses.

図２、図３に示すように、除塵装置１２は、互いに対向する第１除塵装置１２ａと第２除塵装置１２ｂとを備えている。   As shown in FIGS. 2 and 3, the dust removing device 12 includes a first dust removing device 12 a and a second dust removing device 12 b that face each other.

第１除塵装置１２ａ及び第２除塵装置１２ｂは、第１露光部２（第２露光部４）内に配置された搬送フレーム２０によって保持されている。搬送フレーム２０は、ｙ方向（ワーク搬送方向）に延びる固定部材である一対のガイドレール２１、この一対のガイドレール２１によってｙ方向（ワーク搬送方向）にスライド自在に支持された一対のｙ方向移動テーブル２２、一対のガイドレール２１に跨るようにしてｙ方向移動テーブル２２に掛け渡されたｘ方向に延びる接続フレーム２３、一対のｙ方向移動テーブル２２によってｚ方向（重力方向）にスライド自在に支持された一対のｚ方向移動テーブル２５、及びこの一対のｚ方向移動テーブル２５からｙ方向に向けて互いに接近するように突出形成された一対のステー２６を備えている。一対のｚ方向移動テーブル２５は、ｚ方向（重力方向）に延びる固定部材である一対のガイドレール２４にスライド自在に支持されている。ｙ方向移動テーブル２２とｚ方向移動テーブル２５は、図示しないアクチュエータによってガイドレール２１とガイドレール２４に対してスライドして位置決めされる。   The first dust removing device 12a and the second dust removing device 12b are held by a transport frame 20 disposed in the first exposure unit 2 (second exposure unit 4). The transport frame 20 is a pair of guide rails 21 that are fixed members extending in the y direction (work transport direction), and a pair of y direction movements supported by the pair of guide rails 21 so as to be slidable in the y direction (work transport direction). A table 22, a connection frame 23 extending in the x direction spanning the y-direction moving table 22 across the pair of guide rails 21, and a pair of y-direction moving tables 22 are slidably supported in the z direction (gravity direction). The pair of z-direction moving tables 25 and a pair of stays 26 formed so as to protrude from the pair of z-direction moving tables 25 in the y direction are provided. The pair of z-direction moving tables 25 are slidably supported by a pair of guide rails 24 that are fixed members extending in the z direction (gravity direction). The y-direction moving table 22 and the z-direction moving table 25 are positioned by sliding with respect to the guide rail 21 and the guide rail 24 by an actuator (not shown).

第１除塵装置１２ａは、回転軸をｘ方向に向けた第１除塵ローラ１６ａを備えている。この第１除塵ローラ１６ａは、一対のステー２６の一方の先端部に回転自在に支持されている。第２除塵装置１２ｂは、回転軸をｘ方向に向けた第２除塵ローラ１６ｂを備えている。この第２除塵ローラ１６ｂは、一対のステー２６の他方の先端部に回転自在に支持されている。第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面には粘着材の層が形成されている。第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの材質は、除塵対象に合わせて適宜選択することができ、一般的にはシリコンゴム系の材質が選択される。   The first dust removing device 12a includes a first dust removing roller 16a having a rotation axis directed in the x direction. The first dust removing roller 16 a is rotatably supported at one end portion of the pair of stays 26. The second dust removing device 12b includes a second dust removing roller 16b having a rotation axis directed in the x direction. The second dust removing roller 16 b is rotatably supported at the other tip of the pair of stays 26. An adhesive layer is formed on the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b. The material of the first dust removing roller 16a and the second dust removing roller 16b can be appropriately selected according to the dust removal object, and generally a silicon rubber-based material is selected.

搬送フレーム２０は、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂを、除塵対象物であるワークＷ、露光テーブル８またはマスク１０の除塵表面に対して接離移動させるとともに、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周面を除塵対象物の除塵表面に接触させながら回転駆動して、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂと除塵対象物とを相対移動させる移動機構を構成する。搬送フレーム２０の移動に従動して、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが除塵対象物の除塵表面上を回転移動すると、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面の粘着材の粘着力により、除塵対象物の除塵表面上に付着している塵を絡め取ることができる。   The transport frame 20 moves the first dust removing roller 16a and the second dust removing roller 16b in contact with and away from the dust removing surface of the work W, the exposure table 8 or the mask 10 as the dust removing object, and the first dust removing roller 16a and The first dust removing roller 16a, the second dust removing roller 16b, and the dust removing object are moved relative to each other by rotating the peripheral surface of the second dust removing roller 16b in contact with the dust removing surface of the object to be removed. When the first dust removal roller 16a and the second dust removal roller 16b rotate and move on the dust removal surface of the dust removal object in accordance with the movement of the transport frame 20, the adhesion of the outer peripheral surfaces of the first dust removal roller 16a and the second dust removal roller 16b. Due to the adhesive force of the material, dust adhering to the dust removal surface of the dust removal object can be entangled.

露光装置ＥＸには、搬送フレーム（移動機構）２０による第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの駆動を制御する制御部１６ｃが備えられている。制御部１６ｃは、第１除塵ローラ１６ａによる除塵対象物上の転動と第２除塵ローラ１６ｂによる除塵対象物上の転動とを交互に行わせる。すなわち制御部１６ｃは、第１除塵ローラ１６ａと第２除塵ローラ１６ｂが同時に除塵対象物上を転動しないように搬送フレーム２０を制御する。これにより、除塵対象物上で第１除塵ローラ１６ａと第２除塵ローラ１６ｂが干渉するのを防止することができる。   The exposure apparatus EX includes a controller 16c that controls driving of the first dust removing roller 16a and the second dust removing roller 16b by the transport frame (moving mechanism) 20. The controller 16c causes the first dust removal roller 16a to alternately roll on the dust removal object and the second dust removal roller 16b to roll on the dust removal object. That is, the control unit 16c controls the transport frame 20 so that the first dust removing roller 16a and the second dust removing roller 16b do not roll on the dust removal object at the same time. Thereby, it can prevent that the 1st dust removal roller 16a and the 2nd dust removal roller 16b interfere on a dust removal target object.

