KR102023781B1 - 착색제 분산액 - Google Patents

착색제 분산액 Download PDF

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Publication number
KR102023781B1
KR102023781B1 KR1020130038036A KR20130038036A KR102023781B1 KR 102023781 B1 KR102023781 B1 KR 102023781B1 KR 1020130038036 A KR1020130038036 A KR 1020130038036A KR 20130038036 A KR20130038036 A KR 20130038036A KR 102023781 B1 KR102023781 B1 KR 102023781B1
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KR
South Korea
Prior art keywords
group
mass
parts
resin
solvent
Prior art date
Application number
KR1020130038036A
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English (en)
Korean (ko)
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KR20130115141A (ko
Inventor
소연 박
야스키 다츠미
용호 오
Original Assignee
스미또모 가가꾸 가부시키가이샤
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Publication of KR20130115141A publication Critical patent/KR20130115141A/ko
Application granted granted Critical
Publication of KR102023781B1 publication Critical patent/KR102023781B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
KR1020130038036A 2012-04-10 2013-04-08 착색제 분산액 KR102023781B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-089566 2012-04-10
JP2012089566 2012-04-10

Publications (2)

Publication Number Publication Date
KR20130115141A KR20130115141A (ko) 2013-10-21
KR102023781B1 true KR102023781B1 (ko) 2019-09-20

Family

ID=49363099

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130038036A KR102023781B1 (ko) 2012-04-10 2013-04-08 착색제 분산액

Country Status (4)

Country Link
JP (1) JP6192968B2 (zh)
KR (1) KR102023781B1 (zh)
CN (1) CN103360790B (zh)
TW (1) TWI613260B (zh)

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JP2014059538A (ja) * 2012-08-23 2014-04-03 Nippon Kayaku Co Ltd 着色樹脂組成物
CN105408427A (zh) * 2013-05-31 2016-03-16 东友精细化工有限公司 化合物和着色固化性树脂组合物
KR102031127B1 (ko) * 2013-10-03 2019-10-11 동우 화인켐 주식회사 염료 분산액
CN106537239B (zh) * 2014-08-06 2018-05-25 Dic株式会社 液晶显示装置
TWI674477B (zh) 2014-12-25 2019-10-11 日商富士軟片股份有限公司 著色硬化性組成物、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
JP6699999B2 (ja) * 2015-02-26 2020-05-27 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ及び表示装置
CN106019836B (zh) * 2015-03-27 2021-08-27 东友精细化工有限公司 着色固化性树脂组合物
JP6722442B2 (ja) * 2015-12-21 2020-07-15 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 化合物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
KR102383698B1 (ko) * 2016-03-28 2022-04-05 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN107780243A (zh) * 2016-08-30 2018-03-09 江苏吉华化工有限公司 一种高性能聚醚醚酮纤维制品用分散染料体系的制备方法
JP6931575B2 (ja) * 2016-11-16 2021-09-08 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色組成物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
KR102027036B1 (ko) * 2017-11-28 2019-09-30 주식회사 엘지화학 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
JP2019164342A (ja) * 2018-03-15 2019-09-26 三菱ケミカル株式会社 色材分散液、着色樹脂組成物、硬化物及び画像表示装置
JP7203627B2 (ja) * 2019-02-08 2023-01-13 住友化学株式会社 着色硬化性樹脂組成物
KR102596395B1 (ko) * 2019-03-26 2023-10-31 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4911256B1 (ja) * 2011-06-30 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置、及び、有機発光表示装置

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EP2144967A2 (en) * 2007-03-05 2010-01-20 Basf Se Surface-modified nanoparticles comprising a cationic colorant for use in color filters
JP5448352B2 (ja) * 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
TW201111447A (en) * 2009-07-14 2011-04-01 Sumitomo Chemical Co Production method of pigment dispersion solution
JP5579536B2 (ja) * 2009-09-03 2014-08-27 富士フイルム株式会社 着色硬化性組成物及びその調製方法、カラーフィルタ及びその製造方法、並びに固体撮像素子
KR20110070246A (ko) * 2009-12-18 2011-06-24 동우 화인켐 주식회사 안료 분산 조성물, 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 화상표시장치
JP5659853B2 (ja) * 2010-04-08 2015-01-28 Jsr株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP4911253B1 (ja) * 2011-04-28 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4911256B1 (ja) * 2011-06-30 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置、及び、有機発光表示装置

Also Published As

Publication number Publication date
TW201350544A (zh) 2013-12-16
CN103360790A (zh) 2013-10-23
KR20130115141A (ko) 2013-10-21
JP2013235257A (ja) 2013-11-21
JP6192968B2 (ja) 2017-09-06
CN103360790B (zh) 2019-05-03
TWI613260B (zh) 2018-02-01

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