KR101998777B1 - 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 - Google Patents

착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 Download PDF

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KR101998777B1
KR101998777B1 KR1020170005959A KR20170005959A KR101998777B1 KR 101998777 B1 KR101998777 B1 KR 101998777B1 KR 1020170005959 A KR1020170005959 A KR 1020170005959A KR 20170005959 A KR20170005959 A KR 20170005959A KR 101998777 B1 KR101998777 B1 KR 101998777B1
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South Korea
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group
atom
formula
carbon atoms
hydrocarbon group
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KR1020170005959A
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English (en)
Korean (ko)
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KR20180083549A (ko
Inventor
오용호
장호진
이종수
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동우 화인켐 주식회사
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Priority to KR1020170005959A priority Critical patent/KR101998777B1/ko
Priority to JP2017245715A priority patent/JP6552591B2/ja
Priority to CN201711417312.2A priority patent/CN108303850B/zh
Priority to TW107100483A priority patent/TWI668274B/zh
Publication of KR20180083549A publication Critical patent/KR20180083549A/ko
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Publication of KR101998777B1 publication Critical patent/KR101998777B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/14—Benzoxanthene dyes; Benzothioxanthene dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020170005959A 2017-01-13 2017-01-13 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 KR101998777B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020170005959A KR101998777B1 (ko) 2017-01-13 2017-01-13 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
JP2017245715A JP6552591B2 (ja) 2017-01-13 2017-12-22 着色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
CN201711417312.2A CN108303850B (zh) 2017-01-13 2017-12-25 着色感光性树脂组合物、利用其制造的滤色器和图像显示装置
TW107100483A TWI668274B (zh) 2017-01-13 2018-01-05 著色感光性樹脂組合物、利用其製造的濾色器和圖像顯示裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170005959A KR101998777B1 (ko) 2017-01-13 2017-01-13 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치

Publications (2)

Publication Number Publication Date
KR20180083549A KR20180083549A (ko) 2018-07-23
KR101998777B1 true KR101998777B1 (ko) 2019-07-10

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Country Status (4)

Country Link
JP (1) JP6552591B2 (ja)
KR (1) KR101998777B1 (ja)
CN (1) CN108303850B (ja)
TW (1) TWI668274B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
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KR20200061038A (ko) * 2018-11-23 2020-06-02 주식회사 엘지화학 화합물, 이를 포함하는 색재 조성물, 감광성 수지 조성물, 감광재, 컬러필터, 디스플레이 장치

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KR102503367B1 (ko) * 2016-11-16 2023-02-24 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102321087B1 (ko) * 2018-11-23 2021-11-02 주식회사 엘지화학 감광성 수지 조성물, 감광재, 컬러필터 및 디스플레이 장치
WO2020130441A1 (ko) * 2018-12-21 2020-06-25 주식회사 엘지화학 감광성 수지 조성물, 감광재, 컬러필터 및 디스플레이 장치

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KR102503367B1 (ko) * 2016-11-16 2023-02-24 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200061038A (ko) * 2018-11-23 2020-06-02 주식회사 엘지화학 화합물, 이를 포함하는 색재 조성물, 감광성 수지 조성물, 감광재, 컬러필터, 디스플레이 장치
KR102330963B1 (ko) 2018-11-23 2021-11-24 주식회사 엘지화학 화합물, 이를 포함하는 색재 조성물, 감광성 수지 조성물, 감광재, 컬러필터, 디스플레이 장치

Also Published As

Publication number Publication date
KR20180083549A (ko) 2018-07-23
CN108303850B (zh) 2021-05-18
CN108303850A (zh) 2018-07-20
TWI668274B (zh) 2019-08-11
JP6552591B2 (ja) 2019-07-31
JP2018112736A (ja) 2018-07-19
TW201829637A (zh) 2018-08-16

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