図２、図３に示すように、搬送フレーム２０の一対の接続フレーム２３の一方と他方には第１ハンドラ６の搬入ハンドラ６ａと搬出ハンドラ６ｂ（第２ハンドラ７の搬入ハンドラ７ａと搬出ハンドラ７ｂ）がそれぞれ固定されており、第１除塵ローラ１６ａと搬入ハンドラ６ａ（搬入ハンドラ７ａ）及び第２除塵ローラ１６ｂと搬出ハンドラ６ｂ（搬出ハンドラ７ｂ）は一体となって移動する。すなわち搬送フレーム２０は、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂを移動させる移動機構を構成するとともに、第１ハンドラ６及び第２ハンドラ７と協働してワークＷを移動させるワーク移動機構を構成している（移動機構とワーク移動機構を兼ねている）。   As shown in FIGS. 2 and 3, one of the pair of connection frames 23 of the transport frame 20 has a carry-in handler 6 a and a carry-out handler 6 b of the first handler 6 (a carry-in handler 7 a and a carry-out handler 7 b of the second handler 7). ) Are fixed, and the first dust removing roller 16a and the carry-in handler 6a (carry-in handler 7a) and the second dust removing roller 16b and the carry-out handler 6b (carry-out handler 7b) move together. In other words, the transport frame 20 constitutes a moving mechanism that moves the first dust removing roller 16a and the second dust removing roller 16b, and a workpiece moving mechanism that moves the workpiece W in cooperation with the first handler 6 and the second handler 7. Consists of both (moving mechanism and work moving mechanism).

図１、図３、図４に示すように、露光装置ＥＸは、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面に付着した塵を集塵し外周面を清掃する転写ローラ（集塵装置）１８を備えている。転写ローラ１８は、第１露光部２及び第２露光部４に設けられたフレーム１７（搬送フレーム２０とは別個独立している）に支持されている。転写ローラ１８は、チェーンやギヤ等の公知の伝達装置を介して、駆動モータ２７によって回転駆動され、その外周面には、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂよりも強い粘着力を有するテープが巻かれている。第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂは、その清掃位置において転写ローラ１８に接触し、転写ローラ１８が回転することによって従動回転する。その結果、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面に付着していた塵は、転写ローラ１８の表面に転写されて回収される。このように転写ローラ１８によって回収された塵は、転写ローラ１８の外周面から粘着テープを一巻分剥ぎ取られることによって、廃棄される。また、剥ぎ取りや転写ローラ１８の交換の利便性のため、フレーム１７の基部にはガイドレール１９が設けられており、不図示のストッパーを外すことによって転写ローラ１８を作業者側に引き出すことが可能となっている。またフレーム１７には、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが清掃位置にあるとき、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの静電除去を行うための除電器２８が設けられている。   As shown in FIGS. 1, 3, and 4, the exposure apparatus EX collects dust adhering to the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b and cleans the outer peripheral surface (dust collecting unit). Device) 18. The transfer roller 18 is supported by a frame 17 (separate and independent from the transport frame 20) provided in the first exposure unit 2 and the second exposure unit 4. The transfer roller 18 is rotationally driven by a drive motor 27 via a known transmission device such as a chain or a gear, and has an adhesive force stronger than that of the first dust removing roller 16a and the second dust removing roller 16b on the outer peripheral surface thereof. Tape is wound. The first dust removing roller 16a and the second dust removing roller 16b come into contact with the transfer roller 18 at the cleaning position, and are driven to rotate as the transfer roller 18 rotates. As a result, the dust adhering to the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b is transferred to the surface of the transfer roller 18 and collected. The dust collected by the transfer roller 18 in this manner is discarded by peeling off the adhesive tape from the outer peripheral surface of the transfer roller 18 by one volume. Further, for the convenience of stripping and replacement of the transfer roller 18, a guide rail 19 is provided at the base of the frame 17, and the transfer roller 18 can be pulled out to the operator side by removing a stopper (not shown). It is possible. The frame 17 is provided with a static eliminator 28 for electrostatically removing the first dust removing roller 16a and the second dust removing roller 16b when the first dust removing roller 16a and the second dust removing roller 16b are in the cleaning position. Yes.

いま、図５、図６、図７を参照しながら、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周長（有効径）に注目する。図５は露光テーブル８に載置されたワークＷを除塵対象物とした場合、図６は露光テーブル８を除塵対象物とした場合、図７はマスク１０を除塵対象物とした場合をそれぞれ示している。   Now, with reference to FIGS. 5, 6, and 7, attention is paid to the circumferential lengths (effective diameters) of the first dust removing roller 16 a and the second dust removing roller 16 b. 5 shows a case where the workpiece W placed on the exposure table 8 is a dust removal object, FIG. 6 shows a case where the exposure table 8 is a dust removal object, and FIG. 7 shows a case where the mask 10 is a dust removal object. ing.

図５に示すように、除塵対象物であるワークＷの除塵表面ＷＳは、第１除塵表面（分割除塵表面）ＷＳ１と第２除塵表面（分割除塵表面）ＷＳ２とに均等に分割されており、第１除塵ローラ１６ａが第１除塵表面ＷＳ１上を転動し、第２除塵ローラ１６ｂが第２除塵表面ＷＳ２上を転動するようになっている。そして、第１除塵ローラ１６ａの周長１６ａｒは、第１除塵ローラ１６ａの周面と第１除塵表面ＷＳ１との接触移動距離（図５中の第１除塵表面ＷＳ１の幅）よりも長く設定されており、第２除塵ローラ１６ｂの周長１６ｂｒは、第２除塵ローラ１６ｂの周面と第２除塵表面ＷＳ２との接触移動距離（図５中の第２除塵表面ＷＳ２の幅）よりも長く設定されている。   As shown in FIG. 5, the dust removal surface WS of the work W that is a dust removal object is equally divided into a first dust removal surface (divided dust removal surface) WS1 and a second dust removal surface (divided dust removal surface) WS2. The first dust removing roller 16a rolls on the first dust removing surface WS1, and the second dust removing roller 16b rolls on the second dust removing surface WS2. The circumferential length 16ar of the first dust removal roller 16a is set to be longer than the contact movement distance between the circumferential surface of the first dust removal roller 16a and the first dust removal surface WS1 (the width of the first dust removal surface WS1 in FIG. 5). The peripheral length 16br of the second dust removing roller 16b is set to be longer than the contact movement distance between the peripheral surface of the second dust removing roller 16b and the second dust removing surface WS2 (the width of the second dust removing surface WS2 in FIG. 5). Has been.

図６に示すように、除塵対象物である露光テーブル８の除塵表面８Ｓは、第１除塵表面（分割除塵表面）８Ｓ１と第２除塵表面（分割除塵表面）８Ｓ２とに均等に分割されており、第１除塵ローラ１６ａが第１除塵表面８Ｓ１上を転動し、第２除塵ローラ１６ｂが第２除塵表面８Ｓ２上を転動するようになっている。そして、第１除塵ローラ１６ａの周長１６ａｒは、第１除塵ローラ１６ａの周面と第１除塵表面８Ｓ１との接触移動距離（図６中の第１除塵表面８Ｓ１の幅）よりも長く設定されており、第２除塵ローラ１６ｂの周長１６ｂｒは、第２除塵ローラ１６ｂの周面と第２除塵表面８Ｓ２との接触移動距離（図６中の第２除塵表面８Ｓ２の幅）よりも長く設定されている。   As shown in FIG. 6, the dust removal surface 8S of the exposure table 8 that is a dust removal object is equally divided into a first dust removal surface (divided dust removal surface) 8S1 and a second dust removal surface (divided dust removal surface) 8S2. The first dust removing roller 16a rolls on the first dust removing surface 8S1, and the second dust removing roller 16b rolls on the second dust removing surface 8S2. The circumferential length 16ar of the first dust removal roller 16a is set to be longer than the contact movement distance between the circumferential surface of the first dust removal roller 16a and the first dust removal surface 8S1 (the width of the first dust removal surface 8S1 in FIG. 6). The circumferential length 16br of the second dust removing roller 16b is set longer than the contact movement distance between the circumferential surface of the second dust removing roller 16b and the second dust removing surface 8S2 (the width of the second dust removing surface 8S2 in FIG. 6). Has been.

図７に示すように、除塵対象物であるマスク１０の除塵表面１０Ｓは、第１除塵表面（分割除塵表面）１０Ｓ１と第２除塵表面（分割除塵表面）１０Ｓ２とに均等に分割されており、第１除塵ローラ１６ａが第１除塵表面１０Ｓ１上を転動し、第２除塵ローラ１６ｂが第２除塵表面１０Ｓ２上を転動するようになっている。そして、第１除塵ローラ１６ａの周長１６ａｒは、第１除塵ローラ１６ａの周面と第１除塵表面１０Ｓ１との接触移動距離（図７中の第１除塵表面１０Ｓ１の幅）よりも長く設定されており、第２除塵ローラ１６ｂの周長１６ｂｒは、第２除塵ローラ１６ｂの周面と第２除塵表面１０Ｓ２との接触移動距離（図７中の第２除塵表面１０Ｓ２の幅）よりも長く設定されている。   As shown in FIG. 7, the dust removal surface 10S of the mask 10 that is the dust removal object is equally divided into a first dust removal surface (divided dust removal surface) 10S1 and a second dust removal surface (divided dust removal surface) 10S2. The first dust removing roller 16a rolls on the first dust removing surface 10S1, and the second dust removing roller 16b rolls on the second dust removing surface 10S2. The circumferential length 16ar of the first dust removal roller 16a is set to be longer than the contact movement distance between the circumferential surface of the first dust removal roller 16a and the first dust removal surface 10S1 (width of the first dust removal surface 10S1 in FIG. 7). The peripheral length 16br of the second dust removing roller 16b is set to be longer than the contact movement distance between the peripheral surface of the second dust removing roller 16b and the second dust removing surface 10S2 (width of the second dust removing surface 10S2 in FIG. 7). Has been.

したがって、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが除塵対象物の除塵表面を転動して除塵するとき、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周面上の同一部分が除塵対象物の除塵表面に二度接触することがない（第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが１回転未満の転動で除塵する）。このため、除塵中に第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂに一旦付着して除去された塵が除塵対象物に再付着するおそれがなく、再付着に起因する露光欠陥や現像欠陥を未然に防止することができる。   Therefore, when the first dust removal roller 16a and the second dust removal roller 16b roll on the dust removal surface of the dust removal object, the same portions on the peripheral surfaces of the first dust removal roller 16a and the second dust removal roller 16b are the dust removal object. It does not contact the dust removal surface of the object twice (the first dust removal roller 16a and the second dust removal roller 16b remove dust by rolling less than one rotation). For this reason, there is no possibility that the dust once attached to and removed from the first dust removing roller 16a and the second dust removing roller 16b during dust removal will reattach to the object to be removed, and exposure defects and development defects due to reattachment will not occur. Can be prevented.

＜露光装置の除塵装置の動作＞
図８ないし図１４を参照して、本実施形態の露光装置ＥＸの除塵装置１２の動作を説明する。ここでは、第１露光部２のマスク１０と露光テーブル８を除塵対象物として、マスク１０を除塵した後に露光テーブル８を除塵する場合を例示して説明する。 <Operation of dust removing device of exposure device>
The operation of the dust removing device 12 of the exposure apparatus EX of the present embodiment will be described with reference to FIGS. Here, the case where the mask 10 and the exposure table 8 of the first exposure unit 2 are used as dust removal objects and the exposure table 8 is removed after the mask 10 is removed will be described as an example.

まず、作業者または搬送装置（図示せず）によって搬入された未露光のワークＷが投入部１のステージ１ａに載置される。次いで、第１ハンドラ６の搬入ハンドラ６ａによってワークＷが投入部１のステージ１ａから第１露光部２の露光テーブル８に移動される。露光テーブル８に移動されたワークＷは、露光テーブル８の上面に形成された吸引口（図示せず）によって吸着固定される。次いで、昇降機構（図示せず）によって露光テーブル８をマスク１０に向けて上昇させて、露光テーブル８に載置されたワークＷの第１面（上面）にマスク１０を密着させる。次いで、この密着状態で、光源１４によってワークＷのフォトレジスト層を感光させる波長帯域の光（例えば紫外光）を照射することにより、マスク１０に描かれた所定のパターンをワークＷの第１面（上面）のフォトレジスト層に露光する。次いで、昇降機構（図示せず）によって露光テーブル８をその上面がパスレベルと面一となるまで下降させるとともに（図１）、露光テーブル８の吸引口（図示せず）によるワークＷの吸着を解除する。そして、第１ハンドラ６の搬出ハンドラ６ｂによってワークＷを第１露光部２の露光テーブル８から反転部３の反転装置９に移動させる。   First, an unexposed workpiece W carried in by an operator or a transfer device (not shown) is placed on the stage 1 a of the loading unit 1. Next, the work W is moved from the stage 1 a of the loading unit 1 to the exposure table 8 of the first exposure unit 2 by the carry-in handler 6 a of the first handler 6. The workpiece W moved to the exposure table 8 is adsorbed and fixed by a suction port (not shown) formed on the upper surface of the exposure table 8. Next, the exposure table 8 is raised toward the mask 10 by an elevating mechanism (not shown), and the mask 10 is brought into close contact with the first surface (upper surface) of the workpiece W placed on the exposure table 8. Next, in this close contact state, the light source 14 irradiates light (for example, ultraviolet light) in a wavelength band that sensitizes the photoresist layer of the work W, whereby a predetermined pattern drawn on the mask 10 is formed on the first surface of the work W. The (upper surface) photoresist layer is exposed. Next, the exposure table 8 is lowered by an elevating mechanism (not shown) until the upper surface thereof is flush with the pass level (FIG. 1), and the work W is adsorbed by the suction port (not shown) of the exposure table 8. To release. Then, the work W is moved from the exposure table 8 of the first exposure unit 2 to the reversing device 9 of the reversing unit 3 by the carry-out handler 6 b of the first handler 6.

ワークＷが反転部３の反転装置９に移動した後に、除塵装置１２による第１露光部２のマスク１０と露光テーブル８の除塵作業が実行される。   After the workpiece W has moved to the reversing device 9 of the reversing unit 3, the dust removal operation of the mask 10 of the first exposure unit 2 and the exposure table 8 by the dust removing device 12 is performed.

まず、図８に示すように、第１除塵装置１２ａ及び第２除塵装置１２ｂを初期位置に移動させた後、搬送アーム２０によって第１除塵装置１２ａの第１除塵ローラ１６ａを駆動することで、第１除塵ローラ１６ａに第１除塵表面１０Ｓ１上を転動させて、マスク１０の第１除塵表面１０Ｓ１を除塵する。   First, as shown in FIG. 8, after the first dust removing device 12a and the second dust removing device 12b are moved to the initial position, the first dust removing roller 16a of the first dust removing device 12a is driven by the transfer arm 20, The first dust removing roller 16a rolls on the first dust removing surface 10S1, and dust is removed from the first dust removing surface 10S1 of the mask 10.

次いで、図９に示すように、搬送アーム２０によって第１除塵ローラ１６ａを転写ローラ１８と接触する清掃位置に移動させ、転写ローラ１８を回転させることで第１除塵ローラ１６ａの清掃を開始する。同時に、搬送アーム２０によって第２除塵装置１２ｂの第２除塵ローラ１６ｂを駆動することで、第２除塵ローラ１６ｂに第２除塵表面１０Ｓ２上を転動させて、マスク１０の第２除塵表面１０Ｓ２を除塵する。   Next, as shown in FIG. 9, the first dust removal roller 16 a is moved to the cleaning position where the transfer arm 20 comes into contact with the transfer roller 18, and the transfer roller 18 is rotated to start cleaning the first dust removal roller 16 a. At the same time, the second dust removing roller 16b of the second dust removing device 12b is driven by the transport arm 20 so that the second dust removing roller 16b rolls on the second dust removing surface 10S2, and the second dust removing surface 10S2 of the mask 10 is moved. Remove dust.

次いで、図１０に示すように、搬送アーム２０によって第２除塵ローラ１６ｂを転写ローラ１８と接触する清掃位置に移動させ、転写ローラ１８を回転させることで第２除塵ローラ１６ｂの清掃を開始する。   Next, as shown in FIG. 10, the second dust removal roller 16 b is moved to a cleaning position in contact with the transfer roller 18 by the transport arm 20, and the transfer roller 18 is rotated to start cleaning the second dust removal roller 16 b.

図１１に示すように、第１除塵ローラ１６ａの清掃が終了すると、第２除塵ローラ１６ｂの清掃を継続したまま、搬送アーム２０によって第１除塵装置１２ａの第１除塵ローラ１６ａを駆動することで、第１除塵ローラ１６ａに第１除塵表面８Ｓ１上を転動させて、露光テーブル８の第１除塵表面８Ｓ１を除塵する。露光テーブル８の第１除塵表面８Ｓ１を除塵している間に、第２除塵ローラ１６ｂの清掃が終了する。   As shown in FIG. 11, when the cleaning of the first dust removing roller 16a is finished, the first dust removing roller 16a of the first dust removing device 12a is driven by the transport arm 20 while the cleaning of the second dust removing roller 16b is continued. Then, the first dust removing roller 16a rolls on the first dust removing surface 8S1, and dust is removed from the first dust removing surface 8S1 of the exposure table 8. While the first dust removing surface 8S1 of the exposure table 8 is dusted, the cleaning of the second dust removing roller 16b is finished.

次いで、図１２に示すように、搬送アーム２０によって第１除塵ローラ１６ａを転写ローラ１８と接触する清掃位置に移動させ、転写ローラ１８を回転させることで第１除塵ローラ１６ａの清掃を開始する。同時に、搬送アーム２０によって第２除塵装置１２ｂの第２除塵ローラ１６ｂを駆動することで、第２除塵ローラ１６ｂに第２除塵表面８Ｓ２上を転動させて、露光テーブル８の第２除塵表面８Ｓ２を除塵する。   Next, as shown in FIG. 12, the first dust removal roller 16 a is moved to the cleaning position where the transfer arm 18 comes into contact with the transfer arm 20, and the transfer roller 18 is rotated to start cleaning the first dust removal roller 16 a. At the same time, the second dust removing roller 16b of the second dust removing device 12b is driven by the transfer arm 20 to cause the second dust removing roller 16b to roll on the second dust removing surface 8S2, and thereby the second dust removing surface 8S2 of the exposure table 8. Remove dust.

次いで、図１３に示すように、搬送アーム２０によって第２除塵ローラ１６ｂを転写ローラ１８と接触する清掃位置に移動させ、転写ローラ１８を回転させることで第２除塵ローラ１６ｂの清掃を開始する。   Next, as shown in FIG. 13, the second dust removal roller 16 b is moved to a cleaning position in contact with the transfer roller 18 by the transport arm 20, and the transfer roller 18 is rotated to start cleaning the second dust removal roller 16 b.

最後に、図１４に示すように、第１除塵ローラ１６ａの清掃が終了して第１除塵装置１２ａを初期位置に移動させ、その後、第２除塵ローラ１６ｂの清掃が終了して第２除塵装置１２ｂを初期位置に移動させる。   Finally, as shown in FIG. 14, the cleaning of the first dust removing roller 16a is finished and the first dust removing device 12a is moved to the initial position, and then the cleaning of the second dust removing roller 16b is finished and the second dust removing device is finished. 12b is moved to the initial position.

以上説明したように、本実施形態の露光装置ＥＸの除塵方法では、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂによる除塵対象物の除塵工程と、除塵工程が終了した第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周面を転写ローラ１８によって清掃する清掃工程とを交互に実行する。   As described above, in the dust removal method of the exposure apparatus EX of the present embodiment, the dust removal object dust removal process by the first dust removal roller 16a and the second dust removal roller 16b, and the first dust removal roller 16a and the first dust removal roller 16a after the dust removal process are completed. 2. The cleaning process of cleaning the peripheral surface of the dust removing roller 16b by the transfer roller 18 is executed alternately.

ここでは、第１露光部２における除塵動作を説明したが、第２露光部４においても全く同様の除塵動作が行われる。第１露光部２及び第２露光部４において除塵を行うタイミングは、露光テーブル８とマスク１０の間に空間ができるタイミングであればよく、予め一定の露光サイクルで除塵を開始する態様、あるいは任意の露光が完了してワークＷが排出したタイミングで除塵を開始する態様が可能である。   Although the dust removal operation in the first exposure unit 2 has been described here, the same dust removal operation is performed in the second exposure unit 4 as well. The timing at which dust removal is performed in the first exposure unit 2 and the second exposure unit 4 may be any timing that allows a space between the exposure table 8 and the mask 10. It is possible to start the dust removal at the timing when the work W is discharged after the exposure is completed.

また第１露光部２及び第２露光部４において除塵を行う順序はあくまで一例であってこれに限定されるものではない。例えば、第２除塵装置１２ｂ（第２除塵ローラ１６ｂ）による除塵を先に行って、第１除塵装置１２ａ（第１除塵ローラ１６ａ）による除塵を後に行ってもよい。また露光テーブル８の除塵を先に行って、マスク１０の除塵を後に行ってもよい。さらには第１除塵装置１２ａ（第１除塵ローラ１６ａ）と第２除塵装置１２ｂ（第２除塵ローラ１６ｂ）が同時に除塵動作を開始してもよい。   The order of dust removal in the first exposure unit 2 and the second exposure unit 4 is merely an example, and is not limited to this. For example, the dust removal by the second dust removal device 12b (second dust removal roller 16b) may be performed first, and the dust removal by the first dust removal device 12a (first dust removal roller 16a) may be performed later. Alternatively, the exposure table 8 may be dedusted first, and the mask 10 may be dedusted later. Further, the first dust removing device 12a (first dust removing roller 16a) and the second dust removing device 12b (second dust removing roller 16b) may start the dust removing operation simultaneously.

このように本実施形態によれば、第１除塵ローラ１６ａの周長１６ａｒを、第１除塵ローラ１６ａの周面と除塵対象物の第１除塵表面（ＷＳ１、８Ｓ１、１０Ｓ１）との接触移動距離よりも長く設定し、第２除塵ローラ１６ｂの周長１６ｂｒを、第２除塵ローラ１６ｂの周面と除塵対象物の第２除塵表面（ＷＳ２、８Ｓ２、１０Ｓ２）との接触移動距離よりも長く設定している。したがって、１回の除塵工程において、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが除塵対象物の除塵表面を転動して除塵するとき、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周面上の同一部分が除塵対象物の除塵表面に二度接触することがない（第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂが１回転未満の転動で除塵する）。このため、除塵中に第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂに一旦付着して除去された塵が除塵対象物に再付着するおそれがなく、再付着に起因する露光欠陥や現像欠陥を未然に防止することができる。   As described above, according to the present embodiment, the peripheral length 16ar of the first dust removing roller 16a is set as the contact movement distance between the peripheral surface of the first dust removing roller 16a and the first dust removing surface (WS1, 8S1, 10S1) of the dust removing object. The peripheral length 16br of the second dust removing roller 16b is set longer than the contact movement distance between the peripheral surface of the second dust removing roller 16b and the second dust removing surface (WS2, 8S2, 10S2) of the dust removing object. doing. Therefore, when the first dust removing roller 16a and the second dust removing roller 16b roll on the dust removing surface of the dust removing object to remove dust in one dust removing step, the peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b. The same upper part does not contact the dust removal surface of the dust removal object twice (the first dust removal roller 16a and the second dust removal roller 16b remove dust by rolling less than one rotation). For this reason, there is no possibility that the dust once attached to and removed from the first dust removing roller 16a and the second dust removing roller 16b during dust removal will reattach to the object to be removed, and exposure defects and development defects due to reattachment will not occur. Can be prevented.

以上の実施形態では、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの２つの除塵ローラを設けた場合を例示して説明したが、単一の除塵対象物の全除塵表面上を転動する単一の除塵ローラを設ける態様も可能である。この場合、単一の除塵ローラの周長（有効径）を、単一の除塵ローラの周面と除塵対象物の除塵表面との接触移動距離よりも長く設定する。   In the above embodiment, the case where the two dust removing rollers, that is, the first dust removing roller 16a and the second dust removing roller 16b are provided has been described as an example, but the single dust rolling object is simply rolled on the entire dust removing surface. A mode in which one dust removing roller is provided is also possible. In this case, the circumferential length (effective diameter) of the single dust removing roller is set longer than the contact movement distance between the circumferential surface of the single dust removing roller and the dust removing surface of the dust removing object.

以上の実施形態では、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの２つの除塵ローラを設けた場合を例示して説明したが、３つ以上の除塵ローラを設ける態様も可能である。この場合、各除塵ローラの周長（有効径）を、各除塵ローラの周面と除塵対象物の各分割除塵表面との接触移動距離よりも長くする。   In the above embodiment, the case where two dust removing rollers, the first dust removing roller 16a and the second dust removing roller 16b, are described as an example. However, an embodiment in which three or more dust removing rollers are provided is also possible. In this case, the circumferential length (effective diameter) of each dust removal roller is made longer than the contact movement distance between the circumferential surface of each dust removal roller and each divided dust removal surface of the dust removal object.

以上の実施形態では、マスクとワーク（感光性基板）を密着させて露光するコンタクト露光方式によりワークの両面に逐次露光するタイプの露光装置ＥＸを例示して説明したが、本発明の適用対象はこれに限定されるものではない。例えば本発明は、コンタクト露光方式の他にも、マスクとワークが近接しかつ非接触のプロキシミティギャップ方式、マスクを持たず、光を変調しながら走査しパターンを直接描画するダイレクト露光方式、マスクと基板の間に投影光学系が設けられるプロジェクション方式等の各種の方式の露光装置に適用することができる。また本発明は、ワークの両面を同時に露光する両面同時露光方式やワークの片面のみに露光する片面露光方式の露光装置に適用することができる。   In the above embodiment, the exposure apparatus EX of the type that sequentially exposes both sides of the workpiece by the contact exposure method in which the mask and the workpiece (photosensitive substrate) are in close contact with each other has been described as an example. It is not limited to this. For example, in the present invention, in addition to the contact exposure method, the proximity gap method in which the mask and the workpiece are close and non-contact, the direct exposure method in which the mask is not provided and the pattern is directly drawn by scanning while modulating the light, the mask The present invention can be applied to various types of exposure apparatuses such as a projection method in which a projection optical system is provided between the substrate and the substrate. The present invention can also be applied to a double-sided simultaneous exposure method in which both surfaces of a workpiece are simultaneously exposed and a single-sided exposure method in which only one surface of a workpiece is exposed.

以上の実施形態では、ワークを水平方向に搬送しながら露光を行う横型露光装置を例示して説明したが、ワークを鉛直方向に搬送しながら露光を行う縦型露光装置にも本発明は適用可能である。   In the above embodiment, the horizontal exposure apparatus that performs exposure while conveying the workpiece in the horizontal direction has been described as an example. However, the present invention can also be applied to a vertical exposure apparatus that performs exposure while conveying the workpiece in the vertical direction. It is.

以上の実施形態では、ワーク（感光性基板）、露光テーブルまたはマスクを除塵対象物とした場合を例示して説明したが、露光装置の内部において塵が付着し得るあらゆる部材を除塵対象物とすることができる。   In the above embodiment, the case where the workpiece (photosensitive substrate), the exposure table, or the mask is the dust removal target object has been described as an example. However, any member to which dust can adhere inside the exposure apparatus is the dust removal target object. be able to.

以上の実施形態では、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂに付着した塵を集塵する転写ローラ（集塵装置）１８を用いた場合を例示して説明した。しかし転写ローラ（集塵装置）１８を省略して、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂによる除塵動作が終了する度に、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面から粘着材（粘着テープ）を一巻分剥ぎ取る態様も可能である。この態様では、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの外周面から粘着材（粘着テープ）を剥ぎ取る度にその周長が小さくなっていくので、粘着材（粘着テープ）の巻き量が最も少ない状態を基準として、第１除塵ローラ１６ａ及び第２除塵ローラ１６ｂの周長を設定する。   In the above embodiment, the case where the transfer roller (dust collecting device) 18 that collects dust attached to the first dust removing roller 16a and the second dust removing roller 16b is used has been described as an example. However, the transfer roller (dust collecting device) 18 is omitted, and each time the dust removing operation by the first dust removing roller 16a and the second dust removing roller 16b is completed, the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b are adhered. A mode in which the material (adhesive tape) is peeled off by one volume is also possible. In this aspect, the circumference decreases as the adhesive material (adhesive tape) is peeled off from the outer peripheral surfaces of the first dust removal roller 16a and the second dust removal roller 16b, so the winding amount of the adhesive material (adhesive tape) is reduced. The circumferential lengths of the first dust removing roller 16a and the second dust removing roller 16b are set based on the smallest state.

ＥＸ 露光装置
Ｗ ワーク（感光性基板、除塵対象物）
ＷＳ 除塵表面
ＷＳ１ 第１除塵表面（分割除塵表面）
ＷＳ２ 第２除塵表面（分割除塵表面）
１ 投入部
１ａ ステージ
２ 第１露光部
３ 反転部
４ 第２露光部
５ 排出部
５ａ ステージ
６ 第１ハンドラ（ワーク移動機構）
６ａ 搬入ハンドラ
６ｂ 搬出ハンドラ
７ 第２ハンドラ（ワーク移動機構）
７ａ 搬入ハンドラ
７ｂ 搬出ハンドラ
８ 露光テーブル（除塵対象物）
８Ｓ 除塵表面
８Ｓ１ 第１除塵表面（分割除塵表面）
８Ｓ２ 第２除塵表面（分割除塵表面）
９ 反転装置
１０ マスク（除塵対象物）
１０Ｓ 除塵表面
１０Ｓ１ 第１除塵表面（分割除塵表面）
１０Ｓ２ 第２除塵表面（分割除塵表面）
１２ 除塵装置（クリーニングユニット）
１２ａ 第１除塵装置
１２ｂ 第２除塵装置
１４ 光源
１６ａ 第１除塵ローラ
１６ａｒ 第１除塵ローラの周長（有効径）
１６ｂ 第２除塵ローラ
１６ｂｒ 第２除塵ローラの周長（有効径）
１６ｃ 制御部
１７ フレーム
１８ 転写ローラ（集塵装置）
１９ ガイドレール
２０ 搬送フレーム（移動機構、ワーク移動機構）
２１ ガイドレール
２２ ｙ方向移動テーブル
２３ 接続フレーム
２４ ガイドレール
２５ ｚ方向移動テーブル
２６ ステー
２７ 駆動モータ
２８ 除電器 EX exposure equipment W Workpiece (photosensitive substrate, dust removal object)
WS dust removal surface WS1 first dust removal surface (split dust removal surface)
WS2 Second dust removal surface (split dust removal surface)
DESCRIPTION OF SYMBOLS 1 Input part 1a Stage 2 1st exposure part 3 Inversion part 4 2nd exposure part 5 Discharge part 5a Stage 6 1st handler (work movement mechanism)
6a Carry-in handler 6b Carry-out handler 7 Second handler (work movement mechanism)
7a Carry-in handler 7b Carry-out handler 8 Exposure table (dust removal target)
8S dust removal surface 8S1 first dust removal surface (split dust removal surface)
8S2 Second dust removal surface (split dust removal surface)
9 Reversing device 10 Mask (dust removal object)
10S dust removal surface 10S1 first dust removal surface (split dust removal surface)
10S2 Second dust removal surface (split dust removal surface)
12 Dust removal device (cleaning unit)
12a First dust removing device 12b Second dust removing device 14 Light source 16a First dust removing roller 16ar Perimeter of the first dust removing roller (effective diameter)
16b Second dust removing roller 16br Perimeter of second dust removing roller (effective diameter)
16c Control unit 17 Frame 18 Transfer roller (dust collector)
19 Guide rail 20 Transport frame (moving mechanism, workpiece moving mechanism)
21 guide rail 22 y-direction moving table 23 connection frame 24 guide rail 25 z-direction moving table 26 stay 27 drive motor 28 static eliminator

Claims (9)

感光性基板に対してパターンを露光する露光装置において、
周面により、前記露光装置内の除塵対象物の除塵表面に接離可能な除塵ローラと、
前記除塵ローラの周面を前記除塵対象物の除塵表面に接触させながら、前記除塵ローラが回転するように、前記除塵ローラと除塵対象物とを相対移動させる移動機構と、を備え、
前記除塵ローラの周長は、前記移動機構による前記除塵ローラの周面と前記除塵対象物の除塵表面との接触移動距離よりも長く設定されていることを特徴とする露光装置の除塵装置。 In an exposure apparatus that exposes a pattern to a photosensitive substrate,
A dust removing roller capable of coming into contact with and separating from a dust removing surface of a dust removing object in the exposure apparatus by a peripheral surface;
A moving mechanism for moving the dust removal roller and the dust removal object relative to each other so that the dust removal roller rotates while the peripheral surface of the dust removal roller is in contact with the dust removal surface of the dust removal object,
The dust removing device of the exposure apparatus, wherein a circumferential length of the dust removing roller is set longer than a contact moving distance between a circumferential surface of the dust removing roller and a dust removing surface of the dust removing object by the moving mechanism. 請求項１記載の露光装置の除塵装置において、
前記除塵ローラは、単一の除塵対象物の除塵表面を複数に分割した分割除塵表面上を転動するように複数が備えられており、
各除塵ローラの周長は、各除塵ローラの周面と各分割除塵表面との接触移動距離よりも長く設定されている露光装置の除塵装置。 In the dust removal apparatus of the exposure apparatus according to claim 1,
A plurality of the dust removing rollers are provided so as to roll on a divided dust removing surface obtained by dividing a dust removing surface of a single dust removing object into a plurality of parts,
The perimeter of each dust removal roller is a dust removal device of an exposure apparatus that is set longer than the contact movement distance between the peripheral surface of each dust removal roller and each divided dust removal surface. 請求項２記載の露光装置の除塵装置において、
前記除塵ローラは、単一の除塵対象物の除塵表面を２つに分割した第１、第２の分割除塵表面上を転動するように、第１、第２の除塵ローラを備えており、
前記第１の除塵ローラの周長は、前記第１の除塵ローラの周面と前記第１の分割除塵表面との接触移動距離よりも長く設定されており、
前記第２の除塵ローラの周長は、前記第２の除塵ローラの周面と前記第２の分割除塵表面との接触移動距離よりも長く設定されている露光装置の除塵装置。 The dust removal apparatus for an exposure apparatus according to claim 2,
The dust removal roller includes first and second dust removal rollers so as to roll on the first and second divided dust removal surfaces obtained by dividing the dust removal surface of a single dust removal object into two parts,
The circumferential length of the first dust removing roller is set to be longer than the contact movement distance between the circumferential surface of the first dust removing roller and the first divided dust removing surface,
The peripheral length of the second dust removing roller is a dust removing device of the exposure apparatus that is set to be longer than a contact moving distance between the peripheral surface of the second dust removing roller and the second divided dust removing surface. 請求項３記載の露光装置の除塵装置において、
前記第１の除塵ローラの前記第１の分割除塵表面上の転動と、前記第２の除塵ローラの前記第２の分割除塵表面上の転動とを交互に行わせる制御部をさらに備えている露光装置の除塵装置。 In the dust removal apparatus of the exposure apparatus according to claim 3,
And a controller that alternately performs rolling on the first divided dust removing surface of the first dust removing roller and rolling on the second divided dust removing surface of the second dust removing roller. Dust removal device for exposure equipment. 請求項１記載の露光装置の除塵装置において、
前記除塵ローラは、単一の除塵対象物の全除塵表面上を転動する単一ローラからなっている露光装置の除塵装置。 In the dust removal apparatus of the exposure apparatus according to claim 1,
The dust removing roller is a dust removing device of an exposure apparatus that is composed of a single roller that rolls on the entire dust removing surface of a single dust removing object. 請求項１ないし５のいずれか１項記載の露光装置の除塵装置において、
前記移動機構は、感光性基板を保持して移動させるワーク移動機構を兼ねている露光装置の除塵装置。 The dust removal apparatus for an exposure apparatus according to any one of claims 1 to 5,
The moving mechanism is a dust removing device of an exposure apparatus that also serves as a workpiece moving mechanism that holds and moves the photosensitive substrate. 請求項１ないし６のいずれか１項記載の露光装置の除塵装置において、
前記除塵対象物は、感光性基板、露光テーブル及びマスクの１つ以上を含んでいる露光装置の除塵装置。 In the dust removal apparatus of the exposure apparatus according to any one of claims 1 to 6,
The dust removal object is a dust removal apparatus of an exposure apparatus including one or more of a photosensitive substrate, an exposure table, and a mask. 請求項１ないし７のいずれか１項記載の露光装置の除塵装置において、
前記除塵ローラに付着した塵を集塵する集塵装置をさらに備えている露光装置の除塵装置。 In the dust removal apparatus of the exposure apparatus according to any one of claims 1 to 7,
A dust removing device for an exposure apparatus, further comprising a dust collecting device for collecting dust adhering to the dust removing roller. 除塵ローラをその周面を露光装置内の除塵対象物の除塵表面に接触させながら転動させて除塵する除塵工程と、
除塵工程が終了した前記除塵ローラの周面を清掃する清掃工程と、を交互に実行する露光装置の除塵方法において、
１回の除塵工程においては、前記除塵ローラの周面上の同一部分を前記除塵対象物の除塵表面に二度接触させることなく除塵することを特徴とする露光装置の除塵方法。 A dust removal step of removing dust by rolling the dust removal roller while bringing its peripheral surface into contact with the dust removal surface of the dust removal object in the exposure apparatus;
In a dust removal method for an exposure apparatus that alternately executes a cleaning process for cleaning the peripheral surface of the dust removal roller after the dust removal process is completed,
In one dust removal process, the dust removal method of the exposure apparatus is characterized in that dust removal is performed without bringing the same portion on the circumferential surface of the dust removal roller into contact with the dust removal surface of the dust removal object twice.
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CN104508561B (en) 2016-09-21
CN104508561A (en) 2015-04-08
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JP5893537B2 (en) 2016-03-23
KR102062419B1 (en) 2020-01-03

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